• 전자공학회논문지D
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• 제34D권9호
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• pp.1-6
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• 1997

A transmission type phase shift attenuator has a poor reflection characteristics at an output port. And that is controlled by the current, its dynamic rnage decreases due to the current limitation. In this paper, to avoid such disadvantages, a reflection type low phase shift attenuator has been designed and measured. As a result, at a center frequency (1855MHz), the sreflection type low pahse shift attenuator has an attenuation of 30dB, within the limit of 3 phase shift and less than -17dB reflection characteristics at both input and output ports. And it demonstrates the peformance of the reflection type low phase shift attenuator is better than the transmission type phase shift attenuator with the same measurement specifications.

• Journal of Korean Vacuum Science & Technology
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• 제7권1호
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• pp.23-26
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• 2003

In this study, a neutral beam was formed using a low angle forward reflection of the ion beam and its degree of neutralization at different reflection angles was investigated. When the ion beam was reflected by a reflector at the angles lower than 15$^{\circ}$, most of the ions reflected were neutralized and the lower reflector angle showed the higher degree of neutralization. Photoresist(PR) and SiO$_2$ etchings were carried out with the neutralized oxygen and fluorine radical fluxes, respectively, and highly anisotropic etch profiles could be obtained suggesting the formation of highly directional neutral flux.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2003년도 춘계학술발표회 초록집
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• pp.56-56
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• 2003

플라즈마 식각에서 물리적 손상과 전기적 손상은 차세대 Nanoscale 소자와 Deep - Submicron 반도체공정에서 해결되어야 할 가장 큰 문제 중 하나이다. 이 중 전기적인 손상을 줄이기 위한 몇 가지 무손상 공정이 제시되고 있으며, 그러한 기술 중의 하나가 이온빔의 Low Angle Forward Reflection을 이용한 식각방법이다. Low Angle Forward Reflection방법은 이온소오스로부터 발생시킨 이온을 Low Angle 에서 Reflection-시켜 이온빔을 중성화되도록 하는 방법으로, 이전 연구를 통해 Reflection시 입사각이 5도일 경우 대부분의 이온들이 중성화되는 결과를 얻었다. 또한, 실험에 사용된 $SF_6,{\;}NF_3,{\;}CF_4$와 같은 모든 가스종에서 유사한 값의 중성화 정도를 관찰할 수 있었으며, 이러한 가스를 이용하여 $Si0_2$ 식각시 Vertical한 Profile 결과를 얻었다. 본 연구에서는 기존 Grid 장치에서 이온소오스 부분에 Low Angle Forward Reflected Neutral Beam을 위한 판형 Reflector를 부착하였으며, 이에 따라 중성빔의 Flux가 크게 향상되며 Beam의 직진성을 향상시킬 수 있었다. 또한, F계열 가스를 이용한 실험을 통해 $Si0_2$ 식각율과 식각특성 면에서 향상된 실험결과를 얻을 수 있었다.

• 한국방재학회:학술대회논문집
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• 한국방재학회 2008년도 정기총회 및 학술발표대회
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• pp.217-220
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• 2008

The reflection coefficients and the run-up heights affected by submerged structures are studied by using the numerical and the laboratory experimental methods. The three-point method is chosen to calculate the reflection coefficients in both the experimental and the numerical methods. The results of numerical simulations are shown a good agreement with laboratory measurements. The reflection coefficients increase and the run-up heights decrease when the rubble mound breakwater is defended by low-crested structures.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.450-451
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• 2008

In this paper, we have designed the Anti-Reflection (AR) coating for 850, 1310 nm(multi type) and 1310, 1550 nm(multi type) wavelength ranges on the ferrule facet of special optical connector. The reflectance of the AR coated ferrule facet is designed under 5% for 850, 1310 nm(multi type) and 1310, 1550 nm (multi type). AR thin film was deposited by ion- assisted deposition in low temperature. The average return loss of the AR coated ferrule facet is 47.1 dB.

