• Title/Summary/Keyword: LG필립스

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회원사소식

  • Korea Electronics Association
    • Journal of Korean Electronics
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    • v.26 no.5
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    • pp.37-40
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    • 2006
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파주, 최첨단 기업 도시로 변신을 꿈꾸다

  • Lee, Eun-Suk
    • 주택과사람들
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    • s.190
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    • pp.64-69
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    • 2006
  • 한동안 잠잠했던 파주 부동산 시장이 또다시 들썩이고 있다. 이는 운정 2지구 보상을앞두고 대토 문의가 많아지면서 토지 가격이 상승하는 데다 개성공단 등 대북 관문 지역이라는 점 등이 호재로 작용했기 때문이다. 경의선 복선 전철화와 LG 필립스 LCD 산업단지라는 굵직한 호재를 눈앞에 둔 개발의 파고 현장, 파주에 다녀왔다.

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The progress in NF3 destruction efficiencies of electrically heated scrubbers (전기가열방식 스크러버의 NF3 제거 효율)

  • Moon, Dong Min;Lee, Jin Bok;Lee, Jee-Yon;Kim, Dong Hyun;Lee, Suk Hyun;Lee, Myung Gyu;Kim, Jin Seog
    • Analytical Science and Technology
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    • v.19 no.6
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    • pp.535-543
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    • 2006
  • Being used widely in semiconductor and display manufacturing, $NF_3$ is internationally considered as one of the regulated compounds in emission. Numerous companies have been continuously trying to reduce the emissions of $NF_3$ to comply with the global environmental regulation. This work is made to report the destruction and removal efficiency (DRE) of electrically heated scrubbers and the use rate in process chambers installed in three main LCD manufacturing companies in Korea. As the measurement techniques for $NF_3$ emission, mass flow controlled helium gas was continuously supplied into the equipment by which scrubber efficiency is being measured. The partial pressures of $NF_3$ and helium were accurately measured for each sample using a mass spectrometer, as it is emitted from inlet and outlet of the scrubber system. The results show that the DRE value for electrically heated scrubbers installed before 2004 is less than 52 %, while that for the new scrubbers modified based on measurement by scrubber manufacturer has been sigificentely improved upto more than 95 %. In additon, we have confirmed the efficiency depends on such variables as the inlet gas flow rate, water content, heater temperature, and preventative management period. The use rates of $NF_3$ in process chambers were also affected by the process type. The use rate of radio frequency source chambers, built in the $1^{st}$ and $2^{nd}$ generation process lines, was determined to be less than 75 %. In addition, that of remote plasma source chambers for the $3^{rd}$ generation was measured to be aboove 95 %. Therefore, the combined application of improved scrubber and the RPSC process chamber to the semiconductor and display process can reduce $NF_3$ emmision by 99.95 %. It is optimistic that the mission for the reduction of greenhouse gas emission can be realized in these LCD manufacturing companies in Korea.