• Membrane Journal
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• v.31 no.4
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• pp.275-281
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• 2021

To evaluate the possibility as a separator in alkaline water electrolysis, the thermal stability, ion conductivity and durability of 5 commercially available anion exchange membranes were tested. The thermal stability of FAAM-PK-75 and FAAM-40 membrane analyzed by thermo-gravimetric analysis (TGA) showed good performance compared to the other three types of AEM, AHO, and AHA membrane. The ion conductivity of AEM membrane measured in 7 M KOH solution at 25℃ and 80℃ had a higher value of about 4~17 times compared to the other membranes. The durability of FAAM-PK-75 tested in 7 M KOH solution at 25℃ was high compared to the other membranes.

• Elastomers and Composites
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• v.14 no.4
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• pp.231-252
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• 1979

Polymerization of 2-pyrrolidone was carried out through anionic mechanism using $SO_2/KOH$ as catalyst. The effects of KOH concentration, $SO_2/KOH$ mole ratio and temperature on polymerization were investigated. The conversion and viscosity of polymers were measured at various polymerization conditions. It was observed that as the concentration of KOH was increased, equilibrium conversion was also increased. It was, however, found that after the concentration of KOH was reached above 8 mole percent, the equilibrium conversion was decreased. The highest rate of polymerization and maximum conversion were obtained when $SO_2/KOH$ mole ratio was around 0.5. It was also found that the rate of polymerization and the equilibrium conversion were higher at $50^{\circ}C$. than at $30^{\circ}C$. but the viscosity of polymer solution at $50^{\circ}C$. was not so high as expected. The rate constant, $K_p$ of polymerization, was determined by least square method: the value of $K_p$ was observed as 16 liter/mole hour at $50^{\circ}C$. and 2.6 liter/mole hour at $30^{\circ}C$., respectively. The mechanism of polymerization was also discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.299.2-299.2
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• 2013

We investigated the potassium remaining on a crystalline silicon solar cell after potassium hydroxide (KOH) etching and its effect on the lifetime of the solar cell. KOH etching is generally used to remove the saw damage caused by cutting a Si ingot; it can also be used to etch the rear side of a textured crystalline silicon solar cell before atomic layer-deposited Al2O3 growth. However, the potassium remaining after KOH etching is known to be detrimental to the efficiency of Si solar cells. In this study, we etched a crystalline silicon solar cell in three ways in order to determine the effect of the potassium remnant on the efficiency of Si solar cells. After KOH etching, KOH and tetramethylammonium hydroxide (TMAH) were used to etch the rear side of a crystalline silicon solar cell. To passivate the rear side, an Al2O3 layer was deposited by atomic layer deposition (ALD). After ALD Al2O3 growth on the KOH-etched Si surface, we measured the lifetime of the solar cell by quasi steady-state photoconductance (QSSPC, Sinton WCT-120) to analyze how effectively the Al2O3 layer passivated the interface of the Al2O3 layer and the Si surface. Secondary ion mass spectroscopy (SIMS) was also used to measure how much potassium remained on the surface of the Si wafer and at the interface of the Al2O3 layer and the Si surface after KOH etching and wet cleaning.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.123-124
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• 2006

본 연구에서는 KOH 용액을 사용한 Si 습식 이방성 식각실험 진행 후, 나타나는 표면의 거친 현상을 완화하는 데에 중점을 두고 연구를 진행하였다. 이를 위해 $SiO_2$ 웨이퍼 위에 Photo-lithography 공정으로 형성시킨 PMER 패턴을 Mask로 사용하여 HF 용액으로 $SiO_2$를 식각시켰으며, 형성된 $SiO_2$를 Mask로 사용하여 KOH 용액으로 Si을 식각시켰다. 이 때, KOH와 혼합하는 용액으로 IPA와 Ethan이을 각각 사용하여 실험을 진행하였으며, ESEM을 이용하여 표면을 비교하였다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.4 no.3
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• pp.223-229
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• 1994

$KTP(KTiOPO_4)$ single crystals have been hydrothermally grown in KOH solutions. Properties and Raman spectra of grown crystal were investigated. The most effective solvents for the crystal growth of KTP were KOH and KF solutions. In this study, the properties of KTP single crystals grown hydrothermally at $500^{\circ}C$ in 9 m KOH solution were measured. The following results were obtained : lattice parameters ; a=1.281 nm and c=1.058 nm, density ; $2.94 g/cm^3$, Vickers hardness ; $562kg/cm^2$, refractive indices ; $n_e=1.740$ and $n_e= 1.747.$ And Raman spectra of hydrothermal growth KTP single crystal have been investigated at room temperature under atmospheric pressure. As a result, the $A_1$ modes agree very well with KTP single crystal of high temperatures solution growth but the behavior of $B_2$ modes were slightly different.

