• Journal of the Korean Crystal Growth and Crystal Technology
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• v.19 no.6
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• pp.288-292
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• 2009

Hydrophobic/hydrophilic patterned substrates were fabricated on a glass substrate by a liquid phase deposition (LPD) method. Hydrophobic surface was obtained by modifying ZnO thin films with a rough surface using a fluoroalkyltrimethoxysilane (FAS) and hydrophilic surface was prepared by decomposing FAS on an exposed to UV light. The hexagonal ZnO rods were perpendicularly grown by LPD method on glass substrates with a ZnO seed layer. The diameter and thickness of hexagonal ZnO rods were increased as a function of increases of immersion time. The surface morphology, thickness, crystal structure, transmittance and contact angle of prepared ZnO thin films were measured by field emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), UV-visible spectrophotometer (UV-vis) and contact angle measurement. Hydrophilic ZnO thin films with a contact angle of $20^{\circ}{\sim}30^{\circ}$ were changed to a hydrophobic surface with a contact angle of $145^{\circ}{\sim}161^{\circ}$ by a FAS surface treatment. Prepared hydrophobic surface was pattered by an irradiation of UV light using shadow mask with $300\;{\mu}m$ or 3 mm dot size. Finally, the hydrophobic surface exposed to UV light was changed to a hydrophilic surface.

• Journal of the Korean Vacuum Society
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• v.22 no.3
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• pp.150-155
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• 2013

Textured surface has been fabricated to reduce the light reflectance from the solar cells. The textured surface is very suitable for the multi-junction III-V solar cells because it can decrease the light reflectance over a large wavelength range. In this study, we have generated a textured structure on InAlP which is used for the window layer of the multi-junction III-V solar cells. Ultra-thin Pt layer (0.7 nm) has been used for wet etching mask. An array of nanosized pyramid shape formed on InAlP surface dramatically reduces the light reflectance up to 13.7% over a large wavelength range (i.e., $0.3{\sim}1.5{\mu}m$).

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.6
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• pp.97-101
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• 1989

Scale and rotation invariant polar-logarithmic coordinate transformation is used to achieve deformation invariant pattern recognition. The coordinate transformation is produce by a computer generated hologram (CGH). The mask fabricated by a photo (UV light) pattern generator for the 1nr-$theta$ coordinate transformation is made of the CGH whose transmission function is derived by the use of Lee's method. The optically produced coordinate transformed function is derived by the use of Lee's method. The optically produced coordinate transmission input pattern is interfaced on real-time holography. Variations of autocorrelation for scaled and rotated input patterns are suggested experimentally using implemented optical correlator.

• Journal of the Optical Society of Korea
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• v.20 no.1
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• pp.101-106
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• 2016

A pupil filter is a useful technique for modifying the light intensity distribution near the focus of an optical system to realize depth of field (DOF) extension and superresolution. In this paper, we proposed a new design of the phase only pupil filter by using Zernike polynomials. The effect of design parameters of the new filters on DOF extension and superresolution are discussed, such as defocus Strehl ratio (S.R.), superresolution factor (G) and relative first side lobe intensity (M). In comparison with the other two types of pupil filters, the proposed filter presents its advantages on controlling both the axial and radial light intensity distribution. Finally, defocused imaging simulations are carried out to further demonstrate the effectiveness and superiority of the proposed pupil filter on DOF extension and superresolution in an optical imaging system.

• Journal of the Institute of Convergence Signal Processing
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• v.10 no.3
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• pp.151-157
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• 2009

In this paper, we proposed an algorithm of redeye correction. For naturally redeye correction, we assumed positions of the redeye at an image which produced redeye, and we estimated rate of the redeye to apply the appropriate redeye correction suitably. We extract and label pixels those are possible of generating redeye using red, skin and reflected light color. The each labeled group is decided by rates of length and width, dimension, density, the color of white of the eye and reflected light color of groups for the redeye group. We corrected positions of redeye using blurring effect, naturally. In the case of designing the proposed algorithm, we designed the redeye correction hardware using the minimum of memories for efficiency of hardware.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.10
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• pp.1576-1583
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• 1989

In this paper, we describe real-time optical implementation of the Hopfield neural network model for two-dimensional associative memory by using commercial LCTV and Multifocus For real-time processing capability, we use LCTV as a memory mask and a input spatial light modulator. Inner product between input pattern and memory matrix is processed by the multifocus holographic lens. The output signal is then electrically thresholded fed back to the system input by 2-D CCD camera. From the good experimental results, the proposed system can be applied to pattern recognition and machine vision in future.

• Korean Journal of Optics and Photonics
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• v.9 no.3
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• pp.205-211
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• 1998

The MTF(modulation transfer function) measuring system with a linear CCD(charge coupled-device) was constructed to cvaluate a color CRT(catode ray tube). The measured MTF values were corrected by considering the spectral response and the pixel sizes of CCD. The effects of a spot size, video bandwidth, pitch of shadow mask holes, display luminance, and ambient illumination on image quality were studied. The uniformity of resolution and the contrast Ioss by ambient light of the color CRT monitor were measured, and the results were analyzed by MTFA(modulation threshold area).

• Textile Coloration and Finishing
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• v.14 no.2
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• pp.77-77
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• 2002

Cotton fabrics dipped in cationic agent(3-chloro-2-hydroxypropyl trimethyl ammonium chloride) were irradiated with deep Ultra Violet Rays(UV), in the region of UV-C using the low pressure mercury lamp. The chemical changes of cationized cotton fabric surfaces were investigated by FT-IR analysis. The dyeabilities of the irradiated portions were investigated by dyeing with acid dyes. Deep UV(UV-C) irradiation broke O-H bonds in cotton fiber and oxidized the fibers. The dyeability of the UV irradiated portion were different from that of the portion not irradiated. Various pattern were gained from one bath dig dyeing by pattern mask. The tensile strengths of cotton fabrics were decreased in the UV irradiated portion. Washing fastness of cotton dyeings were good about 3∼4 grade and light fastness were fair about 2∼3 grade.

• Textile Coloration and Finishing
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• v.14 no.2
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• pp.1-8
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• 2002

Cotton fabrics dipped in cationic agent(3-chloro-2-hydroxypropyl trimethyl ammonium chloride) were irradiated with deep Ultra Violet Rays(UV), in the region of UV-C using the low pressure mercury lamp. The chemical changes of cationized cotton fabric surfaces were investigated by FT-IR analysis. The dyeabilities of the irradiated portions were investigated by dyeing with acid dyes. Deep UV(UV-C) irradiation broke O-H bonds in cotton fiber and oxidized the fibers. The dyeability of the UV irradiated portion were different from that of the portion not irradiated. Various pattern were gained from one bath dig dyeing by pattern mask. The tensile strengths of cotton fabrics were decreased in the UV irradiated portion. Washing fastness of cotton dyeings were good about 3∼4 grade and light fastness were fair about 2∼3 grade.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.53 no.1
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• pp.47-52
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• 2004

3D microstructures with different side-wall angles and different scales are fabricated by both methods of inclined exposure and rear-side exposure at each of selected areas on a same substrate. Conventional methods of inclined exposure are used to make side-walls with a same inclined angle on one substrate and to get a scale error due to front-side exposure through thick photoresist layer, But, by using the proposed method, we are able to fabricate 3D microstructures on a same substrate with various side-wall angles and accurate dimensions as the original design. In the rear-side exposure, UV exposure light reflects from the chromium mask pattern after passing through the thick photoresist layer, resulting in fabrication of well-defined, inclined 3D structures inside the thick photoresist layer.