• Title/Summary/Keyword: Leakage information

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Improvement of a Verified Secure Key Distribution Protocol Between RFID and Readers (RFID와 리더간의 안전성이 검증된 키 분배 프로토콜의 개선)

  • Bae, Woo-Sik;Lee, Jong-Yun
    • The KIPS Transactions:PartC
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    • v.18C no.5
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    • pp.331-338
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    • 2011
  • The RFID system includes a section of wireless communication between the readers and the tags. Because of its vulnerability in terms of security, this part is always targeted by attackers and causes various security problems including the leakage of secret and the invasion of privacy. In response to these problems, various protocols have been proposed, but because many of them have been hardly implementable they have been limited to theoretical description and theorem proving without the accurate verification of their safety. Thus, this study tested whether the protocol proposed by Kenji et al. satisfies security requirements, and identified its vulnerabilities such as the exposure of IDs and messages. In addition, we proposed an improved RFID security protocol that reduced the number of public keys and random numbers. As one of its main characteristics, the proposed protocol was designed to avoid unnecessary calculations and to remove vulnerabilities in terms of security. In order to develop and verify a safe protocol, we tested the protocol using Casper and FDR(Failure Divergence Refinements) and confirmed that the proposed protocol is safe in terms of security. Furthermore, the academic contributions of this study are summarized as follows. First, this study tested the safety of a security protocol through model checking, going beyond theorem proving. Second, this study suggested a more effective method for protocol development through verification using FDR.

A Novel Method to Assess the Aerobic Gasoline Degradation by Indigenous Soil Microbial Community using Microbial Diversity Information (토양 미생물 다양성 지표를 이용한 토착 미생물 군집의 호기성 가솔린 오염분해능력 평가 기법 개발 연구)

  • Hwang, Seoyun;Lee, Nari;Kwon, Hyeji;Park, Joonhong
    • KSCE Journal of Civil and Environmental Engineering Research
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    • v.36 no.5
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    • pp.839-846
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    • 2016
  • Since oil leakage is one of the most common nonpoint pollution sources that contaminate soil in Korea, the capacity of soil microbial community for degrading petroleum hydrocarbons should be considered to assess the functional value of soil resource. However, conventional methods (e.g., microcosm experiments) to assess the remediation capacity of soil microbial community are costly and time-consuming to cover large area. The present study suggests a new approach to assess the toluene remediation capacity of soil microbial community using a microbial diversity index, which is a simpler detection method than measuring degradation rate. The results showed that Shannon index of microbial community were correlated with specific degradation rate ($V_{max}$), a degradation factor. Subsequently, a correlation equation was generated and applied to Michaelis-Menten kinetics. These results will be useful to conveniently assess the remediation capacity of soil microbial community and can be widely applied to diverse engineering fields including environment-friendly construction engineering fields.

Effects of Oxygen Vacancies on the Electrical Properties of High-Dielectric (Ba,Sr)TiO$_3$Thin Films (산소 결핍이 고유전 BST 박막에 미치는 영향)

  • 김일중;이희철
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.4
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    • pp.63-69
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    • 1999
  • The electrical properties of rf-magnetron sputtered $Ba_{0.5}Sr_{0.3}TiO_3$ (BST) capacitors were investigated by varying annealing temperature and atmosphere of the rapid thermal annealing (RTA). The electrical properties of Pt/BST/Pt capacitors were found to strongly depend on the RTA condition. It seems that the dependence of the electrical properties of the Pt/BST/Pt capacitors on the RTA condition is related to the oxygen vacancies in BST thin films. In order to clarify the relation between the oxygen vacancies and the electrical properties of Pt/BST/Pt capacitors, we have examined the two different annealing methods. One annealing method was performed in $O_2$ gas and the other was done in $O_2$-plasma at the same condition of 450$^{\circ}C$, 20 mtorr. It was found that the leakage current densities of $O_2$-plasma annealed capacitor were much lower than those of $O_2$ annealed capacitor. The dielectric constants of $O_2$ annealed capacitor decreased about 14% comparing with those of as-deposited. In contrast, there was no decrease in the dielectric constant of $O_2$-plasma annealed. These results indicate that $O_2$-plasma annealing is very effective in compensation the oxygen vacancies in BST thin films. It can be also concluded that the oxygen vacancies greatly affect the electrical properties of Pt/BST/Pt capacitors.

