• Title/Summary/Keyword: Ion oxide

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Study on the Fabrication of Various AAO Membranes for the Application of Li-ion Battery Separator (다양한 형태의 AAO membrane 제조 및 리튬이온 전지의 분리막 응용 연구)

  • Kim, Moonsu;Lim, Kyungmin;Ha, Jaeyun;Kim, Yong-Tae;Choi, Jinsub
    • Journal of the Korean institute of surface engineering
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    • v.54 no.5
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    • pp.213-221
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    • 2021
  • In order to improve the energy density and safety of Li-ion batteries, the development of a separator with high thermal stability and electrolyte wettability is an important desire. Thus, the ceramic separator to replace the polymer type is one of the most promising materials that can prevent short-circuit caused by the formation of dendrite and thermal deformation. In this study, we introduce the fabrication of various anodic aluminum oxide membranes for the application of Li-ion battery separators with the advantages of improved mechanical/thermal stability, wettability, and a high rate of Li+ migration through the membrane. Two different types of through-holes and branched anodic aluminum oxide membranes are well used in lithium-ion battery separators, however, branched anodic aluminum oxide membranes exhibit the most improved performance with capacity (126.0 mAh g-1 @ 0.3C), capacity drop at the high C-rate (30.6 %), and low internal resistance (8.2 Ω).

Study on The Electrical Characteristics of Chromium Oxide Film Produced by ton Beam Sputter Deposition (이온선 스퍼터 증착법에 의하여 제초된 CrOX의 전기적 특성에 관한 연구)

  • 조남제;장문식;이규용
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.409-414
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    • 1999
  • The influence of ion beam energy and reactive oxygen partial pressure on the electrical and crystallographic characteristics of transition metal oxide compound(Cr0x) film was studied in this paper. Chromium oxide films were prepared onto the coverglass using Ion Beam Sputter Deposition(1BSD) technique according to the processing conditions of the partial pressure of reactive oxygen gas and ion beam energy. Crystallinity and grain size of as-deposited films were analyzed using XRD analysis. Thickness and Resistivity of the films were measured by $\alpha$-step and 4-point probe measurement. As results, according to the XRD, XPS and resistivity measurement, the deposited films were the cermet type films which has a crystal structure including amorphous oxide(a-oxide) phase and metal Cr phase simultaneously. The increasernent of the ion b m energy during the deposition process happened to decreasernent of metal Cr grain size and the rapid change of resistivity above the critical $O_2$ partial pressure.

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Improving the dielectric reliability using boron doping on solution-processed aluminum oxide

  • Kim, Hyunwoo;Lee, Nayoung;Choi, Byoungdeog
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.411.1-411.1
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    • 2016
  • In this study, we examined the effects of boron doping on the dielectric reliability of solution processed aluminum oxide ($Al_2O_3$). When boron is doped in aluminum oxide, the hysteresis reliability is improved from 0.5 to 0.4 V in comparison with the undoped aluminum oxide. And the accumulation capacitance is increased when boron was doped, which implying the reduction of the thickness of dielectric film. The improved dielectric reliability of boron-doped aluminum oxide is originated from the small ionic radius of boron ion and the stronger bonding strength between boron and oxygen ions than that of between aluminum and oxygen ions. Strong boron-oxygen ion bonding in aluminum oxide results dielectric film denser and thinner. The leakage current of aluminum oxide also reduced when boron was doped in aluminum oxide.

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Effect of Ar ion Sputtering on the Surface Electronic Structure of Indium Tin Oxide

  • Lee, Hyunbok;Cho, Sang Wan
    • Applied Science and Convergence Technology
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    • v.25 no.6
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    • pp.128-132
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    • 2016
  • We investigated the effect of Ar ion sputtering on the surface electronic structure of indium tin oxide (ITO) using X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS) measurements with increasing Ar ion sputtering time. XPS measurements revealed that surface contamination on ITO was rapidly removed by Ar ion sputtering for 10 s. UPS measurements showed that the work function of ITO increased by 0.2 eV after Ar ion sputtering for 10 s. This increase in work function was attributed to the removal of surface contamination, which formed a positive interface dipole relative to the ITO substrate. However, further Ar ion sputtering did not change the work function of ITO although the surface stoichiometry of ITO did change. Therefore, removing the surface contamination is critical for increasing the work function of ITO, and Ar ion sputtering for a short time (about 10 s) can efficiently remove surface contamination.

Intercalation Voltage and Lithium Ion Conduction in Lithium Cobalt Oxide Cathode for Lithium Ion Battery (리튬 이온 전지용 리튬 코발트 산화물 양극에서의 삽입 전압과 리튬 이온 전도)

  • Kim, Dae-Hyun;Kim, Dae-Hee;Seo, Hwa-Il;Kim, Yeong-Cheol
    • Journal of the Korean Electrochemical Society
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    • v.13 no.4
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    • pp.290-294
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    • 2010
  • We performed a density functional theory study to investigate the intercalation voltage and lithium ion conduction in lithium cobalt oxide for lithium ion battery as a function of the lithium concentration. There were two methods for the intercalation of lithium ions; the intercalation of a lithium ion at a time in the individual layer and the intercalation of lithium ions in all the sites of one layer after all the sites of another layer. The average intercalation voltage was the same value, 3.48 V. However, we found the former method was more favorable than the latter method. The lattice parameter c was increased as the increase of the lithium concentration in the range of x < 0.25 while it was decreased as increase of the lithium concentration in the range of x > 0.25. The energy barrier for the conduction of lithium ion in lithium cobalt oxide was increased as the lithium concentration was increased. We demonstrated that the decrease of the intercalation voltage and increase of the energy barrier as the increase of the lithium concentration caused lower output voltage during the discharge of the lithium ion battery.

