• Title/Summary/Keyword: KWON-GA

검색결과 488건 처리시간 0.03초

<황강구곡가>의 창작 배경 및 구성 방식 (Background of creation and composing method in )

  • 장정수
    • 한국시조학회지:시조학논총
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    • 제21집
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    • pp.241-269
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    • 2004
  • 본고의 목적은 <황강구곡가>의 창작 배경과 구성 방식, 내용상의 특성을 규명하는 것이다. <황강구곡가>는 권상하의 유풍이 쇠미해지기 시작하는 시기에, 구곡가의 전승을 통해 기호학파의 도맥을 재확인하고 백부인 권상하를 추숭하고자 하는 의도에서 옥소 권섭이 창작한 작품이다. 따라서 이작품은 각 승경처를 권상하의 삶의 궤적과 연관지어 서술하는 회고의 방식으로 구성되었다. 이 작품에는 권상하의 도학자적 삶이 직접적으로 드러나지 않는다. 권상하가 은거했던 황강 구곡은 선경(仙境)으로, 그의 삶은 신선적 풍류로 그려냄으로써 간접적으로 입증하였다. 이러한 구성 방식과 자연에 대한 인식 태도를 통해 볼 때 <황강구곡가>는 권상하를 위해 창작된 작품이지만 권섭의 의식 세계를 표출하고 있으며, 그의 작품 세계와 연장선에 놓여 있음을 알 수 있다.

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Design and Analysis of Gate-recessed AlGaN/GaN Fin-type Field-Effect Transistor

  • Jang, Young In;Seo, Jae Hwa;Yoon, Young Jun;Eun, Hye Rim;Kwon, Ra Hee;Lee, Jung-Hee;Kwon, Hyuck-In;Kang, In Man
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제15권5호
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    • pp.554-562
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    • 2015
  • This paper presents the design and analysis of gate-recessed AlGaN/GaN Fin-type Field-Effect Transistor (FinFET). The three-dimensional (3-D) technology computer-aided design (TCAD) simulations were performed to analyze the direct-current (DC) and radio-frequency (RF) characteristics for AlGaN/GaN FinFETs. The fin width ($W_{fin}$) and the height of GaN layer ($H_{GaN}$) are the design parameters used to improve the electrical performances of gate-recessed AlGaN/GaN FinFET.

레이저 CVD를 이용한 GaAs/GaAs 및 GaAs/Si 결정성장연구 (Epitaxial Growth of GaAs/GaAs and GaAs/Si by LCVD)

  • 최웅림;구자강;정진욱;권오대
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1989년도 추계학술대회 논문집 학회본부
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    • pp.79-82
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    • 1989
  • We studied the epitaxial growth of GaAs/GaAs and GaAs/Si by Laser CVD with 193nm ArF pulsed excimer laser. The source gases of TMGa and AsC13 or TMGa-TMAs adducts are mixed with H2, and photolyzed above the substrate which is heated up to around 300$^{\circ}C$. Then the photolyzed atoms are deposited on the silicon or GaAs substrate. The deposited films are analyzed with ESKA depth profiling and X-ray differaction method, which shows that the films on Si and GaAs are stoichiometric and crystalized at such a low temperature. We show a clear evidence for the epitaxial growth of GaAs on Si or GaAs on GaAs at low temperature by excimer laser CVD.

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스트라이프 구조 GaAs-(Ga, Al)As 반도체 레이저의 횡모우드에 대한 경계치 해석 (A Boundary Value Solution For The Lateral Modes Of Stripe Geometry GaAs-(Ga,Al)As Lasers)

  • 윤종욱;윤석범;권재상;오환술;김영권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(I)
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    • pp.34-37
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    • 1987
  • Theoretical calculations are presented for analying lateral modes of stripe geometry lasers. The solution technique affords a matching between the fields of the active layer and those of the surrounding passive layer. The fields are written as a liner combination of Hermite-Gaussian function. Therefore fields have been described with a single H - G function. The lowest-order mode spreading is calculated and related to the gain distribution.

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차세대 GaN 고주파 고출력 전력증폭기 기술동향 (Technical Trends of Next-Generation GaN Power Amplifier for High-frequency and High-power)

  • 이상흥;김성일;민병규;임종원;권용환;남은수
    • 전자통신동향분석
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    • 제29권6호
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    • pp.1-13
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    • 2014
  • GaN(Gallium Nitride)는 3.4eV의 넓은 에너지 갭으로 인하여 고전압에서 동작이 가능하고, 분극전하를 이용한 캐리어 농도가 높아 높은 전류밀도와 전력밀도를 얻을 수 있으며, 높은 전자 이동도와 포화 속도로부터 고속 동작이 가능하여 고주파 고출력 고효율 소형의 전력증폭기 소자의 재료로 적합하다. 본고에서는 민수 및 군수 겸용 Ku-대역 및 Ka-대역 GaN 고출력 전력증폭기(SSPA: Solid-State Power Amplifier)와 관련된 GaN 전력증폭 소자, GaN 전력증폭기 MMIC(Microwave Monolithic Integrated Circuit), 내부정합 패키지형 GaN 전력증폭기 및 GaN SSPA에 대하여, 국내외 특허 기술동향과 연구개발 기술동향을 중심으로 고찰하고자 한다. 국외의 GaN 고주파 고출력 전력증폭기 기술의 연구동향이나 특허동향을 심층분석하여 연구개발에 활용하고자 한다.

