• 제목/요약/키워드: Metallization Thickness

검색결과 53건 처리시간 0.034초

도체 두께를 가진 결합선로를 이용하여 강한 결합특성을 갖는 1/4파장 역방향 방향성 결합기의 설계 (Design of Tight Coupled 1/4 Wavelength Backward-Wave Directional Coupler using Coupled Lines with Finite Metallization Thickness)

  • 홍익표;윤남일;육종관
    • 한국전자파학회논문지
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    • 제14권10호
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    • pp.1004-1010
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    • 2003
  • 본 논문에서는 유한한 도체 두께를 갖는 결합선로를 이용하여 1/4파장 역방향 방향성 결합기를 설계하였다. 방향성 결합기를 구성하는 유한 도체 두께를 갖는 결합선로를 해석하기 위한 방법으로 간단하고 빠른 수치해석 방법인 모드정합법을 사용하였다. 본 논문의 해석 결과는 도체 두께를 고려한 역방향 방향성 결합기의 설계가, 도체 두께를 고려하지 않고 설계한 경우 기존에 알려졌던 단점들인 약한 결합특성, 낮은 지향성, 그리고 비현실적인 결합선로의 폭을 극복할 수 있음을 보여준다. 또한, 수치해석 결과로부터 l/4파장 역방향 방향성 결합기에서는 도체 두께의 고려로 강한 결합특성을 만드는 것이 가능하지만, 결합길이가 약간 길어진다는 사실을 확인하였다. 본 논문에서 해석한 유한한 도체 두께는 역방향 방향성 결합기의 새로운 설계 변수로서 사용이 가능하며, 아울러 다양한 마이크로파 집적회로의 설계에도 응용이 가능함을 보여준다.

압력센서의 배선을 위한 다층 박막의 지지조건 변화에 따른 잔류응력 평가 (Evaluation of the Residual Stress with respect to Supporting Type of Multi-layer Thin Film for the Metallization of Pressure Sensor)

  • 심재준;한근조;김태형;한동섭
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1537-1540
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    • 2003
  • MEMS technology with micro scale is complete system utilized as the sensor. micro electro device. The metallization of MEMS is very important to transfer the power operating the sensor and signal induced from sensor part. But in the MEMS structures local stress concentration and deformation is often happened by geometrical shape and different constraint on the metallization. Therefore. this paper studies the effect of supporting type and thickness ratio about thin film thickness of the substrate thickness for the residual stress variation caused by thermal load in the multi-layer thin film. Specimens were made from materials such as Al, Au and Cu and uniform thermal load was applied, repeatedly. The residual stress was measured by FEA and nano-indentation using AFM. Generally, the specimen made of Al induced the large residual stress and the 1st layer made of Al reduced the residual stress about half percent than 2nd layer. Specimen made of Cu and Au being the lower thermal expansion coefficient induce the minimum residual stress. Similarly the lowest indentation length was measured in the Au_Cu specimen by nano-indentation.

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Programmable Metallization Cell(PMC) 소자에서 Ag와 칼코게나이드 박막의 두께에 따른 전기적 광학적 특성 (Electrical and Optical Properties on Thickness of Ag and Chalcogenide Thin Films at Programmable Metallization Cell Device)

  • 최혁;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.24-24
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    • 2007
  • We have demonstrated new functionalities of Ag doped chalcogenide glasses based on their capabilities as solid electrolytes. Formation of such amorphous systems by the introduction of silver via photo-induced diffusion in thin chalcogenide films is considered. The influence of silver on the properties of the newly formed materials is regarded in terms of diffusion kinetics and Ag saturation is related to the composition of the hosting material. Silver saturated chalcogenide glasses have been used in the formation of solid electrolyte which is the active medium in programmable metallization cell (PMC) devices. In this paper, we investigated electrical and optical properties of Ag-doped chalcogenide thin film on changed thickness of Ag and chalcogenide thin films, which is concerned at Ag-doping effect of PMC cell. As a result, when thickness of Ag and chalcogenide thin film was 30nm and 50nm respectively, device have excellent characteristics.

