• Title/Summary/Keyword: Line pattern processing

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Twostep Clustering of Environmental Indicator Survey Data

  • Park, Hee-Chang
    • Journal of the Korean Data and Information Science Society
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    • v.17 no.1
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    • pp.1-11
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    • 2006
  • Data mining technique is used to find hidden knowledge by massive data, unexpectedly pattern, relation to new rule. The methods of data mining are decision tree, association rules, clustering, neural network and so on. Clustering is the process of grouping the data into clusters so that objects within a cluster have high similarity in comparison to one another. It has been widely used in many applications, such that pattern analysis or recognition, data analysis, image processing, market research on off-line or on-line and so on. We analyze Gyeongnam social indicator survey data by 2001 using twostep clustering technique for environment information. The twostep clustering is classified as a partitional clustering method. We can apply these twostep clustering outputs to environmental preservation and improvement.

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Fabrication of diffraction grating mold using dot pattern (도트 패턴을 이용한 회절 격자 금형 제작)

  • Noh, Ji-Whan;Lee, Jae-Hoon;Sohn, Hyon-Kee;Suh, Jeong;Shin, Dong-Sig;Joung, Youn-Gun
    • Proceedings of the Korean Society of Laser Processing Conference
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    • 2006.11a
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    • pp.114-117
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    • 2006
  • Diffraction grating is the optical device which has periodic pattern. Decorative logotypes is the one of application of diffraction grating. In this paper diffraction grating for decorative logotype is fabricated by dot pattern in stead of line pattern. A metallic mold for diffraction gratings is fabricated with a mode-locked 12 ps $Nd:YVO_4$ laser. Laser pulses with a wavelength of 355nm are irradiated on the surface of NOK 80, a mold material, to generate dot patterns. In order to minimize the dot diameter, laser power is set just above the ablation threshold of NOK 80. Results show that the spectrum from the fabricated mold is good enough for some industrial application.

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A Study on Inspection Technology of PDP ITO Defect (PDP ITO 결함 검출기술에 관한 연구)

  • 송준엽;박화영;정연욱;김현종
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.191-195
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    • 2003
  • The formation degree of sustain (ITO pattern) decides quality of PDP (plasma display panel). For this reason. it makes efforts in search defects more than 30 ${\mu}{\textrm}{m}$. Now, the existing inspection process is dependent upon naked eye or SEM equipment in off-line PDP manufacturing process. In this study developed prototype inspection system of PDP ITO glass. This system creates information that detects and sorts kind of defect automatically. Design ed inspection technology adopts line-scan method by slip-beam formation for the minimum of inspection time and image processing algorithm is embodied in detection ability of developed system. Designed algorithm had to make good use of kernel matrix which draws up an approach to geometry. A characteristic of area-shaped defects, as pin hole, substance, protrusion et al, are extracted from blob analysis method. Defects, as open, short, spots, et al, are distinguished by line type inspection algorithm. In experiment results, we could have ensured ability of inspection that can be detected with reliability of up to 95% in about 60 seconds

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Automatic Optical Inspection System for Holograms with Multiple Patterns (다중패턴 홀로그램을 위한 자동광학검사 시스템)

  • Kwon, Hyuk-Joong;Park, Tae-Hyoung
    • Journal of Institute of Control, Robotics and Systems
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    • v.15 no.5
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    • pp.548-554
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    • 2009
  • We propose an automatic inspection system for hologram with multiple patterns. The system hardware consists of illuminations, camera, and vision processor. Multiple illuminations using LEDs are arranged in different directions to acquire each image of patterns. The system software consists of pre-processing, pattern generation, and pattern matching. The acquired images of input hologram are compared with their reference patterns by developed matching algorithm. To compensate for the positioning error of input hologram, reference patterns of hologram for different position should be generated in on-line. We apply a frequency transformation based CGH(computer-generated hologram) method to generate reference images. For the fast pattern matching, we also apply the matching method in the frequency domain. Experimental results for hologram of Korean currency are then presented to verify the usefulness of proposed system.

Effect On-line Automatic Signature Verification by Improved DTW (개선된 DTW를 통한 효과적인 서명인식 시스템의 제안)

  • Dong-uk Cho;Gun-hee Han
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.4 no.2
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    • pp.87-95
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    • 2003
  • Dynamic Programming Matching (DPM) is a mathematical optimization technique for sequentially structured problems, which has, over the years, played a major role in providing primary algorithms in pattern recognition fields. Most practical applications of this method in signature verification have been based on the practical implementational version proposed by Sakoe and Chiba [9], and il usually applied as a case of slope constraint p = 0. We found, in this case, a modified version of DPM by applying a heuristic (forward seeking) implementation is more efficient, offering significantly reduced processing complexity as well as slightly improved verification performance.

