• Title/Summary/Keyword: Material removal

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Removal characteristic of Escherichiacoli and water property conversion for Discharge tube with globular $ZrO_2$ (구형 지르코니아를 갖는 수방전관의 수질성분변환 및 세균제거특성)

  • Lee, Dong-Hoon;Park, Hong-Jae;Park, Jae-Youn
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.550-553
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    • 2003
  • This paper was shown water properly conversion and removal characteristic of escherichia coli for discharge tube with $ZrO_2$ beads. At the result of the removal characteristic experiments of escherichia coli using the discharge tube with $ZrO_2$ beads, because the electric field is also increased when input voltage is increased, the removal characteristic of escherichia coli was appeared relation connection to input voltage. And if a passing number of test water in discharge tube with $ZrO_2$ beads is increased, the removal ratio of escherichia coli is to be increased because passing number of electric field section is increased. And if diameter of $ZrO_2$ beads is increased, the removal time of escherichia coli is to be decreased because dielectric polalization of $ZrO_2$ beads. Also, the removal ratio of escherichia coli of the discharge tube with $ZrO_2$ beads. is appeared higher than the removal ratio of the discharge tube without $ZrO_2$ beads. And a salutation point of ozone and $H_2O_2$ generation density inner water was appeared near 60[min].

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A Study on Microbial Degradation for Removal of Toluene Vapour by Biofilter (Bio 필터를 이용한 Toluene 제거에서 미생물분해에 관한 연구)

  • 하상안;강신묵
    • Journal of environmental and Sanitary engineering
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    • v.14 no.1
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    • pp.24-30
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    • 1999
  • A biological filter for treatment of toluene among volatile organic compounds was studied. The investigation was conducted using specially built stainless steel columns packed with granular activated carbon and cold for removal of toluene. The G.A. and mold as filter material was also coated with Pseudomonas putida microorganisms.The biofilter unit was operated in the condition of moisture content vairation at gas loading rate of 12.5 l/min. Gaseous toluene taken from tedlar bag was analyzed by the use of G.C equipped with F.I.d detector. The removal efficiency of gaseous toluene was 95% at average inlet concentration of 950 ppm during bio-degradation operating condition. Effective removal efficiency was obtained with moisture content 27.5% at activated carbon and 32% at mold in this study. The effective operating condition were obtained with pH 6-8, temperature 28-42℃ for microbial degradation at gas loading rate of 12.5 l/min in packed material.

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A removal characteristics of NOx at the cylinderical plasma reactor with magnetic field (자계가 인가된 원통형 플라즈마 반응기에서 질소산화물(NOx)의 제거특성)

  • Lee, Dong-Hoon;Lee, Tae-Geun;Oh, Jung-Min;Lee, Doo-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05b
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    • pp.104-108
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    • 2004
  • The effect of magnetic field was measured on NOx removal for cylinder-wire plasma reactor with magnetic field applied to electric field vertically. Power was supplied to plasma reactor using rotating spark gap switch. Consumption power increased with increasing discharge voltage. When magnetic field was applied to electric field vertically, consumption power was less than that without magnetic field because of lorenz's force. NOx removal rate of plasma reactor with magnetic field were higher, 10-15%, than that of plsama reactor without magnetic field. And NOx removal rate decreased with increasing gas flow rate.

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Effect of pH level and slurry particle size on the chemical mechanical planarization of langasite crystal wafer (pH level 및 slurry 입도가 langasite wafer의 chemical mechanical planarization에 미치는 영향)

  • Cho Hyun
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.15 no.1
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    • pp.34-38
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    • 2005
  • Effects of pH level and slurry particle size on material removal rate and planarization of langasite single crystal wafer have been examined. Higher material removal rate was obtained with lower pH level slurries while the planarization was found to be determined by average particle size of colloidal silica slurries. Slurries containing 0.045 ㎛ amorphous silica particles showed the best polishing effect without any scratches on the surface. Effective particle number has a strong effect on the surface planarization and the removal rate, so that the lower effective particle numbers produced low removal rate but the better planarization results.

