• Title/Summary/Keyword: MONOS

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Effect of Nitrogen, Titanium, and Yttrium Doping on High-K Materials as Charge Storage Layer

  • Cui, Ziyang;Xin, Dongxu;Park, Jinsu;Kim, Jaemin;Agrawal, Khushabu;Cho, Eun-Chel;Yi, Junsin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.33 no.6
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    • pp.445-449
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    • 2020
  • Non-volatile memory is approaching its fundamental limits with the Si3N4 storage layer, necessitating the use of alternative materials to achieve a higher programming/erasing speed, larger storage window, and better data retention at lower operating voltage. This limitation has restricted the development of the charge-trap memory, but can be addressed by using high-k dielectrics. The paper reviews the doping of nitrogen, titanium, and yttrium on high-k dielectrics as a storage layer by comparing MONOS devices with different storage layers. The results show that nitrogen doping increases the storage window of the Gd2O3 storage layer and improves its charge retention. Titanium doping can increase the charge capture rate of HfO2 storage layer. Yttrium doping increases the storage window of the BaTiO3 storage layer and improves its fatigue characteristics. Parameters such as the dielectric constant, leakage current, and speed of the memory device can be controlled by maintaining a suitable amount of external impurities in the device.

Identification of Hepatitis B (HBV) and C (HCV) Virus Infection among Doctors and Nurses in Tertiary Hospitals in Mongolia

  • Batbold, D.;Baigalmaa, Dovdon;Ganbaatar, B.;Chimedsuren, O.
    • Perspectives in Nursing Science
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    • v.7 no.1
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    • pp.50-54
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    • 2010
  • The studies of M. Colombo (1989) and W. Lange (1992) showed that 30~40% of people became chronic after suffering from hepatitis B virus (HBV) and C virus (HCV) infection, and about 50% of the chronic cases transformed into primary liver cancer. There have been few studies done in Mongolia on hepatitis infection among health professionals, particularly in nurses. In a study done by Chimedsuren (8), the study showed that 19.4% of people with identified surface hepatitis B antigen (HBsAg) and antibodies to hepatitis C virus and 8% of people with the identified nucleotide of RNA for the hepatitis C virus (polymerase chain reaction) had an acute form of hepatitis C. Studies on the hepatitis virus genome damaging effect on liver cells showed that genotype 8 (A, B, C, D, E, F, G, TTV) had the most damaging effect on liver cells (Hahn and Faeka, 2007). Several studies have shown a relationship between hepatitis B virus infection and a lack of compliance regarding safety regulations and rules by medical personnel. Results of a study from the Maternal and Child Health Research Center showed that tests done to detect hepatitis B virus antigen and antibodies to C virus did not reveal anything. Both antigen and antibodies in 69% cases did not show, and separately, B virus and antibodies to hepatitis C virus were identified in 13% and 9%, respectively. Results of the tests taken from health personnel in Shastin Central Hospital showed that in 76% of the cases, the B virus antigen with C virus antibodies was not identified. In 8% of the cases, the B virus antigen was present on its own. The combination of B the virus antigen and C virus antibodies were present in 8% of nurses and doctors, respectively. 82% of the cases had negative results for the detection of a combination of B virus antigen and C virus antibodies taken from health personnel from the State Central Clinical Hospital whereas the B virus antigen and C virus antibodies by themselves were present in 7% and 14% of the cases, respectively. Combined cases of the B virus antigen and C virus antibodies were identified in 4% of the personnel. Results of the tests taken from the health personnel in the Hospital of the Ministry of Justice and Internal Affairs showed that in 79% of the cases, the B virus antigen with C virus antibodies were not identified. Separately, the B virus and antibodies to hepatitis C virus were identified in 8% and 13% of the cases, respectively.

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Characteristics of Aboveground and Red Ginseng Quality of Polystem Ginseng(Panax gjnseng C.A. Meyer) (다경형(多莖型) 인삼(人蔘)의 지상부 생육 및 홍삼(紅蔘) 품질 특성)

  • Lee, Jong-Chul
    • Korean Journal of Medicinal Crop Science
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    • v.4 no.3
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    • pp.255-260
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    • 1996
  • This study was conducted to investigate the characteristics of aboveground plants and red ginseng of polystem ginseng in 6 years of age having two or more stems in a plant. Total leaf weight and area of polystem ginseng were larger, while its stem diameter, and the leaf weight and area of the big­gest stem in each plant were decreased with increase the stem numbers in a plant. The ratio of shoot weight to root weight in the polystem ginseng with three or more stems was higher than that in the monos­tem ginseng and the polystem ginseng with two stems, In ginseng plants with no more than 2 stems, there were positive correlations between root weight and total leaf weight, and leaf area, but not between leaf weight and area of the biggest stem. Inner cavity and inner white, limiting factors for redginseng quality grade, occurred more in tri-stem ginseng than mono- and di-stem one. Percentages of Heaven (1st grade) and Earth (2nd grade) red ginseng in tri-stem ginseng were decreased compared with mono stem and di-stem ginseng.

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Analysis Trap and Device Characteristic of Silicon-Al2O3-Nitride-Oxide-Silicon Memory Cell Transistors using Charge Pumping Method (Charge Pumping Method를 이용한 Silicon-Al2O3-Nitride-Oxide-Silicon Flash Memory Cell Transistor의 트랩과 소자)

  • Park, Sung-Soo;Choi, Won-Ho;Han, In-Shik;Na, Min-Gi;Lee, Ga-Won
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.7
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    • pp.37-43
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    • 2008
  • In this paper, the dependence of electrical characteristics of Silicon-$Al_2O_3$-Nitride-Oxide-Silicon (SANOS) memory cell transistors and program/erase (P/E) speed, reliability of memory device on interface trap between Si substrate and tunneling oxide and bulk trap in nitride layer were investigated using charge pumping method which has advantage of simple and versatile technique. We analyzed different SANOS memory devices that were fabricated by the identical processing in a single lot except the deposition method of the charge trapping layer, nitride. In the case of P/E speed, it was shown that P/E speed is slower in the SANOS cell transistors with larger capture cross section and interface trap density by charge blocking effect, which is confirmed by simulation results. However, the data retention characteristics show much less dependence on interface trap. The data retention was deteriorated as increasing P/E cycling number but not coincides with interface trap increasing tendency. This result once again confirmed that interface trap independence on data retention. And the result on different program method shows that HCI program method more degraded by locally trapping. So, we know as a result of experiment that analysis the SANOS Flash memory characteristic using charge pumping method reflect the device performance related to interface and bulk trap.