• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.15 no.3
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• pp.277-281
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• 2005

Air-line mask is an important personal protective equipment for workers working under hazardous surroundings in which a fixed ventilation system is difficult to be installed. If the air-line mask make loud noise, works wearing the mask may be faced with health problems such as noise induced hearing loss(NIHL). The purpose of this study is to introduce a low noisy technology for workers using air-line mask. A traditional type air-line has been improved to an advanced air-line mask with lesser noise. In the mask, air suppling conduits consists of multi tubes are placed inside of the front of the safety helmet. The noise level reduced from 80dB(A) to less than 80dB(A) when measured by KS A 0701 method at Center for Safety Inspection, Testing and Certification for KOSHA. It is suitable for related regulation[Article 35 of the Industrial Safety and Health Act(Test of Personal Protective Equipment)]. While workers working in noise level of over 90dB(A), they may expose to 82dB(A) or less when they wear the advanced masks. This type masks can be an alternative for works suffering from loud noise generated by traditional air-line masks.

• Journal of the Korean Society of Safety
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• v.31 no.5
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• pp.35-41
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• 2016

Particulate filtering facepiece respirators (PFFR) is one of the most widely used items of personal protective equipments, and a tight fit of the respirators on the wearers is critical for the protection effectiveness. In order to effectively protect the workers through the respirators, it is important to find and evaluate the ways that can be readily applicable at the workplace to improve the fit of the respirators. This study was designed to evaluate effects of mask style (cup or foldable type) and donning training on fit factors (FF) of the respirators, since these are available at various workplace, especially at small business workplace. A total of 40 study subjects, comprised of 30~50s aged male and female workers in metalworking industries, were enrolled in this study. The FF were quantitatively measured before and after training related to the proper donning and use of cup or foldable-type respirators. The pass/fail criterion of FF was set at 100. After the donning training for the cup-type mask, subjects who passed the fit test were increased from 10 to 33. Moreover, the geometric mean (GM) of FF was increased by 340% in subjects who failed the test. In addition, the training effects for the cup-type mask were significant in female and 50s aged subjects. On the other hand, although the GM of FF for the foldable-type mask was also increased after the donning training, the GM of FF for the foldable-type mask and it's increase rate were smaller as compared to the cup-type mask. Furthermore, the differences of the increase rates of the GM of FF in sex and aged of the subjects were not significantly for the foldable-type mask. The multi-distribution of leak points for the foldable-type mask may be one of causes for the less effect of training on the fit of the foldable-type mask. These results imply that the raining on the donning and use of PFFR can enhance the protection effectiveness of cup or foldable-type mask, and that the training effects for the foldable-type mask is less significant than that for the cup-type mask. Therefore, It is recommended that the donning training and fit tests should be conducted before the use of the PFFR, and that efficient tranining programs for the foldable-type mask are required.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.11
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• pp.901-907
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• 2000

As the minimum feature size for making ULSI approaches the wavelength of light source in optical lithography, the aerial image is so hardly distorted because of the optical proximity effect that the accurate mask image reconstruction on wafer surface is almost impossible. We applied the Optical Proximity Correction(OPC) on isolated patterns assuming Attenuated Phase Shift Mask(APSM) as well as binary mask, to correct the widening of isolated patterns. In this study, we found that applying OPC to APSM shows much better improvement not only in enhancing the resolution and fidelity of t도 images but also in enhancing the process margin than applying OPC to the binary mask. Also, we propose the OPC method of APSM for isolated patterns, the size of which is less than the wavelength of the ArF excimer laser. Finally, we predicted the resolution limit of optical lithography through the aerial image simulation.

• 전기의세계
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• v.28 no.11
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• pp.37-44
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• 1979

This paper deals with the computer program of finding the minimal sum-of-products for a switching function by using the MASK method derived from the characteristics of the Boolean algebra. The approach differs from the previous procedures in that all the prime implicants are determined only by the bit operation and the minimal sum-of-products are obtained by the modified Petrick method in this work. The important features are the relatively small amount of the run time and the less memory capacity to solve a problem, as compared to the previous computer programs.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.12
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• pp.62-67
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• 1997

The optical lithography wit an ArF excimer laser as a light source is expected to be used in the mass production of giga-bit DRAMs which require less than 0.2.mu.m minimum feature size. In this case, the distortion of a patterned image becomes very severe, since the lithography porcess is performed at the resolution limit. Traditionally, the photomask pattern was designed and revised with trial-and-error methods, such as repeated execution of process simulators or actual process experiments which require time and effort. Ths paper describes a program which automatically finds an optimal mask pattern. The program divides the mask plane into cells with same sizes, chooses a cell randomly, changes the transparent/opaque property of the cell, and eventually genrates a mask pattern which produces required image pattern. The program was applied to real DRAM cell patterns to produce mask patterns which genertes image patterns closer to object images than original mask patterns.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.370-373
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• 2009

X-ray lithography was employed to fabricate ITO-less high resolution sustain electrodes for plasma display panel (PDP). A polyimide film based X-ray mask and Xray sensitive Ag electrode paste were fabricated to check their effect on the patterning of Ag electrodes with less than 30 ${\mu}m$ in width. The X-ray lithographic method was found to be useful for the high resolution sustain electrode patterns due to the high penetration power and low scattering property of X-ray source.

