• Title/Summary/Keyword: Large scale hydrogen

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High Temperature Corrosion in Carbon-Rich Gases

  • Young, D.J.
    • Corrosion Science and Technology
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    • v.7 no.2
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    • pp.69-76
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    • 2008
  • Common methods for large scale hydrogen production, such as steam reforming and coal gasification, also involve production of carbonaceous gases. It is therefore necessary to handle process gas streams involving various mixtures of hydrocarbons, $H_2$, $H_2O$, CO and $CO_2$ at moderate to high temperatures. These gases pose a variety of corrosion threats to the alloys used in plant construction. Carbon is a particularly aggressive corrodent, leading to carburisation and, at high carbon activities, to metal dusting. The behaviour of commercial heat resisting alloys 602CA and 800, together with that of 304 stainless steel, was studied during thermal cycling in $CO/CO_2$ at $650-750^{\circ}C$, and also in $CO/H_2/H_2O$ at $680^{\circ}C$. Thermal cycling caused repeated scale separation, which accelerated chromium depletion from the alloy subsurface regions. The $CO/H_2/H_2O$ gas, with $a_C=2.9$ and $p(O_2)=5\times10^{-23}$ atm, caused relatively rapid metal dusting, accompanied by some internal carburisation. In contrast, the $CO/CO_2$ gas, with $a_C=7$ and $p(O_2)=10^{-23}-10^{-24}$ atm caused internal precipitation in all three alloys, but no dusting. Inward diffusion of oxygen led to in situ oxidation of internal carbides. The very different reaction morphologies produced by the two gas mixtures are discussed in terms of competing gas-alloy reaction steps.

Development of Al plasma assisted chemical vapor deposition using DMEAA (DMEAA를 이용한 알루미늄 PACVD법의 개발)

  • 김동찬;김병윤;이병일;김동환;주승기
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.10
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    • pp.98-106
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    • 1996
  • A thin film of aluminum for ultra large scale integrated circuits metalization has been deposited on TiN and SiO$_{2}$ substrates by plasma assisted chemical vapor deposition using DMEAA (dimenthylethylamine alane) as a precursor. The effects of plasma on surface topology and growth characteristics were investigated. Thermal CVD Al could not be got continuous films on insulating subsrate such as SiO$_{2}$. However, it was found that Al films could be deposited on SiO$_{2}$ substate without any pretreatments by the hydrogen plasma for pyrolysis of DMEAA. Compared to the thermal CVD, PACVD films showed much better reflectance and resistance on TiN and SiO$_{2}$ substrate. We obtained mirror-like PACVD Al film of 90% reflectance and resistance on TiN and SiO$_{2}$ substrates. We obtained mirror-like PACVD Al film of 90% reflectance on TiN substrate. Excellent conformal step coverage was obtained on submicron contact holes ;by the PACVD blanket deposition.

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Mechanism of Combustion Instability in Supersonic Combustor (초음속 연소기 내의 연소 불안정 메커니즘)

  • 최정열
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2003.10a
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    • pp.191-194
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    • 2003
  • A series of computational simulations have been carried out for non-reacting and reacting flows in a supersonic combustor configuration with and without a cavity. Transverse injection of hydrogen, a simplest form of fuel supply, is considered in the present study with the injection pressure of 0.5 and 1.0 ㎫. The corresponding equivalence ratios are 0.17 and 0.33. The work features detailed resolution of the flow and flame dynamics in the combustor, which was not typically available in most of the previous studies. In particular, oscillatory flow characteristics are captured at a scale sufficient to identify the underlying physical mechanisms. Much of the flow unsteadiness is related not only to the cavity, but also to the intrinsic unsteadiness in the flowfield. The interactions between the unsteady flow and flame evolution may cause a large excursion of flow oscillation. The role of the cavity, injection pressure, and amount of heat addition are examined systematically.

