• Title/Summary/Keyword: Laser patterning

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Process Study of Direct Laser Lithographic System for Fabricating Diffractive Optical Elements with Various Patterns (다중 패턴의 회절광학소자 제작을 위한 레이저 직접 노광시스템의 공정 연구)

  • Kim, Young-Gwang;Rhee, Hyug-Gyo;Ghim, Young-Sik;Lee, Yun-Woo
    • Journal of the Semiconductor & Display Technology
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    • v.18 no.2
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    • pp.58-62
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    • 2019
  • Diffractive Optical Elements(DOEs) diffracts incident light using the diffraction phenomenon of light to generate a desired diffraction image. In recent years, the use of diffraction optics, which can replace existing refractive optical elements with flat plates, has been increased by implementing various optical functions that could not be implemented in refractive optical devices and by becoming miniaturized and compacted optical elements. Direct laser lithography is typically used to effectively fabrication such a diffractive optical element in a large area with a low process cost. In this study, the process conditions for fabricating patterns of diffractive optical elements in various shapes were found using direct laser lithographic system, and optical performance evaluation was performed through fabrication.

Sliding Friction Properties of Laser Surface Dimple Patterned on PMMA under Saline Lubricated (레이저 표면 딤플 패턴된 PMMA 소재 표면의 식염수 윤활 하에서의 미끄럼 마찰특성)

  • Dongho Hyun;Younghun Chae;Da-I Jung
    • Tribology and Lubricants
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    • v.39 no.4
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    • pp.148-153
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    • 2023
  • Laser surface dimple patterning is a method of laser surface texturing to reduce lubrication sliding friction. The dimple pattern improves friction properties by reserving lubricant and trapping worn particles. This surface texturing technology can reduce coefficients of friction and extend the service life by applying a uniform load to the surface of the material. This study investigates the friction properties using PMMA, a highly compatible polymer material, as a specimen. We observe the friction properties of untextured specimens by processing specimens with dimple pattern densities of 5 and 10 on the surface area using laser. Dimple pattern density affects the coefficient of friction. We present the following friction property results using a pin-on-disc sliding friction test under saline lubrication. The coefficients of friction for the dimple patterned specimens are lower than those for the untextured specimens. As the normal load and sliding speed increase, the coefficients of friction of the dimple pattern specimens decrease differently from those of the untextured specimens. The specimen with a dimple pattern density of 5 at a normal load of 24.5 N and a sliding speed of 0.22 m/s has the best friction properties. Notably, different friction properties are exhibited depending on the dimple pattern densities.

Application of femtosecond laser hole drilling with vibration for thin Invar alloy using fine metal mask in AMOLED manufacturing process (AMOLED 제조공정에 사용되는 Fine Metal Mask 용 얇은 Invar 합금의 진동자를 이용한 펨토초 레이저 응용 홀 드릴링)

  • Choi, Won-Suk;Kim, Hoon-Young;Shin, Young-Gwan;Choi, Jun-ha;Chang, Won-Seok;Kim, Jae-Gu;Cho, Sung-Hak;Choi, Doo-Sun
    • Design & Manufacturing
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    • v.14 no.3
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    • pp.44-49
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    • 2020
  • One of display trends today is development of high pixel density. To get high PPI, a small size of pixel must be developed. RGB pixel is arranged by evaporation process which determines pixel size. Normally, a fine metal mask (FMM; Invar alloy) has been used for evaporation process and it has advantages such as good strength, and low thermal expansion coefficient at low temperature. A FMM has been manufactured by chemical etching which has limitation to controlling the pattern shape and size. One of alternative method for patterning FMM is laser micromachining. Femtosecond laser is normally considered to improve those disadvantages for laser micromachining process due to such short pulse duration. In this paper, a femtosecond laser drilling for thickness of 16 ㎛ FMM is examined. Additionally, we introduce experimental results for controlling taper angle of hole by vibration module adapted in laser system. We used Ti:Sapphire based femtosecond laser with attenuating optics, co-axial illumination, vision system, 3-axis linear stage and vibration module. By controlling vibration amplitude, entrance and exit diameters are controllable. Using vibrating objective lens, we can control taper angle when femtosecond laser hole drilling by moving focusing point. The larger amplitude of vibration we control, the smaller taper angle will be carried out.

