• Journal of the Korean Vacuum Society
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• v.12 no.S1
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• pp.113-115
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• 2003

We investigate transmission of light in nanoscale structures. We present spatial and temporal domain measurements of the dephasing of surface plasmon excitations in metal films with periodic nano-hole arrays. By probing coherent spatial SP propagation lengths of a few f1. $\mu$m and an ultrafast decay of the SP polarization on a 10 fs timescale, we demonstrate that the SP transmission peaks are homogeneously broadened by the SP radiative lifetime. The pronounced wavelength and hole size dependence of the dephasing rate shows that the microscopic origin of the conversion of SP into light is a Rayleigh-like scattering by the periodic hole array. We have experimentally studied the dephasing of surface plasmon excitations in metallic nano-hole arrays. By relating nanoscopic SP propagation, ultrafast light transmission and optical spectra, we demonstrate that the transmission spectra of these plasmonic bandgap structures are homogeneously broadened. The spectral line shape and dephasing time are dominated by Rayleigh scattering of SP into light and can varied over a wide range by controlling the resonance energy and/or hole radius. This opens the way towards designing SP nano-optic devices and spatially and spectrally tailoring light -matter interactions on nanometer length scales.

• Journal of the Microelectronics and Packaging Society
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• v.22 no.4
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• pp.71-76
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• 2015

Recently, light emitting diodes (LEDs) have been studied to improve their efficiencies for the uses in various fields. Particularly in the aspect of chip structure, via hole type vertical LED chip is developed for improvement of light output power, and heat dissipations. However, current vertical type LEDs have still drawback, which is current concentration around the n-contact holes. In this research, to solve this phenomenon, we introduced isolation layer under n-contact electrodes. With this sub-electrode, even though the active area was decreased by about 2.7% compared with conventional via-hole type vertical LED, we could decrease the forward voltage by 0.2 V and wall-plug efficiency was improved approximately 4.2%. This is owing to uniform current flow through the area of n-contact.

• Journal of the Optical Society of Korea
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• v.18 no.3
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• pp.283-287
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• 2014

Square lattice nano-hole arrays with diameters and periodicities of 200 and 500 nm, respectively, are fabricated on InGaN/GaN blue light emitting diodes (LEDs) using electron-beam lithography and inductively coupled plasma reactive ion etching processes. Cathodoluminescence (CL) investigations show that light emission intensity from the LEDs with the nano-hole arrays is enhanced compared to that from the planar sample. The CL intensity enhancement factor decreases when the nano-holes penetrate into the multiple quantum wells (MQWs) due to the plasma-induced damage and the residues. Wet chemical treatment using KOH solution is found to be an effective method for light extraction from the nano-patterned LEDs, especially, when the nano-holes penetrate into the MQWs. About 4-fold CL intensity enhancement factor is achieved by the KOH treatments after the dry etching for the sample with a 250-nm deep nano-hole array.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.89-90
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• 2010

최근 우리는 InGaAs 위에 성장한 InAs 양자점에 GaAs를 얇게 덮음으로써 양자고리를 성장하고, 그 광학적 특성을 분석하였다. [1] 이번 연구에서는 이 양자고리 구조의 전자 구조 및 광학적 특성을 전산모사를 통해 계산하였고, GaAs가 구조의 응력, 압전 포텐셜 및 light-hole 분율에 미치는 영향을 분석하였다. 이론적인 분석을 위해, valence force field 방법을 이용하여 이종 물질간의 격자상수 차이에 의한 격자 변형 및 압전 포텐셜의 변화를 계산하였고, 양자고리 내 전자의 양자화 에너지 및 파동함수를 k p 방법을 통해 얻을 수 있었다. 또한 광학적인 특성 등의 다체 효과를 예측하기 위해 configuration interaction 방법을 사용하였다. 이 연구에서 우리는, GaAs가 InAs에 강한 압축 응력을 가할 것이라는 일반적인 예측과 달리, InGaAs 매트릭스 안에서는 격자상수가 작은 GaAs가 InAs 양자고리에 효과적인 압축 응력을 가할 수 없음을 보였다. 특히 GaAs 층의 두께가 얇을 경우, InGaAs 매트릭스에 의해 인장 응력을 받는 GaAs가 InAs의 응력을 해소하기 충분한 공간을 제공하여, 오히려 InAs의 압축 응력을 약화시키는 것을 알 수 있었다. 이 연구 결과는 응력 분포가 단순한 양자우물 등의 2차원 구조와 달리, 응력 분포가 복잡한 3차원 나노 구조에서는 단순히 격자상수만으로 파장 변화 경향을 예측할 수 없음을 나타낸다. 또한 우리는, GaAs의 큰 negative 이방 응력과 InAs의 작은 positive 이방 응력에 의해 전자와 heavy-hole은 InAs에, light-hole은 GaAs에 구속됨을 보였다. 즉, InAs보다 밴드갭이 큰 GaAs가 전자와 heavy-hole에 대해서는 강한 포텐셜 배리어로 작용하지만 light-hole에 대해서는 포텐셜 우물로 작용하는, 반 우물-반 배리어 특성을 가짐을 알 수 있었다. 이로 인해 GaAs가 있는 양자고리의 light-hole 분율이 GaAs가 없을 경우에 비해 2배에서 8배가량 증가함을 보일 수 있었다. 비슷한 특성이 hole에 대해서는 InP나 InGaAsP 위에 성장한 GaAs 층에서 보고된 바가 있으나, 전자는 InAs로, hole은 GaAs로 분리할 수 있는 3차원 나노 구조에 대한 연구는 이 연구가 처음이다. [2]