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Investigation of Buffer Traps in AlGaN/GaN Heterostructure Field-Effect Transistors Using a Simple Test Structure

  • Jang, Seung Yup;Shin, Jong-Hoon;Hwang, Eu Jin;Choi, Hyo-Seung;Jeong, Hun;Song, Sang-Hun;Kwon, Hyuck-In
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제14권4호
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    • pp.478-483
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    • 2014
  • We propose a new method which can extract the information about the electronic traps in the semi-insulating GaN buffer of AlGaN/GaN heterostructure field-effect transistors (HFETs) using a simple test structure. The proposed method has a merit in the easiness of fabricating the test structure. Moreover, the electric fields inside the test structure are very similar to those inside the actual transistor, so that we can extract the information of bulk traps which directly affect the current collapse behaviors of AlGaN/GaN HEFTs. By applying the proposed method to the GaN buffer structures with various unintentionally doped GaN channel thicknesses, we conclude that the incorporated carbon into the GaN back barrier layer is the dominant origin of the bulk trap which affects the current collapse behaviors of AlGaN/GaN HEFTs.

다비 밀식 재배에서 Anti-GA에 의한 벼의 영양생장 조절과 그에 따른 수량 변화 I. 재식밀도에 따른 Anti-GA가 벼의 생육에 미치는 영향 (Modulation of vegetative growth of rice under the high nitrogen and planting density with a Anti-GA for breaking yield-ceiling I. Effect of Anti-GA on the growth and yield of rice under planting density)

  • 임재석;권용웅
    • 한국작물학회:학술대회논문집
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    • 한국작물학회 1992년도 춘계 학술대회지
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    • pp.50-51
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    • 1992
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다비 밀식 재배에서 Anti-GA에 의한 벼의 영양생장 조절과 그에 따른 수량 변화 II. 질소 시비량에 따른 Anti-GA가 벼의 생육에 미치는 영향 (Modulation of vegetative growth of rice under th high nitrogen and planting density with a Anti-GA for breading yield-ceiling II. Effect of Anti-GA on the growth and yield of rice under nitrogen levels)

  • 임재석;권용웅
    • 한국작물학회:학술대회논문집
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    • 한국작물학회 1992년도 춘계 학술대회지
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    • pp.52-53
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    • 1992
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Composition and interface quality control of AlGaN/GaN heterostructure and their 2DEG transport properties

  • Kee, Bong;Kim, H.J.;Na, H.S.;Kwon, S.Y.;Lim, S.K.;Yoon, Eui-Joon
    • Journal of Korean Vacuum Science & Technology
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    • 제4권3호
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    • pp.81-85
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    • 2000
  • The effects of $NH_3$ flow rate and reactor pressure on Al composition and the interface of AlGaN/GaN heterostructure were studied. Equilibrium partial pressure of Ga and Al over AiGaN alloy was calculated as a function of growth pressure, $NH_3$flow rate and temperature. It was found equilbrium vapor pressure of Al is significantly lower than that of Ga, thus, the alloy composition mainly controlled by Ga partial pressure. We believe that more decomposition of Ga occur at lower $NH_3$ flow rate and higher growth pressure leads to preferred Al incorporation into AlGaN. The alloy composition gradient became larger at AlGaN/GaN heterointerface at higher reactor pressures, higher Al composition and low $NH_3$ flow rate. This composition gradient lowered sheet carrier concentration and electron mobility as well. We obtained an AlGaN/GaN heterostructure with sheet carrier density of ${\sim}2{\times}10^{13}cm^{-2}$ and mobility of 1250 and 5000 $cm^2$/Vs at 300 K and 100 K, respectively.

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유전 알고리즘을 이용한 공력 형상 최적화 연구 (Study of Aerodynamic Design Optimization Using Genetic Algorithm)

  • 김수환;권장혁
    • 한국전산유체공학회지
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    • 제6권3호
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    • pp.10-18
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    • 2001
  • Genetic Algorithm(GA) is applied to aerodynamic shape optimization and demonstrated its merits in global searching ability and the independency of differentiability. However, applications of GA are limited due to slow convergence rate, premature termination, and high computing costs. The present aerodynamic designs such as wing shape optimizations using GA have seldom been applied because of high computing costs. This paper has two objects; improvement of the efficiency of GA and application of GA into aerodynamic shape optimization for 2D and 3D wings. The study indicates that GA can be applied to aerodynamic design and its performance is comparable to traditional design methods.

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