• Title/Summary/Keyword: Lattice Type Structure

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Recent Advances in Structural Studies of Antifreeze Proteins (구조 생물학을 이용한 Antifreeze protein의 최근 연구동향)

  • Lee, Jun-Hyuck;Lee, Sung-Gu;Kim, Hak-Jun
    • Ocean and Polar Research
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    • v.33 no.2
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    • pp.159-169
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    • 2011
  • Antifreeze proteins (AFPs) have ice binding affinity, depress freezing temperature and inhibit ice recystallization which protect cellular membranes in polar organisms. Recent structural studies of antifreeze proteins have significantly expanded our understanding of the structure-function relationship and ice crystal growth inhibition. Although AFPs (Type I-IV AFP from fish, insect AFP and Plant AFP) have completely different fold and no sequence homology, they share a common feature of their surface area for ice binding property. The conserved ice-binding sites are relatively flat and hydrophobic. For example, Type I AFP has an amphipathic, single ${\alpha}$-helix and has regularly spaced Thr-Ala residues which make direct interaction with oxygen atoms of ice crystals. Unlike Type I AFP, Type II and III AFP are compact globular proteins that contain a flat ice-binding patch on the surface. Type II and Type III AFP show a remarkable structural similarity with the sugar binding lectin protein and C-terminal domain of sialic acid synthase, respectively. Type IV is assumed to form a four-helix bundle which has sequence similarity with apolipoprotein. The results of our modeling suggest an ice-binding induced structural change of Type IV AFP. Insect AFP has ${\beta}$-helical structure with a regular array of Thr-X-Thr motif. Threonine residues of each Thr-X-Thr motif fit well into the ice crystal lattice and provide a good surface-surface complementarity. This review focuses on the structural characteristics and details of the ice-binding mechanism of antifreeze proteins.

Preferred Orientation and Microstructure of Zinc Electrodeposit in acid Chloride Solution (우선배향과 두절경조직)

  • 예길촌;박계생;손경옥
    • Journal of the Korean institute of surface engineering
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    • v.16 no.4
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    • pp.173-187
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    • 1983
  • Zinc was electrodeposited at temperature from 20$^{\circ}C$ to 60$^{\circ}C$ over the ranges of the current density from 2 to 20 A/dm2 in acid chloride bath. The cathode overpotentials increased with increasing current density and decreasing tem-perature. The (10$.$3)-(10$.$2) preferred orientation developed at cathode overpotentials below about 450mV, the (10$.$3)(10$.$2)-(10$.$1) texture developed at overpotentials between 500mV and 950mV, and the (00$.$1) (10$.$3) texture developed at cathode overpotentials about 1000mV. The (00$.$1) (10$.$3) preferred orientation was also formed at the lower potentials between 400mV and 850mV at temperatures above 40$^{\circ}C$. The preferred orientations of the zinc deposits was discussed was discussed with both cathode overpo-tential and surface energy of deposit lattice planes. The pyramid type of structure with macrostep developed at low cathode overpotentials and the truncated pyramidal type developed at higher overpotenial.

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A Study on Tensile Strength Dependent on Variation of Output Condition of the X-shape Infill Pattern using FFF-type 3D Printing (융합 필라멘트 제조 방식의 3D 프린팅을 이용한 X자 형상 내부 채움 패턴의 출력 옵션 변화에 따른 인장강도 연구)

  • D. H. Na;H. J. Kim;Y. H. Lee
    • Transactions of Materials Processing
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    • v.33 no.2
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    • pp.123-131
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    • 2024
  • Plastic, the main material of FFF-type 3D printing, exhibits lower strength compared to metal. research aimed at increasing strength is needed for use in various industrial fields. This study analyzed three X-shape infill patterns(grid, lines, zigzag) with similar internal lattice structure. Moreover, tensile test considering weight and printing time was conducted based on the infill line multiplier and infill overlap percentage. The three X-shape infill patterns(grid, lines, zigzag) showed differences in nozzle paths, material usage and printing time. When infill line multiplier increased, there was a proportional increase in tensile strength/weight and tensile strength/printing time. In terms of infill overlap percentage, the grid pattern at 50% and the zigzag and lines patterns at 75% demonstrated the most efficient performance.

