• Journal of Korean Vacuum Science & Technology
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• v.6 no.1
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• pp.16-21
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• 2002

Ti-0 film is a kind of biocompatible surface materials. In this paper, a new method, glow discharge plasma oxidizing, has been used in synthesizing Ti-O gradient films on Ti6A14V substrates. The effects of ion bombardment and process parameters on the structures of titanium oxide layers have been investigated. The results demonstrate that DC glow plasma oxidizing is more efficient in preparation of dense, hard, and high adhesive Ti-O biomedical films on titanium and its alloys. Samples treated by this method show higher hardness values than by others. Especially, in the condition of hollow cathode discharge, the ion bombardment enhances ionization of oxygen, promotes the oxygen permeation and facilitates the formation of the oxide of low valence states of titanium.

• Korean Journal of Materials Research
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• v.15 no.3
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• pp.209-215
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• 2005

Titanium dioxide films $(TiO_2)$ doped cobalt transition metal were prepared on titanium metal by water spray pyrolysis technique. Micro-morphology, crystalline structure, chemical composition and binding state of sample groups were evaluated using field emission scanning microscope(FE-SEM), X-ray diffractometer(XRD), Raman spectrometer, X-ray photoelectron spectrometer(XPS). $TiO_2$ films of rutile structure were predominately formed on all sample groups and $Ti_2O_3$ oxide was coexisted on the surface of cobalt doped-sample groups. The optical absorption peaks measured by using UV-VIS-NIR spectrophotometer were observed at specific wavelength region in sample groups doped cobalt ion. This result could be analyzed by introducing crystal field theory.

• Journal of Electrochemical Science and Technology
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• v.11 no.4
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• pp.399-405
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• 2020

Hollow copper oxide/multi-walled carbon nanotubes (CuO/MWCNT) composites were fabricated via an optimized infiltration-reduction-oxidation method, which is more facile and easy to control. The crystalline structure and morphology were characterized by X-ray diffraction (XRD), and transmission electron microscopy (TEM). The as-prepared CuO/MWCNT composites deliver an initial capacity of 612.3 mAh·g^-1 and with 80% capacity retention (488.2 mAh·g^-1) after 100 cycles at a current rate of 0.2 A·g^-1. The enhanced electrochemical performance is ascribed to the better electrical conductivity of MWCNT, the hollow structure of CuO particles, and the flexible structure of the CuO/MWCNT composites.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.10a
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• pp.59-63
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• 2000

BSCCO thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra-low growth rate, and sticking coefficients of the respective elements are evaluated. The sticking coefficient of Bi element exhibits a characteristic temperature dependence : almost a constant value of 0.49 below $730^{\circ}C$ and decreases linearly with temperature over $730^{\circ}C$ This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, $Bi_2O_3$, from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the Bi(2212) phase formation in the co-deposition process.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.30A no.6
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• pp.1-7
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• 1993

After the 1%S-Al metal is deposited, a thin oxide is formed thereon. Then, a single charged Argon(Ar$^{+}$) is ion implanted into the oxide layer, thereby causing the metal grain in the upper surface of the metal layer to become amorphous. Consequently, the grain size will be reduced and the rough surface of the metal layer flattened. However, the remainder of the metal layer beneath the upper surface thereof will still exhibit large grain size and low resistance, because the Argon ion is only implanted to characterized by a dual-sized grain structure which served to reduce interlayer stress, thereby decreasing the rate of stress migration, and to lower the resistivity of the metal line, thereby enhancing the electromigration characteristic thereof. Experiments have shown that the metal line exhibits a metal migration rate which is approximately 700% less than the control group and a standard deviation which is approximately 200% less than these group.p.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.361-364
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• 2000

Antimony doped tin oxide (ATO) thin films were deposited at room temperature by reactive ion-beam sputter deposition (IBSD) technique in oxidizing atmosphere utilizing Sb and Sn metal targets. Effect of Sb doping concentration, film thickness and heat treatment on electrical and optical properties was investigated. The thickness of as-deposited films was controlled approximately to 1500 $\AA$ or 2000$\AA$, and Sb concentration to 10.8 and 14.9 wt%, as determined by SEM and XPS analyses. Heat treatment was performed at the temperature from 40$0^{\circ}C$ to 80$0^{\circ}C$ in flowing $O_2$or forming gas. The resulting ATO films showed widely changing electrical resistivity and optical transmittance values in the visible spectrum depending on the composition, thickness and firing condition.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.1
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• pp.24-28
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• 2010

