• Title/Summary/Keyword: Laser Lithography

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Five Mirror System with Minimal Central Obscuration and All Zero 3rd Order Aberrations Suitable for DUV Optical Lithography (모든 3차 수차를 영으로 하고 Central Obscuration이 최소화된 극자외선 리소그라피용 5-반사광학계)

  • 이동희;이상수
    • Korean Journal of Optics and Photonics
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    • v.5 no.1
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    • pp.1-8
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    • 1994
  • A five mirror system with a reduction magnification(M=+1/5) is designed for DUV optical lithography. First, for spherical mirror systems, the numerical solutions of all zero 3rd order aberrations are derived and the 3-dimensional shape of the solution-domain is obtained. In these solutions, we select solutions which have as less residual aberrations and smaller central obscurration as possible and the aspherization is carried out to the last two spherical mirrors to obtain a system that has as higher NA as possible. Finally we obtain the system of which NA is 0.45, the central obscuration is about 25% and the resolution is about 650 cycles/mm at the 50% MTF value criterion and the depth of focus of 0.8${\mu}m$ for the nearly incoherent illumination (${\sigma}$=1.0) and the wavelength of 0.193${\mu}m$ (ArF excimer laser line).

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Direct Measurement of Distortion of Optical System of Lithography (노광 광학계의 왜곡수차 측정에 관한 연구)

  • Joo, WonDon;Lee, JiHoon;Chae, SungMin;Kim, HyeJung;Jung, Mee Suk
    • Korean Journal of Optics and Photonics
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    • v.23 no.3
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    • pp.97-102
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    • 2012
  • In general, one of the methods used to measure distortion is to use the full image of the regular pattern. However, because of low accuracy, this method is mainly used for an optical system such as a camera.. In order to measure distortion with high accuracy less than 1um, one can use the method of measuring the exact position of a mask image. In this case, a high accuracy stage with a laser encoder is required. In this paper, we investigate measurement of the distortion of high accuracy with a simple manual stage. The main idea is that we split and measure the mask image with the overlapping area by using CCD or CMOS, and then we get an exact position of the mask image by integrating the adjacent split images. We use the Canny Edge Detection method to get the position information of the mask image and we researched the process to exactly calculate distortion by using coordinate transformations and a least square method.

Development of 3D Printing System for Human Bone Model Manufacturing Using Medical Images (의료 영상을 이용한 인체 골 모형 제작의 3차원 프린팅 시스템 개발)

  • Oh, Wang-Kyun
    • Journal of radiological science and technology
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    • v.40 no.3
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    • pp.433-441
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    • 2017
  • The 3D printing selective laser sintering (SLS) and stereo lithography apparatus (SLA) method used for bone model production has good precision and resolution, but the printers are expensive and need professional knowledge for operation. The program that converts computed tomography digital imaging and communications in medicine (DICOM) file into STL (stereolithography) file is also expensive so requesting 3D printing companies takes a lot of time and cost, which is why they are not generally utilized in surgery. To produce bone models of fractured patients, the use of 3D imaging conversion program and 3D printing system should be convenient, and the cost of device and operation should be low. Besides, they should be able to produce big size bone models for application to surgery. Therefore, by using an fused deposition modeling (FDM) method 3D printer that uses thermoplastic materials such as DICOM Viewer OsiriX and plastic wires, this study developed 3D printing system for Fracture surgery Patients customized bone model production for many clinics to use for surgery of fracture patients by universalizing with no limit in printing sizes and low maintenance and production cost. It is expected to be widely applied to the overall areas of orthopedics' education, research and clinic. It is also expected to be conveniently used in not only university hospitals but also regular general hospitals.

LAM 공정을 위한 Underpass를 갖지 않는 나선형 박막 인덕터의 주파수 특성 (Frequency Characteristics of Spiral Planar Inductor without Underpass for LAM Process)

  • Kim, Jae-Wook
    • Journal of IKEEE
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    • v.12 no.3
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    • pp.138-143
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    • 2008
  • In this study, we propose that the structures of spiral inductors have the environment advantage utilizing direct-write and LAM(Laser Ablation of Microparticles) processes without process step of lithography and etching etc. of existing semiconductor process. The structures of inductors have Si thickness of 540${\mu}m$, $SiO_2$ thickness of 3${\mu}m$. The width of Cu coils and the space between segments have 30${\mu}m$, respectively, using for direct-write and LAM processes. The performance of spiral planar inductors was simulated to frequency characteristics for inductance, quality-factor, SRF(Self- Resonance Frequency) using HFSS. The inductors without underpass and via have inductance of 1.11nH over the frequency range of 300 to 800 MHz, quality-factor of maximum 38 at 5 GHz, SRF of 18 GHz. Otherwise, inductors with underpass and via have inductance of 1.12nH over the frequency range of 300 to 800 MHz, quality-factor of maximum 35 at 5 GHz, SRF of 16 GHz.