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A Study on the Electric and Ferroelectric Properties of PZT(30/70) Thick Film Prepared by Using 1,3-Propanediol (1, 3-Propanediol 을 이용해 제작된 PZT(30/70) 후막의 전기적 및 강유전 특성에 관한 연구)

  • 송금석;장동훈;강성준;윤영섭
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.40 no.9
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    • pp.631-637
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    • 2003
  • We have evaluated structural and electric, ferroelectric properties of PZT(30/70) thick film prepared by using 1,3-propanediol based sol-gel method on Pt/Ti/SiO$_2$/Si substrates. Rapid thermal annealing (RTA) is used to reduce the thermal stress and final furnace annealing is processed at $650^{\circ}C$. As the results of SEM analysis, we find that we get 350 nm in thickness for one coating and 1 $\mu$m for three times of coating. In the results of C-D analysis at 1 kHz, dielectric constant ($\varepsilon$$_{r}$) and dissipation factor were 886 and 0.03, respectively. C-V curve is shaped as a symmetrical butterfly. Leakage current density at 200 kV/cm is 1.23${\times}$10$^{-5}$ A/cm$^2$ and in the results of hysteresis loops measured at 150 kV/cm, the remnant polarization (P$_{r}$) and the coercive field (E$_{c}$) are 33.8 $\mu$C/cm$^2$ and 56.9 kV/cm, respectively. PZT(30/70) thick film exhibits relatively good ferroelectric, electric properties.s..

Fabrication of IMT-2000 Linear Power Amplifier using Current Control Adaptation Method in Signal Cancelling Loop (신호 제거 궤환부의 전류 제어 적응형 알고리즘을 이용한 IMT-2000용 선형화 증폭기 제작)

  • 오인열;이창희;정기혁;조진용;라극한
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.40 no.1
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    • pp.24-36
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    • 2003
  • The digital mobile communication will be developed till getting multimedia service in anyone, any where, any time. Theses requiring items are going to be come true via IMT-2000 system. Transmitting signal bandwidth of IMT-2000 system is 3 times as large as IS-95 system. That is mean peak to average of signal is higher than IS-95A system. So we have to design it carefully not to effect in adjacent channel. HPA(High Power Amplifier) located in the end point of system is operated in 1-㏈ compression point(Pl㏈), then it generates 3rd and 5th inter modulation signals. Theses signals affect at adjacent channel and RF signal is distorted by compressed signal which is operated near by Pl㏈ point. Then the most important design factor is how we make HPA having high linearity. Feedback, Pre-distorter and Feed-forward methods are presented to solve theses problems. Feed-forward of these methods is having excellent improving capacity, but composed with complex structure. Generally, Linearity and Efficiency in power amplifier operate in the contrary, then it is difficult for us to find optimal operating point. In this paper we applied algorithm which searches optimal point of linear characteristics, which is key in Power Amplifier, using minimum current point of error amplifier in 1st loop. And we made 2nd loop compose with new structure. We confirmed fabricated LPA is operated by having high linearity and minimum current condition with ACPR of -26 ㏈m max. @ 30㎑ BW in 3.515㎒ and ACLR of 48 ㏈c max@${\pm}$㎒ from 1W to 40W.

