• Title/Summary/Keyword: Mean Film Temperature

Search Result 96, Processing Time 0.024 seconds

Temperature Dependent Current Transport Mechanism in Graphene/Germanium Schottky Barrier Diode

  • Khurelbaatar, Zagarzusem;Kil, Yeon-Ho;Shim, Kyu-Hwan;Cho, Hyunjin;Kim, Myung-Jong;Kim, Yong-Tae;Choi, Chel-Jong
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.15 no.1
    • /
    • pp.7-15
    • /
    • 2015
  • We have investigated electrical properties of graphene/Ge Schottky barrier diode (SBD) fabricated on Ge film epitaxially grown on Si substrate. When decreasing temperature, barrier height decreased and ideality factor increased, implying their strong temperature dependency. From the conventional Richardson plot, Richardson constant was much less than the theoretical value for n-type Ge. Assuming Gaussian distribution of Schottky barrier height with mean Schottky barrier height and standard deviation, Richardson constant extracted from the modified Richardson plot was comparable to the theoretical value for n-type Ge. Thus, the abnormal temperature dependent Schottky behavior of graphene/Ge SBD could be associated with a considerable deviation from the ideal thermionic emission caused by Schottky barrier inhomogeneities.

Growth and Optoelectrical Properties for $CuInS_2$ Single Crystal Thin Film ($CuInS_2$ 단결정 박막 성장과 광전기적 특성)

  • Hong, Kwang-Joon;Lee, Sang-Youl
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2004.11a
    • /
    • pp.230-233
    • /
    • 2004
  • The stochiometric mix of evaporating materials for the $CuInS_2$ single crystal thin films was prepared from horizontal furnance. Using extrapolation method of X-ray diffraction patterns for the $CuInS_2$ polycrystal, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.524\;{\AA}$ and $11.142\;{\AA}$, respectively. To obtain the single crystal thin films, $CuInS_2$ mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperature were 640 t and 430 t, respectively and the thickness of the single crystal thin films was $2{\mu}m$. Hall effect on this sample was measured by the method of van dot Pauw and studied on carrier density and temperature dependence of mobility. The carrier density and mobility deduced from Hall data are $9.64{\times}10^{22}/m^3,\;2.95{\times}10^{-2}\;m^2/V{\cdot}s$ at 293 K, respectively The optical energy gaps were found to be 1.53 eV at room temperature. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the thin film, we have found that the values of spin orbit coupling splitting ${\Delta}So$ and the crystal field splitting ${\Delta}Cr$ were 0.0211 eV and 0.0045 eV at 10 K, respectively. From PL peaks measured at 10K, 807.7nm (1.5350ev) mean Ex peak of the free exciton emission, also 810.3nm (1.5301eV) expresses $I_2$ peak of donor-bound exciton emission and 815.6nm (1.5201eV) emerges $I_1$ peak of acceptor-bound exciton emission. In addition, the peak observed at 862.0nm (1.4383eV) was analyzed to be PL peak due to donor-acceptor pair(DAP).

  • PDF

Sliding Wear Behavior of UHMWPE against Novel Low Temperature Degradation-Free Zirconia/Alumina Composite

  • Lee, K.Y.;Lee, M.H.;Lee, Y.H.;Seo, W.S.;Kim, D.J.
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
    • /
    • 2002.10b
    • /
    • pp.365-366
    • /
    • 2002
  • The sliding wear behavior of ultra high molecular weight polyethylene (UHMWPE) was examined on a novel low temperature degradation-free zirconia/alumina composite material and conventional alumina and zirconia ceramics used for femoral head in total hip joint replacement. The wear of UHMWPE pins against these ceramic disks was evaluated by performing linear reciprocal sliding and repeat pass rotational sliding tests for one million cycles in bovine serum. The weight loss of polyethylene against the novel low temperature degradation-free zirconia/alumina composite disks was much less than those against conventional ceramics for all tests. The mean weight loss of the polyethylene pins was more io the linear reciprocal sliding test than in the repeal pass rotational sliding lest for all kinds of disk materials. Neither the coherent transfer film nor the surface damage was observed on the surface of the novel zirconia/alumina composite disks during the test. The observed r,'stilts indicated that the wear of the polyethylene was closely related to contacting materials and kinematic motions. In conclusion, the novel zirconia/alumina composite leads the least wear of polyethylene among the tested ceramics and demonstrates the potential as lhe alternative materials for femoral head in total hip joint replacement.

