• Title/Summary/Keyword: Light mask

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Novel structure for a full-color AMOLED using a blue common layer (BCL)

  • Kim, Mu-Hyun;Chin, Byung-Doo;Suh, Min-Chul;Yang, Nam-Chul;Song, Myung-Won;Lee, Jae-Ho;Kang, Tae-Min;Lee, Seong-Taek;Kim, Hye-Dong;Park, Kang-Sung;Oh, Jun-Sik;Chung, Ho-Kyoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.797-798
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    • 2005
  • We report a novel structure for a full-color AMOLED (Active Matrix Organic Light Emitting Diode) eliminating the patterning process of a blue emitting layer. The patterning of the three primary colors, RGB, is a key technology in the OLED fabrication process. Conventional full color AMOLED containing RGB layers includes the three opportunities of the defects to make an accurate position and fine resolution using various technologies such as fine metal mask, ink-jet printing and laser-induced transfer system. We can skip the blue patterning step by simply stacking the blue layer as a common layer to the whole active area after pixelizing two primary colors, RG, in the conventional small molecular OLED structure. The red and green pixel showed equivalent performances without any contribution of the blue emission.

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High Density Inductively Coupled Plasma Etching of III-V Semiconductors in BCI3Ne Chemistry (BCI3Ne 혼합가스를 이용한 III-V 반도체의 고밀도 유도결합 플라즈마 식각)

  • 백인규;임완태;이제원;조관식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.12S
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    • pp.1187-1194
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    • 2003
  • A BCl$_3$/Ne plasma chemistry was used to etch Ga-based (GaAs, AIGaAs, GaSb) and In-based (InGaP, InP, InAs and InGaAsP) compound semiconductors in a Planar Inductively Coupled Plasma (ICP) reactor. The addition of the Ne instead of Ar can minimize electrical and optical damage during dry etching of III-V semiconductors due to its light mass compared to that of Ar All of the materials exhibited a maximum etch rate at BCl$_3$ to Ne ratios of 0.25-0.5. Under all conditions, the Ga-based materials etched at significantly higher rates than the In-based materials, due to relatively high volatilities of their trichloride etch products (boiling point CaCl$_3$ : 201 $^{\circ}C$, AsCl$_3$ : 130 $^{\circ}C$, PCl$_3$: 76 $^{\circ}C$) compared to InCl$_3$ (boiling point : 600 $^{\circ}C$). We obtained low root-mean-square(RMS) roughness of the etched sulfate of both AIGaAs and GaAs, which is quite comparable to the unetched control samples. Excellent etch anisotropy ( > 85$^{\circ}$) of the GaAs and AIGaAs in our PICP BCl$_3$/Ne etching relies on some degree of sidewall passivation by redeposition of etch products and photoresist from the mask. However, the surfaces of In-based materials are somewhat degraded during the BCl$_3$/Ne etching due to the low volatility of InCl$_{x}$./.

Application of Transmittance-Controlled Photomask Technology to ArF Lithography (투과율 조절 포토마스크 기술의 ArF 리소그래피 적용)

  • Lee, Dong-Gun;Park, Jong-Rak
    • Korean Journal of Optics and Photonics
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    • v.18 no.1
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    • pp.74-78
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    • 2007
  • We report theoretical and experimental results for application of transmittance-controlled photomask technology to ArF lithography. The transmittance-controlled photomask technology is thought to be a promising technique fo critical dimension (CD) uniformity correction on a wafer by use of phase patterns on the backside of a photomask. We could theoretically reproduce experimental results for illumination intensity drop with respect to the variation of backside phase patterns by considering light propagation from the backside to the front side of a photomask at the ArF lithography wavelength. We applied the transmittance-controlled photomask technology to ArF lithography for a critical layer of DRAM (Dynamic Random Access Memory) having a 110-nm design rule and found that the in-field CD uniformity value was improved from 13.8 nm to 9.7 nm in $3{\sigma}$.

High Efficiency AMOLED using Hybrid of Small Molecule and Polymer Materials Patterned by Laser Transfer

  • Chin, Byung-Doo;Suh, Min-Chul;Kim, Mu-Hyun;Kang, Tae-Min;Yang, Nam-Choul;Song, Myung-Won;Lee, Seong-Taek;Kwon, Jang-Hyuk;Chung, Ho-Kyoon;Wolk, Martin B.;Bellmann, Erika;Baetzold, John P.
    • Journal of Information Display
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    • v.4 no.3
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    • pp.1-5
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    • 2003
  • Laser-Induced Thermal Imaging (LITI) is a laser addressed patterning process and has unique advantages such as high-resolution patterning with over all position accuracy of the imaged stripes of within 2.5 micrometer and scalability to large-size mother glass. This accuracy is accomplished by real-time error correction and a high-resolution stage control system that includes laser interferometers. Here the new concept of hybrid system that complement the merits of small molecule and polymer to be used as an OLED; our system can realize easy processing of light emitting polymers and high luminance efficiency of small molecules. LITI process enables the stripes to be patlerned with excellent thickness uniformity and multi-stacking of various functional layers without having to use any type of fine metal shadow mask. In this study, we report a full-color hybrid OLED using the multi-layered structure consisting of small molecules and polymers.

