• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.4
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• pp.286-291
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• 2003

(Pb,Sr)TiO$_3$(PST) thin films have attracted great interest as new dielectric materials of capacitors for Gbit dynamic random access memories. In this study, inductively coupled CF$_4$/Ar plasma was used to etch PST thin films. The maximum etch rate of PST thin films was 740 $\AA$/min at a CF$_4$(20 %)/Ar(80 %) 9as mixing ratio, an RF power of 800 W, a DC bias voltage of -200 V, a total gas flow of 20 sccm, and a chamber pressure of 15 mTorr. To clarify the etching mechanism, the residue on the surface of the etched PST thin films was investigated by X-ray photoelectron spectroscopy. It was found that Pb was mainly removed by physically assisted chemical etching. Sputter etching was effective in the etching of Sr than the chemical reaction of F with Sr, while Ti can almost removed by chemical reaction.

• Journal of the Korean Magnetics Society
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• v.6 no.2
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• pp.98-105
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• 1996

스퍼터링 방법으로 제작된 NiFe 박막에서 Ar 압력이 자기 및 자기저항 성질에 미치는 여향을 조사하였다. 타겟으로는 Ni$_{81}$$Fe_{19}$ 조성의 합금타겟을 사용하였다. TEM을 써서 박막의 미세구조를 조사하였으며, 보자력과 포화자화는 VSM으로 측정하였다. 합금박막의 조성은 ICPS로 분석 확인하였다. 10 mTorr 이상의 높은 Ar 압력에서 제작된 박막에서 갈라진 틈새(crack-like void)를 갖는 주상구조가 관찰되었다. 이러한 주상 결정립경계(columnar grain boundary)가 자화 과정에서 자구벽 핀닝자리(pinning site)가 되어, Ar 압력이 커짐에 따라 보자력이 증가 하였으며, 박막의 밀도가 감소하여 포화자화가 줄어드는 것을 볼 수 있었다. 한편, Ar 압력이 증가하면서 자기저항비가 감소하는 결과를 얻었다. 결정립 경계 산란과 결정립간 터널링에 의한 박막의 비저항의 증가가 이러한 자기저항비 감소의 주원인임을 알 수 있었다.다.

• Proceedings of the KIEE Conference
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• 2003.07c
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• pp.1695-1697
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• 2003

In this paper the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber a RF power of 13.56MHz was appied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar-I line, luminance were investigated. At this time the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10${\sim}$60m Torr, 10${\sim}$300W respectively.

• Proceedings of the KIEE Conference
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• 2004.11a
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• pp.150-152
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• 2004

In recent, there have been several developments in lamp technology that promise savings in electrical power consumption and improved quality of the lighting space. The electrodeless fluorescent lamp is intended as a high efficacy replacement for the incandescent reflector lamp in many applications. In this paper, electron temperature and electron density were measured in a radio-frequency inductively coupled plasma using a Langmuir probe method for emission characteristics. Measurement was conducted in an Ne discharge for pressure from 10 [mTorr] and input RF power 100 [W] to 150 [W]. As for the electron density, a electron temperature was more distinguished for a emission characteristic. The results of ideal may contribute to systematic understanding of a electrodeless fluorescent lamps of emission characteristics.

• Proceedings of the KIEE Conference
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• 2004.11a
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• pp.167-170
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• 2004

In recent, there have been several developments in lamp technology that promise savings in electrical power consumption and improved quality of the lighting space. The electrodeless fluorescent lamp is intended as a high efficacy replacement for the incandescent reflector lamp in many applications. In this paper, electron temperature and electron density were measured in a radio-frequency inductively coupled plasma using a Langmuir probe method for emission characteristics. Measurement was conducted in an Argon, Ne discharge for pressure from 1 [mTorr] and input RF power 10 [W] to 150 [W]. As for the electron density, a electron temperature was more distinguished for a emission characteristic. The results of ideal may contribute to systematic understanding of a electrodeless fluorescent lamps of emission characteristics.

• Proceedings of the KIEE Conference
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• 2004.11a
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• pp.306-309
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• 2004

Recently, the environmental problem has received considerable attention. so, many lamps have been developing for environmental requirement and energy efficiency. also, at glow discharge lamp researchers try to reduce energy spending that is power saving lamp. this kind requirement agree with strong points of electrodeless fluorescent lamp has received to now lighting sauce. At low pressure as mTorr I.C.P make high density plasma easily, is good to maintain discharge, has high ionization and does not have failing lighting and losing ability of electron radiation by oxidation and volatilization of electrodes, because this tape does not have electrodes. This point of I.C.P can use at electrodeless fluorescent lamp in this study ICP display elements and Ar, Ne, Kr are researched for optical characteristic. each gas is looked into optical characteristic, also mixed gases is experiment for optical characteristic.

• Proceedings of the KIEE Conference
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• 1996.11a
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• pp.203-205
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• 1996

DLC(Diamond-Like Carbon) films were prepared by Inductively Coupled Plasma(ICP) CVD system. It was confirmed that the field emission characteristics are closely related to the richness of C-H bonding incorporated in the DLC. According to Fowler-Nordheim equation, it is thought that the ability of DLC to emit electron at relatively low voltage is due to the field enhancement caused by the nodules of ${\sim}100nm$ size on the surface of DLC. The electric field to start field emission was about $1.4{\times}10^9V/m$ in case of DLC film deposited at input power of 400W and substrate bias of -100V.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.318-321
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• 2005

FIB (Focused ion Beam) milling on a 500-nm-thick silicon nitride membrane was studied in order to fabricate a high-resolution shadow mask, or called a nanostencil. The silicon nitride membrane was fabricated by MEMS processes of LPCVD, photolithography, ICP etching and bulk silicon etching. The apertures made by FIB milling and normal photolithography were compared. The square metal pattern deposited through FIB milled shadow mask showed 6 times smaller comer radius than the case of photolithography. The results show high resolution patterning could be achieved by local deposition through FIB milled shadow-mask.

• Journal of the Korean Physical Society
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• v.73 no.9
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• pp.1399-1404
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• 2018

This study used an inductively coupled plasma (ICP) dry etching process with a metal amplitude mask to fabricate a double-side notched long-period fiber grating (DNLPFG) for loading sensing. The DNLPFG exhibited increasing resonance attenuation loss for a particular wavelength when subjected to loading. When the DNLPFG was subjected to force loading, the transmission spectra were changed, showing a with wavelength shift and resonance attenuation loss. The experimental results showed that the resonant dip of the DNLPFG increased with increasing loading. The maximum resonant dip of the $40-{\mu}m$ DNLPFG sensor was -26.522 dB under 0.049-N loading, and the largest force sensitivity was -436.664 dB/N. The results demonstrate that the proposed DNLPFG has potential for force sensing applications.

• Proceedings of the Korea Information Processing Society Conference
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• 2023.11a
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• pp.848-849
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• 2023

본 논문은 로봇의 실내 환경에서의 자율성을 높이기 위한 SLAM과 내비게이션 방법을 제시한다. 2D LiDAR와 카메라를 이용하여 위치를 인식하고 사람과 장애물을 의미론적으로 검출하며, ICP와 RTAB-map, YOLOv3를 통합하여 Semantic Map을 생성하고 실내 환경에서 자율성을 유지한다. 이 연구를 통해 로봇이 복잡한 환경에서도 높은 수준의 자율성을 유지할 수 있는지 확인하고자 한다.