• 핵의학기술
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• 제19권2호
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• pp.87-92
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• 2015

SPECT에서 Uniformity는 균일한 방사능을 갖는 선원에 대하여 균일한 영상을 제공하는 능력이다. 영상에서 다양한 이유로 불균일이 발생하게 되고, 불균일은 artifacts를 발생시켜 임상적으로 진단하는데 영향을 줄 수 있다. Uniformity correction map은 검사에 사용되는 방사성 동위원소를 이용하여 영상에서 Uniformity의 변동폭을 최소화 시켜주는 역할을 한다. 본원에서 시행되고 있는 $^{201}Tl$을 이용한 심근 SPECT에서는 $^{99m}Tc$으로 기본 설정되어 있는 Uniformity correction map을 사용하고 있으며, 이에 따라 본 연구에서는 $^{201}Tl$과 $^{99m}Tc$ 두 가지 핵종으로 Uniformity correction map을 각각 설정하였을 때 영상의 질에 차이가 있는지 비교 분석하고, 영상의 질을 최적화 할 수 있는 방법에 대하여 모색해 보고자 한다. 장비는 GE Ventri Gamma camera, Flood phantom, Jaszczak ECT phantom을 이용하였다. 실험에 앞서 Collimator를 제거한 상태에서 Detector 표면 중심으로부터 2.5 m 떨어진 지점에 1 cc 주사기에 $^{99m}Tc$ 25.9 Mbq, $^{201}Tl$ 14.8 Mbq의 방사성 동위원소를 주입한 point source를 이용하여 장비사에서 권고하는 $6{\times}10^7count$로 $^{99m}Tc$와 $^{201}Tl$ 각각의 방사성 동위원소로 Uniformity Mapping을 실시하였다. Flood phantom에는 $^{201}Tl$ 21.3 kBq/mL, Jaszczak ECT phantom에는 $^{201}Tl$ 33.4 kBq/mL를 주입하여 phantom을 제작하였다. Flood Phantom으로 획득된 데이터는 Xeleris ver 2.05 프로그램을 이용하여 Integral uniformity, Differential uniformity을 두 가지 항목에 대하여 분석하였다. Jaszczak ECT Phantom으로 획득된 데이터를 본원에서 자체 개발한 Interactive Data Language 프로그램에 입력하여 Integral uniformity, Contrast, Coefficient of variation, Spatial Resolution을 4가지 항목에 대하여 분석하였다. Flood phantom test 에서는 $^{99m}Tc$에서의 Flood I.U값은 3.6%, Flood D.U값은 3.0%으로 나타났고, $^{201}Tl$ Flood I.U값은 3.8%, Flood D.U값은 2.1%으로 나타났다. 이를 통해 $^{201}Tl$으로 Uniformity correction map을 설정하였을 때, Flood I.U값은 감소하였으나 Flood D.U은 향상되어 Flood 영상에서는 크게 영상의 질이 개선되었는지는 알 수 없었다. 반면 Jaszczak ECT Phantom test에서는 $^{99m}Tc$에서의 SPECT I.U값은 13.99%, Coefficient of variation값은 4.89%, contrast값은 0.69, $^{201}Tl$에서의 SPECT I.U값은 11.37%, Coefficient of variation값은 4.79%, contrast값은 0.78로 나타났으며, 육안 분석을 실시한 Spatial Resolution 항목에서는 육안으로 큰 차이를 보이지 않았다. 이를 통해 $^{201}Tl$으로 Uniformity correction map을 설정하였을 때, Spatial Resolution 을 제외한 SPECT I.U, Coefficient of variation, Contrast 세 항목에서 각각 18%, 2%, 13%의 향상된 수치를 보였다는 점에서 영상의 질이 개선되었음을 알 수 있었다. Uniformity correction map이 영상의 질을 크게 좌우할 수 없으나, 개선의 효과를 가져다 준다는 점에서 임상적으로 진단에 영향을 주는지 또한 다른 검사에서 또 다른 방사성 동위원소로 Uniformity correction map을 설정했을 경우 영상의 질을 개선시킬 수 있는지에 관하여 추가적인 연구가 필요할 것으로 사료된다.