Effects of Chemical and Abrasive Particles for the Removal Rate and Surface Microroughness in Ruthenium CMP (Ru CMP 공정에서의 화학액과 연마 입자 농도에 따른 연마율과 표면 특성)

  • Lee, Sang-Ho;Kang, Young-Jea;Park, Jin-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.1296-1299
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    • 2004
  • MIM capacitor has been investigated for the next generation DRAM. Conventional poly-Si bottom electrode cannot satisfy the requirement of electrical properties and comparability to the high k materials. New bottom electrode material such as ruthenium has been suggested in the fabrication of MIM structure capacitor. However, the ruthenium has to be planarized due to the backend scalability. For the planarization CMP has been widely used in the manufacture of integrated circuit. In this research, ruthenium thin film was Polished by CMP with cerium ammonium nitrate (CAN)base slurry. HNO3 was added on the CAN solution as an additive. In the various concentration of chemical and alumina abrasive, ruthenium surface was etched and polished. After static etching and polishing, etching and removal rate was investigated. Also microroughness of surface was observed by AFM. The etching and removal rate depended on the concentration of CAN, and HNO3 accelerated the etching and polishing of ruthenium. The reasonable removal rate and microroughness of surface was achieved in the 1wt% alumina slurry.

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Application of hybrid material, modified sericite and pine needle extract, for blue-green algae removal in the lake

  • Choi, Hee-Jeong
    • Environmental Engineering Research
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    • v.23 no.4
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    • pp.364-373
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    • 2018
  • The present study assessed the efficient removal of nutrients and Chlorophyll-a (Chl-a) by using methyl esterified sericite (MES) and pine needle extracts (PNE), a low cost and abundant green hybrid material from nature. For this purpose, the optimal conditions were investigated, such as the pH, temperature, MES and PNE ratio, and MES-PNE dose. In addition, a Microcystis aeruginosa control using MES-PNE was also analyzed with various inhibition models. The removal of the nutrient and Chl-a onto MES-PNE was optimized for over 95% removal as follows: 2-2.5 for the MES-PNE ratio, 7-8 pH and a $22-25^{\circ}C$ temperature. In this respect, approximately 1.52-2.20 g/L of MES-PNE was required to remove each 1 g of dry weight/L of Chl-a. Total phosphorus (TP) has a greater influence on the increase in Chl-a than total nitrogen (TN) according to the correlation between TN, TP and Chl-a. Moreover, the Luong model was the best model for fitting the biodegradation kinetics data from Chl-a on MES-PNE from lake water. The novel hybrid material MES-PNE was very effective at removing TN, TP and Chl-a from the lake and can be applied in the field.

Application of dental microscope in endodontic treatment procedure. (근관치료 영역에서 치과용 미세현미경의 활용)

  • Choi, Sung Baik
    • The Journal of the Korean dental association
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    • v.55 no.8
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    • pp.542-555
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    • 2017
  • 1. Diagnosis Diagnosis of Crack, Direct pulp capping 2. Access opening Find the calcified canal orifice Removal of dentin shelf Obtaining the MB2 canal (MB2, MB3, DB2) 3. Perforation repair during endodontic treatment 4. Removal of the separated files 5. Open apex treatment 6. Void removal on CWT procedure 7. Re-endodontic treatment Removal of restorative material filled in pulp chamber Post removal Identification and removal of residual gutta-perch 8. Surgical endodontic treatment In each case will overview how to use a dental microscope.

