References
- T. H. P. Chang, D. P. Kern, and L. P. Muray, IEEE Trans. Electron Devices 38, 2284 (1991) [DOI: http://dx.doi. org/10.1109/16.88511].
- K. Uemura, S. Kanemaru, and J. Itoh, Jpn. J. Appl. Phys. 35, 6629 (1996) [DOI: http:// dx.doi.org/10.1143/JJAP.35.6629].
- J. Liu, J. J. Hren, C. T. Sune, G. W. Jones, and H. F. Gray, IEDM92, 374 (1992).
- C. A. Spindt, C. E. Holland, A. Rosengreen, and I. Brodie, IEEE Trans. Electron Devices 38, 2355 (1991) [DOI: http:// dx.doi. org/10.1109/16.88525].
- S. Wolf: Silicon processing for the VLSI Era Volume 1-Process Technology, (Lattice Press, Sunset Beach, 1986).
- G. N. A. van Veen and B. Theunissen, J. Vac. Sci. Technol. B 13, 478 (1995) [DOI: http:// dx.doi.org/10.1116/1.588337].
- Y. Yamada, S. Kanemaru, and J. Itoh, Jpn. J. Appl. Phys. 35, 6626 (1996) [DOI: http:// dx.doi.org/10.1143/JJAP.35.6626].
- C. A. Spindt, I. Brodie, L. Humphrey, and E. R. Westerberg, J. Appl. Phys. 47, 5248 (1976) [DOI: http:// dx.doi.org/10.1063/1.322600].
- S.-H. Yang and M. Yokoyama: Mater. Chem. Phys. 51, 6 (1997)[DOI: http:// dx.doi.org/10.1016/S0254-0584(97)80258-1].
- S. S. Choi, S. H. Lim, D. W. Kim, M. Y. Jung, and H. Jeon, J. Vac. Sci. Technol. B 17, 4583 (1999) [DOI: http:// dx.doi. org/10.1116/1.590598].
- J. E. Pogemiller, H. H. Busta, and B. J. Zimmerman, J. Vac. Sci. Technol. B 12, 680 (1994) [DOI: http:// dx.doi. org/10.1116/1.587369].
- W. Mehr, A. Wolff, H. Frankenfeld, T. Skaloud, W. Hoppner, E. Bugiel, J. Larz, and B. Hunger, Microelec. Eng 30, 395 (1996) [DOI: http:// dx.doi.org/10.1016/0167-9317(95)00271-5].
- C. G. Lee, B. G. Park, and J. D. Lee: J. Vac. Sci. Technol. B 15, 464 (1997) [DOI: http:// dx.doi.org/10.1116/1.589600].
- H. Y. Ahn: Dr. Thesis, Faculty of Engineering, the Seoul National University, Seoul, 1996
- H. S. Uh: Dr. Thesis, Faculty of Engineering, the Seoul National University, Seoul, 1998.
- K. X. Liu and J. P. Heritage: J. Vac. Sci. Technol. B 21, 464 (2003) [DOI: http:// dx.doi.org/10.1116/1.1539060].