• Title/Summary/Keyword: Memory Switching

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Design of Local Field Switching MRAM (Local Field Switching 방식의 MRAM 설계)

  • Lee, Gam-Young;Lee, Seung-Yeon;Lee, Hyun-Joo;Lee, Seung-Jun;Shin, Hyung-Soon
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.8
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    • pp.1-10
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    • 2008
  • In this paper, we describe a design of a 128bit MRAM based on a new switching architecture which is Local Field Switching(LFS). LFS uses a local magnetic field generated by the current flowing through an MTJ. This mode reduces the writing current since small current can induce large magnetic field because of close distance between MTJ and the current. It also improves the cell selectivity over using conventional MTJ architecture because it doesn't need a digit line for writing. The MRAM has 1-Transistor 1-Magnetic Tunnel Junction (IT-1MTJ) memory cell structure and uses a bidirectional write driver, a mid-point reference cell block and a current mode sense amplifier. CMOS emulation cell is adopted as an LFS-MTJ cell to verify the operation of the circuit without the MTJ process. The memory circuit is fabricated using a $0.18{\mu}m$ CMOS technology with six layers o) metal and tested on custom board.

Resistive Switching Properties of Cr-Doped SrZrO3 Thin Film on Si Substrate (실리콘 기판위에서의 Cr-Doped SrZrO3 박막의 저항변화 특성)

  • Yang, Min-Kyu;Ko, Tae-Kuk;Park, Jae-Wan;Lee, Jeon-Kook
    • Korean Journal of Materials Research
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    • v.20 no.5
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    • pp.241-245
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    • 2010
  • One of the weak points of the Cr-doped SZO is that until now, it has only been fabricated on perovskite substrates, whereas NiO-ReRAM devices have already been deposited on Si substrates. The fabrication of RAM devices on Si substrates is important for commercialization because conventional electronics are based mainly on silicon materials. Cr-doped ReRAM will find a wide range of applications in embedded systems or conventional memory device manufacturing processes if it can be fabricated on Si substrates. For application of the commercial memory device, Cr-doped $SrZrO_3$ perovskite thin films were deposited on a $SrRuO_3$ bottom electrode/Si(100)substrate using pulsed laser deposition. XRD peaks corresponding to the (112), (004) and (132) planes of both the SZO and SRO were observed with the highest intensity along the (112) direction. The positions of the SZO grains matched those of the SRO grains. A well-controlled interface between the $SrZrO_3$:Cr perovskite and the $SrRuO_3$ bottom electrode were fabricated, so that good resistive switching behavior was observed with an on/off ratio higher than $10^2$. A pulse test showed the switching behavior of the Pt/$SrZrO_3:Cr/SrRuO^3$ device under a pulse of 10 kHz for $10^4$ cycles. The resistive switching memory devices made of the Cr-doped $SrZrO_3$ thin films deposited on Si substrates are expected to be more compatible with conventional Si-based electronics.

Advanced Tellurium-Based Threshold Switching Devices for High-Density Memory Arrays (Tellurium 기반 휘발성 문턱 스위칭 및 고집적 메모리용 선택소자 응용 연구)

  • Seunghwan Kim;Changhwan Kim;Namwook Hur;Joonki Suh
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.6
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    • pp.547-555
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    • 2023
  • High-density crossbar arrays based on storage class memory (SCM) are ideally suited to handle an exponential increase in data storage and processing as a central hardware unit in the era of AI-based technologies. To achieve this, selector devices are required to be co-integrated with SCM to address the sneak-path current issue that indispensably arises in such crossbar-type architecture. In this perspective, we first summarize the current state of tellurium-based threshold-switching devices and recent advances in the material, processing, and device aspects. We thoroughly review the physicochemical properties of elemental tellurium (Te) and representative binary tellurides, their tailored deposition techniques, and operating mechanisms when implemented in two-terminal threshold switching devices. Lastly, we discuss the promising research direction of Te-based selectors and possible issues that need to be considered in advance.

