Fabrication of nano pattern using the injection molding

사출성형을 이용한 미세 패턴 성형

  • 이관희 (서울산업대학교 나노아이티공학과) ;
  • 유영은 (한국기계연구원 나노공정장비연구센터) ;
  • 김선경 (서울산업대학교 금형설계학과) ;
  • 김태훈 (충남대학교 메카트로닉스공학과) ;
  • 제태진 (한국기계연구원 나노공정장비연구센터) ;
  • 최두선 (한국기계연구원 나노공정장비연구센터)
  • Published : 2007.05.30

Abstract

A plastic substrate with tiny rectangular pillars less than 100nm is injection molded to study pattern replication in injection molding. The size of the substrate is 50mm ${\times}$ 50mm and 1mm thick. The substrate has 9 patterned areas of which size is 2mm ${\times}$ 2mm respectively. The lengths of the pillars are 50nm, 100nm, 150nm and 200nm and the width and height are 50nm and about 100nm respectively. A pattern master is fabricated by e-beam writing using positive PR(photo resist) and then a nickel stamper replicated from the PR master by nickel electro-plating. Cr is deposited on the PR pattern master before nickel electro-plating as a conducting layer. Using this nickel stamper, several injection molding experiments are done to investigate effects of the injection molding parameters such as mold temperature, injection rate, packing pressure or pattern location on the replication of the patterns under 100nm.

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