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Design and Analysis of Aluminum Melting Machine in Fused Deposition Modeling Method (압출 적층 방식의 알루미늄 용융기의 설계 및 해석)

  • Lee, Hyun-Seok;Na, Yeong-Min;Kang, Tae-Hun;Park, Jong-Kyu;Park, Tae-Gone
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.14 no.4
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    • pp.62-72
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    • 2015
  • Interest in three-dimensional (3D) printing processes has grown significantly, and several types have been developed. These 3D printing processes are classified as Selective Laser Sintering (SLS), Stereo-Lithography Apparatus (SLA), and Fused Deposition Modeling (FDM). SLS can be applied to many materials, but because it uses a laser-based material removal process, it is expensive. SLA enables fast and precise manufacturing, but available materials are limited. FDM printing's benefits are its reasonable price and easy accessibility. However, metal printing using FDM can involve technical problems, such as suitable component supply or the thermal expansion of the heating part. Thus, FDM printing primarily uses materials with low melting points, such as acrylonitrile butadiene styrene (ABS) or polylactic acid (PLA) resin. In this study, an FDM process for enabling metal printing is suggested. Particularly, the nozzle and heatsink for this process are focused for stable printing. To design the nozzle and heatsink, multi-physical phenomena, including thermal expansion and heat transfer, had to be considered. Therefore, COMSOL Multiphysics, an FEM analysis program, was used to analyze the maximum temperature, thermal expansion, and principal stress. Finally, its performance was confirmed through an experiment.

A Study on the Micro Pattern Fabrication of Lab-on-a-chip Mold Master using Micro EDM (Micro EDM을 이용한 Lab-on-a-chip금형의 미세 패턴 제작에 관한 연구)

  • Shin, B.C.;Kim, K.B.;Cho, M.W.;Kim, B.H.;Jung, W.C.;Heo, Y.M.
    • Transactions of Materials Processing
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    • v.20 no.1
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    • pp.17-22
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    • 2011
  • Recently, analyzing system is studying for applying to biomedical engineering field, actively. Micro fluidics control system has been manufactured using LIGA (Lithographie Galvanoformung und Abformung), Etching, Lithography and Laser etc. However, it is difficult that above-mentioned methods are applied to fabrication of precision mold master efficiently because of long processing time and rising cost of equipments. Therefore, in this study, micro EDM and micro WEDG system were developed to analyze machining characteristics with tool wear, surface roughness and process time. Then, optimal machining conditions could be obtained from the results of analysis. As the results, mold master of staggered herringbone mixer which has a high mixing efficiency, one of passive mixer of Lab-on-a-chip, could be fabricated from micro pattern(< 50um) using micro EDM successfully.

Fabrication of Two-dimensional Photonic Crystal by Roll-to-Roll Nanoreplication (롤투롤 나노 복제 공정을 이용한 이차원 광결정 소자의 제작)

  • Kim, Young-Kyu;Byeon, Euihyeon;Jang, Ho-Young;Kim, Seok-Min
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.12 no.5
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    • pp.16-22
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    • 2013
  • A two-dimensional photonic crystal structure was investigated using a roll-to-roll nanoreplication and physical vapor deposition processes for the inexpensive enhanced fluorescence substrate which is not sensitive to the polarization directions of excitation light source. An 8 inch silicon master having nano dot array with a diameter of 200 nm, a height of 100 nm and a pitch of 400 nm was prepared by KrF laser scanning lithography and reactive ion etching processes. A flexible polymer mold was fabricated by flat type UV replication process and a deposition of 10 nm nickel layer as an anti-adhesion layer. A roll mold was prepared by warping the flexible polymer mold on an aluminum roll base and a roll-to-roll UV replication process was carried out using the roll mold. After the deposition of ~ 100 nm $TiO_2$ layer on the replicated nano dot array, a 2 dimensional photonic crystal structure was realized with a resonance wavelength of 635 nm for both p- and s-polarized light sources.