• Design & Manufacturing
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• 제17권3호
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• pp.8-14
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• 2023

In this study, basic research was conducted on manufacturing technology of thick-walled light guide a component that controls the light source of automobile lamps. As a preliminary study for manufacturing the final injection molded parts, a model for analyzing the influence of micro patterns on light guides is presented. The optical characteristics of the light guide were analyzed according to the change of the curvature radius of the micro-optical pattern, and the injection molding characteristics of the light guide according to the change of injection molding conditions were analytically evaluated. It was confirmed that the luminance uniformity improves as the R value decreases for changes in the micro-pattern R value, but it was confirmed that there are technical limitations in actual injection mold core processing and high-replication injection molding. Injection molding analysis showed that cooling channel design is very important compared to general injection molding due to thick-wall characteristics and thickness variation. It was also confirmed that the cooling channel has a great influence on the cycle time and birefringence result due to residual stress. As a result of analyzing the influence of filling time, holding condition, and cooling on shrinkage, it was found that the cooling water temperature has a significant effect on the shrinkage of ultra-fine light guide parts, and the holding condition also has a significant effect.

• 한국자동차공학회논문집
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• 제22권3호
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• pp.171-178
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• 2014

From now on, in order to meet more stringer diesel emission standard, diesel vehicle should be equipped with emission after-treatment devices as NOx reduction catalyst and particulate filters. Urea-SCR is being developed as the most efficient method of reducing NOx emissions in the after-treatment devices of diesel engines, and recent studies have begun to mount the urea-SCR device for diesel passenger cars and light duty vehicles. That is because their operational characteristics are quite different from heavy duty vehicles, urea solution injection should be changed with other conditions. Therefore, the number and diameter of the nozzle, injection directions, mounting positions in front of the catalytic converter are important design factors. In this study, major design parameters concerning urea solution injection in front of SCR are optimized by using a CFD analysis and Taguchi method. The computational prediction of internal flow and spray characteristics in front of SCR was carried out by using STAR-CCM+7.06 code that used to evaluate $NH_3$ uniformity index($NH_3$ UI). The design parameters are optimized by using the $L_{16}$ orthogonal array and small-the-better characteristics of the Taguchi method. As a result, the optimal values are confirmed to be valid in 95% confidence and 5% significance level through analysis of variance(ANOVA). The compared maximize $NH_3$ UI and activation time($NH_3$ UI 0.82) are numerically confirmed that the optimal model provides better conversion efficiency of $NH_3$. In addition, we propose a method to minimize wall-wetting around the urea injector in order to prevent injector blocks caused by solid urea loading. Consequently, the thickness reduction of fluid film in front of mixer is numerically confirmed through the mounting mixer and correcting injection direction by using the trial and error method.

• 전기전자학회논문지
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• 제26권3호
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• pp.445-455
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• 2022

본 논문에서는 90W급 LED-TV용 DC-DC Flyback 컨버터에 사용되고 있는 소형화 및 권선 자동화에 적합한 사출형 평면 동판 권선 방식의 Flyback 변압기 최적화 설계에 대해서 나타낸다. 또한 본 논문에서는 수동권선방식의 기존 양산 Flyback 변압기에 비해 권선 자동화, Trans 체적 저감 및 전기적 특성 동질성 향상이 가능한 사출형 평면 동판 권선 방식의 Flyback 변압기를 제안한다. 특히 본 논문에서 제안한 사출형 평면 동판 권선 변압기는 권선 자동화를 위하여 수직형 권선 방식으로 구성한다. 본 논문 제안한 사출형 평면 동판 권선 방식의 Flyback 변압기의 1차측과 2차측 권선은 각각 기존 권선, 3중 절연 권선 및 사출형 평면 동판권선을 사용하였다. 최종적으로 Maxwell 2D 및 3D Tool을 이용한 시뮬레이션 결과를 토대로 본 논문에서 제안한 소형화 및 권선 자동화에 적합한 사출형 평면 동판 권선 방식의 Flyback 변압기 최적화 설계를 수행하였다.

• 한국연소학회지
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• 제21권4호
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• pp.6-15
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• 2016

The oxygen fuel MILD (Moderate or Intense Low-oxygen Dilution) combustion has been considered as one of the promising combustion technology for flame stability, high thermal efficiency, low emissions and improved productivity. In this paper, the effect of oxygen and fuel injection condition on formation of MILD combustion was analyzed using lab scale oxygen fuel MILD combustion furnace. The results show that the flame mode was changed from a diffusion flame mode to a split flame mode via a MILD combustion flame mode with increasing the oxygen flow rate. A high degree of temperature uniformity was achieved using optimized combination of fuel and oxygen injection configuration without the need for external oxygen preheating. In particular, the MILD combustion flame was found to be very stable and constant flame temperature region at 7 KW heating rate and oxygen flow rate 75-80 l/min.