  • PDF

Dielectric $Bi_3NbO_7$ thin film grown on flexible substrates by Nano Cluster Deposition

  • Lee, Hyun-Woo;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2009.11a
    • /
    • pp.10-10
    • /
    • 2009
  • Transparent BNO thin films were grown on Al-doped ZnO (AZO)/Ag/AZO/polyethersulfon (PES) (abbreviated as AAAP) transparent electrodes at a low temperature by the NCD technique. The BNO films grown on the crystallized AZO/Ag/AZO (AAA) electrodes exhibit an amorphous phase with a root mean square (rms) roughness of approximately 2 nm in the range of deposition temperature. The capacitors (Pt/BNO/AAAP) with BNO films grown at $100^{\circ}C$ show a dielectric constant of 24 and dissipation factor of 8% at 100 kHz, a leakage current density of about $8{\times}10^{-6}A/cm^2$ at an applied voltage of 1.0V. The optical transmittances of the BNO/AAAP exhibited above 80% at wavelength of 550nm at all of deposition temperature. The mechanical stability of the BNO/AAA as well as AAA electrode with the PES substrates through the bending was ensured for flexible electronic device applications. The transparent BNO capacitors grown on AAAP are powerful candidate for integration with the transparent solar cells.

  • PDF

Effect of Annealing Temperature on the Low Emissivity of TiO2/Ag/TiO2 Films (열처리 온도에 따른 TiO2/Ag/TiO2 박막의 근적외선 반사 특성 변화)

  • Kim, So-young;Moon, Hyun-joo;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
    • /
    • v.28 no.3
    • /
    • pp.134-138
    • /
    • 2015
  • Ag intermediated $TiO_2$ films were deposited by RF and DC magnetron sputtering and then vacuum annealed at 100, 200 and $300^{\circ}C$ for 30 minutes to investigate the effect of annealing temperature on the structural and optical properties of the films. For all depositions, the thickness of the $TiO_2$ and Ag films were kept constant at 24 and 15 nm by controlling the deposition time. As-deposited $TiO_2/Ag/TiO_2$ trilayer films have a weak crystalline and an optical reflectance in a near infrared wavelength region of 77.8%, while the films annealed at $300^{\circ}C$ show the polycrystalline structure and an increased mean optical reflectance of 80.4%. From the experimental results, it can be concluded that increasing the annealing temperature enhanced the structural and optical properties of the $TiO_2/Ag/TiO_2$ films.

Development of {110}<110> Textured Ag Substrate for YBCO Coated Conductors ({110}<110> 집합조직을 가지는 YBCO 박막 선재용 Ag Substrate 개발)

  • 임준형;김정호;지봉기;장석헌;김규태;주진호;김찬중;홍계원
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.17 no.1
    • /
    • pp.94-100
    • /
    • 2004
  • We fabricated textured Ag substrates for YBCO coated conductor and evaluated the effects of annealing temperature on microstructural evolution, texture formation, and surface morphology. Ag ingot, as an initial specimen, was prepared by plasma arc melting(PAM). Subsequently, the ingot was cold rolled to 100 ${\mu}{\textrm}{m}$ thick tape and annealed at temperatures of 600-80$0^{\circ}C$. The texture and surface morphology of the substrate were characterized by pole-figure and atomic force microscopy(AFM) profile, respectively. It was observed that a strong {110}<110> texture was formed after annealing and its symmetry improved as annealing temperature increased. The full-width at half-maximum(FWHM) of {110}<110> pole was as sharp as 10$^{\circ}$ for the substrate annealed at 80$0^{\circ}C$. On the other hand, it was found that the thermal grooving and faceting became remarkable as annealing temperature increased : root-mean-square(RMS) roughness of the substrate annealed at 80$0^{\circ}C$ was 39.2 nm. The substrate of strong texture and smooth surface, fabricated in our study, is considered to be suitable for use as a substrate for the epitaxial deposition of superconductor film.

NO2 Sensing Characteristics of WO3 Thick Film Sensors Using Nanosized WO3 Powders Prepared by Sol-Precipitation Process (Sol-Precipitation법으로 제조된 WO3 나노분말을 이용한 후막 센서의 NO2 감지 특성)

  • Ryu, Hyun-Wook;Park, Kyung-Hee;Kim, In-Chun;Hong, Kwang-Joon;Park, Jin-Seong
    • Korean Journal of Materials Research
    • /
    • v.12 no.12
    • /
    • pp.930-934
    • /
    • 2002
  • Nanosized $WO_3$ powders were synthesized by the sol-precipitation process using $WCl_{6}$ as the starting material, ethanol as a solvent and $NH_4$OH solution as a precipitant, followed by a washing-drying treatment and calcination. The effects on the powder crystallinity and microstructure of calcination temperature were investigated with XRD and FE-SEM. The $WO_3$ powders calcined at $500^{\circ}C$ and $700^{\circ}C$ showed good crystallinity and their mean particle size was 30nm and 70nm, respectively. These powders were used for the preparation of pastes which were printed as thick films on alumina substrates with comb-type Pt electrodes. The particle size strongly influenced the $NO_2$ gas sensing property of the thick films. A significant reduction in the $NO_2$ sensitivity was observed for the film prepared from larger particle size, having thus a larger grain size. For the film having a smaller grain size, on the other hand, the higher $NO_2$ sensitivity was observed and the sensitivity increased with $NO_2$ concentration.