Compensation of Relation Formula between Luffing Wire Tension and Overturning Moment in a Crawler Crane Considering the Deflection of Boom (크롤러 크레인에서 붐의 처짐을 고려한 러핑와이어 장력과 전도모멘트 사이의 관계식 보정)

  • Jang, Hyo-Pil;Han, Dong-Seop
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.10 no.4
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    • pp.44-49
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    • 2011
  • The crawler crane, which consists of a lattice boom, a driving system, and movable vehicle, is widely used in a construction site. It needs to be installed an overload limiter to prevent the overturning accident and the fracture of structure. This research is undertaken to provide the relation formula for designing the overload limiter as follows: First the relation formulas between the wire-rope tension and the hoisting load or the overturning ratio according to the luffing angle and length of a lattice boom are established. Secondly the derived formulas are corrected by using the compensated angle considering the deflection of boom through the finite element analysis. The stiffness analysis is carried out for 30-kinds of models as a combination of 6-kinds of luffing angle and 5-kinds of length of boom. Finally the shape design of a stick type load cell, which is the device to measure the wire-rope tension, is performed. 5-kinds of notch radius and 5-kinds of center hole radius are adopted as the design parameter for the strength analysis of the load cell.

Ge Crystal Growth on Si Substrate for GaAs/Ge/Si Structure by Plasma-Asisted Epitaxy (GaAs/Ge/Si 구조를 위하여 PAE법을 이용한 Si 기판위에 Ge결정성장)

  • 박상준;박명기;최시영
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.26 no.11
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    • pp.1672-1678
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    • 1989
  • Major problems preventing the device-quality GaAs/Si heterostructure are the lattice mismatch of about 4% and difference in thermal expansion coefficient by a factor of 2.64 between Si and GaAs. Ge is a good candidate for the buffer layer because its lattice parameter and thermal expansion coefficient are almost the same as those of GaAs. As a first step toward developing heterostructure such as GaAs/Ge/Si entirely by a home-built PAE (plasma-assisted epitaxy), Ge films have been deposited on p-type Si (100)substrate by the plasma assisted evaporation of solid Ge source. The characteristics of these Ge/Si heterostructure were determined by X-ray diffraction, SEM and Auge electron spectroscope. PAE system has been successfully applied to quality-good Ge layer on Si substrate at relatively low temperature. Furthermore, this system can remove the native oxide(SiO2) on Si substrate with in-situ cleaning procedure. Ge layer grown on Si substrate by PAE at substrate temperature of 450\ulcorner in hydrogen partial pressure of 10mTorr was expected with a good buffer layer for GaAs/Ge/Si heterostructure.

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Effect on Al Concentration of AlGaAs Ternary Alloy (AlGaAs합금의 Al 도핑농도에 대한 효과)

  • Kang, B.S.
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.4
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    • pp.125-129
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    • 2021
  • We investigated the electronic property and atomic structure for chalcopyrite (CH) AlxGa1-xAs semiconductor by using first-principles FPLMTO method. The CH-AlxGa1-xAs exhibits a p-type semiconductor with a direct band-gap. For low Al concentration unoccupied hole-carriers are induced, but for high Al concentration it is formed a localized bonding or anti-bonding state below Fermi level. The hybridization of Al(3s)-Ga(4s, or 4p) is larger than that of Al(3s)-As(4s, or 4p). And the Al film on As-terminated surface, Al/AsGa(001), is more energetically favorable one than that on Ga-terminated (001) surface. Consequently, the band-gap of CH-AlxGa1-xAs system increases exponentially with increasing Al concentration. The change of lattice parameter is shown two different configurations with increasing Al concentration. The calculated lattice parameters for CH-AlxGa1-xAs system are compared to the experimental ones of zinc-blend GaAs and AlAs.

SEL 법으로 제조된 $CuInS_2$ 화합물 반도체 박막의 전기적 특성

  • Park, Gye-Choon;Jeong, Woon-Jo;Kim, Jong-Uk
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1605-1608
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    • 2004
  • Single phase $CuInS_2$ thin film with a highest diffraction peak (112) at a diffraction angle ($2{\theta}$) of 27.7$^{\circ}$ was well made by SEL method at annealing temperature of 250 $^{\circ}C$ and annealing hour of 60 min in vacuum of $10^{-3}$ Torr or in S ambience for an hour. And the peak of diffraction intensity at miller index (112) of $CuInS_2$ thin film annealed in S ambience was shown a little higher about 11 % than in only vacuum. Single phase $CuInS_2$ thin films were appeared from 0.85 to 1.26 of Cu/In composition ratio and sulfur composition ratios of $CuInS_2$ thin films fabricated in S ambience were all over 50 atom%. Also when Cu/In composition ratio was 1.03, $CuInS_2$ thin film with chalcopyrite structure had the highest XRD peak (112). And lattice constant a and grain size of the thin film in S ambience were appeared a little larger than those in only vacuum. The largest lattice constant of a and grain size of $CuInS_2$ thin film in S ambience was 5.63 ${\AA}$ and 1.2 ${\mu}$m respectively. And the films in S ambience were all p-conduction type with resistivities of around $10^{-1}{\Omega}cm$.