• 한국공작기계학회논문집
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• 제16권3호
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• pp.117-124
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• 2007

In order to operate CD and DVD compatibly in a pickup system, the objective lens comprise diffractive optical element(DOE) zone and aspheric curvature on its lens surface. The DOE objective lens is effective to simplify this dual-purpose pickup system of the 655nm and 785nm wavelength by using only one lens, but requires more precision manufacturing process and system due to the complicated shape. This paper presents the overall manufacturing process of this objective lens and describes main parameters in each process, for the correction of the aspheric surface in its core, the shrinkage compensation after injection molding, and the uniformity compensation by adjusting molding conditions.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 춘계학술대회 논문집
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• pp.533-534
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• 2006

Micro pyramid pattern and its array are designed to enhance the brightness and its uniformity of LGP which is one of key parts in LCD. The designed micro pyramid patterns are fabricated on a Si-wafer first through MEMS process and then a Ni-stamper is electro-plated from the Si pattern master. Adopting the fabricated Ni-stamper, LGPs are injection molded at different mold temperatures and the fidelity of the pattern replication is estimated for each molding conditions and pattern locations. The replicated patterns are found to have some defect such as local short shot or micro weld line which are believed to have negative effect on the performance of the LGP.

• Applied Science and Convergence Technology
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• 제23권3호
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• pp.139-144
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• 2014

GaN deposition equipment and processes for the fabrication of white LEDs (Light Emitting Diode) using MOCVD (Metal Organic Chemical Vapor Deposition) were numerically modeled to analyze the effects of a reactive gas introduction strategy. The source gases, TMGa and $NH_3$, were injected from a shower head at the top of the chamber; the carrier gases, $H_2$ or $N_2$, were introduced using two types of injection structures: vertical and horizontal. Wafers sat on the holder at a radial distance between 100 mm and 150 mm. The non-uniformity of the deposition rates for vertical and horizontal injection were 4.3% and 3.1%, respectively. In the case of using $H_2$ as a carrier gas instead of $N_2$, the uniform deposition zone was increased by 20%.

• 대한기계학회논문집A
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• 제21권11호
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• pp.1773-1785
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• 1997

The cooling stage is the very critical and most time consuming stage of the injection molding process, thus it cleary affects both the productivity and the part quality. Even through there are several commercialized package programs available in the injection molding industry to analyze the cooling performance of the injection molding coling stage, optimization of the cooling system has npt yet been accomplished in the literature due to the difficulty in the sensitivity analysis. However, it would be greatly desirable for the mold cooling system designers to have a computer aided design system for the cooling stage. With this in mind, the present study has successfully developed an interated computer aided design system for the injection molding cooling system. The CAD system utilizes the sensitivity analysis via a Boundary Element Method, which we recently developed, and the well-known CONMIN alforuthm as an optimization technique to minimize a weighted combination (objective function) of the temperature non-uniformity over the part surface and the cooling time related to the productivity with side constranits for the design reality. In the proposed objective function , the weighting parameter between the temperature non-uniiformity abd the cooling time can be adjusted according to user's interest. In this cooling system optimization, various design variable are considered as follows : (i) (design variables related to processing conditions) inlet coolant bulk temperature and volumetric flow rate of each cooling channel, and (ii) (design variables related to mold cooling system design) radius and location of each cooling channel. For this optimum design problem, three different radius and location of each cooling channel. For this optimum design problem, three different strategies are suffested based upon the nature of design variables. Three sample problems were successfully solved to demonstrated the efficiency and the usefulness of the CAD system.

• 반도체디스플레이기술학회지
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• 제5권2호
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• pp.47-49
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• 2006

Various methods of making thin film is being used in semiconductor manufacturing process. The most common method in this field includes CVD(Chemical Vapor Deposition) and PVD(Physical Vapor Deposition). Thin film is deposited on both the backside and the frontside of wafers. The thin film deposited on the backside has poor thickness profile, and can contaminate wafers in the following processes. If wafers with the thin film remaining on the backside are immersed in batch type process tank, the thin film fall apart from the backside and contaminate the nearest wafer. Thus, it is necessary to etch the backside of the wafer selectively without etching the frontside, and chemical injection nozzle positioned under the wafer can perform the backside etching. In this study, the backside chemical injection nozzle with optimized chemical injection profile is built for single wafer tool. The evaluation of this nozzle, performed on $Si_3N_4$ layer deposited on the backside of the wafer, shows the etching rate uniformity of less than 5% at the etching rate of more than $1000{\AA}$.