• 대한화학회지
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• 제15권4호
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• pp.165-169
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• 1971

A general method of calculating the frequency shift due to lattice defects is developed for a one dimensional lattice with an arbitrary number of lattice points. The method is based on the Fourier transform of the equation of motion. It is shown that the frequency spectrum is determined by the roots of 5${\times}$5 secular equation, the coefficients of which depend on defects in the mass and the force constant as well as the number of the lattice points. For the limiting case of infinite lattice, the dimension of the secular equation reduces to three and the result agrees with that of Montroll and Potts.

• Journal of Information Display
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• 제12권3호
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• pp.121-124
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• 2011

The mechanism for lattice-shaped mura defects was proposed by characterizing the electro-optic properties of liquid crystal (LC), which showed different transmission properties between the normal and mura defect areas. An increase in the mura defect rate was observed when the dotted LC in the one drop filling (ODF) was exposed for a longer time. The dotted LC droplet at the edge evaporated more rapidly than that in the center. This resulted in a higher concentration of polar singles at the edge of the dotted LC droplet, leading to a higher ${\Delta}n$ value and higher transmittance. This implies that the reductio of the exposure time of the dotted LC to air plays a critical role in decreasing the occurrence of lattice-shaped mura defects in ODF.

• 한국세라믹학회지
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• 제32권12호
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• pp.1377-1382
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• 1995

A high-resolution transmission electron microscopy study on the lattice defects formed in the high energy P ion implanted silicon was carried out on an atomic level. Results show that Lomer dislocations, 60$^{\circ}$perfect dislocations, 60$^{\circ}$ dislocation dipole and extrinsic stacking fault formed in the near Rp of as-implanted specimen. In the annelaed specimens, interstitial Frank loops, 60$^{\circ}$perfect disolations, 60$^{\circ}$dislocation dipoles, stacking faults, precipitates, perfect dislocation loops and <112> rodlike defects existed exclusively near in the Rp with various annealing temperature and time. From these results, it is concluded that extended secondary defects as well as the point defect clusters could be formed without annealing. Even at low temperature annealing such as 55$0^{\circ}C$, small interstitial Frank loops could be formed and precipitates were also formed by $700^{\circ}C$ annealing. The defect band annealed at 100$0^{\circ}C$ for 1 hr could be divided into two regions depending on the distribution of the secondary defects.

• 한국결정성장학회지
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• 제8권3호
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• pp.401-406
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• 1998

LiNbO_3$ 단결정의 광학소자 광도파관 등의 응용을 위하여는 빛의 조사에 따라 굴절률이 변하는 광손상을 극복하여야 한다. 이러한 광손상 극복은 LiNbO_3$ 에 MgO를 첨가한 단결정의 성장과 산처리를 통하여 가능하다. 본 연구에서는 LiNbO_3$ 의 광손상 극복 기구를 이해하기 위하여, FT-IR을 이용하여 LiNbO_3$ 단결정에 MgO 첨가와 산처리가 발생시키는 격자결함의 변화를 OH- 흡수밴드를 통하여 간접적으로 관찰하였다. 또한 액체 헬륨을 이용한 온도강하시 생기는 격자결함의 관찰과 산처리한 시편의 광택연마와 열처리에 따른 격자결함으 조사하였다. MgO 첨가는 LiNbO_3$ 격자내 $Mg_{Nb}^{2+}$ 결함을 발생시켜 광손상 저항을 증가시키며, 산처리는 결정표면의 산소층에 $H^+$이온이 침입하여 격자결함을 발생시키며, 이 격자결함은 $400^{\circ}C$이상에서 열처리하면 $H^+$가 결정내부로 확산하여 들어감을 확인하였다.

• 전기의세계
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• 제16권4호
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• pp.11-16
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• 1967

A physical analysis is applied to the measured phenomena of aromatic organic compounds under the uniform electric field of 0.1MV/cm through 1.5MV/cm, when they are irradiated or non-irradiated respectively. Upon the observations about irradiation effects, space charge effects and their temperature dependance, the conditions of lattice defects act conspicuously on electric conductrivity, photo conductivity and dielectric breakdown. Although the qualitative agreement with Frohlich's high energy criterion theory for the above mechanisms is poor, it is concluded that the phenomena of aromatic compounds may possibly be due to the effect of lattice defects or impurity centers generated by .gamma.-ray irradiations.

