• Title/Summary/Keyword: Line mask

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Development of a Low Noisy Type of Air-line Mask (저소음형 송기마스크 개발)

  • Paik, Eun-Gyu;Kim, Bong-Nyun;Kim, Kwang-Jong
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.15 no.3
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    • pp.277-281
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    • 2005
  • Air-line mask is an important personal protective equipment for workers working under hazardous surroundings in which a fixed ventilation system is difficult to be installed. If the air-line mask make loud noise, works wearing the mask may be faced with health problems such as noise induced hearing loss(NIHL). The purpose of this study is to introduce a low noisy technology for workers using air-line mask. A traditional type air-line has been improved to an advanced air-line mask with lesser noise. In the mask, air suppling conduits consists of multi tubes are placed inside of the front of the safety helmet. The noise level reduced from 80dB(A) to less than 80dB(A) when measured by KS A 0701 method at Center for Safety Inspection, Testing and Certification for KOSHA. It is suitable for related regulation[Article 35 of the Industrial Safety and Health Act(Test of Personal Protective Equipment)]. While workers working in noise level of over 90dB(A), they may expose to 82dB(A) or less when they wear the advanced masks. This type masks can be an alternative for works suffering from loud noise generated by traditional air-line masks.

Half-Mask Interface Prototype Design using Korean Face Anthropometric Data (한국인 안면부 인체 데이터를 이용한 마스크 계면 프로토타입 설계)

  • Song, Young-Woong;Yang, Won-Ho
    • Journal of the Korea Safety Management & Science
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    • v.12 no.4
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    • pp.87-92
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    • 2010
  • The mask-face interface design should consider the face shape to improve the half mask respirator's fit ratio. This study tried to design the mask-face interface using recent Korean face data. By using the data of 1536 men's 3D face scanning (Size Korea data), head clay mock-up was made and mask-face interface line was extracted from this head mock-up. Using this interface line, the half-mask prototype was made. According to the quantitative fitting test, the proposed mask was found to be well fitted (average fit-ratio > 100). The proposed method had two advantages. 1) The method could use massive head-related anthropometric data like Size Korea data. 2) The qualitative fit test (observation) could be conducted very quickly by fitting the prototype to the head mock-up. However, this method also had several limitations. 1) The head clay mock-up could be different according to the mock-up maker. 2) The average values of the head-related anthropometric data were used to make the head mock-up. Small and large size head mock-ups should be made and tested.

DPSS UV Laser Projection Ablation of IC Substrates using an INVAR Mask (INVAR 마스크 응용 반도체 기판 소재의 고체 UV 레이저 프로젝션 어블레이션)

  • Sohn, Hyonkee;Choe, Hanseop;Park, Jong-Sig
    • Laser Solutions
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    • v.15 no.4
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    • pp.16-19
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    • 2012
  • Due to the fact that the dimensions of circuit lines of IC substrates have been forecast to reduce rapidly, engraving the circuit line patterns with laser has emerged as a promising alternative. To engrave circuit line patterns in an IC substrate, we used a projection ablation technique in which a metal (INVAR) mask and a DPSS UV laser instead of an excimer laser are used. Results showed that the circuit line patterns engraved in the IC substrate have a width of about 15um and a depth of $13{\mu}m$. This indicates that the projection ablation with a metal mask and a DPSS UV laser could feasibly replace the semi-additive process (SAP).

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Modeling and Simulation of Line Edge Roughness for EUV Resists

  • Kim, Sang-Kon
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.14 no.1
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    • pp.61-69
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    • 2014
  • With the extreme ultraviolet (EUV) lithography, the performance limit of chemically amplified resists has recently been extended to 16- and 11-nm nodes. However, the line edge roughness (LER) and the line width roughness (LWR) are not reduced automatically with this performance extension. In this paper, to investigate the impacts of the EUVL mask and the EUVL exposure process on LER, EUVL is modeled using multilayer-thin-film theory for the mask structure and the Monte Carlo (MC) method for the exposure process. Simulation results demonstrate how LERs of the mask transfer to the resist and the exposure process develops the resist LERs.

Shadow Mask 제조공정의 열변형특성(I)

  • 손순식;서윤철;강충길
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 1997.10a
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    • pp.102-109
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    • 1997
  • The surface deformation of shadow mask was studied by the experiments and numerical analysis for process improvement and delet of the stabilizing process in the shadow mask manufaturing line. To inverigate the thermal deformation of shadow mask with and without stabilizing process mask, data of spring strength, frame flatness, frame magnetic force and a mask surface curvature were measured. The tube characteristics of two kind of shadow masks were also investigated.

