• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.2
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• pp.829-834
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• 2011

Exposure process is the most important technology to fabricate highly integrated circuit. Up to now, mask type lithography process has been generally used. However, it is not efficient for small quantity and/or frequently changing products. Therefore, maskless lithography technology is raised in exposure process. In this study, relations between multi-beam energy and overlay were analyzed. Exposure experiment of generating pattern was performed. It was from presented scan line by multi- beam simulation. As a result, optimal scan line distance was proposed by simulation, and micro pattern accuracy could be improved by exposure experiment using laser direct imaging system.

• Korean Journal of Optics and Photonics
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• v.19 no.1
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• pp.20-24
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• 2008

A color filter was proposed and demonstrated by incorporating a subwavelength patterned 1-dimensional grating in poly silicon. It was produced by employing the laser interference lithography method, providing much wider effective area compared to the conventional e-beam lithography. A $SiO_2$ layer was introduced on top of the silicon grating layer as a mask for the etching of the silicon, facilitating the etching of the silicon layer. It was theoretically found that the selectivity of the filter was also improved thanks to the oxide layer. The parameters for the designed device include the grating pitch of 450 nm, the grating height of 100 nm and the oxide-layer height of 200 nm. As for the fabricated filter, the spectral pass band corresponded to the blue color centered at 470 nm and the peak transmission was about 40%. Within the effective area of $3{\times}3mm^2$, the variation in the relative transmission efficiency and in the center wavelength was less than 10% and 2 nm respectively. Finally, the influence of the angle of the incident beam upon the transfer characteristics of the device was investigated in terms of the rate of the relative transmission efficiency, which was found to be equivalent to 1.5%/degree.

• Korean Journal of Optics and Photonics
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• v.3 no.1
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• pp.67-72
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• 1992

Since the inception of the idea to develop an X-ray laser in 1960's, a rapid progress to demonstrate soft X-ray lasers in the wavelength region below 300$\AA$ has been made during the last ten years. Among many prospective proposals, the recombination scheme and the collisional exitation scheme have been most successful in achieving a significant gain. An appreciable single-pass amplification was achieved at 182 $\AA$ from CVI ions using the recombination scheme and at 206 and 290$\AA$ from the Se XXV ions using the collisional excitation scheme. The current research on X-ray lasers emphasizes the enhancement of amplification upto saturation and the extension of operating wavelength to shorter wavelengths, especially to the water window region between 23 and 44 $\AA$. X-ray lasers are expected to open many application fields, such as X-ray laser microscopy, X-ray holography, X-ray lithography, and more, in the near future.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.13-14
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• 2006

The use of soft-lithography instead of standard photolithography and dry etching technologies is attractive because inexpensive optical device can be realized. Polymerization using multi-photon absorption of materials is also a good method for optical waveguide fabrication. Laser induced self-writing technology of optical waveguide is also very simple and attractive. Using these processes, we can fabricate and interconnect optical circuits at once. In this presentation, several simple fabrication methods will be introduced. New optical loss evaluation method for polymer optical waveguides will also be presented

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.288-289
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• 2003

금속 박막 위의 알칸티올분자의 흡착에 의한 자기조립단분자막(SAMs)은 접착 방지, 마찰 저하 등의 기능을 가진 코팅층으로서의 응용과 분자 또는 생분자의 미세 구조물 형성을 위한 방법으로 널리 연구되어지고 있다. 이러한 연구 중에서 자기조림단분자막(SAMs)의 매우 얇은 두께(수 nm)의 특성을 활용하여 AFM tip Scratching Lithography 또는 알칸티올 포토패터닝(alkanethiol Photopatterning) 방법을 사용함으로써 microscale의 패턴을 형성하는 연구 결과가 많은 이들의 관심을 받아왔다. (중략)

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1539-1542
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• 2005

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, $HS(CH_2)_nX$, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the wellknown diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser coupled to a near-field scanning optical microscope (NSOM).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.134-134
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• 2010

We have investigated the holographic grating formation on Ag-doped amorphous chalcogenide AsGeSeS thin films with Ag thickness. Holographic gratings have been formed using Diode Pumped Solid State laser (DPSS, 532.0nm) under [P:P] polarized the intensity polarization holography. The diffraction efficiency was obtained by +1st order intensity.

• Proceedings of the Optical Society of Korea Conference
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• 2000.02a
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• pp.130-131
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• 2000

One of the more promising proposals for guiding and focusing neutral atoms involves dark hollow laser beams. When the frequency of the laser is detuned to the blue of resonance, the dipole force the atoms feel in the light confines them to the dark core where the atoms can be transported with minimal interaction with the light. The ability of the all-light atom guides to transport large number of ultracold atoms for long distances without physical walls leads to the possibility of a versatile tool for atom lithography, atom interferometry, atomic spectroscopy as well as for transporting and manipulating Bose-Einstein condensates. Furthermore since the atoms transported in all-light atom guides do not come into contact with matter, they can in principle be used to transport antimatter as well. The ability to vary the core size of the hollow beam makes the all-light atom guide potentially useful for focusing neutral atoms. The atoms could be focused as tight as the core size of the hollow beam at its waist. This new focusing scheme, called the atom funnel, would not show spherical and chromatic aberrations that conventional harmonic focusing suffers from. (omitted)

• Proceedings of the Optical Society of Korea Conference
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• 2003.02a
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• pp.234-235
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• 2003

All solid-state UV lasers provide efficient, clean and semipermanent light sources for various applications, such as eye surgery, microchip lithography. $CsLiB_{6}O_{10}$ (CLBO) is one of the most suitable crystals for UV generation because of its small walk-off, large effective nonlinear susceptibility in UV region and high damage threshold. We produced fourth (266 nm) and fifth (213 nm) harmonic generation of an Nd：YAG laser (1064 nm) with $LiB_{3}O_{5}$ as a second harmonic generation medium and CLBO as a fourth harmonic and fifth harmonic mediums. (omitted)

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.7
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• pp.94-103
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• 1995

Thin film acoustooptic beam deflector in proton-exchanged Y-cut LiNbO$_{3}$ was fabricated and measured. The planar waveguide was fabricated by using the proton-exchanged and annealing method in Y0cut LiNbO$_{3}$. Interdigital transducer for SAW(surface acoustic wave) was made by the laser lithography. Using above method, the thin film acoustooptic beam deflector was constructed. Its SAW wavelength was 20.mu.m at 174MHz center frequency. The interaction length between guided optical wave and SAW was 2.16mm. The measured 3dB bandwidth was 17MHz using He-Ne laser. And 70% diffraction efficiency was obtained at 970mW RF driving power.