• The KIPS Transactions:PartD
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• v.15D no.4
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• pp.581-588
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• 2008

Old films or photographs usually have damages from physical or chemical effects, and the damage and digitalization make stain, scratch, scribbling, noise, and digital drop out in frames. Damages include global damage and local damage, and it is well known that local damage restoration is a main factor for improving image quality. Previous researches have focused on impairment localization (esp. for line scratch impairments) and restoration techniques for line scratch, dirt, blob, and intentional scratch. Inpainting is a key technique using partial derivatives to restore damages in images. It does not show good quality for the complex images because it is based on finite order for partial derivatives, and it takes much time complexity. In this paper, we present a modified inpainting scheme, where we use Sobel edge operator's and angle to compute isophotes, and compare our scheme with Bertalmio's scheme. We experiment our scheme with two old Korean films, and Simulation results show that our scheme requires smaller time complexity than Bertalmio's scheme with comparable reconstructed image quality.

• Journal of the Institute of Electronics Engineers of Korea CI
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• v.44 no.6
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• pp.36-42
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• 2007

According to the increased demand of high quality multimedia content, it needs to recover an old movies. But the film of old movie is damaged with line scratches and dust. In this paper, the detection and restoration algorithm of B/W line scratch is proposed. Our scheme estimates and interpolates the damaged partial information of line scratch using the linear recursive curve trace which consider the intensity values of left and right region of line scratch and then median filtering processed. As a result, the film image PSNR 44.68 with B/W line scratch is increased up to 48.60 and the intensity of the interpolate pixel is approached about 14 against the pixel of original image.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.10a
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• pp.23-23
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• 2011

Chemical-Mechanical Planarization (CMP) 공정이란 화학적 반응 및 기계적인 힘이 복합적으로 작용하여 표면을 평탄화하는 공정이다. 이러한 CMP 공정은 반도체 산업에서 회로의 고집적화와 다층구조를 형성하기 위하여 도입되었으며 반도체 제조를 위한 필수공정으로 그 중요성이 강조되고 있다. 특히 최근에는 Inter-Level Dielectric (ILD)의 형성과 Shallow Trench Isolation (STI) 공정에서실리콘 산화막을 평탄화하기 위한 CMP 공정에 대해 연구가 활발히 이루어지고 있다. 그러나 CMP 공정 후 scratch, pitting corrosion, contamination 등의 Defect가 발생하는 문제점이 존재한다. 이 중에서도 scratch는 기계적, 열적 스트레스에 의해 생성된 패드의 잔해, 슬러리의 잔유물, 응집된 입자 등에 의해 표면에 형성된다. 반도체 공정에서는 다양한 종류의 실리콘 산화막이 사용되고 gks이러한 실리콘 산화막들은 종류에 따라 경도가 다르다. 따라서 실리콘 산화막의 경도에 따른 CMP 공정 및 이로 인한 Scratch 발생에 관한 연구가 필요하다고 할 수 있다. 본 연구에서는 scratch 형성의 거동을 알아보기 위하여 boronphoshposilicate glass (BPSG), plasma enhanced chemical vapor deposition (PECVD) tetraethylorthosilicate (TEOS), high density plasma (HDP) oxide의 3가지 실리콘 산화막의 기계적 성질 및 이에 따른 CMP 공정에 대한 평가를 실시하였다. CMP 공정 후 효율적인 scratch 평가를 위해 브러시를 이용하여 1차 세정을 실시하였으며 습식세정방법(SC-1, DHF)으로 마무리 하였다. Scratch 개수는 Particle counter (Surfscan6200, KLA Tencor, USA)로 측정하였고, 광학현미경을 이용하여 형태를 관찰하였다. Scratch 평가를 위한 CMP 공정은 실험에 사용된 3가지 종류의 실리콘 산화막들의 경도가 서로 다르기 때문에 동등한 실험조건 설정을 위해 동일한 연마량이 관찰되는 조건에서 실시하였다. 실험결과 scratch 종류는 그 형태에 따라 chatter/line/rolling type의 3가지로 분류되었다 BPSG가 다른 종류의 실리콘 산화막에 비해 많은 수에 scratch가 관찰되었으며 line type이 많은 비율을 차지한다는 것을 확인하였다. 또한 CMP 공정에서 압력이 증가함에 따라 chatter type scratch의 길이는 짧아지고 폭이 넓어지는 것을 확인하였다. 본 연구를 통해 실리콘 산화막의 경도에 따른 scratch 형성 원리를 파악하였다.

• Tribology and Lubricants
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• v.28 no.5
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• pp.240-245
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• 2012

In this study, we developed a new carrier finger to prevent scratches in a sheet metal forming line. The developed carrier finger was designed to have a streamlined shape with a larger radius of curvature at the edges, as well as a smaller contact area. To evaluate the scratch alleviation effect, a sliding contact analysis and scratch test using the pin on a plate wear tester were conducted for both the old and new carrier fingers. The results show that, for both transverse and longitudinal movements of the strip, the newly designed carrier finger reduces both the friction and scratch depth by its streamlined shape, which decreases the pressure spike at the edge.