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.04a
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• pp.31-32
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• 2008

The structure of OLEDs with conventional heterostructure consists of anode, hole injection layer, hole transport layer, light-emitting layer, electron transport layer, electron injection layer, and cathode. NPB used as a hole transport layer and DPVBi used as a blue light emitting layer were graded-mixed at selected ratio. Interface at heterojunction between the hole transport layer and the elecrtron transport layer restricts device's stability. Mixing of the hole transport layerand the emitting layer removes abrupt interface between the hole transport. layer and the electron transport layer. The stability of OLED with graded mixed-layer developed in this study was improved.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.316-319
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• 2001

Organic light emitting diodes(OLEDs) with a hole injection layer inserted between Indium-Tin-Oxide(ITO) anode and hole transport layer were fabricated. The effect of plasma treatment on the surface properties of Indium-Tin-Oxide(ITO) anode were studied. The electrical and optical characteristics of the fabricated organic light emitting diodes(OLEDs) were also studied. The diode including of plasma treated ITO substrate and the hole injection layer, which showed the luminance of 5280 $cd/m^{2}$ at 8 V

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11a
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• pp.316-319
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• 2001

Organic light emitting diodes(OLEDs) with a hole injection layer inserted between Indium-Tin-Oxide(ITO) anode and hole transport layer were fabricated. The effect of plasma treatment on the surface properties of Indium-Tin-Oxide(ITO) anode were studied. The electrical and optical characteristics of the fabricated organic light emitting diodes(OLEDs) were also studied. The diode including of plasma treated ITO substrate and the hole injection layer, which showed the luminance of 5280 cd/㎡ at 8 V

• International Journal of Precision Engineering and Manufacturing
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• v.7 no.2
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• pp.52-55
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• 2006

The OLEDs(Organic Light-Emitting Diodes) structure organizes the bottom layer using glass, ITO(indium thin oxide), hole injection layer, hole transport layer, emitting material layer, electron transport layer, electron injection layer and cathode using metal. OLED has various advantages. OLEDs research has been divided into structural side and emitting material side. The amount of emitting light and luminescence efficiency has been improved by continuing effort for emitting material layer. The emitting light mechanism of OLEDs consists of electrons and holes injected from cathode and anode recombination in emitting material layer. The mobilities of injected electrons and holes are different. The mobility of holes is faster than that of electrons. In order to get high luminescence efficiency by recombine electrons and holes, the balance of their mobility must be set. The more complex thin film structure of OLED becomes, the more understanding about physical phenomenon in each interface is needed. This paper observed what the thickness change of hole transport layer has an affection through the below experiments. Moreover, this paper uses numerical analysis about carrier transport layer thickness change on the basis of these experimental results that agree with simulation results.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.741-744
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• 2007

The research applied the processes of spin-coating and thermal-evaporating in proper order to deposit the hole transport material N,N'-Bis(naphthalen-1-yl)- N,N'-bis(phenyl)-benzidine (NPB) on the ITO substrate to make flexible organic light emitting diodes (FOLED) with double hole transport layer.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1805-1808
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• 2006

In this paper, we describe a versatile use of fullerene(C60) as a charge transporting material for organic light-emitting diodes. The use of fullerene as a buffer layer for an anode, a doping material for hole transport layer, and an electron transport layer was investigated. Fullerene improved the hole injection from an anode to a hole transport layer by lowering the interfacial energy barrier and enhanced the lifetime of the device as a doping material for a hole transport layer. In addition, it was also effective as an electron transporting material to get low driving voltage in the device.