• Title/Summary/Keyword: Metal-insulator composite

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Properties and Structure of High Frequency Soft Magnetic Nano-composite Films

  • Ohnuma, Shigehiro;Masumoto, Hiroshi
    • Journal of Magnetics
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    • v.16 no.4
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    • pp.403-407
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    • 2011
  • Metal-insulator type, nano-granular soft magnetic films have been reviewed from the viewpoint of high frequency magnetic materials. The formation of nano-granular structure is related to the magnitude of heat of formation of intergranule materials. Variation of the ratio of granule phase to intergranule phase in the film is found to produce various characteristics in the magnetic properties of the film. The HRTEM observation reveals that neighboring granules in the film with above 60 at.% Co, contact at considerable points and the films show soft magnetic properties which are explainable in terms of the random anisotropy model for nano-crystalline materials. Addition of Ni group elements in Co-O based films enhances their anisotropy field up to 400 Oe and they exhibit excellent frequency response of permeability. Also, large electromagnetic noise suppression effect is demonstrated as one of their potential applications.

Fabrication and measurement of RH/LH mode-switchable CRLH transmission line based on silicon RF MEMS switches (실리콘 RF MEMS 스위치 기반의 RH/LH 모드 스위칭이 가능한 CRLH 전송선 제작 및 측정)

  • Hwang, Sung-Hyun;Jang, Tae-Hee;Bang, Yong-Seung;Kim, Jong-Man;Kim, Yong-Kweon;Lim, Sung-Joon;Baek, Chang-Wook
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1507_1508
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    • 2009
  • This study proposes a composite right/left-handed transmission line (CRLH-TL) that permits switching between the right-handed (RH) and left-handed (LH) modes using single crystalline silicon (SCS) RF MEMS switches. It is possible to change modes from the RH to LH mode, or vice versa, by controlling the admittance of capacitors and the impedance of inductors using switch operations. The proposed switchable CRLH-TL consists of SCS RF MEMS switches, metal-insulator-metal (MIM) capacitors and shunt inductors. At 8 GHz, the fabricated device shows a phase response of $87^{\circ}$ with an insertion loss of 2.7 dB in the LH mode, and a phase response of $-77^{\circ}$ with an insertion loss of 0.56 dB in the RH mode.

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Neural Network Modeling of PECVD SiN Films and Its Optimization Using Genetic Algorithms

  • Han, Seung-Soo
    • International Journal of Fuzzy Logic and Intelligent Systems
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    • v.1 no.1
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    • pp.87-94
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    • 2001
  • Silicon nitride films grown by plasma-enhanced chemical vapor deposition (PECVD) are useful for a variety of applications, including anti-reflecting coatings in solar cells, passivation layers, dielectric layers in metal/insulator structures, and diffusion masks. PECVD systems are controlled by many operating variables, including RF power, pressure, gas flow rate, reactant composition, and substrate temperature. The wide variety of processing conditions, as well as the complex nature of particle dynamics within a plasma, makes tailoring SiN film properties very challenging, since it is difficult to determine the exact relationship between desired film properties and controllable deposition conditions. In this study, SiN PECVD modeling using optimized neural networks has been investigated. The deposition of SiN was characterized via a central composite experimental design, and data from this experiment was used to train and optimize feed-forward neural networks using the back-propagation algorithm. From these neural process models, the effect of deposition conditions on film properties has been studied. A recipe synthesis (optimization) procedure was then performed using the optimized neural network models to generate the necessary deposition conditions to obtain several novel film qualities including high charge density and long lifetime. This optimization procedure utilized genetic algorithms, hybrid combinations of genetic algorithm and Powells algorithm, and hybrid combinations of genetic algorithm and simplex algorithm. Recipes predicted by these techniques were verified by experiment, and the performance of each optimization method are compared. It was found that the hybrid combinations of genetic algorithm and simplex algorithm generated recipes produced films of superior quality.

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Controlling Structural and Electrical Properties of Pt Nanopowder-Dispersed SiO2 Film (Pt 나노분말이 분산된 SiO2 박막의 구조 및 전기적 특성 제어)

  • Lee, Jae Ho;Shin, In Joo;Lee, Sung Woo;Kim, Hyeong Cheol;Choi, Byung Joon
    • Journal of Powder Materials
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    • v.21 no.5
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    • pp.355-359
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    • 2014
  • Pt nanopowder-dispersed $SiO_2$ (SOP) films were prepared by RF co-sputtering method using Pt and $SiO_2$ targets in Ar atmosphere. The growth rate and Pt content in the film were controlled by means of manipulating the RF power of Pt target while that of $SiO_2$ was fixed. The roughness of the film was increased with increasing the power of Pt target, which was mainly due to the increment of the size and planar density of Pt nanopowder. It was revealed that SOP film formed at 10, 15, 20 W of Pt power contained 2.3, 2.7, and 3.0 nm of spherical Pt nanopowder, respectively. Electrical conductivity of SOP films was exponentially increased with increasing Pt power as one can expect. Interestingly, conductivity of SOP films from Hall effect measurement was greater than that from DC I-V measurement, which was explained by the significant increase of electron density.

Influence of Ne-Xe Gas Mixture Ratio on the Extreme Ultraviolet (EUV) Emission Measurement from the Coaxially Focused Plasma

  • Lee, Sung-Hee;Hong, Young-June;Choi, Duk-In;Uhm, Han-Sup;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.220-220
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    • 2011
  • The Ne-Xe plasmas in dense plasma-focus device with coaxial electrodes were generated for extreme ultraviolet (EUV) lithography. The influence of gas mixture ratio, Ne-Xe (1, 10, 15, 20, 25, 30, 50%) mixture gas, on EUV emission measurement, EUV intensity and electron temperature in the coaxially focused plasma were investigated. An input voltage of 4.5 kV was applied to the capacitor bank of 1.53mF and the diode chamber was filled with Ne-Xe mixture gas at a prescribed pressure. The inner surface of the cylindrical cathode was lined by an acetal insulator. The anode was made of tin metal. The EUV emission signal of the wavelength in the range of 6~16 nm has been detected by a photo-detector (AXUV-100 Zr/C, IRD). The visible emission line was also detected by the composite-grating spectrometer of the working wavelength range of 200~1100 nm (HR 4000CG). The electron temperature is obtained by the optical emission spectroscopy (OES) and measured by the Boltzmann plot with the assumption of local thermodynamic equilibrium (LTE).

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