An Image Denoising Algorithm for the Mobile Phone Cameras (스마트폰 카메라를 위한 영상 잡음 제거 알고리즘)

  • Kim, Sung-Un
    • The Journal of the Korea institute of electronic communication sciences
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    • v.9 no.5
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    • pp.601-608
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    • 2014
  • In this study we propose an image denoising algorithm appropriate for mobile smart phone equipped with limited computing ability, which has better performance and at the same time comparable quality comparing with previous studies. The proposed image denoising algorithm for mobile smart phone cameras in low level light environment reduces computational complexity and also prevents edge smoothing by extracting just Gaussian noises from the noisy input image. According to the experiment result, we verified that our algorithm has much better PSNR value than methods applying mean filter or median filter. Also the result image from our algorithm has better clear quality since it preserves edges while smoothing input image. Moreover, the suggested algorithm reduces computational complexity about 52% compared to the method applying original Laplacian mask computation, and we verified that our algorithm has good denoising quality by implementing the algorithm in Android smart phone.

Atmospheric Pressure Plasma Etching Technology for Forming Circular Holes in Perovskite Semiconductor Materials (페로브스카이트 반도체 물질에 원형 패턴을 형성하기 위한 상압플라즈마 식각 기술)

  • Kim, Moojin
    • Journal of Convergence for Information Technology
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    • v.11 no.2
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    • pp.10-15
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    • 2021
  • In this paper, we formed perovskite (CH3NH3PbI3) thin films on glass with wet coating methods, and used various analytical techniques to discuss film thickness, surface roughness, crystallinity, composition, and optical property. The coated semiconductor material has no defects and is uniform, the surface roughness value is very small, and a high absorption rate has been observed in the visible light area. Next, in order to implement the hole shape in the organic-inorganic layer, Samples in the order of a metal mask with holes at regular intervals, a glass coated with a perovskite material, and a magnet were etched with atmospheric pressure plasma equipment. The shape of the hole formed in the perovskite material was analyzed by changing the time. It can be seen that more etching is performed as the time increases. The sample with the longest processing time was examined in more detail, and it was classified into 7 regions by the difference according to the location of the plasma.

Influencing factors for Sleep Disturbance in the Intensive Care Unit Patients: A Systematic Review (중환자실 환자의 수면에 영향을 미치는 요인: 체계적 고찰)

  • Cho, Young Shin;Joung, Sunae
    • Journal of Korean Critical Care Nursing
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    • v.16 no.2
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    • pp.1-14
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    • 2023
  • Purpose : Sleep disturbances in patients in the intensive care unit (ICU) are related to health problems after discharge. Therefore, active prevention and management are required. Hence, identification of the factors that affect sleep in patients who are critically ill is necessary. Methods : The PubMed, Cochrane Library, CINAHL, EMBASE, and Web of Science databases were searched. Selection criteria were observational and experimental studies that assessed sleep as an outcome, included adult patients admitted to the ICU, and published between November 2015 and April 2022. Results : A total of 21,136 articles were identified through search engines and manual searches, and 42 articles were selected. From these, 22 influencing factors and 11 interventions were identified. Individual factors included disease severity, age, pain, delirium, comorbidities, alcohol consumption, sex, sleep disturbance before hospitalization, chronic obstructive pulmonary disease (COPD), cardiovascular disease, and high diastolic blood pressure (DBP), low hemoglobin (Hb), and low respiratory rate (RR). Environmental factors included light level, noise level, and temperature. Furthermore, treatment-related factors included use of sedatives, melatonin administration, sleep management guidelines, ventilator application, nursing treatment, and length of ICU stay. Regarding sleep interventions, massage, eye mask and earplugs, quiet time and multicomponent protocols, aromatherapy, acupressure, sounds of the sea, adaptive intervention, circulation lighting, and single occupation in a room were identified. Conclusion : Based on these results, we propose the development and application of various interventions to improve sleep quality in patients who are critically ill.