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Hierarchical Correlation-based Anomaly Detection for Vision-based Mask Filter Inspection in Mask Production Lines (마스크 생산 라인에서 영상 기반 마스크 필터 검사를 위한 계층적 상관관계 기반 이상 현상 탐지)

  • Oh, Gunhee;Lee, Hyojin;Lee, Heoncheol
    • IEMEK Journal of Embedded Systems and Applications
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    • v.16 no.6
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    • pp.277-283
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    • 2021
  • This paper addresses the problem of vision-based mask filter inspection for mask production systems. Machine learning-based approaches can be considered to solve the problem, but they may not be applicable to mask filter inspection if normal and anomaly mask filter data are not sufficient. In such cases, handcrafted image processing methods have to be considered to solve the problem. In this paper, we propose a hierarchical correlation-based approach that combines handcrafted image processing methods to detect anomaly mask filters. The proposed approach combines image rotation, cropping and resizing, edge detection of mask filter parts, average blurring, and correlation-based decision. The proposed approach was tested and analyzed with real mask filters. The results showed that the proposed approach was able to successfully detect anomalies in mask filters.

Refilled mask structure for Minimizing Shadowing Effect on EUV Lithography

  • Ahn, Jin-Ho;Shin, Hyun-Duck;Jeong, Chang-Young
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.4
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    • pp.13-18
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    • 2010
  • Extreme ultraviolet (EUV) lithography using 13.5 nm wavelengths is expected to be adopted as a mass production technology for 32 nm half pitch and below. One of the new issues introduced by EUV lithography is the shadowing effect. Mask shadowing is a unique phenomenon caused by using mirror-based mask with an oblique incident angle of light. This results in a horizontal-vertical (H-V) biasing effect and ellipticity in the contact hole pattern. To minimize the shadowing effect, a refilled mask is an available option. The concept of refilled mask structure can be implemented by partial etching into the multilayer and then refilling the trench with an absorber material. The simulations were carried out to confirm the possibility of application of refilled mask in 32 nm line-and-space pattern under the condition of preproduction tool. The effect of sidewall angle in refilled mask is evaluated on image contrast and critical dimension (CD) on the wafer. We also simulated the effect of refilled absorber thickness on aerial image, H-V CD bias, and overlapping process window. Finally, we concluded that the refilled absorber thickness for minimizing shadowing effect should be thinner than etched depth.

A Study on Paintless Injection Molding in TV Mask Front (TV MASK FRONT 무도장 성형에 관한 연구)

  • Cho, Chae-Sung;Kim, Jong-Kab;Park, Sang-Duck;Chang, Jae-Eon
    • Proceedings of the KSME Conference
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    • 2000.04a
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    • pp.737-740
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    • 2000
  • Injection molded plastic parts have many appearance imperfections: weld line sink mark flow mark, gloss, shading, scratching, etc. Because these appearance faults have not accepted esthetically, so pastic parts are produced through painting or texturing. The purpose of this paper is to develop a paintless molded part of TV Mask Front, using numerical simulations and experiments. In order to minimize problems of injection, this study carried out computer aided injection mold filling simulations using MF/FLOW. Based on these numerical results we developed FR(Flame Retardant) HIPS and estabilished guidelines of part design, mold design, and processing conditions. We took effects of cost savings, inprovement of productivity, and utilization of recycling by eliminated painting process.

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A Study on Paintless Molded Parts in TV Mask Front Using Gas-Assisted Injection Molding (가스사출성형을 이용한 TV MASK FRONT의 무도장 제품에 관한 연구)

  • 조재성
    • Transactions of Materials Processing
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    • v.11 no.8
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    • pp.691-700
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    • 2002
  • Injection molded plastic parts have many surface detects: weld line, sink mark, flow mark, gloss, shading, scratching, and so on. Because these surface faults have not been accepted esthetically, plastic parts are Produced through painting or texturing. The purpose of this paper is to develop a paintless molded part of TV Mask Front by flow control method and gas-assisted injection molding. In order to minimize defects from injection molding, this study was carried out using computer aided injection mold filling simulations using MF/FLOW and MF/GAS. Based on these numerical results, we developed FR(Flame Retardant) HIPS and established guidelines of part design, mold design, and Processing conditions. We have achieved of cost sayings, improvement of productivity, and utilization of recycling by eliminating surface defects and painting process.

Wear Evaluation of Protective Mask according to Internal Volume (보호마스크의 내부 부피에 따른 착용 평가)

  • Eom, Ran-i;Park, Sunhee;Park, Soyoung;Lee, Yejin
    • Journal of the Korean Society of Clothing and Textiles
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    • v.44 no.4
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    • pp.626-638
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    • 2020
  • In this study, protective masks were designed in varying internal volume and analyzed in regards to wearing effect. Masks were measured by surface temperature and subjective wear evaluation. Four experimental masks were created with an increasing distance between the mask center line and nose in increments. The distances were set at 0.0 cm (M0), 2.0 cm (M2), 4.0 cm (M4), and 6.0 cm (M6). The area and volume of each experimental mask was measured and both measurements had a positive correlation with the set distances. Among the experimental masks, M2 was the most breathable. The heat between the face and the mask created by exhalation was able to escape from the mask and provided the highest comfort sensation when worn. Conversely, an internal volume that is too large would decrease its comfort because repetitive breathing deforms the appearance of the mask and adversely affects its fit. Therefore, creating and maintaining the optimal internal volume of the M2 mask is important to achieve maximum thermal sensation and ease of wear.