• Title/Summary/Keyword: LaAlO$_3$

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Formation of La-$\beta$-Aluminate in $\alpha$-Alumina Matrix and Its Influence on Mechanical Properties (La-$\beta$-Aluminate의 형성이 $\alpha$-Alumina의 기계적 성질에 미치는 영향)

  • 강석원;고재웅;김해두
    • Journal of the Korean Ceramic Society
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    • v.29 no.1
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    • pp.23-28
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    • 1992
  • Alumina ceramics was reinforced by in-situ formation of La-${\beta}$-aluminate in ${\alpha}$-alumina matrix. The powder mixture of which composition is (100-12x)Al2O3+x(La2O3+11Al2O3) was prepared for the formation of La-${\beta}$-aluminate in ${\alpha}$-alumina matrix. The amount of La-${\beta}$-aluminate in the matrix was controlled by varing x which is number of moles. The dense composite was produced by sintering at 1600$^{\circ}C$ in air or hot-pressing at 1550$^{\circ}C$ under 30 MPa. Bending strength and fracture toughness were increased, resulting from the grain growth inhibition and the crack deflection and crack bridging mechanism when La-${\beta}$-aluminate was produced in ${\alpha}$-alumina matrix.

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Effect of La and Si Addition on Thermal Stabilization of Alumina (La 및 Si 첨가에 의한 알루미나의 열안정화 효과)

  • Lee, Chae-Hyun;Lim, Dae-Young;Kim, Jong-Ock;Seo, Doo-Won;Han, Moon-Hee
    • The Journal of Engineering Research
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    • v.3 no.1
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    • pp.215-222
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    • 1998
  • The effect of La and Si addition of the thermal stabilization of $\gamma-alumina$ powers have been studied. Reagent grade $La(NO_3)_3{\cdot}6H_2O$ and $Si(OC_2H_5)_4$ were used as starting materials. These additives were introduced by wet impregnation method. Both La and Si additives suppressed the sintering of alumina and were found to be good thermal stabilizers of $\gamma-alumina$. Especially, Si drastically suppressed the phase transition of alumina at high temperatures. The major mechanisms for the thermal stabilization of alumina were seemed to be new phase formation and retardation of surface diffusion by addition of La or Si into alumina matrix.

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A Study on the Electrical Properties of Al2O3/La2O3/Al2O3 Multi-Stacked Films Using Tunnel Oxide Annealed at Various Temperatures

  • Kim, Hyo-June;Cha, Seung-Yong;Choi, Doo-Jin
    • Journal of the Korean Ceramic Society
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    • v.46 no.4
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    • pp.436-440
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    • 2009
  • The structural and electrical properties of $Al_2O_3/La_2O_3/Al_2O_3$ (ALA) films using a tunnel oxide annealed at various temperatures were investigated. The program/erase properties of the ALA films using the tunnel oxide annealed at $600^{\circ}C$ were superior to others. The program/erase voltage and time of the ALA films using the tunnel oxide annealed at $600^{\circ}C$ were 11 V for 10 ms (program) and -11 V for 100 ms (erase), respectively, and the corresponding memory window was about 1.59 V. In the retention test, the $V_{th}$ distributions of all films were not changed up to about $10^4$ cycles. In this study, all data showed sufficient characteristics to be used in flash memory devices.

Photoluminescence properties of oxy-fluoride glass-ceramics of La2O3-CaF2-Al2O3-SiO2 system (La2O3-CaF2-Al2O3-SiO2 계 oxy-fluoride 결정화 유리의 광 발광 특성)

  • Ha, Taewan;Kang, Seunggu
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.31 no.2
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    • pp.84-88
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    • 2021
  • The change of the photoluminescence properties of La2O3-CaF2-Al2O3-SiO2 glass-ceramics doped with rare earth material, that is used as laser and optical sensors, was analyzed according to heat treatment temperature. The heat treatment conditions for fabricating glass-ceramics were obtained through non-isothermal thermal analysis, and X-ray diffraction analysis was performed to determine the degree of crystal growth and kinds of crystal phases generated according to the heat treatment temperature. Using Scherrer's equation, it was predicted that crystals with a size of 25~40 nm would be generated inside the glass-ceramics. Photoluminescence (PL) analysis showed that the specimens heat-treated at 660℃ to 670℃ for 1 hour had the highest PL intensity. Also, from the CIE color coordinate analysis, all glass-ceramics specimens emitted red-orange light regardless of the heat treatment condition.

Electrode Dependence of Asymmetric Behavior of (La,Sr)CoO₃/Pb(Zr,Ti)O₃/(La,Sr)CoO₃ Thin Film Capacitors ((La,Sr)CoO₃/Pb(Zr,Ti)O₃/(La,Sr)CoO₃박막 캐패시터의 비대칭성의 전극 의존성)

  • 최치홍;이재찬;박배호;노태원
    • Journal of the Korean Ceramic Society
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    • v.35 no.7
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    • pp.647-647
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    • 1998
  • (La,Sr)CoO3/Pb(Zr,Ti)O3/(La,Sr)CoO3 (LSCO) heterostructures have been grown on LaAlO3 substrates by pulsed laser deposition (PLD) to investigate asymmetric polarization of Pb(Zr,Ti)O3 (PZT) thin flims with different electrode configuration. P-V hysteresis loop of LSCO/PZT/LSCO was symmetric. However, LaCoO3 (LCO_/PZT/LSCO showed a largely asymmetric P-V hystersis loop and large relaxation of the remanent polarization at the negatively poled state, which means that the negatively poled state was unstable. On the other hand, LSCO/PZT/LCO exhibited large relaxation of the positively poled state. The asymmetric behavior of the polarized states implies the presence of an interal electric firld inside the PZT layer. It is suggested that internal electric field is caused by built-in voltages at LCO/PZT and LSCO/PZT interfaces. The built-in voltages at LCO/PZT and CSCO/PZT interfaces were 0.6 V and -0.12 V, respectively.

Effect of Substrates on Structural and Electrical Properties of Chemical Solution Derived LaNiO3 thin Films

  • Lee, Hyung-Min;Hwang, Kyu-Seog;Lee, Kyong-Moo;Kim, Byung-Hoon
    • The Korean Journal of Ceramics
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    • v.4 no.3
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    • pp.231-234
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    • 1998
  • LaNiO3 thin films were fabricated on various substrates by spin-coating technique using metal naphthenates as starting materials. Highly-oriented LaNiO3 films with smooth and crack-free surfaces were grown on SrTiO3 (100) and LaAlO3(100) substrates, while films on MgO(100) and Si(100) substrates showed random orientation. In this study, we concluded that lattice-mismatches between LaNiO3 films and substrates used affect film's properties.

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