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The Modified DTW Method for on-line Automatic Signature Verification (온라인 서명자동인식을 위한 개선된 DTW)

  • Cho, Dong-Uk;Bae, Young-Lae
    • The KIPS Transactions:PartB
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    • v.10B no.4
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    • pp.451-458
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    • 2003
  • Dynamic Programming Matching (DPM) is a mathematical optimization technique for sequentially structured problems, which has, over the years, played a major role in providing primary algorithms in pattern recognition fields. Most practical applications of this method in signature verification have been based on the practical implementational version proposed by Sakoe and Chiba [9], and is usually applied as a case of slope constraint p = 0. We found, in this case, a modified version of DPM by applying a heuristic (forward seeking) implementation is more efficient, offering significantly reduced processing complexity as well as slightly improved verification performance.

Explicit feature analysis model of S/W Product line domain using Ontology (온톨로지를 이용한 S/W Product line 도메인의 명시적 feature 분석 모델)

  • Lee Soon-Bok;Lee Tae-Woong;Kim Jin-Woo;Baik Doo-Kwon
    • Proceedings of the Korea Information Processing Society Conference
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    • 2006.05a
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    • pp.269-272
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    • 2006
  • 현재 제품계열 공학에서 feature 중심의 공통성 및 가변성 분석을 통한 재사용성에 대한 연구가 활발히 이루어지고 있다. 지금까지는 도메인 전문가의 직관 및 경험에 의해 feature가 분석되어 그 개념의 불명확함으로 재사용 측면에서 제한점을 내포하고 있다. 본 논문에서는 개별 feature 속성 List 작성을 통해 feature간의 의미관계를 중심으로 한 Pattern 분석 방법을 제시하고, 의미 유사성 관계를 적용한 feature 온톨로지 그래프를 이용하여 S/W 제품계열 도메인 공학에서 사용자와 개발자간의 동일한 해석이 가능하고 재사용성을 위한 명시적 feature를 분석 및 추출하는 모델을 제안한다.

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Developement of On-Line System for Vibration Signal Analysis (진동신호 분석을 위한 On-Line 시스템 개발)

  • Kim, O.S.;Rim, S.J.;Kim, Y.S.;Lee, Y.G.;Kim, J.C.;Chung, C.S.;Chung, S.J.
    • Proceedings of the KIEE Conference
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    • 1995.07b
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    • pp.616-619
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    • 1995
  • This paper describes developement of on-line system for vibration signal analysis. In the power system, the main reason of transformer fault is due to a large amount of current by a short-circuit and a ground-fault. The electromagnetic force caused by fault-current deforms transformer windings and results in vibration pattern change. Therefore if the continuous on-line vibration monitoring on transformer is performed, an incipient failure can be detected. The developed system is composed of data acquisition devices, user interface program, signal processing program, diagnosis and trend analysis program, self diagnosis program and communication program.

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Two-dimensional Laser Drilling Using the Superposition of Orthogonally Polarized Images from Two Computer-generated Holograms

  • Lee, Hwihyeong;Cha, Seongwoo;Ahn, Hee Kyung;Kong, Hong Jin
    • Current Optics and Photonics
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    • v.3 no.5
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    • pp.451-457
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    • 2019
  • Laser processing using holograms can greatly improve processing speed, by spatially distributing the laser energy on the target material. However, it is difficult to reconstruct an image with arrays of closely spaced spots for laser processing, because the specklelike interference pattern prevents the spots from getting close to each other. To resolve this problem, a line target was divided in two, reconstructed with orthogonally polarized beams, and then superposed. Their optical reconstruction was performed by computer-generated holograms and a pulsed laser. With this method, we performed two-dimensional (2D) laser drilling of polyimide film, with a kerf width of $20{\mu}m$ and a total processing length of 20 mm.

Maskless Pattern Fabrication on Si (100) Surface by Using Nano Indenter with KOH Wet Etching (나노인덴터와 KOH 습식 식각 기술을 병용한 Si(100) 표면의 마스크리스 패턴 제작 기술)

  • 윤성원;신용래;강충길
    • Transactions of Materials Processing
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    • v.12 no.7
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    • pp.640-646
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    • 2003
  • The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as potential application to fabricate the surface nanostructures because of its operational versatility and simplicity. The objective of the work is to suggest new mastless pattern fabrication technique using the combination of machining by nanoindenter and KOH wet etching. The scratch option of the nanoindenter is a very promising method for obtaining nanometer scale features on a large size specimen because it has a very wide working area and load range. Sample line patterns were machined on a silicon surface, which has a native oxide on it, by constant load scratch (CLS) of the Nanoindenter with a Berkovich diamond tip, and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structure was made because of masking effect of the affected layer generated by nano-scratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved patterns can be used as a mold that will be used for mass production processes such as nanoimprint or PDMS molding process. All morphological data of scratch traces were scanned using atomic force microscope (AFM).