Si 함유 DLC 필름의 탄성특성 평가

  • 정진원;조성진;이광렬;고대흥
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.136-136
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    • 1999
  • 박막의 탄성특성을 평가하는 방법으로 nano-indentation, Brillouin light scattering measurement, ultrasonic surface wave measurement, bulge test, vibration membrane method 등 여러 가지가 제시되어 왔다. 최근에는 탄성특성을 평가할 수 있는 간단한 방법으로 기판 식각 기법을 이용한 freehang, bridge 방법이 제시되었다. 이중에서 bridge 방법은 간단한 식각 기법을 이용하여 얇은 박막에서도 탄성 특성을 평가할 수 있는 방법으로 제시되었다. 그러나 식각 과정에서 발생하는 patch 부분의 under-cut으로 인해 정확한 bridge의 길이를 측정할 수 없게 되어 오차가 발생하고 있다. 본 연구에서는 bridge 방법에서 발생하는 오차를 줄이기 위한 방법으로, patch 부분에 etch-stop을 제작해 줌으로서 식각 과정에서 발생하는 under-cut을 효과적으로 제거시켰다. Etch-stop은 2장의 mask를 align key를 이용하여 제작하였다. 먼저 산화막이 형성되어 있는 Si 기판위에 mask 1을 이용하여 patch 부분을 lithography 작업하고, 습식 식각 공정을 한 뒤 DLC 필름을 증착시킨다. 다음으로 mask 2를 이용하여 bridge pattern을 제작하고, DLC 필름을 증착시킨 후 lift-off 기술과 산화막 등방식각 공정을 통해 bridge를 제작하였다. 이렇게 제작된 bridge를 통해 필름이 기판에 부착되기 위해 필요한 변형률을 측정하고, 독립적으로 측정된 필름의 잔류응력과 함께 박막의 응력-변형률 관계식에 적용시켜 biaxial elastic modulus, E/(1-v)를 구할 수 있었다. Sidl 첨가된 DLC 필름은 rf-PACVD 장비를 이용하여 증착하였다. 이때 전극과 플라즈마 사이의 바이어스 음전압은 -400V로 합성압력은 10mTorr로 고정하였다. 사용한 반응가스는 벤젠(C6H6)과 희석된 실렌(SiH4:2H=10:90)이며, 희석된 실렌의 첨가량을 조절하여 필름 내에 함유된 Si의 양을 조절하였다. 각각의 조건에서 증착시간을 조절하여 필름의 두께를 조절하였다. 필름의 잔류응력은 압축잔류 응력에 의해 발생한 필름/기판 복합체의 곡률을 laser 반사법을 이용하여 측정하고, 이 결과를 Brenner 등에 의해 유도된 식을 대입하여 계산하였다.

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Micro Metal Powder Injection Molding in the W-Cu System (W-Cu의 마이크로 금속분말사출성형)

  • 김순욱;양주환;박순섭;김영도;문인형
    • Journal of Powder Materials
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    • v.9 no.4
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    • pp.267-272
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    • 2002
  • The production of micro components is one of the leading technologies in the fields of information and communiation, medical and biotechnology, and micro sensor and micro actuator system. Microfabrication (micromachining) techniques such as X-ray lithography, electroforming, micromolding and excimer laser ablation are used for the production of micro components out of silicon, polymer and a limited number of pure metals or binary alloys. However, since the first development of microfabrication technologies there have been demands for the cost-effective replication in large scale series as well as the extended range of available material. One such promising process is micro powder injection molding (PIM), which inherits the advantages of the conventional PIM technology, such as low production cost, shape complexity, applicability to many materials, applicability to many materials, and good tolerance. This paper reports on a fundamental investigation of the application of W-Cu powder to micro metal injection molding (MIM), especially in view of achieving a good filling and a safe removal of a micro mold conducted in the experiment. It is absolutely legitimate and meaningful, at the present state of the technique, to continue developing the micro MIM towards production processes for micro components.

Deep UV 마이크로 리소그라피를 위한 새로운 4-반사경 광학계에 관한 수차해석

  • 김종태;이상수
    • Korean Journal of Optics and Photonics
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    • v.4 no.1
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    • pp.1-8
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    • 1993
  • A design of four-mirror optical system with reduction magnification 5X for deep UV ($\lambda$=248 nm of KrF excimer laser) submicron lithography is presented. Initially by using the paraxial quantities, the domain of solution for $t=d_1+d_2+d_3$<0 (d;: distance between the mirror $c_i$ and $c_{i+1}$ is found for the system which is free from the four off-axial Seidel first order aberrations that are coma, astigmatism, field curvature, and distortion. The solution with $d_5$=2.95 (normalized with respect to $c_i$= -1) is choosen and the aspherization is carried out to the spherical mirror surfaces ($c_3$ and $c_4$ in order to reduce the axial and residual off-axial higher order aberrations. The numerical aperture of the final system is as large as 0.4, which gives Rayleigh resolution of 0.38 $\mu\textrm{m}$.

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