• Title/Summary/Keyword: Methyl hippuric acid

Search Result 7, Processing Time 0.03 seconds

Evaluation of Mixed Organic Solvent Exposures in Painting Plants (도료 제조업 근로자들의 복합유기용제 폭로농도에 관한 연구)

  • Choi, Ho Chun;Oh, Doe-Suk;Oh, Se-Min;Chung, Kyou-Chull
    • Journal of Korean Society of Occupational and Environmental Hygiene
    • /
    • v.3 no.2
    • /
    • pp.177-187
    • /
    • 1993
  • The exposure levels of mixed organic solvents for 66 exposed workers in six paint manufacturing plants were evaluated. In 66 exposed workers and 30 control subjects, we also determined the concentrations of toluene and xylene metabolites, hippuric acid, ($o^-$, $m^-$, and $p^-$)methylhippuric acid. The results were as follow ; 1. Seven organic compounds, which on averge accounted for approximately 90% of the identified mass in each painting plants air samples, were selected for quantification : methyl ethyl ketone, ethyl acetate, methyl isobutyl ketone, toluene, butyl acetate, ethyl benzene, ($o^-$, $m^-$, $p^-$)xylene. 2. The average mixed organic solvent exposure levels in 66 points with workplce were 3.8ppm of MEK, 12.2ppm of ethyl acetate, 4.0ppm of MIBK, 28.7ppm of toluene, 3.8ppm of butyl acetate, 10.2ppm of ethyl benzene, 14.6ppm of xylene, respectively. 3. For the total 66 points with workplace, the rate of them of which mixed solvents in air was exceeded th TLV of 1.0 were obtained for 23%(15/66 point). 4. The concentrations of hippuric acid in urine of exposed group and control were $0.94{\pm}0.65g/g$ of creatinine, $0.16{\pm}0.11g/g$ of creatinine, respectively. 5. There was a linear correlation between the end shift hippuric acid acid levels in urine and exposed toluene in air : y=0.02079X+494.2, r=0.6488, n=55 y:hippuric acid in urine(mg/g of creatinine), x:toluene levels in air(ppb) Toluene levels of 100ppm in air have been caculated to hippuric acid of 2.57g/g of creatinine in urine. 6. There was a linear correlation between the end shift methylhippuric acid acid levels in urine and exposed xylene in air : y=0.01664X+31.6, r=0.7264, n=55 y:methylhippuric acid in urine(mg/g of crea.), x:xylene levels in air(ppb) Xylene levels of 100ppm in air have been caculated to methylhippuric acid of 1.69g/g of creatinine in urine.

  • PDF

A Correlation between Urinary Methylhippuric Acid and Hematologic Finding and Urinalysis Index due to Xylene Exposure

  • Lee, Won-Gun;Kim, In-Sik;Kang, Sang-Sun;Hyun, Sung-Hee
    • Biomedical Science Letters
    • /
    • v.18 no.1
    • /
    • pp.42-48
    • /
    • 2012
  • This study was performed to investigate the urinary methyl hippuric acid (UMHA) excretion among aircraft maintenance workers exposed to xylene by examination of blood test, urine test and biochemical tests. Study subjects (301) were divided into 2 groups; non-exposed group (n=123, who were not exposed to xylene), and exposed group (n=178, who were exposed to xylene). The average of blood level and MHA level was normal. The ${\gamma}$-GTP level was 35.5 IU/L (45.7%) in the exposed group and 27.9 IU/L (44.7%) in the non-exposed (control) group. The proportion of total cholesterol (TG) level higher than 150 mg/dl were 34.3% in the exposed group and 21.1% in the non-exposed group. These results were showed statistically significant difference (${\chi}^2$ = 6.10, P<0.05). Other items showed no statistically significant differences. The results of urine tests were no statistically significant differences in protein, occult blood and glucose level.

Biological Exposure Indices of Organic Solvents for Korean Workers (유기용제의 생물학적 폭로기준 설정에 관한 연구)

  • Jang, Jae Yeon;Chun, Hyang Sook;Chung, Ho Keun
    • Journal of Korean Society of Occupational and Environmental Hygiene
    • /
    • v.1 no.2
    • /
    • pp.192-199
    • /
    • 1991
  • Biological exposure indices (BEI) of toluene, perchloroethylene (PCE) and methyl ethyl ketone (MEK) for Korean workers were studied respectively. Environmental exposures in workplace to organic solvent were measured by personal sampling. Blood toluene, blood perchloroethylene, urinary trichloroacetic acid and urinary MEK were determined by headspace gas chromatography. Urinary hippuric acid were determined by HPLC and corrected by creatinine. BEIs for Korean workers were calculated as the levels of determinants which are correspond to permissible exposure limits in Korea. Blood toluene level of 2.2mg/l and urinary hippuric acid level of 1.7g/g creatinine are correspond to an exposure of 100 ppm toluene. Blood PCE concentration of 1.6mg/l and urinary trichloroacetic acid concentration of 2.9mg/l are correspond to an exposure of 50ppm PCE. Urinary MEK concentration of 1.0mg/l is correspond to an exposure of 200ppm of MEK. BEIs for Korean workers determined in this study are very different to ACGIH's BEI as urinary determinants are much lower and blood determinants are much higher than ACGIH's BEI.