Characteristics of the NO/$N_2O$ Nitrided Oxide and Reoxidized Nitrided Oxide for NVSM (비휘발성 기억소자를 위한 NO/$N_2O$ 질화산화막과 재산화 질화산화막의 특성에 관한 연구)

  • 이상은;서춘원;서광열
    • Journal of the Korean Vacuum Society
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    • v.10 no.3
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    • pp.328-334
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    • 2001
  • The characteristics of $NO/N_2O$ nitrided oxide and reoxidized nitrided oxide being studied as super thin gate oxide and gate dielectric layers of nonvolatile semiconductor memory(NVSM) was investigated by dynamic secondary ion mass spectrometry(D-SMS), time-of-flight secondary ion mass spectrometry(ToF-SIMS), and x-ray photoelectron spectroscopy (XPS). The specimen was annealed in $NO/N_2O$ ambient after initial oxide process. The result of D-SIMS exhibits that the center of nitrogen exists at the initial oxide interface and the distribution of nitrogen is wider in the annealing process with $N_2O$ than with NO annealing process. For investigating the condition of nitrogen that exists within the nitrided oxide, ToF-SIMS and XPS analysis were carried out. It was shown that the center of nitrogen investigated by D-SIMS was expected the SiON chemical bonds. The nitrogen near the newly formed reoxide/silicon substrate interface was appeared as $Si_2NO$ chemical bonds, and it is agreed with the distribution of SiN and $Si_2NO$ species by ToF-SIMS.

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Temperature cycling test of Cu films on anodized aluminum substrate of metal-PC application

  • Kim, Hyeong-Jin;Park, Jae-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.334-334
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    • 2011
  • We applied N-ion bombardment and heat treatment to the Cu thin films deposited on aluminum oxide layer for the enhancement of adhesion. With e-beam evaporation method. $1,000{\AA}$ thick Cu pre-bombardment layer was deposited on the aluminum oxide surface and then N-ion beam was bombared in order to mix the atoms at the film/substrate interface. Additional $4,000{\AA}$-thick Cu film was the coated. Subsequently, the ion mixide Cu on aluminum oxide was annealed at $200^{\circ}C$ and $300^{\circ}C$ in vacuum.

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Chromatographic Separation of Lithum Isotopes by Hydrous Managanese(Ⅳ) Oxide (가수된 산화 망간(Ⅳ)에 의한 리튬 동위원소의 크로마토그래피적 분리)

  • Kim, Dong Won
    • Journal of the Korean Chemical Society
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    • v.45 no.3
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    • pp.219-222
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    • 2001
  • Separation of lithium isotopes was investigated by chemical ion exchange with a hydrous manganese(IV) oxide ion exchanger using an elution chromatography. The capacity of manganese(IV) oxide ion exchanger was 0.5 meq/g. The heavier lithium isotope was enriched in the solution phase, while the lighter isotope was enriched in the ion exchanger phase. The separation factor was determined according to the method of Glueckauf from the elution curve and isotopic assays. The separation factor of $^6Li^+$-$^7Li^+$ isotope pair fractionation was 1.018.

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MO Studies on the Gas-Phase Reaction of Dypnone Oxide with Chloride Ion$^\dag$

  • Kim, Wang-Ki;Sohn, Chang-Kook;Lee, Ik-Choon
    • Bulletin of the Korean Chemical Society
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    • v.7 no.4
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    • pp.279-282
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    • 1986
  • The MNDO calculations were performed in order to investigate the gas-phase reaction mechanism of 2-propene-1-al oxide, as a model compound of dypnone oxide(1,3-diphenyl-2-butene-1-one oxide) with the chloride ion. Optimized geometries and heats of formation for two probable concerted pathways, CHO and H migration, were determined and their activation energies were obtained. MO results show that although the formyl migration is thermodynamically more favorable than the hydride migration, the latter kinetically predominates over the formyl migration, which is contrary to the established migrating preferences. It is concluded that the hydride migratory propensity is catalyzed by the chloride ion by reducing the capability of the carbonyl ${\pi}$ bond to participate in the migration.

Homogeneous Alignment Characteristics of Liquid Crystal Molecules on Solution-Derived Lanthanum Zinc Oxide Film with Ion-Beam Irradiation (이온빔 조사된 용액 공정 기반 LaZnO 박막 위 액정 분자의 수평 배향 특성)

  • Oh, Byeong-Yun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.5
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    • pp.382-386
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    • 2019
  • The alignment characteristics of liquid crystal (LC) molecules on a solution-derived lanthanum zinc oxide (LZO) film under ion-beam irradiation were demonstrated. Using the solution process, an LZO film was fabricated on the glass substrate and cured at $100^{\circ}C$. Afterwards, ion-beam irradiation was performed following the LC alignment method. Using this film, an LC cell was fabricated and the characteristics of the LC alignment were verified. Cross polarizing microscopy and the crystal rotation method were used to investigate the alignment state of the LC molecules on the LZO films. Furthermore, field emission scanning electron microscopy and X-ray photoelectron spectroscopy were used to explore the effect of the ion-beam irradiation on the LZO film. Through these, it was confirmed that the ion-beam irradiation induced surface modification, which demonstrated anisotropic physical and chemical surface characteristics. Due to this, uniform LC alignment was achieved. Finally, the residual DC and anchoring energy of the LC cell based on the LZO films were measured using a capacitance-voltage curve.