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초발수 기판의 친수 패터닝을 이용한 금속배선화 (Patterning of Super-hydrophobic Surface Treated Polyimide Film)

  • 나종주;엄대용;이건환;최두선;김완두
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1553-1555
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    • 2008
  • Super-hydrophobic treated Polyimide film was used as a flexible substrate for developing a new method of metallization. Hydrophilic patterns were fabricated by IN irradiation through shadow mask. Patterned super-hydrophobic substrate was dipped into a bath containing silver nano ink Silver ink was only coated on hydrophilic patterned area. Metal lines of $600{\mu}m$ pitch were fabricated successfully. However, their thickness was too thin to serve as interconnection. To overcome this problem, iterative dipping was conducted. After repeating five times, the thickness of silver metal lines were increased to over than $2{\mu}$. After heat treatment of silver lines, their resistivities were reduced to order of $30{\mu}{\Omega}$-cm the similar level of values reported in other literatures. So, a new method of metallization has high potential for application of RFID antenna and flexible electronics substrates.

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Programmable Metallization Cell 응용을 위한 Ag-doped 칼코게나이드 박막의 전기적 저항 변화 특성 (Properties on Electrical Resistance Change of Ag-doped Chalcogenide Thin Films Application for Programmable Metallization Cell)

  • 최혁;구상모;조원주;이영희;정홍배
    • 한국전기전자재료학회논문지
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    • 제20권12호
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    • pp.1022-1026
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    • 2007
  • We have demonstrated new functionalities of Ag doped chalcogenide glasses based on their capabilities as solid electrolytes. Formation of such amorphous systems by the introduction of silver via photo-induced diffusion in thin chalcogenide films is considered. The influence of silver on the properties of the newly formed materials is regarded in terms of diffusion kinetics and Ag saturation is related to the composition of the hosting material. Silver saturated chalcogenide glasses have been used in the formation of solid electrolyte which is the active medium in programmable metallization cell (PMC) devices. In this paper, we investigated electrical and optical properties of Ag-doped chalcogenide thin film on changed thickness of Ag and chalcogenide thin films, which is concerned at Ag-doping effect of PMC cell. As a result, when thickness of Ag and chalcogenide thin film was 30 nm and 50 nm respectively, device have excellent characteristics.

구리 및 은 금속 배선을 위한 전기화학적 공정 (Electrochemical Metallization Processes for Copper and Silver Metal Interconnection)

  • 권오중;조성기;김재정
    • Korean Chemical Engineering Research
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    • 제47권2호
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    • pp.141-149
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    • 2009
  • 초고속 연산용 CMOS(complementary Metal Oxide Semiconductor) 배선재료로 사용되고 있는 구리(Cu)가, 기가급 메모리 소자용 금속 배선 물질에도 사용이 시작되면서 구리 박막에 대한 재료 및 공정이 새로운 조명을 받고 있다. 반도체 금속 배선에 사용하는 수 nm 두께의 구리 박막의 형성에 전해도금(electrodeposition)과 무전해 도금(electroless deposition) 같은 전기화학적 방법을 이용하게 되어서 표면 처리, 전해액 조성과 같은 중요한 요소에 대한 최신 연구 동향을 요약하였다. 구리 박막에서 구리 배선을 제작하여야 하므로 새로운 패턴 기술인 상감기법이 도입되어, 구리도금과 상감기법과의 공정 일치성 관점에서 전해도금과 무전해 도금의 요소 기술에 대해 기술하였다. 구리보다 비저항이 낮아 차세대 소자용 배선에 있어서 적용이 예상되는 은(Ag)을 전기화학적 방법으로 금속 배선에 적용하는 최신 연구에 대하여도 소개하였다.

