• 제목/요약/키워드: Langmuir probe system

검색결과 38건 처리시간 0.028초

Development of the DC-RF Hybrid Plasma Source

  • 김지훈;천세민;강인제;이헌주
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.213-213
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    • 2011
  • DC arc plasmatron is powerful plasma source to apply etching and texturing processing. Even though DC arc plasmatron has many advantages, it is difficult to apply an industry due to the small applied area. To increase an effective processing area, we suggest a DC-RF hybrid plasma system. The DC-RF hybrid plasma system was designed and made. This system consists of a DC arc plasmatron, RF parts, reaction chamber, power feeder, gas control system and vacuum system. To investigate a DC-RF hybrid plasma, we used a Langmuir probe, OES (Optical emission spectroscopy), infrared (IR) light camera. For RF matching, PSIM software was used to simulate a current of an impedance coil. The results of Langmuir probe measurements, we obtain a homogeneous plasma density and electron temperature those are about $1{\times}1010$ #/cm3 and 1~4 eV. The DC-RF hybrid plasma source is applied for plasma etching experimental, and we obtain an etching rate of 10 ${\mu}m$/min. through a 90 mm of reaction chamber diameter.

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Etching Mechanism of Indium Tin Oxide Thin Films using Cl2/HBr Inductively Coupled Plasma

  • Kim, Sung-Ihl;Kwon, Kwang-Ho
    • Transactions on Electrical and Electronic Materials
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    • 제10권1호
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    • pp.1-4
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    • 2009
  • Dry etching characteristics of indium tin oxide films and etch selectivities over photoresist films were investigated using $Cl_2/HBr$ inductively coupled plasma. From a Langmuir probe diagnostic system, it was observed that while the plasma temperature was kept nearly constant in spite of the change of the HBr mixing ratio, the positive ion density decreases rapidly with increasing the mixing ratio. On the other hand, a quadrupole mass spectrometer showed that the neutral HBr and Br species increased. The etching mechanism in the $HBr/Cl_2$ plasma was analyzed.

ICP 광원 시스템의 Ne:Xe, Ne:Ar 혼합가스의 단일탐침법을 이용한 플라즈마 진단 (Plasma Diagnosis of Ne:Xe, Ne:Ar Mixed Gases by Single Langmuir Probe in Inductively Coupled Plasma Light Source System)

  • 최용성;이우기;;이경섭;이상헌
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 영호남 합동 학술대회 및 춘계학술대회 논문집 센서 박막 기술교육
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    • pp.91-95
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    • 2006
  • In whole world consciousness of environment maintenance have increased very quickly for the end of the 20th century. To use and disuse toxic substances have been controled at the field of industry. Also the field of lighting source belong to environmental control. And in the future the control will be strong. In radiational mechanism of fluorescence lamp mechanism is the worst environmental problem. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem root. In the mercury free lighting source system the Xe gas lamp is one type. And the Ne:Xe mixing gas lamp improvements firing voltage of Xe gas lamp. Purpose and subject of this study are understand, efficiency, ideal of Ne:Xe plasma which mercury free lamp. Before ICP was designed, basic parameters of plasma, which are electron temperature and electron density, were measured and calculated by Langmuir probe data. Property of electron temperature and electron density were confirmed by changing ratio of Ne:Xe.

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Measurement of plasma potential by a biased cut off probe

  • 김대웅;김정형;성대진;유신재;장홍영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.465-465
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    • 2010
  • Cut off probe, the efficient method, can measure the plasma parameters like the plasma electron density and the electron temperature. Plasma potential is also one of the important parameters in plasma processing but cannot be measured by cut off probe yet. Thus we developed method to measure plasma potential by focusing on relation between bias on a tip and sheath around tip. The system consist of a ICP(Inductive Coupled Plasma) source, a Network analyzer and a bias tee that can be bridge apply DC voltage on the cut off probe tip. Plasma potential is identified by using this system. The results corresponded well with the measured results by single langmuir probe(SLP).

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Discharge characterization of two-region arc plasma (TRAP) ion source

  • Kihyun Lee;Seung Ho Jeong;Tae-Seong Kim;Dae-Sik Chang;Sung-Ryul Huh
    • Nuclear Engineering and Technology
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    • 제56권9호
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    • pp.3961-3968
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    • 2024
  • The Korea Atomic Energy Research Institute (KAERI) is developing a novel Two-Region Arc Plasma Ion Source (TRAP) as a negative hydrogen (deuterium) ion source for a Neutral Beam Injection (NBI) system in a fusion tokamak. The TRAP ion source is based on a two-region configuration, comprising a high energy electron region that creates highly vibrationally excited molecules and a low electron temperature region that generates negative ions by attaching electrons to molecules. This configuration can be achieved by optimizing the filament position and magnetic cusp field. In order to optimize the TRAP configuration, the plasma parameters are investigated under various operating conditions, such as filament position, gas pressure, and arc power. Electron density and temperature are determined using Langmuir probe measurements. In this paper, the detailed experimental results are described and discussed.

Experimental Research of an ECR Heating with R-wave in a Helicon Plasma Source

  • Ku, Dong-Jin;An, C.Y.;Park, Min;Kim, S.H.;Wang, S.J.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.274-274
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    • 2012
  • We have researched on controlling an electron temperature and a plasma collision frequency to study the effect of collisions on helicon plasmas. So, we have designed and constructed an electron cyclotron resonance (ECR) heating system in the helicon device as an auxiliary heating source. Since then, we have tried to optimize experimental designs such as a magnetic field configuration for ECR heating and 2.45GHz microwave launching system for its power transfer to the plasma effectively, and have characterized plasma parameters using a Langmuir probe. For improving an efficiency of the ECR heating with R-wave in the helicon plasma, we would understand an effect of R-wave propagation with ECR heating in the helicon plasma, because the efficiency of ECR heating with R-wave depends on some factors such as electron temperature, electron density, and magnetic field gradient. Firstly, we calculate the effect of R-wave propagation into the ECR zone in the plasma with those factors. We modify the magnetic field configuration and this system for the effective ECR heating in the plasma. Finally, after optimizing this system, the plasma parameters such as electron temperature and electron density are characterized by a RF compensated Langmuir probe.

