• Bulletin of the Korean Chemical Society
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• 제28권4호
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• pp.553-556
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• 2007

We previously reported a 27.12 MHz inductively coupled plasma source at atmospheric pressure for atomic emission spectrometry based on polymer microchip plasma technology. For the PDMS polymer microchip plasma, molecular emission was observed, but no metallic detection was done. In this experiment, a lab-made electrothermal vaporizer (ETV) with tantalum coil was connected to the microchip plasma for aqueous sample introduction to detect metal ions. The electrode geometry of this microchip plasma was redesigned for better stability and easy monitoring of emission. The plasma was operated at an rf power of 30-70 W using argon gas at 300 mL/min. Gas kinetic temperatures between 800-3200 K were obtained by measuring OH emission band. Limits of detection of about 20 ng/mL, 96.1 ng/mL, and 1.01 μ g/mL were obtained for alkali metals, Zn, and Pb, respectively, when 10 μ L samples in 0.1% nitric acid were injected into the ETV.

• Current Applied Physics
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• 제18권12호
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• pp.1553-1557
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• 2018

Gallium nitride (GaN) nanoparticles are synthesized by the gallium particle trapping effect in a $N_2$ nonthermal plasma with metallic Ga vapor. A proposed method has an advantage of synthesized GaN nanoparticle purity because the gallium vapor from the inductively heated tungsten boat does not contain any impurity source. The synthesized particle size can be controlled by the amount of Ga vapor, which is adjusted using the plasma emission ratio of nitrogen to gallium, owing to the particle trapping effect. The synthesized nanoparticles are investigated by electron microscopy studies. High-resolution transmission electron microscopy (HRTEM) studies confirm that the synthesized GaN nanoparticles (10-40 nm) crystallize in a single-phase wurtzite structure. Room-temperature photoluminescence (PL) measurements indicate the band-edge emission of GaN at around 378 nm without yellow emission, which implies that the synthesized GaN nanoparticles have high crystallinity.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 춘계학술강연 및 발표대회강연 및 발표논문 초록집
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• pp.44-44
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• 2006

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2005년도 추계학술발표회 및 workshop
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• pp.168-168
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• 2005

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2005년도 추계학술강연 및 발표대회강연 및 발표논문 초록집
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• pp.106-106
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• 2005

• 한국재료학회지
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• 제3권6호
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• pp.565-574
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• 1993

Ar/Ar-$H_{2}$ 플라즈마법으로 고순도 Nb금속을 환원 정련하였다. 또한, Ar-(20%)$H_{2}$플라즈마에서의 용융Nb금속과 수소간의 반응을 해석하였다. Ar플라즈마 환원에서는 $C/Nb_{2}O_{5}$=5.00의 비에서 99.5wt%의 금속 Nb을 얻었으며, 니오븀 산화물의 열분해에 의한 O/Sub 2/의 손실은 발생하지 않았다. Ar-(20%)$H_{2}$ 플라즈마에서는 $C/Nb_{2}O_{5}$=4.80의 비에서 99.8wt%의 금속 Nb을 제조하였다. 주된 탈산반응은 H, $H_{2}$와의 반응이었으며,$NbO_{x}$의 증발에 의한 탈산은 발생하지 않았으나, "splash"효과에 의해 Nb의 질량손실이 발생함을 관찰하였다. 탈산반응은 1차 반응속도론에 따랐으며, 탈산의 반응속도 상수(k')는 $7.8 \times 10_{-7}$(m/sec)였다. Ar-(20%)$H_{2}$ 플라즈마법에서 Nb금속 내의 수소 용해도는 60ppm으로 분자상태 수소의 용해도인 40ppm 보다 높았으며, 포화되는 시간은 60초 이내였다. 이를 다시 Ar 플라즈마로 처리함으로써 수소 함량을 10ppm 이하로 감소시킬 수 있었다.소시킬 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.301-301
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• 2010

In order to enhance the efficiency of the organic solar cells, the effects of plasma surface treatment with using $CF_4$ and $O_2$ gas on the anode ITO were studied. The polymer solar cell devices were fabricated on ITO glasses an active layer of P3HT (poly-3-hexylthiophene) and PCBM ([6,6]-phenyl C61-butyric acid methyl ester) mixture, without anode buffer layer, such as PEDOT:PSS layer. The metallic electrode was formed by thermally evaporated Al. Before the coating of organic layers, ITO surface was exposed to plasma made of $CF_4$ and $O_2$ gas, with/without heat treatment. In order to identify the effect the surface treatment, the current density and voltage characteristics were measured by solar simulator and the chemical composition of plasma treated ITO surface was analyzed by using X-ray photoelectron spectroscopy(XPS). In addition, the work function of the plasma treated ITO surface was measured by using ultraviolet photoelectron spectroscopy(UPS). The effects of plasma surface treatment can be attributed to the removal organic contaminants of the ITO surface, to the improvement of contact between ITO and buffer layer, and to the increase of work function of the ITO.

• 한국분말재료학회지
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• 제11권4호
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• pp.328-332
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• 2004

Fe nanopowders were successfully synthesized by plasma arc discharge (PAD) process using Fe rod. The influence of chamber pressure on the microstructure was investigated by means of X-ray Diffraction (XRD), Field Emission Scanning Electron Microscope (FE-SEM), Transmission Electron Microscopy (TEM) and X-ray Photoelectron Spectroscopy (XPS). The prepared particles had nearly spherical shapes and consisted of metallic cores (a-Fe) and oxide shells (Fe$_{3}$O$_{4}$), The powder size increased with increasing chamber pressure due to the higher dissolution and ejection rate of H$_2$ and gas density in the molten metal.

• Journal of Magnetics
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• 제11권4호
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• pp.156-159
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• 2006

We have studied the magnetic properties of the CuNi nanoparticles for three different sizes prepared by plasma and chemical techniques. The magnetization is enormously enhanced with decreasing the nanoparticle size. This enhanced magnetic moment shows almost inversely linear temperature dependence, which could be interpreted by the Langevin-type superparamagnetism. The field dependence exhibits ferromagnetic-like behavior with weak hysteresis, which could described in terms of uncompensated spin and/or surface anisotropy. In addition, the magnetic data suggest that the CuNi nanoparticles produced by the plasma method result in significantly less oxidized metallic nanoparticles than those prepared by other techniques.

• Current Optics and Photonics
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• 제2권4호
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• pp.378-382
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• 2018

In most previous investigations of plasmonic and metamaterial applications, the metallic film has been regarded as a perfect electrical conductor. Here we demonstrate the resonance characteristics of THz metamaterials fabricated from metal film that has a finite dielectric constant, using finite-difference time-domain simulations. We found strong redshift and spectral broadening of the resonance as we decrease the metal's plasma frequency in the Drude free-electron model. The frequency shift can be attributed to the effective thinning of the metal film, originating from the increase in penetration depth as the plasma frequency decreases. On the contrary, only peak broadening occurs with an increase in the scattering rate. The metal-thickness dependence confirms that the redshift and spectral broadening occur when the effective metal thickness drops below the skin-depth limit. The electromagnetic field distribution illustrates the reduced field enhancement and reduced funneling effects near the gap area in the case of low plasma frequency, which is associated with reduced charge density in the metal film.