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Unsteady Numerical Analysis of Transverse Injection Jet into Supersonic Mainstream (초음속 주유동에 수직 분사되는 제트의 비정상 수치해석)

  • Choi Jeong-Yeol;Yang Vigor
    • 한국전산유체공학회:학술대회논문집
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    • 2003.08a
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    • pp.126-131
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    • 2003
  • A series of computational simulations have been carried out for supersonic flows in a scram jet engine with and without a cavity. Transverse injection of hydrogen, a simplest form of fuel supply, is considered in the present study with the injection pressure varying from 0.5 to 1.5 MPa. The corresponding equivalence ratios are 0.167 - 0.50. The work features detailed resolution of the flow dynamics in the combustor, which was not typically available in most of the Previous studies. In particular, oscillatory flow characteristics are captured at a scale sufficient to identify the underlying physical mechanisms. Much of the flow unsteadiness is related not only to the cavity, but also to the intrinsic unsteadiness in the flowfield. The interactions between shock waves and shear layer may cause a large excursion of flow oscillation. The role of the cavity and injection pressure are examined systematically.

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Mono and Multilayer Assembly of Zeolite Microcrystals on Substrates

  • Yoon, Kyung-Byung
    • Bulletin of the Korean Chemical Society
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    • v.27 no.1
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    • pp.17-26
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    • 2006
  • We have shown that zeolite microcrystals can be readily organized in the form of uniformly oriented monoand multilayers on various substrates by well-defined chemical linkages based on covalent, ionic, and hydrogen bondings between the microcrystals and the substrates. This finding establishes the fact that micrometer-scale building blocks can be readily organized into organized entities through interconnection of the surface-tethered large number of functional groups. Since zeolite crystals have highly regular and uniform nanochannels and nanopores within them, the resulting mono and multilayers of zeolite microcrystals bear great potential to be utilized in various novel applications.

The effect of various parameters for few-layered graphene synthesis using methane and acetylene

  • Kim, Jungrok;Seo, Jihoon;Jung, Hyun Kyung;Kim, Soo H.;Lee, Hyung Woo
    • Journal of Ceramic Processing Research
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    • v.13 no.spc1
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    • pp.42-46
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    • 2012
  • The effect of the parameters for few-layered graphene growth by thermal CVD on nickel substrate was investigated. Graphene can be synthesized by using different strategies. Chemical vapor deposition (CVD) has known as one of the most attractive methods to produce graphene due to its good film uniformity, compatibility and large scale production. The control of parameters such as temperature, growth time and pressure in CVD process has been widely recognized as the most important process in graphene growth. Different carbon precursors, methane and acetylene, were introduced in the quartz tube with a variety of growth conditions. Raman spectroscopy was used to confirm the presence of a few- or multi-layered graphene.

High-Temperature Structural Analysis of a Small-Scale Prototype of a Process Heat Exchanger (IV) - Macroscopic High-Temperature Elastic-Plastic Analysis - (공정열교환기 소형 시제품에 대한 고온구조해석(IV) - 거시적 고온 탄·소성 구조해석을 중심으로 -)

  • Song, Kee-Nam;Hong, Sung-Deok;Park, Hong-Yoon
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.35 no.10
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    • pp.1249-1255
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    • 2011
  • A PHE (Process Heat Exchanger) is a key component required to transfer heat energy of $950^{\circ}C$ generated in a VHTR (Very High Temperature Reactor) to a chemical reaction that yields a large quantity of hydrogen. A small-scale PHE prototype made of Hastelloy-X was scheduled for testing in a small-scale gas loop at the Korea Atomic Energy Research Institute. In this study, as a part of the evaluation of the high-temperature structural integrity of the PHE prototype, high-temperature structural analysis modeling, and macroscopic thermal and elastic-plastic structural analysis of the PHE prototype were carried out under the gas-loop test conditions as a preliminary qwer123$study before carrying out the performance test in the gas loop. The results obtained in this study will be used to design the performance test setup for the modified PHE prototype.