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KSR-III 과학탑재 시스템 개발

  • 황승현;김준;전영두;김용하;장민환
    • 항공우주기술
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    • 제1권2호
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    • pp.83-90
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    • 2002
  • 본 논문에서는 3단형 과학관측로켓(KSR-III)에 탑재될 과학탑재부 시스템에 대하여 기술하였다. 과학탑재부에는 크게 오존측정기, 이온층 전자측정기, 대기광도계, 자력계 등이 있으며 선별적으로 탑재되어 한반도 상공의 고층 대기 상태에 대한 연구를 수행할 예정이다. 오존측정기는 한반도 상공의 오존 기둥 밀도를 측정하며 전자측정기는 이온층의 전자밀도와 전자온도를 측정한다. 대기광도계는 중간권의 대기광을 측정하며 자력계는 로켓 자세정보와 로켓이 비행하는 고도에서의 자기장 섭동량을 측정한다. 탑재체들은 현재 개발이 완료된 상태이며 지상 보정 실험도 수행하였으며 각종 환경시험을 통과하였다.

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Measurement of Electron Density and Electron-neutral Collision Frequency Using Cutoff Probe Based on the Plasma Reactance Measurement

  • 유광호;김대웅;나병근;서병훈;유신재;김정형;성대진;신용현;장홍영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.184-184
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    • 2012
  • We proposed a new measurement method of cutoff probe using the reactance spectrum of the plasma in cutoff probe system instead of transmission spectrum. The high accurate reactance spectrum of the plasma which is expected in previous circuit simulation of cutoff probe [1] was measured by using the automatic port extension method of the network analyzer. The measured reactance spectrum is good agreement with E/M wave simulation result (CST Microwave Studio). From the analysis of the measured reactance spectrum based on the circuit modeling, not only the electron density but also electron-neutral collision frequency can be simply obtained. The obtained results of electron density and e-n collision frequency were presented and discussed in wide range of experimental conditions, together with comparison result with previous methods (a previous cutoff probe using transmission spectrum and a single langmuir probe).

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Fast Measurement using Wave-Cutoff Method

  • 서상훈;나병근;유광호;장홍영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.30-30
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    • 2011
  • The wave-cutoff tool is a new diagnostic method to measure electron density and electron temperature. Most of the plasma diagnostic tools have the disadvantage that their application to processing plasma where toxic and reactive gases are used gives rise to many problems such as contamination, perturbation, precision of measurement, and so on. We can minimize these problems by using the wave-cutoff method. Here, we will present the results obtained through the development of the wave-cutoff diagnostic method. The frequency spectrum characteristics of the wave-cutoff probe will be obtained experimentally and analyzed through the microwave field simulation by using the CST-MW studio simulator. The plasma parameters are measured with the wave-cutoff method in various discharge conditions and its results will be compared with the results of Langmuir probe. Another disadvantage is that other diagnostic methods spend a long time (~ a few seconds) to measure plasma parameters. In this presentation, a fast measurement method will be also introduced. The wave-cutoff probe system consists of two antennas and a network analyzer. The network analyzer provides the transmission spectrum and the reflection spectrum by frequency sweeping. The plasma parameters such as electron density and electron temperature are obtained through these spectra. The frequency sweeping time, the time resolution of the wave-cutoff method, is about 1 second. A short pulse with a broad band spectrum of a few GHz is used with an oscilloscope to acquire the spectra data in a short time. The data acquisition time can be reduced with this method. Here, the plasma parameter measurement methods, Langmuir probe, pulsed wave-cutoff method and frequency sweeping wave-cutoff method, are compared. The measurement results are well matched. The real time resolution is less than 1 ?sec. The pulsed wave-cutoff technique is found to be very useful in the transient plasmas such as pulsed plasma and tokamak edge plasma.

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$Cl_2$/Ar 혼합가스를 이용한 $Ba_2Ti_9O_{20}$ 유전박막의 유도결합 플라즈마 식각 (Etching characteristics of $Ba_2Ti_9O_{20}$ films in inductively coupled $Cl_2$/Ar plasma)

  • 이태훈;김만수;전효민;권광호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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    • pp.65-65
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    • 2009
  • 본 연구에서는 ICP 식각장치 및 $Cl_2$/Ar 플라즈마에 의한 $Ba_2Ti_9O_{20}$(BTO) 박막의 식각 특성을 고찰하였다. XPS 분석 장치를 이용하여 식각 표면 반응을 조사하였으며, 공정 변수 ($Cl_2$/Ar 가스 혼합비, 소스파워, 챔버 압력, 바이어스 파워)에 따라 플라즈마 특성 변화를 Langmuir probe measuring system을 이용하여 추출하였다. $Cl_2$/Ar 가스에서 Ar 가스의 혼합비가 증가함에 따라 BTO 박막의 식각 속도는 감소하였으며, $Cl_2$ 가스만을 사용하는 경우, 31.7 nm/min 으로 가장 높은 식각 속도를 보였다. Ar 가스의 혼합비에 따른 BTO박막의 식각속도 변화는 Langmuir probe 특성과 XPS 분석결과로부터 플라즈마 내에 형성되는 Cl radical density와 밀접한 관련이 있는 것으로 판단할 수 있다.

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