• 한국주조공학회지
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• 제22권5호
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• pp.265-270
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• 2002

A novel jewelry master pattern manufacturing process which reduce manufacturing steps by employing a Duraform rapid prototyping mold and a low melting alloy has been suggested. The novel process follows the steps of 'jewelry 3D CAD design ${\rightarrow}$ Durafrom RP mold ${\rightarrow}$ low melting alloy master pattern' while the previous process follows more complicated steps of 'jewelry idea sketch ${\rightarrow}$ detailed drawing ${\rightarrow}$ wax carving ${\rightarrow}$ flask ${\rightarrow}$ silver master pattern.' An upper and a lower part of molds have been manufactured of Duraform powder, of which melting point is $190^{\circ}C$. A maser pattern was manufactured by pouring a low melting alloy of Pb-Sn-Bi-Cd, so called Woods Metal, of which melting point is $70^{\circ}C$, into the mold. The master pattern is a shape of a disk of 20mm diameter that contains various design factors. The variations of dimensions, surface roughness, surface pore ratio were measured by an optical microscope, a surface roughness profilometer, and a Rockwell hardness tester. The pattern made of were maeasured by an optical microscope, a surface roughness profilometer, and a Rockwell hardness tester. The pattern made of low melting alloy has sufficient surface hardness, and surface pore ratio to be used as the jewelry master pattern.

• 복식문화연구
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• 제25권2호
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• pp.224-236
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• 2017

Kimono sleeves have continuously appeared in modern fashion as a design motif and this trend has become increasingly prevalent recently. However for research in the area of clothing composition for kimono sleeves in Korea, there has been a lack of development of master patterns based on basic data from the analysis of the standard body type of Korean people and finalized designs based on comparative experiments and analysis of pre-existing research Thus, there is no ideal master kimono sleeve pattern development research based on the examination of the results of the analysis of the standard body type of Korean people. Therefore by recognizing the importance of developing a master kimono sleeve pattern, this research aims to present a practical master kimono sleeve pattern for the standard body type of someone in their 30s. First, the four master patterns were collected and a dressing evaluation was conducted, and by selecting and improving one of these master designs, a final research master pattern was developed after a second dressing evaluation. Through this research, it was possible to design a master kimono sleeve pattern appropriate both externally and functionally for the standard body type of someone in their 30s, which has not been a consideration in previous research.

• 한국정밀공학회지
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• 제25권4호
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• pp.134-139
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• 2008

A spirally arrayed nano-pattern is designed as a model pattern for the next generation optical storage media. The pattern consists off types of embossed rectangular dot, which are 50nm, 100nm, 150nm and 200nm in length and 50nm in width. The height of the dot is designed to be 50nm. The pitch of the spiral track of the pattern is 100nm. A ER(Electron resist) master for this pattern is fabricated by e-beam lithography process. The ER is first spin-coated to be 50nm thick on a Si wafer and then the model pattern is written on the coated ER layer by e-beam. After developing this pattern written wafer in the solution, a ER pattern master is fabricated. The most conventional e-beam machine can write patterns in orthogonal way, so we made our own pattern generator which can write the pattern in circular or spiral way. This program generates the patterns to be compatible with the e-beam machine from Raith(Raith 150). To fabricate 50nm pattern master precisely, a series of experiments were done including the design compensation for the pattern size, optimization of the dose, acceleration voltage, aperture size and developing. Through these experiments, we conclude that the higher accelerating voltages and smaller aperture size are better for mastering the nano pattern which is in order of 50nm. With the optimized e-beam lithography process, a spiral arrayed 50nm pattern master adopting PMMA resist was fabricated to have dimensional accuracy over 95% compared to the designed. Using this pattern master, a metal pattern stamp will be fabricated by Ni electro plating for injection molding of the patterned plastic substrate.

• 한국산학기술학회논문지
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• 제3권2호
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• pp.110-114
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• 2002

주얼리 제조 공정중 마스터패턴 제조 공정은 전체 제조원가의 20%를 차지하기 때문에 매우 중요한 공정이다. 지금까지는 수작업으로 왁스 패턴을 제작하고 이를 이용하여 석고형을 만들고 석고형으로 마스터 패턴을 제작하는 복잡한 공정을 거쳐 제작하였다. 본 연구는 쾌속조형기를 이용하여 듀라폼 재질의 몰드를 만들고 저융점합금을 이용하여 마스터패턴을 직접 제작하는 새로운 공정을 개발하였다. 듀라폰의 용융진이 190℃ 이므로 용융점 70℃의 Pb-Sn-Bi-Cd 계의 저융점 합금을 주물재료로 이용하여 마스터패턴을 제작하였다.

• 한국금형공학회:학술대회논문집
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• 한국금형공학회 2008년도 하계 학술대회
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• pp.35-38
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• 2008

A pattern master and a Ni stamper for 50nm class of patterns are fabricated through e-beam lithography and Ni electroforming process. A model pattern set is designed, which is based on unit patterns of 50nm, 100nm, 150nm and 200nm in length and 50nm in width. The e-beam process is optimized to fabricate designed patterns with some parameters including dose, accelerating voltage, focal distance and developing time. For Ni electroforming to fabricate Ni stamper, a seed layer, a conducting layer, is deposited first on the pattern master fabricated by an e-beam lithography process. Ni, Ti/Ni and Cr are first tested to find optimal seed layer process. Currently the best result is obtained when adopting Cr deposited to be 100nm thick with continuous tilting motion of the master substrate during the deposition process.