An Optical Asynchronous Transfer Mode(ATM) Switching System Using Free Space Optics and an Output Buffer Memory (자유공간 광학과 출력 버퍼 메모리를 이용한 광 Asynchronous Transfer Mode(ATM) 교환방식)

  • 지윤규;이상신
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.16 no.4
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    • pp.326-334
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    • 1991
  • We propose an optical Asynchronous Transfer Mode(ATM) switching system using free-space optics and an output buffer memory. The distributor system in the switching fabric was analyzed using the Huygens-Fresnel principle and lens transformation. For monochromatic illumination, a pattern similar to the Fourier transform of the input distribution was observed across the output plane. A spatially broadened intensity distribution across the the output plane can be expected when the system is illminated with a partially coherent, quasimonochromatic beam. Spatially coherent pulses as short as 100fs can propagate through the distributor without severe spatial broadening.

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Dual mode LCD with dynamic mode of horizontal switching

  • Lee, Joong-Ha;Lee, Seong-Ryong;Kim, Tae-Hyung;Jhun, Chul-Gyu;Yoon, Tae-Hoon;Kim, Jae-Chang
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.215-217
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    • 2009
  • The authors propose a novel dual mode liquid crystal display (LCD) which has both dynamic and memory operating LCD modes. The mode uses a horizontal switching and bistable chiral splay nematic (BCSN) LCD. The proposed dual mode does not require pixeldivision and has a higher aperture ratio and resolution than the previously proposed dual mode. Experimental results of the memory and dynamic mode show a high contrast ratio of over 100:1.

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Effect of the polymer wall boundary condition on the dynamic and memory behavior of the ferroelectric liquid crystal

  • Lee, Ji-Hoon;Lim, Tong-Kun;Park, Seo-Kyu;Kwon, Soon-Bum
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1132-1134
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    • 2006
  • In this research, we examined the correlation between the polymer wall boundary condition and the dynamic/ memory behavior of the ferroelectric liquid crystal (FLC) molecules. It was shown that the polymer wall perpendicular to the rubbing direction induces asymmetric switching to the rubbing direction and induce smaller cone angle angle of LC. On the contrary, in the cell with polymer wall parallel to the rubbing direction, the FLC molecules are oriented in the rubbing direction and shows symmetric switching and has larger cone angle. Memory behavior of each cell has strong correlation with the dynamic state of the FLC molecules. Response time of each cell was also examined.

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Evolution of Nonvolatile Resistive Switching Memory Technologies: The Related Influence on Hetrogeneous Nanoarchitectures

  • Eshraghian, Kamran
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.6
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    • pp.243-248
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    • 2010
  • The emergence of different and disparate materials together with the convergence of both the 'old' and 'emerging' technologies is paving the way for integration of heterogeneous technologies that are likely to extend the limitations of silicon technology beyond the roadmap envisaged for complementary metal-oxide semiconductor. Formulation of new information processing concepts based on novel aspects of nano-scale based materials is the catalyst for new nanoarchitectures driven by a different perspective in realization of novel logic devices. The memory technology has been the pace setter for silicon scaling and thus far has pave the way for new architectures. This paper provides an overview of the inevitability of heterogeneous integration of technologies that are in their infancy through initiatives of material physicists, computational chemists, and bioengineers and explores the options in the spectrum of novel non-volatile memory technologies considered as forerunner of new logic devices.

A Light Incident Angle Stimulated Memristor Based on Electrochemical Process on the Surface of Metal Oxide