We have proposed an Buffer layer to improve the transmittance of ITO. Here, $SiO_2$ and $TiO_2$ were selected as the Buffer layer coating material. The structures of Buffer layer were designed in ITO/$SiO_2/TiO_2$/Glass and ITO/Glass/$TiO_2/SiO_2$. Then, these materials were deposited by ion-assisted deposition system. Transmittances of deposited ITO were 86.14 and 85.07%, respectively. These results show that the proposed structure has higher transmittance than the conventional ITO device.

• Food Science and Biotechnology
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• v.17 no.5
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• pp.1010-1015
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• 2008

The effects of heat treatment on the physicochemical properties and mineral composition of sun-dried salt were investigated. The salts parched at high temperature were appeared the higher alkalinity and the lower oxidation-reduction potential (ORP) than the samples without heat treatment. The commercial salts (bamboo salt and yellow loess salt) and the sun-dried salt parched at high temperature had relatively higher sodium ion content (418-450 ppm) compared to that (418.0 ppm) of refined salt. The increase of calcium ion occurred in the salts parched at high temperature compared to the sun-dried salt without heat treatment, but the magnesium ion was vice versa. The commercial salt, yellow loess salt had highest turbidity (0.973) whereas sun-dried salt showed lowest level (0.097) among the tested samples. Turbidity of heat treatment samples decreased as solubility increased. The maximum concentration of dialyzed salt was reached after 4 hr regardless of various processed salts, but those had no difference significantly among the tested samples. The X-ray diffraction patterns of the parched sun-dried salts showed different peak intensity with common salts, and they were similar to the patterns of oxide salts, especially MgO. The maximum value (2.56%) of MgO appeared in the sun-dried salt parched at $1,400^{\circ}C$.

• Proceedings of the Korean Radioactive Waste Society Conference
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• 2004.02a
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• pp.73-82
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• 2004

This paper studies the leaching behaviors of pyrochlore-rich synroc incorporated 46.8wt% simulated actinides waste under the five simulated geological disposal media, which included the bentonite, granite, granite ＋ ferroferric oxide, granite ＋ cement, bentonite ＋ ferroferric oxide, respectively. The mass loss rates reached to equilibrium after 182 day and was 10-7 g/$\textrm{mm}^2{\cdot}d$. That suggests the mass loss rate of pyrochlore-rich synroc, loaded 46.8wt% actinides waste, was very low. The surfaces of the leached specimens were analyzed by XRD, SEM/EDS. The experimental results show that the pyrochlore-rich synroc samples in the systems, which contained bentonite and cement, have two new phases formed on the leached specimens surface at $90^{\circ}C$ for 728d; The bentonite and cement can retard the elements leaching; $Fe_3O_4$ can speed the elements leaching; Expect for Ti ion depleted on the sample surface, other ion, such as U, Zr, AI, Ca, were in equable states and Ba ion was enriched during test time, which indicated the simulated disposal media have good ability to retard the leaching behavior of the pyrochlore-rich synroc.

• Transactions on Electrical and Electronic Materials
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• v.11 no.3
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• pp.116-119
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• 2010

The etching characteristics of zinc oxide (ZnO) were investigated, including the etch rate and the selectivity of ZnO in a $Cl_2/BCl_3$/Ar plasma. It was found that the ZnO etch rate, the RF power, and the gas pressure showed non-monotonic behaviors with an increasing Cl2 fraction in the $Cl_2/BCl_3$/Ar plasma, a gas mixture of $Cl_2$(3 sccm)/$BCl_3$(16 sccm)/Ar (4 sccm) resulted in a maximum ZnO etch rate of 53 nm/min and a maximum etch selectivity of 0.89 for ZnO/$SiO_2$. We used atomic force microscopy to determine the roughness of the surface. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the plasmas. Due to the relatively low volatility of the by-products formed during etching with $Cl_2/BCl_3$/Ar plasma, ion bombardment and physical sputtering were required to obtain the high ZnO etch rate. The chemical states of the etched surfaces were investigated using X-ray photoelectron spectroscopy (XPS). This data suggested that the ZnO etch mechanism was due to ion enhanced chemical etching.