  • PDF

Expression of cytochrome P-450(CYP)2B1/2 in lymphocytes of workers exposed to toluene and xylene (Toluene과 Xylene 노출 근로자의 림포사이트에서 Cytochrome P-450(CYP)2B1/2의 발현)

  • Kim, Ki-Woong
    • Journal of Korean Society of Occupational and Environmental Hygiene
    • /
    • v.21 no.1
    • /
    • pp.49-54
    • /
    • 2011
  • In order to develop the methods for exposure assessment and find susceptibility markers for the workers who are exposed to low doses of toluene, xylene and other chemical in petroleum industries, we investigated the application of P-450 expression in human lymphocytes utilizing mouse monoclonal anti-rat CYP2B1/2, the levels of toluene and xylene in air and their metabolite levels in urine with the levels of expressed CYP2B1/2 proteins. The general characteristics such as age, smoking and drinking habit were no significant difference between the control and exposed workers, but the working durations and working hours were significantly different. Workers in exposed group were exposed to the mean of 2.1 ppm (range, 0.00-4.54) of toluene and 0.3 ppm (rang, 0.00-1.23) of xylene. The mean concentration of urinary hippuric acid was low and less than 1/5 of the biological exposure index recommended by the Ministry of Employment and Labor Korea. Methyl hippuric acid in urine was not detected in control and exposed workers. Also, there were no significant differences in the levels of the urinary metabolites between the control and exposed group. When chemiluminescence dot blottings were carried out utilizing mouse monoclonal antibody against CYP2B1/2, the strong density dots corresponding to a mouse monoclonal antibody was observed in the human lymphocytes from the exposed workers. These results suggested that the chemiluminescence dot blot assay for CYP of lymphocytes should be valuable for identifying CYP expression as biomarkers in the workers exposed to toluene and xylene.

Urinary Metabolites of Dimethylformamide, Methyl Ethyl Ketone, and Toluene exposed Workers in Synthetic Leather Factories (일부 합성피혁 근로자들의 Dimethylformamide, Methyl Ethyl Ketone, Toluene 노출에 따른 요중 대사물질)

  • Choi, Ho-Chun;Kim, Kang Yoon;An, Sun-Hee;Lee, Young-Ja;Chung, Kyou-Chull
    • Journal of Korean Society of Occupational and Environmental Hygiene
    • /
    • v.11 no.2
    • /
    • pp.135-144
    • /
    • 2001
  • This study was performed to measure airborne dimethylformamide(DMF), methyl ethyl ketone(MEK) and toluene and their urinary metabolites concentrations and to determine the relationship between airborne and urinary concentration. Airborne samples and their urinary metabolites were measured 98 male workers who work for 8 synthetic leather factories in a portion of Kyoung-In area. Urine samples were collected at end-of-shift to estimate the exposure levels. 1. The concentration of airborne DMF by process was 8.81 ppm for wet-mixing, 15.05 ppm for wet-coating, 6.03 ppm for dry-mixing, 5.58 ppm for dry-coating, 5.37 ppm for printing, and 9.03 ppm for total. There was statistically significant difference by process. Urinary NMF concentrations of wet-mixing, wet-coating, dry-mixing, dry-coating and printing were $90.55mg/{\ell}$, $79.80mg/{\ell}$, $39.86mg/{\ell}$, $25.23mg/{\ell}$, and $38.15mg/{\ell}$, respectively, and total geometric mean was $56.24mg/{\ell}$. There was significant difference by process. 2. The concentration of airborne MEK by process was 1.89 ppm for wet-mixing, 1.96 ppm for wet-coating, 10.33 ppm for dry-mixing, 29.24 ppm for dry-coating, 14.98 ppm for printing, and 4.87 ppm for total. There was statistically significant difference by process. Urinary MEK concentrations of wetmixing, wet-coating, dry-mixing, dry-coating and printing were $0.93mg/{\ell}$, $0.70mg/{\ell}$, $3.29mg/{\ell}$, $3.29mg/{\ell}$, and $1.06mg/{\ell}$, respectively, and total geometric mean was $1.25mg/{\ell}$. There was statistically significant difference by process. Urinary MEK 3. The concentration of airborne toluene by process was 0.35ppm for wet-mixing, 0.42ppm for wet-coating, 2.95ppm for dry-mixing, 11.67ppm for dry-coating, 4.88ppm for printing, 1.24ppm for total. There was statistically significant difference by process. Urinary hippuric acid concentrations of wet-mixing, wet-coating, dry-mixing, dry-coating and printing were 0.24g/g creatinine, 0.21g/g creatinine, 0.34g/g creatinine, 0.52g/g creatinine, and 0.29g/g creatinine, respctively and total geometric mean was 0.28g/g creatinine. There was statistically significant difference by process. 4. No. of exceeded KPEL was 40 workers(40.8%) for DMF(10ppm), 1 worker(1.0%) for MEK(200ppm), and no worker for toluene(100ppm). No. of exceeded KBEI was 62 workers(63.3%) for urinary NMF($40mg/{\ell}$), 29 workers(29.6%) for urinary MEK, 1 worker(1.0%) for urinary hippuric acid. 5. The regression equations were Log(NMF)=0.4094*Log(DMF)+1.3587(r=0.4516) for DMF, Log(MEKU)=0.1859*Log(MEK)-0.0324(r=0.3303) for MEK, Log(HA)=0.2106*Log(Toluene)-0.5685(r=0.4497) for toluene. Synthetic leather factory workers expose to 3 kinds of organic solvents which are DMF, MEK and toluene. Their urinary NMF and MEK levels were higher than their concentration levels through respiratory. It seems that the urinary levels were affected skin absorption for working habit and alcohol intake.

