• Title/Summary/Keyword: Langmuir probe

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Characteristics of the Plasma Source for Ground Ionosphere Simulation Surveyed by Disk-Type Langmuir Probe

  • Ryu, Kwangsun;Lee, Junchan;Kim, Songoo;Chung, Taejin;Shin, Goo-Hwan;Cha, Wonho;Min, Kyoungwook;Kim, Vitaly P.
    • Journal of Astronomy and Space Sciences
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    • v.34 no.4
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    • pp.343-352
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    • 2017
  • A space plasma facility has been operated with a back-diffusion-type plasma source installed in a mid-sized vacuum chamber with a diameter of ~1.5 m located in Satellite Technology Research Center (SaTReC), Korea Advanced Institute of Science and Technology (KAIST). To generate plasma with a temperature and density similar to the ionospheric plasma, nickel wires coated with carbonate solution were used as filaments that emit thermal electrons, and the accelerated thermal electrons emitted from the heated wires collide with the neutral gas to form plasma inside the chamber. By using a disk-type Langmuir probe installed inside the vacuum chamber, the generation of plasma similar to the space environment was validated. The characteristics of the plasma according to the grid and plate anode voltages were investigated. The grid voltage of the plasma source is realized as a suitable parameter for manipulating the electron density, while the plate voltage is suitable for adjusting the electron temperature. A simple physical model based on the collision cross-section of electron impact on nitrogen molecule was established to explain the plasma generation mechanism.

Measurement of plasma potential by a biased cut off probe

  • Kim, Dae-Ung;Kim, Jeong-Hyeong;Seong, Dae-Jin;Yu, Sin-Jae;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.465-465
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    • 2010
  • Cut off probe, the efficient method, can measure the plasma parameters like the plasma electron density and the electron temperature. Plasma potential is also one of the important parameters in plasma processing but cannot be measured by cut off probe yet. Thus we developed method to measure plasma potential by focusing on relation between bias on a tip and sheath around tip. The system consist of a ICP(Inductive Coupled Plasma) source, a Network analyzer and a bias tee that can be bridge apply DC voltage on the cut off probe tip. Plasma potential is identified by using this system. The results corresponded well with the measured results by single langmuir probe(SLP).

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Measurement of Electron Density and Electron-neutral Collision Frequency Using Cutoff Probe Based on the Plasma Reactance Measurement

  • Yu, Gwang-Ho;Kim, Dae-Ung;Na, Byeong-Geun;Seo, Byeong-Hun;Yu, Sin-Jae;Kim, Jeong-Hyeong;Seong, Dae-Jin;Sin, Yong-Hyeon;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.184-184
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    • 2012
  • We proposed a new measurement method of cutoff probe using the reactance spectrum of the plasma in cutoff probe system instead of transmission spectrum. The high accurate reactance spectrum of the plasma which is expected in previous circuit simulation of cutoff probe [1] was measured by using the automatic port extension method of the network analyzer. The measured reactance spectrum is good agreement with E/M wave simulation result (CST Microwave Studio). From the analysis of the measured reactance spectrum based on the circuit modeling, not only the electron density but also electron-neutral collision frequency can be simply obtained. The obtained results of electron density and e-n collision frequency were presented and discussed in wide range of experimental conditions, together with comparison result with previous methods (a previous cutoff probe using transmission spectrum and a single langmuir probe).

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A study on the characteristics of axially magnetized capacitively coupled radio frequency plasma (축 방향으로 자화된 용량 결합형 RF 플라즈마의 특성 연구)

  • 이호준;태흥식;이정해;신경섭;황기웅
    • Journal of the Korean Vacuum Society
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    • v.10 no.1
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    • pp.112-118
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    • 2001
  • Magnetic field is commonly used in low temperature processing plasmas to enhance the performance of the plasma reactors. E$\times$B magnetron or surface multipole configuration is the most popular. However, the properties of capacitively coupled rf plasma confined by axial static magnetic field have rarely been studied. With these background, the effect of magnetic field on the characteristics of capacitively coupled 13.56 MHz/40 KHz argon plasma was studied, Ion saturation current, electron temperature and plasma potential were measured by Langmuir probe and emissive probe. At low pressure region (~10 mTorr), ion current increases by a factor of 3-4 due to reduction of diffusion loss of charged particles to the wall. Electron temperature slightly increases with magnetic field for 13.56 MHz discharge. However, for 40 KHz discharge, electron temperature decreased from 1.8 eV to 0.8 eV with magnetic field. It was observed that the magnetic field induces large temporal variation of the plasma potential. Particle in cell simulation was performed to examine the behaviors of the space potential. Experimental and simulation results agreed qualitatively.