• Journal of Biosystems Engineering
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• 제24권3호
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• pp.259-266
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• 1999

This research was carried out to investigate the possibility of real time rice milling ratio measurement using the spectral reflection characteristics. In this study, various methods were compared such as \circled1 using the whiteness meter, \circled2 using the colorimeter, \circled3 using the Visible and the NIR reflection spectrum. The samples were milled in the domain of 84~96% by 0.5% interval classified by milling ratio. The NMG treatment method required about 20 minutes to determine the milled ratio and r2 was 0.0028 to 0.7959 that was very low. In case of whiteness meter, r2 was high but speed of measurement was 5 minutes that was very low. Measurement with the colorimeter required about 5 minutes and r2 was 0.60 to 0.85 that was low. The reflection spectrum were measured in the range of 400~2,500nm with 2nm interval and the MLR model with six-wavelength obtained from first derivative of spectra gave the best results(r2 = 0.967, SEP = 0.729%)

• 전자공학회논문지A
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• 제33A권6호
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• pp.189-196
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• 1996

We have studied sngle-frequency yield of 1.55${\mu}$m DFB lasers with uniform sinusoidal grating using an effective index transfer matrix method considering both threshold gain difference and spatial hole-burning effect. Optimum grating height and mirror reflectivities that maximize the single-frequency yield are found for a low-reflection (LR)/high-reflection(HR) mirror structure and a LR/as-cleaved miror structure for an assumed basic waveguide structure. LR/HR structure has a high yield of about 80% in a narrow range of grating height while LR/as-cleaved mirror structure has a low yield of about 50% in a relatively wide range of grating height. The effect of the low-reflection facet reflectivity is also studied.

• 한국산학기술학회논문지
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• 제13권5호
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• pp.1996-2001
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• 2012

본 시각 검사시스템은 전자 부품과 같이 잘 형성된 표면 재료에 널리 사용되고 있다. 반사 능력이 나쁜 재료의 경우, 시각 검사시스템이 도입될 때 많은 문제점이 발생한다. 혼합 생산 라인에서 진위의 모델을 알 수 없을 때 저 반사비와 많은 노이즈에도 잘 작동할, 강인한 시각 검사시스템을 개발하였다. 유형을 인식하기 위하여 k-means를 이용한 작업물 인식 기법이 제안되었다. 인식 유형에 기반하여 active contour라는 노이즈에 강인한 분할 기법이 영상에서 특징을 분할하는데 응용되었다. 오차 변화를 조정하는데 Kalman 필터가 사용되었다. 자동시각 검사시스템의 실험은 프로젝터를 이용한 수작업 측정의 정확도 수준을 보여준다.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2003년도 추계학술대회 발표 논문집
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• pp.117-121
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• 2003

In this paper, a micromachined low-loss and ultra wide band reflection-type phase shifter (RTPS) is proposed. The phase shifter shows a constant phase shift from 5 to 17 GHz and consists of two cascaded reflection-type phase shifter. Low-loss reflection termination consists of digital capacitive switches, and air-gap overlay CPW couplers are used in order to employ the low-loss 3 dB coupling. The fabricated phase shifter showed the 5 discrete states, $0^{\circ},{\;}22.5^{\circ},{\;}45^{\circ},{\;}67.5^{\circ},{\;}90^{\circ}$ respectively, the average insertion loss of 3.48 dB, and maximum rms phase error of ${\pm}1.80^{\circ}$ for the relative phase shift from $0^{\circ}{\;}to{\;}90^{\circ}$ over 5-17 GHz.

• 간호행정학회지
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• 제19권2호
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• pp.282-291
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• 2013

Purpose: The purpose of this study was to identify clusters of nursing competency, and investigate the influence of reflective thinking, team learning climate, and learning organization building according to nursing competency clusters. Methods: Participants were 244 clinical nurses who worked in 4 general hospitals in Gwangju Metropolitan City. Data were collected by self-report questionnaires during June and July, 2011. Nursing competency, levels of reflection hierarchy, team learning climate, and learning organization building were measured. Data were analyzed using frequencies, means, t-test, one-way ANOVA, Pearson correlation coefficients, and K-means cluster analysis with SPSS/WIN 20.0 version. Results: Nursing competency correlated positively with intensive reflection, reflection, team learning climate, and learning organization building (p<.001). There were three clusters of nursing competency in a clinical ladder, which were derived from cluster analysis, grouped as high, middle, and low competency. Intensive reflection, reflection, team learning climate, and learning organization building showed significant differences according to grouping of nursing competency. Conclusion: The results indicate that developing intensive reflection, reflection, team learning climate, and learning organization building would be useful strategies for enhancement of nursing competency.