Effect of Joule Heating Variation on Phonon Heat Flow in Thin Film Transistor (줄 가열 변화에 따른 박막 트랜지스터 내 포논 열 흐름에 대한 수치적 연구)

  • Jin, Jae-Sik;Lee, Joon-Sik
    • Transactions of the Korean Society of Mechanical Engineers B
    • /
    • v.33 no.10
    • /
    • pp.820-826
    • /
    • 2009
  • The anisotropic phonon conductions with varying Joule heating rate of the silicon film in Silicon-on-Insulator devices are examined using the electron-phonon interaction model. It is found that the phonon heat transfer rate at each boundary of Si-layer has a strong dependence on the heating power rate. And the phonon flow decreases when the temperature gradient has a sharp change within extremely short length scales such as phonon mean free path. Thus the heat generated in the hot spot region is removed primarily by heat conduction through Si-layer at the higher Joule heating level and the phonon nonlocality is mainly attributed to lower group velocity phonons as remarkably dissimilar to the case of electrons in laser heated plasmas. To validate these observations the modified phonon nonlocal model considering complete phonon dispersion relations is introduced as a correct form of the conventional theory. We also reveal that the relation between the phonon heat deposition time from the hot spot region and the relaxation time in Si-layer can be used to estimate the intrinsic thermal resistance in the parallel heat flow direction as Joule heating level varies.

Polymer Thin Film of Phthalic Anhydride via Plasma Polymerization (플라즈마 중합에 의한 프탈릭 안하이드라이드 고분자 박막 필름 제조 연구)

  • Kang, Hyun Min;Basarir, Fevzian;Paek, Kwan Yeol;Yoon, Tae-Ho
    • Journal of Adhesion and Interface
    • /
    • v.10 no.1
    • /
    • pp.17-22
    • /
    • 2009
  • Polymer thin films were prepared by radio frequency (RF) plasma polymerization of phthalic anhydride (PA). First, monomer vaporization temperature ($100{\sim}160^{\circ}C$) was optimized by evaluating the thermal properties of thin films using differential scanning calorimeter (DSC) and measuring the root-mean-square (RMS) roughness with atomic force microscope (AFM) at the fixed plasma power of 10 W and time of 5 min in a continuous-wave (CW) mode. Plasma power (5~20 W) was then optimized by measuring the film solubility in solvents such as toluene, acetone, dimethylsulfoxide (DMSO) and 1 methylpyrrolidine (NMP). Next, pulsed mode plasma polymerization was also studied by varying the duty cycle of on-time (5, 20%) under optimized conditions of continuous-wave (CW) mode ($120^{\circ}C$, 10 W) in order to increase the anhydride functional groups. Finally, polymer thin films were characterized by Fourier transform infrared spectroscopy (FT-IR), thermogravimetric analyzer (TGA) and ${\alpha}$-step.

  • PDF

Characteristics of AS-deposited TaN Thin Films by Annealing Temperature (As-deposited TaN 박막의 열처리 온도에 따른 특성 변화)

  • Heo, J.S.;Kim, I.S.;Song, J.S.;Kim, H.S.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2001.05c
    • /
    • pp.197-200
    • /
    • 2001
  • 반응성 스퍼터링법으로 TaN film을 증착한 후 열처리온도에 따라 TaN 박막의 $R_s$(sheet resistance) 특성을 평가하고 미세구조 변화에 따른 전기적 특성 변화를 고찰하였다. TaN 박막을 열처리한 결과 $400^{\circ}C$에서 $600^{\circ}C$까지는 (110)의 회절피크만 보이다가 $700^{\circ}C$ 에서는 (200)의 회절 피크가 나타났고 특히 as-deposition 상태와 $300^{\circ}C$ 열처리시에는 Ta와 TaN 상이 혼재한 상태로 나타났으며 전기저항 변화는 as-deposition 상태가 $140{\Omega}/{\square}$로 가장 높았으며 열처리 온도가 증가함에 따라 저항은 점차적으로 감소하다가 $600^{\circ}C$$700^{\circ}C$에서는 전기저항이 다시 증가하였다. $500^{\circ}C$까지는 표면 형상이나 표면조도보다는 열처리 온도의 증가에 따른 TaN 박막의 결정구조 변화가 전기저항에 영향을 주는 주 요인으로 작용하고, $600^{\circ}C$$700^{\circ}C$ 열처리시에 결정립의 증가에도 불구하고 전기저항이 증가하는 것은 고온 열처리에 의한 표면조도가 증가하였기 때문이라고 생각된다.

  • PDF