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Fast Measurement using Wave-Cutoff Method

  • Seo, Sang-Hun;Na, Byeong-Geun;Yu, Gwang-Ho;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.30-30
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    • 2011
  • The wave-cutoff tool is a new diagnostic method to measure electron density and electron temperature. Most of the plasma diagnostic tools have the disadvantage that their application to processing plasma where toxic and reactive gases are used gives rise to many problems such as contamination, perturbation, precision of measurement, and so on. We can minimize these problems by using the wave-cutoff method. Here, we will present the results obtained through the development of the wave-cutoff diagnostic method. The frequency spectrum characteristics of the wave-cutoff probe will be obtained experimentally and analyzed through the microwave field simulation by using the CST-MW studio simulator. The plasma parameters are measured with the wave-cutoff method in various discharge conditions and its results will be compared with the results of Langmuir probe. Another disadvantage is that other diagnostic methods spend a long time (~ a few seconds) to measure plasma parameters. In this presentation, a fast measurement method will be also introduced. The wave-cutoff probe system consists of two antennas and a network analyzer. The network analyzer provides the transmission spectrum and the reflection spectrum by frequency sweeping. The plasma parameters such as electron density and electron temperature are obtained through these spectra. The frequency sweeping time, the time resolution of the wave-cutoff method, is about 1 second. A short pulse with a broad band spectrum of a few GHz is used with an oscilloscope to acquire the spectra data in a short time. The data acquisition time can be reduced with this method. Here, the plasma parameter measurement methods, Langmuir probe, pulsed wave-cutoff method and frequency sweeping wave-cutoff method, are compared. The measurement results are well matched. The real time resolution is less than 1 ?sec. The pulsed wave-cutoff technique is found to be very useful in the transient plasmas such as pulsed plasma and tokamak edge plasma.

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Cutoff Probe Analysis and Improvement

  • Kim, Dae-Ung;Yu, Sin-Jae;Yu, Gwang-Ho;Park, Min;Kim, Jeong-Hyeong;Seong, Dae-Jin;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.142-142
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    • 2011
  • Microwave diagnostics method for plasma science and engineering is vigorous research area for its good characteristics such as high sensitivity, reliability, and broad measurement spectrum from low density plasma to high density. We investigate mechanism of microwave probes (hairpin, impedance and absorbtionf probe) and apply it for interpretation of full transmitted spectrum of cutoff probe. Mechanism of the spectrum having same key roles of I-V curve of Langmuir probe is not exactly revealed yet in spite of its importance. This study elucidates physics behind it using a circuit model and E/M wave simulation. Circuit model reveals exact cut-off peak frequency taking account of a collision frequency and a plasma frequency and it enable precise diagnostics of plasma densty from low pressure to high pressre. Cut-off like peaks have been obstacle for choosing cut-off peak is analyzed by E/M simulation and one of cutoff like peaks made by probe holder used for acquire plasma density with cutoff peak applying the hairpin relation. Furthermore, phase difference method for plasma density is conducted. This method uses a single microwave frequency source and it is low-priced.

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Experimental Research of an ECR Heating with R-wave in a Helicon Plasma Source

  • Ku, Dong-Jin;An, C.Y.;Park, Min;Kim, S.H.;Wang, S.J.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.274-274
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    • 2012
  • We have researched on controlling an electron temperature and a plasma collision frequency to study the effect of collisions on helicon plasmas. So, we have designed and constructed an electron cyclotron resonance (ECR) heating system in the helicon device as an auxiliary heating source. Since then, we have tried to optimize experimental designs such as a magnetic field configuration for ECR heating and 2.45GHz microwave launching system for its power transfer to the plasma effectively, and have characterized plasma parameters using a Langmuir probe. For improving an efficiency of the ECR heating with R-wave in the helicon plasma, we would understand an effect of R-wave propagation with ECR heating in the helicon plasma, because the efficiency of ECR heating with R-wave depends on some factors such as electron temperature, electron density, and magnetic field gradient. Firstly, we calculate the effect of R-wave propagation into the ECR zone in the plasma with those factors. We modify the magnetic field configuration and this system for the effective ECR heating in the plasma. Finally, after optimizing this system, the plasma parameters such as electron temperature and electron density are characterized by a RF compensated Langmuir probe.

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