  • Park, Jin-Ju;Yong, Gi-Jung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.174-174
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    • 2014
  • Memristor devices are one of the most promising candidate approaches to next-generation memory technologies. Memristive switching phenomena usually rely on repeated electrical resistive switching between non-volatile resistance states in an active material under the application of an electrical stimulus, such as a voltage or current. Recent reports have explored the use of variety of external operating parameters, such as the modulation of an applied magnetic field, temperature, or illumination conditions to activate changes in the memristive switching behaviors. Among these possible choices of signal controlling factors of memristor, photon is particularly attractive because photonic signals are not only easier to reach directly over long distances than electrical signal, but they also efficiently manage the interactions between logic devices without any signal interference. Furthermore, due to the inherent wave characteristics of photons, the facile manipulation of the light ray enables incident light angle controlled memristive switching. So that, in the tautological sense, device orienting position with regard to a photon source determines the occurrence of memristive switching as well. To demonstrate this position controlled memory device functionality, we have fabricated a metal-semiconductor-metal memristive switching nanodevice using ZnO nanorods. Superhydrophobicity employed in this memristor gives rise to illumination direction selectivity as an extra controlling parameter which is important feature in emerging. When light irradiates from a point source in water to the surface treated device, refraction of light ray takes place at the water/air interface because of the optical density differences in two media (water/air). When incident light travels through a higher refractive index medium (water; n=1.33) to lower one (air; n=1), a total reflection occurs for incidence angles over the critical value. Thus, when we watch the submerged NW arrays at the view angles over the critical angle, a mirror-like surface is observed due to the presence of air pocket layer. From this processes, the reversible switching characteristics were verified by modulating the light incident angle between the resistor and memristor.

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Resistive Switching Behavior of Cr-Doped SrZrO3 Perovskite Thin Films by Oxygen Pressure Change (산소 분압의 변화에 따른 Cr-Doped SrZrO3 페로브스카이트 박막의 저항변화 특성)

  • Yang, Min-Kyu;Park, Jae-Wan;Lee, Jeon-Kook
    • Korean Journal of Materials Research
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    • v.20 no.5
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    • pp.257-261
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    • 2010
  • A non-volatile resistive random access memory (RRAM) device with a Cr-doped $SrZrO_3/SrRuO_3$ bottom electrode heterostructure was fabricated on $SrTiO_3$ substrates using pulsed laser deposition. During the deposition process, the substrate temperature was $650^{\circ}C$ and the variable ambient oxygen pressure had a range of 50-250 mTorr. The sensitive dependences of the film structure on the processing oxygen pressure are important in controlling the bistable resistive switching of the Cr-doped $SrZrO_3$ film. Therefore, oxygen pressure plays a crucial role in determining electrical properties and film growth characteristics such as various microstructural defects and crystallization. Inside, the microstructure and crystallinity of the Cr-doped $SrZrO_3$ film by oxygen pressure were strong effects on the set, reset switching voltage of the Cr-doped $SrZrO_3$. The bistable switching is related to the defects and controls their number and structure. Therefore, the relation of defects generated and resistive switching behavior by oxygen pressure change will be discussed. We found that deposition conditions and ambient oxygen pressure highly affect the switching behavior. It is suggested that the interface between the top electrode and Cr-doped $SrZrO_3$ perovskite plays an important role in the resistive switching behavior. From I-V characteristics, a typical ON state resistance of $100-200\;{\Omega}$ and a typical OFF state resistance of $1-2\;k{\Omega}$, were observed. These transition metal-doped perovskite thin films can be used for memory device applications due to their high ON/OFF ratio, simple device structure, and non-volatility.

Technology of MRAM (Magneto-resistive Random Access Memory) Using MTJ(Magnetic Tunnel Junction) Cell

  • Park, Wanjun;Song, I-Hun;Park, Sangjin;Kim, Teawan
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.3
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    • pp.197-204
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    • 2002
  • DRAM, SRAM, and FLASH memory are three major memory devices currently used in most electronic applications. But, they have very distinct attributes, therefore, each memory could be used only for limited applications. MRAM (Magneto-resistive Random Access Memory) is a promising candidate for a universal memory that meets all application needs with non-volatile, fast operational speed, and low power consumption. The simplest architecture of MRAM cell is a series of MTJ (Magnetic Tunnel Junction) as a data storage part and MOS transistor as a data selection part. To be a commercially competitive memory device, scalability is an important factor as well. This paper is testing the actual electrical parameters and the scaling factors to limit MRAM technology in the semiconductor based memory device by an actual integration of MRAM core cell. Electrical tuning of MOS/MTJ, and control of resistance are important factors for data sensing, and control of magnetic switching for data writing.