• The Journal of Advanced Prosthodontics
• /
• v.11 no.5
• /
• pp.286-296
• /
• 2019

PURPOSE. The aim was to study the masking ability of high-translucency monolithic zirconia and provide guidance in selecting resin luting cements in order to mask discolored substrates. MATERIALS AND METHODS. 160 high-translucency zirconia specimens were divided into 32 groups depending on their thickness and shades. Using five shades of try-in paste, the specimens were luted onto the substrates (Co-Cr, precious-metal, opaque porcelain-sintered Co-Cr, opaque porcelain-sintered precious-metal, and 5M3-shade zirconia). All CIELAB color parameters were measured and statistically analyzed. RESULTS. Zirconia shade and thickness and try-in paste shade affected CIELAB color parameters (P=.000) in different substrates groups, and there were interactions among these factors (P=.000). All five try-in paste shades can be chosen to achieve ${\Delta}E$ values of zirconia with 1.2 - 1.5 mm for masking dark-tooth-like 5M3-shade and zirconia with 1.5 mm for masking precious-metal groups < 2.6. Only suitable try-in paste shades were used, can ${\Delta}E$ values that less than 2.6 be achieved when applied translucent monolithic zirconia with 0.7-1.0 mm for masking dark-tooth-like 5M3-shade and zirconia with 0.7 - 1.2 mm for masking precious-metal groups. CONCLUSION. Choosing suitable resin cement shades is necessary for high-translucency monolithic zirconia to achieve ideal masking ability (${\Delta}E$ < 2.6) on the dark-tooth.

• International Journal of Precision Engineering and Manufacturing
• /
• v.7 no.1
• /
• pp.13-17
• /
• 2006

Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

• Transactions of the Korean Society for Noise and Vibration Engineering
• /
• v.15 no.8 s.101
• /
• pp.980-987
• /
• 2005

It is very difficult to reduce ambient noise level in the downtown. The best method is to improve the sound amenity of the districts, considering concept of soundscape. This study aims to survey the effect of introducing sound and masking to reduce the background noise level. We carried out the evaluating test for 18 introducing sounds varied S/N ratio(-5, 0, +5) in the city riverside. In these test, subjects evaluated the sound environment with five bipolar adjective scales. It was evaluated that introducing sounds improved the sound environment, and that S/N +5 dB was very appropriate to mask the background noise. But the hearing level was suggested to be S/N 0 dB or less.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
• /
• 2005.05a
• /
• pp.607-610
• /
• 2005

It is very difficult to reduce traffic noise level in the downtown. The best method is to improve the sound amenity of the districts, considering concept of soundscape. ?his study aims to survey the effect of introducing sound and masking to reduce the background noise level. We carried out the evaluating test for 18 introducing sounds varied S/N ratio(-5, 0, +5) in the city riverside. In these test, subjects evaluated the sound environment with five bipolar adjective scales. It was evaluated that introducing sounds improved the sound environment and that S/N + 5dB was very appropriate to mask the background noise. But the hearing level was suggested to be S/N 0 dB or less.

• Journal of the Korean Society for Precision Engineering
• /
• v.21 no.12
• /
• pp.160-166
• /
• 2004

Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated fer applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecule and bio molecule. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAMs structure formation.

• Journal of the Korean Society for Precision Engineering
• /
• v.24 no.12
• /
• pp.128-135
• /
• 2007

Micro-channels for a wave micropump have been fabricated using the Stereolithography and UV Photolithography. The micro-channel with a channel height of $500\;{\mu}m$ was fabricated with stereolithography. UV photolithography was used for producing micro-channels with a channel length less than $100\;{\mu}m$. The fabrication process data including spinning rpm, pre-bake and post-bake time, and develop time for single layer and multiple layer 3D micro-structures using SU-8 photo resist are experimentally found. A film mask printed with a 40,000 dpi laser printer was used for UV lithography and micro-structures in the order of tens of micrometers in dimension were successfully fabricated.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2004.10a
• /
• pp.369-372
• /
• 2004

Photo-induced surface alignment is charming as a non-contact photo-patternable alignment technology which can be used in the next generation of displays, such as large area, multi-domain. For decades, many polymer film have been investigated and developed to be used in the photo alignment. Among these photoreactive materials, recently developed polyimide, Chloromethylated Polyimide(CMPI) now became the focus of interests in this area because of its high photosensitivity and superior thermal stability. In this report, we present micro patterning method to form the nanoscale structure by Mask-Less laser patterning using this CMPI film and NSOM probe.

• Transactions on Electrical and Electronic Materials
• /
• v.14 no.1
• /
• pp.28-31
• /
• 2013

A volcano shaped gated Si-FEA (silicon field emitter array) was simply fabricated using sputtering as a gate electrode deposition and lift-off for the removal of the oxide mask, respectively. Due to the limited step coverage of well-controlled sputtering and the high aspect ratio in Si dry etch caused by high RF power, it was possible to obtain Si FEAs with a stable volcano shaped gate structure and to realize the restriction of gate leakage current in field emission characteristics. For 100 tip arrays and 625 tip arrays, gate leakage currents were restricted to less than 1% of the anode current in spite of the volcano-shaped gate structure. It was also possible to keep the emitters stable without any failure between the Si cathode and gate electrode in field emission for a long time.

• Proceedings of the KIEE Conference
• /
• 2005.05a
• /
• pp.179-181
• /
• 2005

There is asymmetric in horizontal and vertical side of PDP cell. Every vertical line has BM(Black Mask) to improve luminance contrast. When error diffusion is processed in PDP system, these problems make an error bigger. In 4 inch PDP system, every red, green, blue color of test pattern is presented and each luminance is measured. That is called horizontal(H), diagonal right(R), diagonal left(L) and vertical(V). In red channel, high luminance descending order is V-H-R-L. In green channel, V-H-L-R. In blue channel, V-M-R=L. After average luminance of each direction is calculated. new weighted error diffusion(Weighted ED) is proposed. In digital image signal processing, the error in weighted ED is differ from ED's. The image of weighted ED is more less error compare to conventional ED and close to original image. As the gray level linearity and big size panel is adopted, weighted ED could produce good image.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2003.06a
• /
• pp.219-222
• /
• 2003

Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecular and bio molecular. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance in selective etching of thin metal film of Self- Assembled Monolayers. In this report, we present the micromachining thin metal film by Mask-Less laser patterning of alknanethiolate Self-Assembled Monolayers.