• 대한기계학회논문집A
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• 제28권5호
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• pp.624-631
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• 2004

In this paper, new replication techniques fur a metal microcomponent having a real 3D shape were introduced. Helical gear was selected as one of a real 3D microcomponents for this study. The helical gear, which was made of photo-curable resin, was fabricated as a master pattern by microstereolithography technology. Then, a silicone rubber mold was fabricated from the master pattern. Lastly, a final bismuth alloy pattern was transferred from the silicone rubber mold by the microcasting process. In this paper, the replication technique is described in detail from the master pattern to the final pattern with some investigation on factors related to the technique.

• 분석과학
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• 제28권1호
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• pp.26-32
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• 2015

육안검사, 지문융선의 특징점 비교 및 자동지문식별시스템의 특징점 검색기능을 이용해 잉크젯 프린터로 인공잠재지문을 반복적으로 출력해도 인공잠재지문이 균질하고 일관성 있게 출력된다는 것을 입증하였다. 표준잠재지문 출력용 master fingerprint pattern은 살아있는 사람의 지문을 종이에 찍은 후 이를 스캐너로 스캔하여 만들었고 Adobe Photoshop CS 5의 output level 조절기능을 이용해 이 master fingerprint pattern의 세기를 조절하였다. 인공 표준잠재지문은 master fingerprint pattern을 인공땀으로 채운 잉크젯 프린터 카트리지로 출력하는 방법으로 만들었다. 인공땀으로 출력한 표준잠재지문은 ninhydrin과 1,2-Indandion(1,2-IND)/$ZnCl_2$로 처리하여 현출하였다. 두 시약으로 현출한 지문을 육안으로 검사한 결과 잉크를 묻혀 찍은 원지문에 있는 특징들이 표준잠재지문에서도 동일하게 나타나는 것을 확인할 수 있었다. 인공땀을 이용하여 표준잠재지문 100점을 출력한 후 이 중 50점은 ninhydrin으로, 나머지 50점은 1,2-IND/$ZnCl_2$로 처리하여 현출한 후 AFIS의 연산기능을 이용해 특징점을 검색한 결과 ninhydrin으로 현출한 지문은 $52.4{\pm}2.4$개(range = 48~56), 1,2-IND/$ZnCl_2$로 처리한 지문은 $50.2{\pm}1.9$개(range = 47~53)의 특징점이 검색되었다. 이처럼 표준편차가 적게 나타난 점으로 보아 인공적으로 만든 표준잠재지문은 반복적으로 균질하게 출력된다는 것을 알 수 있었다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.311-314
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• 2003

Holographic diffuser(HD) layer was demonstrated to be located inside LC cell for a transmissive LCD of TFT-array on Color Filter structure. Master pattern of this layer was generated by holographic method and this pattern was replicated by the stamping of the master pattern on UV resin. Combined with a compensation film, TN-mode LCD with this layer showed improved viewing angle characteristics, especially along the up-down direction.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회A
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• pp.1532-1536
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• 2007

A plastic substrate with tiny rectangular pillars less than 100nm is injection molded to study pattern replication in injection molding. The size of the substrate is 50mm ${\times}$ 50mm and 1mm thick. The substrate has 9 patterned areas of which size is 2mm ${\times}$ 2mm respectively. The lengths of the pillars are 50nm, 100nm, 150nm and 200nm and the width and height are 50nm and about 100nm respectively. A pattern master is fabricated by e-beam writing using positive PR(photo resist) and then a nickel stamper replicated from the PR master by nickel electro-plating. Cr is deposited on the PR pattern master before nickel electro-plating as a conducting layer. Using this nickel stamper, several injection molding experiments are done to investigate effects of the injection molding parameters such as mold temperature, injection rate, packing pressure or pattern location on the replication of the patterns under 100nm.

• 한국기계가공학회지
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• 제19권7호
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• pp.67-73
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• 2020

Shrinkage is inevitable in the curing of resins during the nanoimprint process. The degree of shrinkage that occurs as the resin transforms from a viscous liquid to solid differs depending on the type of resin. However, if the cured material is repeatedly cured using the same material, constant shrinkage can be confirmed. In this study, the pattern of change was observed by repeatedly performing the nanoimprint process using a resin with a constant shrinkage rate. The observed pattern for the change of shape was made using a triangular pyramid-shaped aluminum master mold and a flexible replica mold made from the master. Shrinkage that results from the nanoimprint process occurs linearly in the longitudinal direction of the pattern and can be predicted by simple calculations. The change of the pattern due to shrinkage occurred as expected. If the shrinkage rate remains constant, various patterns can be manufactured with high accuracy by correcting these changes before producing a specific shape. This study confirms that the pattern of the desired angle can be obtained by performing the repeated imprint without having to manufacture a master mold.