A STUDY OF DWARF GALAXIES EMBEDDED IN A LARGE-SCALE Hɪ RING IN THE LEO I GROUP

  • KIM, MYO JIN;CHUNG, AEREE;LEE, JONG CHUL;LIM, SUNGSOON;KIM, MINJIN;KO, JONGWAN;LEE, JOON HYEOP;YANG, SOUNG-CHUL;LEE, HYE-RAN
    • Publications of The Korean Astronomical Society
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    • v.30 no.2
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    • pp.517-519
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    • 2015
  • A large-scale neutral hydrogen ($H\small{I}$) ring serendipitously found in the Leo I galaxy group is 200 kpc in diameter with $M_{H\small{I}}{\sim}1.67{\times}10^9M_{\odot}$, unique in size in the Local Universe. It is still under debate where this $H\small{I}$ ring originated - whether it has formed out of the gas remaining after the formation of a galaxy group (primordial origin) or been stripped during galaxy-galaxy interactions (tidal origin). We are investigating the optical and $H\small{I}$ gas properties of the dwarf galaxies located within the gas ring in order to probe its formation mechanism. In this work, we present the photometric properties of the dwarfs inside the ring using the CFHT MegaCam $u^{\ast}$, $g^{\prime}$, $r^{\prime}$ and $i^{\prime}$-band data. We discuss the origin of the gas ring based on the stellar age and metal abundance of dwarf galaxies contained within it.

A study on Safety Management and Control in Wet-Etching Process for H2O2 Reactions (습식 에칭 공정에서의 과산화수소 이상반응에 대한 안전 대책 및 제어에 관한 연구)

  • Yoo, Heung-Ryol;Son, Yung-Deug
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.4
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    • pp.650-656
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    • 2018
  • The TFT-LCD industry is a kind of large-scale industrial Giant Microelectronics device industry and has a similar semiconductor process technology. Wet etching forms a relatively large proportion of the entire TFT process, but the number of published research papers on this topic is limited. The main reason for this is that the components of the etchant, in which the reaction takes place, are confidential and rarely publicized. Aluminum (Al) and copper (Cu), which have been used in recent years for the manufacture of large area LCDs, are very difficult materials to process using wet etching. Cu, a low-resistance material, can only be used in the wet etching process, and is used as a substitute for Al due to its high speed etching, low failure rate, and low power consumption. Further, the abnormal reaction of hydrogen peroxide ($H_2O_2$), which is used as an etching solution, requires additional piping and electrical safety devices. This paper proposes a method of minimizing the damage to the plant in the case of adverse reactions, though it cannot limit the adverse reaction of hydrogen peroxide. In recent years, there have been many cases in which aluminum etching equipment has been changed to copper. This paper presents a countermeasure against abnormal reactions by implementing safety PLC with a high safety grade.

Development of Large-scale Ni-Al Alloy Fabrication Process at Low Temperature (대용량 저온 Ni-Al 합금 분말 제조 공정 개발)

  • LEE, MIN JAE;KANG, MIN GOO;JANG, SEONG-CHEOL;HAM, HYUNG CHUL;AHN, JOONG WOO;NAM, SUK WOO;YOON, SUNG PIL;HAN, JONGHEE
    • Transactions of the Korean hydrogen and new energy society
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    • v.29 no.1
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    • pp.64-70
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    • 2018
  • In this study, the kg-class Ni-Al alloy fabrication process at low temperature was developed from the physical mixture of Ni and Al powders. The AlCl3 as an activator was used to reduce the temperature of alloy synthesis below the melting temperature of Ni and Al elements (<$500^{\circ}C$). Mixed phase of Ni3Al intermetallic and Ni-Al solid-solution were identified in the XRD pattern analysis. Furthermore, from the analysis of SEM and particle size analyzer, we found that the particle size of synthesized alloy powders was not changed compared to the initial size of Ni particle after the formation of alloy powder at $500^{\circ}C$. In the creep test, the anode (which was fabricated by the prepared Ni-Al alloy powders in this study) displayed the enhanced creep resistance compared to the conventional anode.