결정입계 처리에 따른 다결정 실리콘 태양전지의 효율 향상 (Efficiency Improvement of Polycrystalline Silicon Solar Cells using a Grain boundary treatment)

  • 김상수;김재문;임동건;김광호;원충연;이준신
    • E2M - 전기 전자와 첨단 소재
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    • 제10권10호
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    • pp.1034-1040
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    • 1997
  • A solar cell conversion effiency was degraded by grain boundary effect in polycrystalline silicon. Grain boundaries acted as potential barriers as well as recombination centers for the photo-generated carriers. To reduce these effects of the grain boundaries we investigated various influencing factors such as emitter thickness thermal treatment preferential chemical etching of grain boundaries grid design contact metal and top metallization along boundaries. Pretreatment in $N_2$atmosphere and gettering by POCl$_3$and Al were performed to obtain multicrystalline silicon of the reduced defect density. Structural electrical and optical properties of slar cells were characterized before and after each fabrication process. Improved conversion efficiencies of solar cell were obtained by a combination of pretreatment above 90$0^{\circ}C$ emitter layer of 0.43${\mu}{\textrm}{m}$ Al diffusion in to grain boundaries on rear side fine grid finger top Yb metal and buried contact metallization along grain boundaries.

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$RuO_2$/n-GaN 구조의 Schottky Diode 특성 (Characteristics of $RuO_2$/n-GaN Schottky Diode)

  • 김동식
    • 전자공학회논문지 IE
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    • 제46권3호
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    • pp.1-5
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    • 2009
  • 고전력, 고온에서 사용되는 소자에서 RuO2는 다른 전극 물질에 비해 많은 장점을 가지고 있으며, 특히 GaN를 이용하는 소자의 전극물질로서 매우 우수한 특성을 갖음을 확인할 수 있었다. RuO2을 이용한 GaN 소자의 제작은 새로운 전기화학 금속증착법을 통하여 금속배선을 형성하였으며, 과염소산(HClO4)용액을 수용액 사용하였다. RuO2의 두께는 인가전압과 시간에 의존하며, 두께를 조절함으로서 정류성 및 비정류성 소자의 전극으로의 사용 가능성을 확인할 수 있었다.

차폐된 코플래너 도파로의 전송특성 (Propagation Characteristics of Shielded Coplanar Waveguides)

  • 김영택;이택경
    • 전자공학회논문지A
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    • 제32A권9호
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    • pp.1236-1243
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    • 1995
  • The propagation characteristics of the symmetric and the asymmetric shielded coplanar waveguide with finite metallization thickness is analyzed by boundary integral method employing the equivalence principle. Since the Green's function and the basis functions are composed of sinusoidal functions, the integration in Galerkin's method is solved analytically. The propagation constants of the fundamental and the first higher order mode are obtained and the effects of strip thickness, substrate permittivity, and the asymmetry of the structure are calculated.

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압력센서의 배선을 위한 다층 박막의 지지조건 변화에 따른 잔류응력 평가 (Evaluation of the Residual Stress with Respect to Supporting Type of Multi-layer Thin Film for the Metallization of Pressure Sensor)

  • 심재준;한동섭;한근조
    • 대한기계학회논문집A
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    • 제28권5호
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    • pp.532-538
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    • 2004
  • MEMS technology applying to the sensors and micro-electro devices is complete system. These microsystems are made by variable processes. Especially, the mentallization process has very important functions to transfer the power operating the sensor and signal induced from sensor part. But in the structures of MEMS the local stress concentration and deformation are often yielded by an irregular geometrical shape and different constraint. Therefore, this paper studies the effect of supporting type and thickness ratio about thin film of the substrate on the residual stress variation when the thermal loads is applied to the multi-layer thin film fabricated by metallization process. Specimens were made from several materials such as Al, Au and Cu. Then, uniform thermal load was applied, repeatedly. The residual stress was measured by FE Analysis and nano-indentation method using AFM. Generally, the specimen made of Al induced the larger residual stress than that of made of other materials. Specimen made of Cu and Au having the low thermal expansion coefficient induces the minimum residual stress. Similarly, the lowest indentation length was measured by nano-indentation method in the Si/Au/Cu specimen. Particularly, clusters are created in the specimen made of Cu by thermal load and the indentation length became increasingly large by cluster formation.