Preparation of a Bi$_{4}$Ti$_{3}$O$_{12}$ Thin Film and Its Electrical Properties (Bi$_{4}$Ti$_{3}$O$_{12}$ 박막의 제작과 그 특성에 관한 연구)

  • Gang, Seong-Jun;Jang, Dong-Hun;Min, Gyeong-Jin;Kim, Seong-Jin;Jeong, Yang-Hui;Yun, Yeong-Seop
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.4
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    • pp.7-14
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    • 2000
  • A Bi$_{4}$Ti$_{3}$O$_{12}$ (BIT) thin film is prepared by sol-gel method using acetate precursors and evaluated whether it could be applied to NVFRAM (Non-Volatile Ferroelectric RAM). The drying and the annealing temperature are 40$0^{\circ}C$ and $650^{\circ}C$, respectively and they are determined from the DT-TG (Differential Thermal-Thermal Gravimetric) analysis. The BIT thin film deposited on Pt/Ta/SiO$_{2}$/Si substrate shows orthorhombic perovskite phase. The grain size and the surface roughness are about 100 nm and 70.2$\AA$, respectively. The dielectric constant and the loss tangent at 10 KHz are 176 and 0.038, respectively, and the leakage current density at 100 ㎸/cm is 4.71 $mutextrm{A}$/$\textrm{cm}^2$. In the results of hysteresis loops measured at $\pm$250 ㎸/cm, the remanent polarization (Pt) and the coercive field (Ec) are 5.92 $\mu$C/$\textrm{cm}^2$ and 86.3 ㎸/cm, respectively. After applying 10$^{9}$ square pulses of $\pm$5V, the remanent polarization of the BIT thin film decreases as much as about 33% from 5.92 $\mu$C/$\textrm{cm}^2$ of initial state to 3.95 $\mu$C/$\textrm{cm}^2$.

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A Schottky Type Ultraviolet Photo-detector using RUO$_2$/GaN Contact (RUO$_2$/GaN 쇼트키 다이오드 형 자외선 수광소자)

  • Sin, Sang-Hun;Jeong, Byeong-Gwon;Bae, Seong-Beom;Lee, Yong-Hyeon;Lee, Jeong-Hui;Ham, Seong-Ho
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.38 no.10
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    • pp.671-677
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    • 2001
  • A RuO$_2$ Schottky photo-detector was designed and fabricated with GaN layers on the sapphire substrate. For good absorption of UV light, an epitaxial structure with undoped GaN(0.5 ${\mu}{\textrm}{m}$)/n ̄-GaN(0.1${\mu}{\textrm}{m}$)/n+-GaN(1.5${\mu}{\textrm}{m}$) was grown by MOCVD. The structure had the carrier concentrations of 3.8$\times$10$^{18}$ cm ̄$^3$, the mobility of 283$\textrm{cm}^2$/V.s. After ECR etching process for mesa structure with the diameter of about 500${\mu}{\textrm}{m}$, Al ohmic contact was formed on GaN layer. After proper passivation between the contacts with Si$_3$/N$_4$, was formed on undoped GaN layer. The fabricated Schottky diode had a specific contact resistance of 1.15$\times$10$^{-5}$$\Omega$.$\textrm{cm}^2$]. It has a low leakage current of 305 pA at -5 V, which was attributed by stable characteristics of RuO$_2$ Schottky contact. In optical measurement, it showed the high UV to visible extinction ratio of 10$^{5}$ and very high responsivity of 0.23 A/W at the wavelength of 365nm.

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A Low Power SRAM using Supply Voltage Charge Recycling (공급전압 전하재활용을 이용한 저전력 SRAM)

  • Yang, Byung-Do;Lee, Yong-Kyu
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.46 no.5
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    • pp.25-31
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    • 2009
  • A low power SRAM using supply voltage charge recycling (SVCR-SRAM) scheme is proposed. It divides into two SRAM cell blocks and supplies two different powers. A supplied power is $V_{DD}$ and $V_{DD}/2$. The other is $V_{DD}/2$ and GND. When N-bit cells are accessed, the charge used in N/2-bit cells with VDD and $V_{DD}/2$ is recycled in the other N/2-bit cells with $V_{DD}/2$ and GND. The SVCR scheme is used in the power consuming parts which bit line, data bus, word line, and SRAM cells to reduce dynamic power. The other parts of SRAM use $V_{DD}$ and GND to achieve high speed. Also, the SVCR-SRAM results in reducing leakage power of SRAM cells due to the body-effect. A 64K-bit SRAM ($8K{\times}8$bits) is implemented in a $0.18{\mu}m$ CMOS process. It saves 57.4% write power and 27.6% read power at $V_{DD}=1.8V$ and f=50MHz.