Preliminary research to verify night light satellite data using AIS data analysis (AIS 자료 분석을 이용한 야간 불빛 위성 자료 검증 사전연구)

  • Yoon suk;Jeong-Seok Lee;Hey-Min Choi;Hyeong-Tak Lee;Hae-Jong Han;Hyun Yang
    • Proceedings of the Korean Institute of Navigation and Port Research Conference
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    • 2022.11a
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    • pp.366-368
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    • 2022
  • 지구온난화에 따른 우리나라 주변 환경의 변화와 최근 중국 불법 어선의 연근해 어업 자원의 고갈 등으로 인해 우리나라 연근해 어족자원을 보호할 필요성이 증대되고 있으며, 지속 가능한 어업을 위해서는 어획물의 종류와 양을 정확히 파악하고 불법 어업에 대한 철저한 감시 및 관리가 필요하다. 이러한 시공간적으로 다양하게 변하는 생태 및 어장 환경 정보와 선박에 대한 정보를 통해 해양관측과 위성 원격탐사를 동시에 이용함으로써 근해와 원양 생물자원 실태를 관측하는 것이 가능하다. 본 연구에서는 NOAA-20 위성의 VIIRS (Visible Infrared Imaging Radiometer Suite) DNB (Day & Night Band) 영상을 기반으로 추정한 야간 불빛 자료를 활용하고자 한다. DNB 불빛 영상은 낮은 조도의 불빛을 감지하여 그 정보를 보여 준다. 야간 불빛 자료에 포함된 구름 부분을 마스킹하기 위해 NASA의 신규알고리즘이 적용된JPSS-JRR-CloudMask 기술을 이용하였다. 이번 연구에서는 구름의 영향이 없는 날짜를 선별한 후 AIS 정보에서 어선의 정보를 추출하여 검증 자료로 사용하였다. 실제 선박의 정보를 이용한 위성 불빛 자료의 검증을 통해 위성자료의 신뢰성을 확보하고 향후 불빛과 선단 규모의 상관관계 분석 및 어선의 분포 경향 분석을 통하여 우리나라의 어장환경 분석에 활용 가능할 것으로 기대한다.

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A Stereo Video Avatar for Supporting Visual Communication in a $CAVE^{TM}$-like System ($CAVE^{TM}$-like 시스템에서 시각 커뮤니케이션 지원을 위한 스테레오 비디오 아바타)

  • Rhee Seon-Min;Park Ji-Young;Kim Myoung-Hee
    • Journal of KIISE:Computer Systems and Theory
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    • v.33 no.6
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    • pp.354-362
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    • 2006
  • This paper suggests a method for generating high qualify stereo video avatar to support visual communication in a CAVE$^{TM}$-like system. In such a system because of frequent change of light projected onto screens around user, it is not easy to extract user silhouette robustly, which is an essential step to generate a video avatar. In this study, we use an infrared reflective image acquired by a grayscale camera with a longpass filter so that the change of visible light on a screen is blocked to extract robust user silhouette. In addition, using two color cameras positioned at a distance of a binocular disparity of human eyes, we acquire two stereo images of the user for fast generation and stereoscopic display of a high quality video avatar without 3D reconstruction. We also suggest a fitting algorithm of a silhouette mask on an infrared reflective image into an acquired color image to remove background. Generated stereo images of a video avatar are texture mapped into a plane in virtual world and can be displayed in stereoscopic using frame sequential stereo method. Suggested method have advantages that it generates high quality video avatar taster than 3D approach and it gives stereoscopic feeling to a user 2D based approach can not provide.

Design and Analysis of a Laser Lift-Off System using an Excimer Laser (엑시머 레이저를 사용한 LLO 시스템 설계 및 분석)

  • Kim, Bo Young;Kim, Joon Ha;Byeon, Jin A;Lee, Jun Ho;Seo, Jong Hyun;Lee, Jong Moo
    • Korean Journal of Optics and Photonics
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    • v.24 no.5
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    • pp.224-230
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    • 2013
  • Laser Lift-Off (LLO) is a process that removes a GaN or AIN thin layer from a sapphire wafer to manufacture vertical-type LEDs. It consists of a light source, an attenuator, a mask, a projection lens and a beam homogenizer. In this paper, we design an attenuator and a projection lens. We use the 'ZEMAX' optical design software for analysis of depth of focus and for a projection lens design which makes $7{\times}7mm^2$ beam size by projecting a beam on a wafer. Using the 'LightTools' lighting design software, we analyze the size and uniformity of the beam projected by the projection lens on the wafer. The performance analysis found that the size of the square-shaped beam is $6.97{\times}6.96mm^2$, with 91.8 % uniformity and ${\pm}30{\mu}m$ focus depth. In addition, this study performs dielectric coating using the 'Essential Macleod' to increase the transmittance of an attenuator. As a result, for 23 layers of thin films, the transmittance total has 10-96% at angle of incidence $45-60^{\circ}$ in S-polarization.