• Journal of the Korean Society of Safety
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• v.33 no.6
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• pp.28-36
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• 2018

There was a difference in recognition of respirators according to the educational performance environment. they were showed higher recognition of respirators of group by internal and external mix trainer, less than 6 months, over 1hour, more than 5 times, variety of education. To identify the relationship between types of job classification(typical and atypical)and the levels of recognition of respirators, a total of 153 workers in a business workplace. mainly, typical workers showed higher recognition of respirators than atypical workers. Training of correct wearing showed high demands both typical and atypical workers. Descriptive statistics(SAS ver 9.2)was performed. the results of recognition of respirators were analyzed the mean and standard deviation by t-test, and anova, fit factor is used geometric means(geometric standard deviation), paired t-test, Wilcoxon analysis(P=0.05). Particulate filtering facepiece respirators (PFFR) is one of the most widely used items of personal protective equipments, and a tight fit of the respirators on the wearers is critical for the protection effectiveness. In order to effectively protect the workers through the respirators, it is important to find and evaluate the ways that can be readily applicable at the workplace to improve the fit of the respirators. This study was designed to evaluate effects of mask style (cup or foldable type) and donning training on fit factors (FF) of the respirators, since these are available at various workplace, especially at small business workplace. A total of 40 study subjects, comprised of employment type workers in metalworking industries, were enrolled in this study. The FF were quantitatively measured before and after training related to the proper donning and use of cup or foldable-type respirators. The pass/fail criterion of FF was set at 100. After the donning training for the cup-type mask, fit test were increased by 769%. but foldable-type mask was also increased after the donning training, the GM of FF for the foldable-type mask and it's increase rate were smaller as compared to the cup-type mask. Furthermore, the differences of the increase rates of the GM of FF in employment type of the subjects were not significantly for the foldable-type mask. These results imply that the raining on the donning and use of PFFR can enhance the protection effectiveness of cup or foldable-type mask, and that the training effects for the foldable-type mask is less significant than that for the cup-type mask. Therefore, it is recommended that the donning training and fit tests should be conducted before the use of the PFFR, and listening to workers opinion regularly.

• Particle and aerosol research
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• v.15 no.4
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• pp.191-202
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• 2019

In this study, performance (particle removal efficiency and breathing resistance) of several commercially available face masks (electrostatic filter masks (KF80 certified), a nanofiber filter mask (KF80 certified), and an uncertified mask) with their filter structure and composition were evaluated. Also, effects of relative humidity (RH) of incoming air, water and alcohol exposure, and reusability on performance of face masks were examined. Monodisperse and polydisperse sodium chloride particles were used as test aerosols. Except the uncertified mask filter, PM_2.5 removal efficiency was found to be higher than 90%, and the nanofiber filter mask had the highest quality factor due to the low pressure drop and high removal efficiency (nanofibers were arranged in a densely packed pore structure and contained a significant amount of fluorine in addition to carbon and oxygen). In the case of the KF80 certified mask, the removal efficiency was little affected when the RH of incoming air increased. When the mask filters were soaked in water, the removal efficiency of mask filters was degraded. In particular, the uncertified mask filter showed the highest removal efficiency degradation (26%). When the mask was soaked in alcohol, the removal efficiency also decreased with the greater degree than the water soaking case. The nanofiber mask filter showed the strongest resistance to alcohol exposure among tested mask filters. During evaluation of reusability of masks in real life, the removal efficiency of certified mask filter was less than 4% for 5 consecutive days (2 hours per day), while the removal efficiency of uncertified mask filter significantly decreased by 30% after 5 days.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.133-136
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• 2002

It is very important to get a stable and large-capacity organic effusion source for achievement of OLED mass-production equipment. We present an organic effusion source with film uniformity less than ${\pm}$ 5%, the material charge volume, 300cc for $400{\times}400\;mm^2$ substrate. The fine metal shadow mask alignment technology, one of the color forming technique, also have to support more accurate and fast operating in mass-production. In this paper, we will describe the OLED mass-production equipment with the large volume effusion source and the precision shadow mask alignment technique.

• Fashion & Textile Research Journal
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• v.23 no.3
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• pp.406-414
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• 2021

This study aimed to evaluate the inhalation resistance(IR) and fiber structure of disposable masks when exposed to repeated heating and ultraviolet(UV) sterilization. The experiments consisted of a lab-scale and a field test. For the lab-scale test, KF94 and N95 masks were selected and a trial was composed of three repetitions of an 80-min sterilization. For the field test, a subject participated over four days, of which a KF94 was worn without sterilization, and the same trial was conducted during the next four days with daily sterilization. The results showed that the IR of the KF94 mask(9.5 Pa) gradually increased according to the sterilization up to the second repetition(15.6 Pa) but decreased at the third treatment(9.7 Pa). However, the N95 mask did not showany tendency of IR during the repetitions. Microscope photos showed several warped or blackened fibers in the stiffener layer after the repeated sterilization. After wearing a KF94 mask for four consecutive days, its IR decreased until the three days but increased the fourth day, whereas another KF94 mask with sterilization showed an increase in IR for the four days. In the microscope-photos after the consecutive four days, outside fibers and stiffener layers were warped or became less dense. In summary, the IR of the KF94 mask slightly increased through the three~four rounds of heating and UV sterilizations, but the fiber structures were not significantly deformed by the repeated sterilization. To reduce discarded mask waste, the repeated sterilization of masks can be recommended.