• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2000년도 ITC-CSCC -2
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• pp.851-854
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• 2000

Digital halftoning is a technique to make an equivalent binary image from scanned photo or graphic images. Low pass filtering characteristic of human visual system can be applied to get the effect of spatial averaging of local area consisted of black and white pixels for gray image. The overlapping of black dot decreases brightness and black dot is very sensitive to human visual system in the bright region. In this paper, for gray-level expression, only bright gray region in the color image is considered for blue noise mask (BNM) approach. To solve this problem, BNM with CMY dot is used for the bright region instead of black dot. Dot-on-dot model with single mask causes the problem making much black dot overlap, color distortion. Therefore approach with three masks for C, M and Y each is proposed to decrease pixel overlap and color distortion.

• 한국의류산업학회지
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• 제14권6호
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• pp.889-897
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• 2012

This study suggests a direction for stage-costume design by making stage costumes based on amusement, eclecticism, and the masquerade, which are the criteria for approaching stage costume designs according to characteristics of the mask theatre presented by P. G. Bogatyryov. The conclusions of this study are as follows. First, criteria to approach stage costume design for mask theatre can be classified into amusement, eclecticism, and masquerade according to the characteristics of the mask theatre presented by P. G. Bogatyryov. Second, the stage costume of a mongrel dog showed amusement through the expression of the image of therianthropy through the combination of a fur-lined vest and wristlet, Korean traditional trousers with the paw-prints of a dog. Third, eclecticism contains diverse characteristics and escapes from being singularly defined due to the fusion of severally different heterogeneous objects. The stage costume differently used a method of wearing clothing in a different period, of choosing clothing materials, and of expressing color in every character to indicate ambiguity to which the drama points through the integration of various expression elements. Fourth, the masquerade present characters (Taembang, Daejang, and Changseok)who simultaneously play the role of fairies after having changed into a white mask and having worn Korean a traditional overcoat (Durumagi) on the original clothes; the, result is the change of the theatrical structure into another time and space inside the theatrical scene of imagination through a concealment of the original clothing.

• 한국의류학회지
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• 제43권4호
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• pp.579-591
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• 2019

This research investigated the needs analysis on consumers of fine dust masks to effectively develop a design prototype. Data were collected through focus group interviews on 32 individuals who have used fine dust masks. As a result, there is a new demand by consumers for technology based design changes that better fit the nose and face. Consumers preferred the smell and feel of traditional Korean paper. Young adults expressed the importance of masks that can be used for protection as well as fashion. The prototype improved the drawbacks of existing models using an origami-inspired design in a variety of colors, patterns and in sizes that are customized to fit the wearer. The proposed prototype is made of Dak felt fibers and jersey materials. It is characterized by downward-facing ear bands made of polyurethane to improve the fit around the ears and chin to more effectively block incoming air. The mask is foldable and has a crease that goes along the chin to increase the amount of enclosed space against the face making it easier to breathe compared to existing mask designs.

• 대한전자공학회논문지
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• 제25권8호
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• pp.998-1009
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• 1988

A Hierarchical Circuit Extract Algotithm, which efficiently extract circuits from VLSI mask pattern information, is programmed. Quad-tree is used as a data structure which includes various CIF circuit elements and instances. This system is composed of CIF input routine, Quad-tree making routine, Transistor finding routine and Connection list making routine. This circuit extractor can extract circuit with hierarchical structure of circuit. This system is designed using YACC and LEX. By programming this algorithm with C language and adopting to various circuits, the effectiveness of this algorithm is showed.

• 한국인쇄학회지
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• 제26권1호
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• pp.73-85
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• 2008

We have manufactured a photoresist which has excellent dispersity and good applying property due to 330cps of viscosity for environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with CRT light source. Then it was developed by air spray with $1.7kgf/cm^2$ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were worse than those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making was 0.5 mm since the exposure system for maskless plate making has weak light intensity and the diffusion of light. But we could obtain maskless screen plate which has sharp edges of line image and confirm a possibility of dry development process by air spray method.

• 한국정보통신학회논문지
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• 제18권1호
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• pp.210-216
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• 2014

영상에서 에지는 물체와 물체 사이 또는 배경과 물체 사이에 나타나는 밝기 변화가 급격한 부분이며, 대상의 크기, 위치, 방향, 질감 등의 특징 정보를 포함한다. 에지 검출은 이러한 영상 정보를 획득하는 기술이며, 에지를 검출하기 위한 연구가 활발히 진행되고 있다. 대표적인 기존의 에지 검출 방법은 1차 미분 연산자를 이용한 Sobel, Prewitt, Roberts 및 2차 미분 연산자를 이용한 Laplacian 방법 등이 있다. 이러한 방법들은 salt and pepper 잡음에 훼손된 영상에서 에지 검출 특성이 다소 미흡하다. 따라서 본 논문에서는 국부 마스크의 잡음 밀도에 따라 처리 마스크 크기를 다르게 적용하는 변형된 마스크를 이용한 에지 검출 알고리즘을 제안하였다.

• 한국인쇄학회지
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• 제26권2호
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• pp.55-64
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• 2008

We designed a UV-LED exposure system which has 365nm dominant wavelength due to the environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with UV-LED light source. Then it was developed by air spray with $1.7\;kgf/cm^2$ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were excellent as those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making. was $100{\mu}m$, so we could establish the possibility of environment-friendly maskless screen plate making technology. But the sharpness of the patterns were ${\pm}40{\mu}m$ since the exposure system for maskless plate making has weak light intensity and the diffusion of light.

• 한국정밀공학회지
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• 제23권3호
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• pp.56-60
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• 2006

A high-resolution shadow mask, or called a nanostencil was fabricated for high resolution lithography. This high-resolution shadowmask was fabricated by a combination or MEMS processes and focused ion beam (FIB) milling. 500 nm thick and $2{\times}2mm$ large membranes wore made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane. By local deposition through the apertures of nanostencil, nanoscale patterns down to 70 nm could be achieved.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.871-874
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• 2004

Fabrication of a high-resolution shadow mask, or called nanostencil, is presented. This high-resolution shadowmask is fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. 500 nm thick and 2x2 mm large membranes are made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. Subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to high resolution of FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane.

• 한국정밀공학회지
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• 제16권2호통권95호
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• pp.60-67
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• 1999

Micro-fabrication techniques such as lithography and LIGA processes usually require large investment and are suitable for mass production. Therefore, there is a need for a new micro-fabrication technique that is flexible and more cost effective. In this paper a novel, economical and flexible method of producing micro-pattern on silicon wafer is presented. This method relies on selective removal of mask by mechanical cutting. Then micro-pattern is produced by chemical etching. V-shaped grooved of about 3 ${\mu}m$ wide and 2 ${\mu}m$ deep has been made on ${SiO_2}m$ coated silicon wafer with this method. This method may be utilized for making microstructures in MEMS application at low cost.