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Adaptive Lattice Step-Size Algorithm for Narrowband Interference Suppression in DS/CDMA Systems

  • Benjangkaprasert, Chawalit;Teerasakworakun, Sirirat;Jorphochaudom, Sarinporn;Janchitrapongvej, Kanok
    • 제어로봇시스템학회:학술대회논문집
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    • 2003.10a
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    • pp.2087-2089
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    • 2003
  • The presence of narrowband interference (NBI) in Direct-sequence code division multiple access (DS/CDMA) systems is an inevitable problem when the interference is strong enough. The improvement in the system performance employs by adaptive narrowband interference suppression techniques. Basically there have been two types of method for narrowband interference suppression estimator/subtracter approaches and transform domain approaches. In this paper the focus is on the type of estimator/subtracter approaches. However, the binary direct sequence (DS) signal, that acts as noise in the prediction process is highly non-Gaussian. The case of a Gaussian interferer with known in an autoregressive (AR) signal or a digital signal and also in a sinusoidal signal (Tone) that included in is paper. The proposed NBI suppression is presence in an adaptive IIR notch filter for lattice structure and more powerful by using a variable step-size algorithm. The simulation results show that the proposed algorithm can significantly increase the convergence rate and improved system performance when compare with adaptive least mean square algorithm (LMS).

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Improved Photolysis of Water from Ti Incorporated Double Perovskite Sr2FeNbO6 Lattice

  • Borse, P.H.;Cho, C.R.;Yu, S.M.;Yoon, J.H.;Hong, T.E.;Bae, J.S.;Jeong, E.D.;Kim, H.G.
    • Bulletin of the Korean Chemical Society
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    • v.33 no.10
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    • pp.3407-3412
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    • 2012
  • The Ti incorporation at Fe-site in the double perovskite lattice of $Sr_2FeNbO_6$ (SFNO) system is studied. The Ti concentration optimization yielded an efficient photocatalyst. At an optimum composition of Ti as x = 0.07 in $Sr_2Fe_{1-x}Ti_xNbO_6$, the photocatalyst exhibited 2 times the quantum yield for photolysis of $H_2O$ in presence of $CH_3OH$, than its undoped counterpart under visible light (${\lambda}{\geq}420nm$). Heavily Ti-doped $Sr_2Fe_{1-x}Ti_xNbO_6$ lattice exhibited poor photochemical properties due to the existence of constituent impurity phases as observed in the structural characterization, as well as deteriorated optical absorption. The higher electron-density acquired by n-type doping seem to be responsible for the more efficient charge separation in $Sr_2Fe_{1-x}Ti_xNbO_6$ (0.05 < x < 0.4) and thus consequently displays higher photocatalytic activity. The Ti incorporated structure also found to yield stable photocatalyst.

Study of the Nitrogen-Beam Irradiation Effects on ALD-ZnO Films (ALD로 성장된 ZnO박막에 대한 질소이온 조사효과)

  • Kim, H.S.
    • Journal of the Korean Vacuum Society
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    • v.18 no.5
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    • pp.384-389
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    • 2009
  • ZnO, a wurtzite lattice structure, has attracted much attention as a promising material for light-emitting diodes (LEDs) due to highly efficient UV emission resulting from its large band gap of 3.37 eV, large exciton binding energy of 60 meV, and low power threshold for optical pumping at room temperature. For the realization of LEDs, both n-type ZnO and p-type ZnO are required. Now, n-type ZnO for practical applications is available; however, p-type ZnO still has many drawbacks. In this study, ZnO films were grown on glass substrates by using atomic layer deposition (ALD) and the ZnO films were irradiated by nitrogen ion beams (20 keV, $10^{13}{\sim}10^{15}ions/cm^2$). The effects of nitrogen-beam irradiation on the ZnO structure as well as the electrical property were investigated by using fieldemission scanning electron microscopy (FESEM) and Hall-effect measurement.