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Effects of Groove Shape Dimension on Lapping Characteristics of Sapphire Wafer (정반 그루브의 형상치수가 사파이어 기판의 연마특성에 미치는 영향)

  • Lee, Taekyung;Lee, Sangjik;Jeong, Haedo;Kim, Hyoungjae
    • Tribology and Lubricants
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    • v.32 no.4
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    • pp.119-124
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    • 2016
  • In the sapphire wafering process, lapping is a crucial operation in order to reduce the damaged layer and achieve the target thickness. Many parameters, such as pressure, velocity, abrasive, slurry and plate, affect lapping characteristics. This paper presents an experimental investigation on the effect of the plate groove on the material removal rate and roughness of the wafer. We select the spiral pattern and rectangular type as the groove shapes. We vary the groove density by controlling the groove shape dimension, i.e., the groove width and pitch. As the groove density increases to 0.4, the material removal rate increases and gradually reaches a saturation point. When the groove density is low, the pressing load is mostly supported by the thick film, and only a small amount acts on the abrasives resulting to a low material removal rate. The roughness decreases on increasing the groove density up to 0.3 because thick film makes partial participations of large abrasives which make deep scratches. From these results, we could conclude that the groove affects the contact condition between the wafer and plate. At the same groove density, the pitch has more influence on reducing the film thickness than the groove width. By decreasing the groove density with a smaller pitch and larger groove width, we could achieve a high material removal rate and low roughness. These results would be helpful in understanding the groove effects and determining the appropriate groove design.

Effect of Rotating Speed and Air Flow Rate on Material Removal Characteristics in Abrasive Fluidized Bed Machining of Polyacetal (폴리아세탈의 입자유동베드 가공에서 회전속도와 공기 유량이 재료제거 특성에 미치는 영향)

  • Jang, Yangjae;Kim, Taekyoung;Hwang, Heondeok;Seo, Joonyoung;Lee, Dasol;Lee, Hyunseop
    • Tribology and Lubricants
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    • v.33 no.5
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    • pp.214-219
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    • 2017
  • Abrasive fluidized bed machining (AFBM) is similar to general abrasive fluidized machining (AFM) in that it can perform polishing of the outer and inner surfaces of a 3-dimensional shape by the flow of particles. However, in the case of AFM, the shear force generated by the flow of the particles causes material removal, while in AFBM, the abrasive particles are suspended in the chamber to form a bed. AFBM can be used for deburring, polishing, edge contouring, shot peening, and cleaning of mechanical parts. Most studies on AFBM are limited to metals, and research on application of AFBM to plastic materials has not been performed yet. Therefore, in this study, we investigate the effect of rotating speed of the specimen and the air flow rate on the material removal characteristics during AFBM of polyacetal with a horizontal AFBM machine. The material removal rate (MRR) increases linearly with increase of the rotating speed of the main shaft because of the shear force between the particles of the fluidized bed and the rotation of the workpiece. The reduction in surface roughness tends to increase as the rotating speed of the main shaft increases. As the air flow rate increases, the MRR tends to decrease. At a flow rate of 70 L/min or more, the MRR remains almost constant. The reduction of the surface roughness of the specimen is found to decrease with increasing air flow rate.

Removal Characteristics of Nitrogen Oxide in Electromagnetic-Catalytic Plasma Reactor (전자계-촉매형 플라즈마 반응기의 질소 산화물 제거 특성)

  • 이현수;박재윤;이동훈;한병성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.7
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    • pp.640-648
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    • 2002
  • This study is to develop electromagnetic-catalyst application plasma reactors for indoor air purification. Nitrogen Oxide(NOx) removal characteristics are measured in the electromagnetic catalyst application plasma reactors with various parameters and the effect of catalyst or/and magnetic field are investigated on the NOx removal. And AC or DC high voltage is applied for corona discharge, flow rates are 150~1500 $\ell/min$ and NO initial concentration is about 10 ppm. $Mn0_2$ and $TiO_2$ catalysts to increase NOx removal rate are used. In the results, NOx removal rate by AC power is about 10 % higher than that by DC power under the experimental condition of 700 $\ell/min$, 5 magnets, $MnO_2$ and $Ti)_2$ catalysts. When magnet is applied to the reactor, NOx removal rate increased. Also, the reactor with $MnO_2$ and $Ti)_2$ catalyst and magnet have the best removal rate.