DOI QR코드

DOI QR Code

Studies of electron emitters for a miniaturized electron column design

초소형 전자 칼럼 설계를 위한 전자 방출원 연구

  • Kim, Young-Chul (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sunmoon University) ;
  • Kim, Dae-Wook (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sunmoon University) ;
  • Ahn, Seung-Joon (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sunmoon University) ;
  • Kim, Ho-Seob (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sunmoon University) ;
  • Jang, Won-Kweon (Dept. of Physics, Hansoe University)
  • 김영철 (선문대학교 신소재과학과, 차세대반도체기술연구소) ;
  • 김대욱 (선문대학교 신소재과학과, 차세대반도체기술연구소) ;
  • 안승준 (선문대학교 신소재과학과, 차세대반도체기술연구소) ;
  • 김호섭 (선문대학교 신소재과학과, 차세대반도체기술연구소) ;
  • 장원권 (한서대학교, 컴퓨터응용물리학과)
  • Published : 2002.08.01

Abstract

We examine the adjustment of the semiconvergent angle and current for the miniaturized micro column working at low voltage but producing maximized current. Our study shows that the minimum electron beam sizes are 10 ㎚ for the cold field emitter (CFE) and 20 ㎚ for the thermal field emitter (TFE) at a given condition.

저전압(~1 ㎸)에서 구동되어 수 ㎁의 전류를 얻을 수 있는 초소형 전자 칼럼(microcolumn) 설계를 위한 프로브(probe) 빔의 직경이 최소가 되는 전자 광학계의 조건을 조사하였다. 프로브 빔의 최소 직경은 전자 방출원의 특성에 의존하는데, 동일 조건의 광학계에 대하여 thermal field emitter(TFE)인 경우 ~20 ㎚인 반면 cold field emitter(CFE)인 경우 ~10 ㎚인 것으로 조사되었다.

Keywords

References

  1. H. S. Kim, M. L. Yu, U. Staufer, L. P. Muray, D. P. Kern, and T. H. P. Chang, “Oxygen processed field emission tips for microcolumn applications,” J. Vac. Sci. Technol. B, vol. 11, no. 6, pp. 2327-2331, 1993 https://doi.org/10.1116/1.586981
  2. M. L. Yu, B. W. Hussey, H. S. Kim, and T. H. P. Chang, “Emission characteristics of ultrasharp cold field emitters,” J. Vac. Sci. Technol. B, vol. 12, no. 6, pp. 3431-3435, 1994. https://doi.org/10.1116/1.587526
  3. E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, “Sub-40 nm resolution 1 keV scanning tunneling microscope fieldemission microcolumn,” J. Vac. Sci. Technol. B, vol. 12, no. 6, pp. 3503-3507, 1994. https://doi.org/10.1116/1.587459
  4. E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, “An electronbeam microcolumn with improved resolution, beam current, and stability,” J. Vac. Sci. Technol. B, vol. 13, no. 6, pp. 2498-2503, 1995. https://doi.org/10.1116/1.588381
  5. M. G. R. Thomson and T. H. P. Chang, “Lens and deflector design for microcolumns,” J. Vac. Sci. Technol. B, Vol. 13, no. 6, pp. 2445-2449, 1995. https://doi.org/10.1116/1.588018
  6. P. W. Hawkers and E. Kasper, Principles of Electron Optics (ACADEMIC PRESS, San Diego, USA, 1989), Chapter 26, vol. 1.
  7. P. W. Hawkers and E. Kasper, Principles of Electron Optics (ACADEMIC PRESS, San Diego, USA, 1989), Chapter 24, vol. 1.