Small-Swing Low-Power SRAM Based on Source-Controlled 4T Memory Cell (소스제어 4T 메모리 셀 기반 소신호 구동 저전력 SRAM)

  • Chung, Yeon-Bae;Kim, Jung-Hyun
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.47 no.3
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    • pp.7-17
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    • 2010
  • In this paper, an innovative low-power SRAM based on 4-transistor latch cell is described. The memory cells are composed of two cross-coupled inverters without access transistors. The sources of PMOS transistors are connected to bitlines while the sources of NMOS transistors are connected to wordlines. They are accessed by totally new read and write method which results in low operating power dissipation in the nature. Moreover, the design reduces the leakage current in the memory cells. The proposed SRAM has been demonstrated through 16-kbit test chip fabricated in a 0.18-${\mu}m$ CMOS process. It shows 17.5 ns access at 1.8-V supply while consuming dynamic power of $87.6\;{\mu}W/MHz$ (for read cycle) and $70.2\;{\mu}W/MHz$ (for write cycle). Compared with those of the conventional 6-transistor SRAM, it exhibits the power reduction of 30 % (read) and 42 % (write) respectively. Silicon measurement also confirms that the proposed SRAM achieves nearly 64 % reduction in the total standby power dissipation. This novel SRAM might be effective in realizing low-power embedded memory in future mobile applications.

Structure and Magnetic Properties of Ho and Ni Co-doped BiFeO3 Ceramics

  • Hwang, J.S.;Yoo, Y.J.;Park, J.S.;Kang, J.H.;Lee, K.H.;Lee, B.W.;Kim, K.W.;Lee, Y.P.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.183-183
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    • 2014
  • Recently, multiferroic materials gain much attention due to their fascinating fundamental physical properties. These materials offer wide range of potential applications such as data storage, spintronic devices and sensors, where both electronic and magnetic polarizations can be coupled. Among single-phase multiferroic materials, $BiFeO_3$ is typical because of the room-temperature magnetoelectric coupling in view of long-range magnetic- and ferroelectric-ordering temperatures. However, $BiFeO_3$ is well known to have large leakage current and small spontaneous polarization due to the existence of oxygen vacancies and other defects. Furthermore the magnetic moment of pure $BiFeO_3$ is very weak owing to its antiferromagnetic nature. Recently, various attempts have been performed to improve the multiferroic properties of $BiFeO_3$ through the co-doping at the A and the B sites, by making use of the fact that the intrinsic polarization and magnetization are associated with the lone pair of $Bi^{3+}$ ions at the A sites and the partially-filled 3d orbitals of $Fe^{3+}$ ions at the B sites, respectively. In this study, $BiFeO_3$, $Bi_{0.9}Ho_{0.1}FeO_3$, $BiFe_{0.97}Ni_{0.03}O_3$ and $Bi_{0.9}Ho_{0.1}Fe_{0.97}Ni_{0.03}O_3$ bulk compounds were prepared by solid-state reaction and rapid sintering. High-purity $Bi_2O_3$, $Ho_2O_3$, $Fe_2O_3$ and $NiO_2$ powders with the stoichiometric proportions were mixed, and calcined at $500^{\circ}C$ for 24 h to produce the samples. The samples were immediately put into an oven, which was heated up to $800^{\circ}C$ and sintered in air for 1 h. The crystalline structure of samples was investigated at room temperature by using a Rigaku Miniflex powder diffractometer. The field-dependent and temperature-dependent magnetization measurements were performed with a vibrating-sample magnetometer and superconducting quantum-interference device.

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