Ag Electrode Strain Sensor Fabrication Using Laser Direct Writing Process

  • Kim, Hyeonseok;Shin, Jaeho;Hong, Sukjoon;Ko, Seung Hwan
    • Journal of Sensor Science and Technology
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    • v.24 no.4
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    • pp.215-218
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    • 2015
  • As several innovative technologies for flexible electric devices are being realized, demand for in-situ strain monitoring for flexible electric devices is being emphasized. Because flexible devices are commonly influenced by substrate strain, suitable strain sensors for flexible devices are essential for the sophisticated maneuvering of flexible devices. In this study, a flexible strain sensor based on an Ag electrode is prepared on a polyimide substrate using the LDW (laser direct writing) process. In this process, first, the Ag nanoparticles are coated on the substrate and selectively sintered using a focused laser. Because of the advantages of the LDW process (such as being mask-less, using low temperatures, and having non-vacuum characteristics), the entire fabrication process has been dramatically simplified; as a final outcome, a highly reliable strain sensor has been fabricated. Using this strain sensor, various strain conditions that arise from different bending radii can be detected by measuring real-time electrical signals.

Operational Properties of Ridge Waveguide Lasers with Laterally Tapered Waveguides for Monolithic Integration

  • Kwon, Oh-Kee;Kim, Ki-Soo;Sim, Jae-Sik;Baek, Yong-Soon
    • ETRI Journal
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    • v.29 no.6
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    • pp.811-813
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    • 2007
  • We report on a ridge waveguide laser diode with laterally tapered waveguides fabricated in a single growing step using a double patterning method. In this structure, nearly constant output power is obtained with the change of the lower tapered waveguide width, and the facet power ratio of 1.4 to 1.5 is observed over the current range. The asymmetric facet power property is also investigated.

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Effect of buffer layer on the microstructure and magnetic properties of NdFeB thin films (NdFeB 박막의 자기적 특성 및 미세구조에 미치는 buffer layer의 영향)

  • ;;;G. A. Kapustin
    • Proceedings of the Korean Magnestics Society Conference
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    • 2002.12a
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    • pp.234-235
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    • 2002
  • NdFeB 박막자석은 Sputtering, MBE, Laser ablation법에 의해 제조되고 있으며[1-3] milli-size motor[4], magnetic recording media[5], micro-patterning[3]등에 응용될 수 있다. 최근에는 MEMS(Micro-electro mechanical system)분야에서도 잠재적 응용가능성을 지니고 있는 것으로 알려져 있다. 최근에는 NdFeB 박막 제조 시 자성층의 산화방지 및 자기 특성을 향상을 위하여 buffer layer를 이용한 많은 연구가 이루어지고 있다.[6] (중략)

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Laser Photo Patterning Using Organic Self-Assembled Monolayers (유기 자기조립 단분자막을 이용한 레이저 포토패터닝 기술)

  • 최무진;장원석;신보성;김재구;황경현
    • Proceedings of the Optical Society of Korea Conference
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    • 2003.07a
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    • pp.288-289
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    • 2003
  • 금속 박막 위의 알칸티올분자의 흡착에 의한 자기조립단분자막(SAMs)은 접착 방지, 마찰 저하 등의 기능을 가진 코팅층으로서의 응용과 분자 또는 생분자의 미세 구조물 형성을 위한 방법으로 널리 연구되어지고 있다. 이러한 연구 중에서 자기조림단분자막(SAMs)의 매우 얇은 두께(수 nm)의 특성을 활용하여 AFM tip Scratching Lithography 또는 알칸티올 포토패터닝(alkanethiol Photopatterning) 방법을 사용함으로써 microscale의 패턴을 형성하는 연구 결과가 많은 이들의 관심을 받아왔다. (중략)

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Two-dimensional Nano-patterning with Immersion Holographic Lithography (액침 홀로그래픽 리소그래피 기술을 이용한 2 차원 나노패터닝)

  • Kim, Sang-Won;Park, Sin-Jeung;Kang, Shin-Il;Hahn, Jae-Won
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.12 s.189
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    • pp.128-134
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    • 2006
  • Two-dimensional nano-patterns are fabricated using immersion holographic lithography. The photoresist layer is exposed to an interference pattern generated by two incident laser beams($\lambda$=441.6 nm, He-Cd laser) of which the pitch size is less than 200 nm. Good surface profiles of the 2 dimensional patterns are achieved by trimming the lithography process parameters, such as, exposure time, developing time and refractive index of medium liquid.