  • PDF

Antimicrobial Assessment of Some Heterocyclic Compounds Utilizing Ethyl 1-Aminotetrazole-5-carboxylate (Ethyl 1-Aminotetrazole-5-carboxylate로부터 유도된 헤테로고리 화합물들의 항균 활성 시험)

  • Taha, Mamdouh A. M.;El-Badry, Susan M.
    • Journal of the Korean Chemical Society
    • /
    • v.54 no.4
    • /
    • pp.414-418
    • /
    • 2010
  • Ethyl 1-aminotetrazole-5-carboxylate (1) reacted with hydrazine hydrate to give the corresponding aminohydrazide 2. Cyclization of 2 by carbon disulfide yielded 1,3,4-oxadiazole-5-thiol structure 3. Reaction of 3 with either chloroacetone or ethyl chloroacetate furnished S-acyl 1,3,4-oxadiazole derivatives 4 and 5, respectively. Also compound 3 reacted with hydrazine hydrate afforded 4-amino-1,2,4-triazole-5-thiol derivative 6. 6-Methyl-1,3,4-triazolo[3,4-b]-1,3,4-thiadiazole structure 7 was synthesized by reaction of aminothiol 6 with glacial acetic acid. Diazotization of 1 with sodium nitrite in presence of hydrochloric acid yielding the diazonium salt which on treating with hippuric acid, oxazolone derivative 8 was obtained. Furthermore, tetrazolo[5,1-f]-1,2,4-triazine 9 was constructed via cyclization of aminoester 1 with formamide. Compound 9 reacted with carbon disulfide to furnish 8-thione derivative 10 which reacting with chloroacetone, ethyl chloroacetate, and hydrazine hydrate, the corresponding chemical structures 11, 12, and 13 were synthesized. 1,2,4-Triazolo[4,3-d]tetrazolo[5,1-f]-1,2,4-triazines 14 and 15 were resulted by treating of compound 13 with triethyl orthoformate, and glacial acetic acid, respectively. The structures of the newly synthesized products were elucidated according to elemental analyses and spectroscopic evidences. Some of the representative members of the prepared compounds were screened for antimicrobial activity.

Exposures of Organic Solvent Mixtures to Rotogravure Printing Workers (일부 그라비아 인쇄업 근로자의 혼합 유기용제 노출농도)

  • Choi, Ho-Chun;Kim, Kangyoon;An, Sun-Hee;Chung, Kyou-Chull
    • Journal of Korean Society of Occupational and Environmental Hygiene
    • /
    • v.7 no.1
    • /
    • pp.71-85
    • /
    • 1997
  • The purpose of this study was to evaluate concentrations of organic solvent mixtures in air of rotogravure printing workplaces. Qualitative and quantitative analysis of organic solvents contained in the gravure inks used at rotogravure factories had been done. The results obtained were as follows: 1. The gravure inks mainly consist of toluene, methyl ethyl ketone(MEK), and ethyl acetate(EA), and traces of isopropyl alcohol(IPA), xylene, 2-butanol, cyclohexane, cellosolve etc were also contained in them. 2. Thinner used as a diluent consist of toluene, MEK, and EA. 3. Geometric mean concentration of toluene in ambient air were 23.81 ppm at gravure printing of packing material, 42.10 ppm at gravure printing of wallpaper, 16.95 ppm at gravure printing of plastic bottle for beverage and 4.31 ppm at gravure printing of plywood printing or floor covering. Concentrations of toluene in ambient air showed statistically significant difference between types of printing. 4. Concentrations of MEK in ambient air were 12.43 ppm at gravure printing of packing material, 5.47 ppm at gravure printing of wallpaper, 16.78 ppm at gravure printing of plastic bottle for beverage and 16.44 ppm at gravure printing of plywood printing or floor covering. MEK concentrations in ambient air showed no significant difference. 5. Conentrations of EA were 14.30 ppm at gravure printing of packing material, 1.92 ppm at gravure printing of wallpaper and 21.12 ppm at gravure printing of plywood printing or floor covering. EA concentrations in ambient air shown significant difference. 6. Percentage of the workplaces where the ambient air concentration of organic solvent mixtures exceeded the Korean Permissble Exposure Level(KPEL) amounted to 18.03%. 7. Toluene concentrations in ambient air of rotogravure printing workplaces ranged from 0.69 to 156.02 ppm and urinary hippuric acid excretion ranged from 0.10 to $1.32g/{\ell}$.

  • PDF