• Journal of The Korean Association of Information Education
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• v.15 no.4
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• pp.533-542
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• 2011

In this paper, we have selected traveling algorithms of Line-Tracer as the focused learning elements with the PBL-based programming instruction method. Line-Tracer traveling algorithm programming has been simulated using the Scratch EPL. Development of robot web courseware such as Line-Tracer can create an effective educational environment and also provide solutions for lack of environmental conditions, such as time or spatial factor restrictions and excessive expense issues; these are major obstacles to developing robot programming education. Finally, we analyzed the effects on growth of student's logical thinking and problem solving abilities by demonstrating the Scratch application courseware to the field of elementary education.

• Journal of the Institute of Electronics Engineers of Korea CI
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• v.45 no.6
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• pp.162-169
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• 2008

Film restoration is to detect the location and extent of defected regions from a given movie film, and if present, to reconstruct the lost information of each regions. It has gained increasing attention by many researchers, to support multimedia service of high quality. Among artifacts, scratch is the most frequent degradation. In this paper, an automatic film line scratch removal system is developed that can detect and restore all kind of scratches. For this we use the spatial information of scratches: The scratch in old films has lower or higher brightness than neighboring pixels in its vicinity and usually appears as a vertically long thin line. Our systems consists of scratch detection and scratch restoration. The scratches of various types are detected by neural network based texture classifier and morphology-based shape filter and then the degraded regions are restored using bilinear interpolation. To assess the validity of the Proposed method, it has been tested with all kinds of scratches, and then experimental results show that the proposed approach is robust to various scratches and efficient to apply a real film removal system.

• Transactions of Materials Processing
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• v.12 no.7
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• pp.640-646
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• 2003

The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as potential application to fabricate the surface nanostructures because of its operational versatility and simplicity. The objective of the work is to suggest new mastless pattern fabrication technique using the combination of machining by nanoindenter and KOH wet etching. The scratch option of the nanoindenter is a very promising method for obtaining nanometer scale features on a large size specimen because it has a very wide working area and load range. Sample line patterns were machined on a silicon surface, which has a native oxide on it, by constant load scratch (CLS) of the Nanoindenter with a Berkovich diamond tip, and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structure was made because of masking effect of the affected layer generated by nano-scratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved patterns can be used as a mold that will be used for mass production processes such as nanoimprint or PDMS molding process. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

• Journal of the Institute of Electronics Engineers of Korea CI
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• v.43 no.6 s.312
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• pp.26-33
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• 2006

Film restoration is to detect the location and extent of defected regions from a given movie film, and if present, to reconstruct the lost information of each region. It has gained increasing attention by many researchers, to support multimedia service of high quality. In general, an old film is degraded by dust, scratch, flick, and so on. Among these, the most frequent degradation is the scratch. So far techniques for the scratch restoration have been developed, but they have limited applicability when dealing with all kinds of scratches. To fully support the automatic scratch restoration, the system should be developed that can detect all kinds of scratches from a given frame of old films. This paper presents a neurual network (NN)-based texture classifier that automatically detect all kinds of scratches from frames in old films. To facilitate the detection of various scratch sizes, we use a pyramid of images generated from original frames by having the resolution at three levels. The image at each level is scanned by the NN-based classifier, which divides the input image into scratch regions and non-scratch regions. Then, to reduce the computational cost, the NN-based classifier is only applied to the edge pixels. To assess the validity of the proposed method, the experiments have been performed on old films and animations with all kinds of scratches, then the results show the effectiveness of the proposed method.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.11 no.12
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• pp.4715-4720
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• 2010

In this study, we developed new tapered rolling type strip pressure key for the prevention of scratch in sheet metal forming line. The developed pressure key is equipped with two tapered rollers inside a conventional block pressure key. Through the scratch test, for the case of transversal movement the tapered rolling type pressure key reduces both friction and depth of scratch by the effect of tapered shape which decreases the pressure spike on edge, and for longitudinal movement the scratch on the sheet metal surface is certainly removed by the rolling contact.

• Journal of the Korea Society of Computer and Information
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• v.19 no.4
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• pp.9-16
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• 2014

This paper proposes a linear scratch detection and restoration algorithm using pixel data comparison in a single frame or consecutive frames. There exists a high parallelism in that a scratch detection and restoration algorithm needs a large amount of comparison operations. The proposed scratch detection and restoration algorithm is designed with a GPU for fast computation. We test the proposed algorithm in sequential and parallel processing with the set of digital videos in National Archive of Korea. In the experiments, the scratch detection rate of consecutive frames is as fast as about 20% for that of a single frame. The detection and restoration rates of a GPU-based algorithm are similar to those of a CPU-based algorithm, but the parallel implementation speeds up to about 50 times.