• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.367-369
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• 2009

Optically anisotropic rotating balls were disposed in a monolayer, and controllably closely packed with respect to one another in the monolayer. The close packed monolayer configuration provided high brightness and improved contrast. The monolayer rotating ball display (MRB) electrically demonstrated a fast response time of approximately 40 msec at a voltage of 30 V. Measurements of the rotation as a function of voltage led to surface charge density for the balls in the range of 3-4 ${\mu}C/m^2$.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.431-434
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• 2007

Rapid progress has been made in the development of commercially viable Light Emitting Polymer (LEP) materials for display and lighting applications. This presentation will focus on: ${\bullet}$ Degradation studies that have led to the design of new and improved materials ${\bullet}$ Recent lifetime and efficiency results for red, green, blue, and white polymers ${\bullet}$ Challenges of formulating inks that can be used in a production environment

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.501-504
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• 2006

The Process technology for uniform SLS poly-Si and performance enhancement of furnace activated poly-Si TFTs are reported. By strictly optimizing SLS optics, threshold voltage variation in pixel TFTs was remarkably decreased and the non-uniformity such as SLS shot mark was removed. Optimized doping process for low sheet resistance and passivation annealing are critical for the enhancement of device performances.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.198-201
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• 2006

The optimization of poly-Si TFT process on metal foil for UTL AMOLED was systematically investigated. The improvement in device performance of poly-Si TFT on metal foil was achieved by optimizing the dopant activation condition and gate dielectric structure. Hence, the world first flexible full color 5.6-inch AMOLED with top emission mode on poly-Si TFT stainless steel foil is demonstrated.

• Proceedings of the Korean Radioactive Waste Society Conference
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• 2017.10a
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• pp.225-226
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• 2017

• Proceedings of the Korean Radioactive Waste Society Conference
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• 2017.05a
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• pp.346-347
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• 2017

• Proceedings of the Korean Nuclear Society Conference
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• 2004.10a
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• pp.1403-1404
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• 2004

• Journal of Information Display
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• v.11 no.2
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• pp.49-51
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• 2010

Nanoimprint lithography (NIL) using ultraviolet (UV) rays is a technique in which unconventional lithographic patterns are formed on a substrate by curing a suitable liquid resist in contact with a transparent patterned mold, then releasing the freshly patterned material. Here, various solutions are introduced to achieve sufficient overlay accuracy and to overcome the technical challenges in resist patterning via UV imprinting. Moreover, resist patterning of all the layers in TFT and of the BM layer in CF was carried out using UV imprinting lithography to come up with a 12.1-inch TFT-LCD panel with a resolution of $1280{\times}800$ lines (125 ppi).

• Proceedings of the Korean Magnestics Society Conference
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• 2007.05a
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• pp.61.2-61.2
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• 2007

• Bulletin of the Korean Chemical Society
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• v.27 no.7
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• pp.1075-1078
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• 2006