• 한국표면공학회지
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• 제35권5호
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• pp.289-294
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• 2002

ZnTe films have been grown on (100) GaAs substrate with two representative problems. The one is lattice mismatch, the other is thermal expansion coefficients mismatch of ZnTe /GaAs. It claims here, the relationship of film thickness and defects distribution with (100) ZnTe/GaAs using hot wall epitaxy (HWE) growth was investigated by transmission electron microscopy (TEM). It analyzed on the two-sort side using TEM with cross-sectional transmission electron microscopy (XTEM) and high-resolution electron microscopy (HREM). Investigation into the nature and behavior of dislocations with dependence-thickness in (100) ZnTe/ (100) GaAs hetero-structures grown by transmission electron microscopy (TEM). This defects range from interface to 0.7 $\mu\textrm{m}$ was high density, due to the large lattice mismatch and thermal expansion coefficients. The defects of low density was range 0.7$\mu\textrm{m}$~1.8$\mu\textrm{m}$. In the thicker range than 1.8$\mu\textrm{m}$ was measured hardly defects.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1996년도 제11회 학술발표회 논문개요집
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• pp.50-50
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• 1996

• 한국표면공학회지
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• 제36권2호
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• pp.135-140
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• 2003

The difference in lattice parameter and thermal expansion coefficient between GaN and Si which results in many defects into the grown GaN is larger than that between GaN and sapphire. In order to obtain high quality GaN films on Si substrate, it is essential to understand growth characteristics of GaN. In this study, GaN layers were grown on Si(111) substrates by MOCVD at three different GaN growth temperatures ($900^{\circ}C$, $1,000^{\circ}C$ and $1,100^{\circ}C$), using AlN and LT-GaN buffer layers. Using TEM, we carried out the comparative investigation of growth characteristics of GaN by characterizing lattice coherency, crystallinity, orientation relationship and defects formed (transition region, stacking fault, dislocation, etc). The localized region with high defect density was formed due to the lattice mismatch between AlN buffer layer and GaN. As the growth temperature of GaN increases, the defect density and surface roughness of GaN are decreased. In the case of GaN grown at $1,100^{\circ}$, growth thickness is decreased, and columns with out-plane misorientation are formed.

• The Korean Journal of Ceramics
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• 제4권2호
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• pp.128-135
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• 1998

The paper gives a brief introduction to protonic defects and their chemistry, thermodynamics and transport in oxides. The temperature dependence of the equilibrium concentration of protons is illustrated and compared for different acceptor-doped oxides. The difficulties of saturating as well as emptying the oxides of protons are discussed. In order to illustrate the possibility of lattice relaxation of defects, a conceptual study is made of a case where the enthalpy of dissolution of protons(water) at the cost of oxygen vacancies is assumed dependent on the concentration of vacancies. It is shown how this changes the behavior of hydration curves vs temperature and water vapour pressure. finally, a discussion is given on the water uptake in heavily oxygen deficient oxides; how water uptake may affect order-disorder in the oxygen sublattice and eventually lead to defective, disordered or ordered oxyhydroxides or hydroxides of potential interest as intermediate temperature proton conductions.

• 한국결정성장학회지
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• 제9권4호
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• pp.402-416
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• 1999

The thermal distributions near the growth interface of 150nm CZ crystals were measured by three thermocouples installed at the center, middle (half radius) and edge (10nm from surface) of the crystals. The results show that larger growth rates produced smaller thermal gradients. This contradicts the widely used heat flux balance equation. Using this fact, it is confirmed in CZ crystals that the type of point defects created is determined by the value of the thermal gradient(G) near the interface during growth, as already reported for FZ crystals. Although depending on the growth systems the effective length of the thermal gradient for defect generation are varied, we defined the effective length as 10n,\m from th interface in this experiment. If the G is roughly smaller than 20C/cm, vacancy rich CZ crystals are produced. If G is larger than 25C/cm, the species of point defects changes dramatically from vacancies to interstitials. The experimental results after detaching FZ and CZ crystals from the melt show that growth interfaces are filled with vacancies. We propose that large G produces shrunk lattice spacing and in order to relax such lattice excess interstitials are necessary. Such interstitials recombine with vacancies which were generated at the growth interface, nest occupy interstitial sites and residuals aggregate themselves to make stacking faults and dislocation loops during cooling. The shape of the growth interface is also determined by te distributions of G across the interface. That is, the small G and the large G in the center induce concave and convex interfaces to the melts, respectively.