• New & Renewable Energy
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• v.5 no.1
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• pp.26-31
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• 2009

The surface etching characteristics of single crystalline silicon wafer were investigated using potassium hydroxide (KOH) and tetramethylammonium hydroxide (TMAH). The saw damage layer was removed after 10min by KOH 45wt% solution at $80^{\circ}C$. The wafer etched at high temperature ($90^{\circ}C$) and in low concentration (4wt%) of TMAH solution showed an increased etch rate of silicon wafer and wavy patterns on the surface. Especially, pyramidal textures were formed in 4wt% TMAH solution without alcohol additives.

• Transactions of the Korean hydrogen and new energy society
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• v.23 no.2
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• pp.117-124
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• 2012

Alkaline electrolysis needs the electrode having a low overvoltage and good corrosion resistance in alkaline solution such as KOH and NaOH, for the oxygen and hydrogen production. The commercial materials such as SUS(stainless steel)-316, Ni and NiFe were evaluated for the electrode in alkaline electrolysis. The test solution for the alkaline electrolysis used 1~9M NaOH and 1~9M KOH. The voltage increased with an increase of current density in each solution. As for the 15wt.% (about 5M) NaOH, the voltage of the tested electrode under the current density of 1.8A/$cm^2$ showed the almost same value. The voltage over the current density of 1.8A/$cm^2$ deceased in the order: Ni${\fallingdotseq}$NiFe$cm^2$ showed the almost same value. The voltage over the current density of 1.8A/$cm^2$ deceased in the order: NiFe${\fallingdotseq}$SUS-316. From the results, it was estimated that NiFe and Ni was suitable as the electrode for the alkaline water electrolysis using NaOH and KOH electrolyte.

• Korean Journal of Materials Research
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• v.22 no.6
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• pp.321-327
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• 2012

The production of functional activated carbon materials starting from inexpensive natural precursors using environmentally friendly and economically effective processes has attracted much attention in the areas of material science and technology. In particular, the use of plant biomass to produce functional carbonaceous materials has attracted a great deal of attention in various aspects. In this study the preparation of activated carbon has been attempted from rice husks via a chemical activation-assisted microwave system. The rice husks were milled via attrition milling with aluminum balls, and then carbonized under purified $N_2$. The operational parameters including the activation agents, chemical impregnation weight ratio of the calcined rice husk to KOH (1:1, 1:2 and 1:4), microwave power heating within irradiation time (3-5 min), and the second activation process on the adsorption capability were investigated. Experimental results were investigated using XRD, FT-IR, and SEM. It was found that the BET surface area of activated carbons irrespective of the activation agent resulted in surface area. The activated carbons prepared by microwave heating with an activation process have higher surface area and larger average pore size than those prepared by activation without microwave heating when the ratio with KOH solution was the same. The activation time using microwave heating and the chemical impregnation ratio with KOH solution were varied to determine the optimal method for obtaining high surface area activated carbon (1505 $m^2$/g).

• Korean Journal of Materials Research
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• v.8 no.4
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• pp.368-374
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• 1998

The corrosion characteristics of zirconium alloys have been investigated in various aqueous solutions of LiOH. NaOH, KOH, RbOH. and CsOH at 3S$0^{\circ}C$. The concentrations of solutions were set to 4.3 mmol and 32.Smmol with equimolar $M^+$ and OH . The oxide characterization was performed using TEM on the samples corroded in 32. Smmol LiOH, NaOH, and KOH solution. The samples were prepared to have the same oxide thickness for the pretransition and post- transition regimes. Considering the trend of experimental data, the cation would playa major role in the corrosion process of Zr alloys in alkali hydroxide solutions. The microstructures of the oxides formed in various solutions were quite different. In LiOH solution the oxides grown in pre-transition as well as post-transition had the equiaxed structures with many pores and open grain boundaries. The oxides grown in NaOH solution had the protective columnar structures in pre-transition and the equiaxed structures with many open grain boundaries in post- transition. On the other hand. in KOH solution the columnar structure was maintained from pre- transition to post- transition. It was considered that the cation incorporation into zirconium oxide controlled the oxide characteristics and the corrosion acceleration in alkali hydroxide solutions.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.351-354
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• 2004

This work presents a simple and cost-effective approach for maskless fabrication of positive-tone silicon master for the replica molding of hyperfine elastomeric channel. Positive-tone silicon masters were fabricated by a maskless fabrication technique using the combination of nanoscratch by Nanoindenter ⓡ XP and XOH wet etching. Grooves were machined on a silicon surface coated with native oxide by ductile-regime nanoscratch, and they were etched in a 20 wt％ KOH solution. After the KOH etching process, positive-tone structures resulted because of the etch-mask effect of the amorphous oxide layer generated by nanoscratch. The size and shape of the positive-tone structures were controlled by varying the etching time (5, 15, 18, 20, 25, 30 min) and the normal loads (1, 5 mN) during nanoscratch. Moreover, the effects of the Berkovich tip alignment (0, 45$^{\circ}$) on the deformation behavior and etching characteristic of silicon material were investigated.