• Journal of information and communication convergence engineering
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• v.5 no.2
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• pp.150-154
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• 2007

Transponders of RFID system are classified as active or passive depending on the type of power supply they use. In passive transponders the data carrier has to obtain its power from the induced voltage. The induced voltage is converted into direct current using a low loss bridge rectifier and then smoothed. In practice, the induced voltage in the transponder coil is variable according to the coupling coefficient k and the load resistance ($R_L$). Therefore, the rectified voltage is unstable and the transponder of RFID is unstable sometimes. In this paper, a voltage-dependent shunt resistor ($R_s$) circuits are designed and inserted in parallel with the load resistance of RFID transponder in order to improve the stability of power.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05e
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• pp.77-80
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• 2003

MEMS(Micro Electro Mechanical System) 기술에서 실리콘 식각기술의 중요성으로 플라즈마 식각기술의 개발이 꾸준히 진행되고 있다. 이중에서 ICP(Inductive Coupled Plasma)는 기존의 증착장치에 유도결합식 플라즈마를 추가로 발생시켜 증착막의 특성을 획기적으로 개선시키는 가장 최근에 개발된 기술이며, 이용에너지를 증가시키지 않고도 이용밀도를 높이고 이용업자들에 방향성을 가할 수 있는 새로운 플라즈마 기술로, 주로 MEMS 제조공정에 응용되고 있다. 본 연구에서는 STS-ICP $ASE^{HR}$을 이용하여 식각과 증착공정을 반복하여 식각을 하는 Bosch 식각에 관하여 연구하였다 STS-ICP $ASE^{HR}$ 장비의 Platen power, Coil power 및 Process pressure에 다양한 변화를 주어 각 변수에 따른 식각속도를 관찰하였다. 각 공정별 변수를 변화시킨 결과 Platen power 12W, Coil power 500W, 식각/Passivation Cycle 6/7sec 일 경우 식각속도는 $1.2{\mu}m$/min 이었고, Sidewall profile은 $90{\pm}0.7^{\circ}$로 나타나 매우 우수한 결과를 보였다.

• Journal of Power Electronics
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• v.18 no.1
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• pp.309-322
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• 2018

The technology of inductive power transfer has been proved to be a promising solution in many applications especially in electric vehicle (EV) charging systems, due to its features of safety and convenience. However, loosely coupled transformers lead to the system efficiency not coming up to the expectation at the present time. Therefore, at first, the magnetic core losses are calculated with a novel magnetic-circuit model instead of the commonly used finite-element-method (FEM) simulations. The parameters in the model can be obtained with a one-time FEM simulation, which makes the calculation process expeditious. When compared with traditional methods, the model proposed in the paper is much less time-consuming and relatively accurate. These merits have been verified by experimental results. Furthermore, with the proposed loss calculation model, the system is optimized by parameter sweeping, such as the operating frequency and winding turns. Specifically, rather than a predesigned switching frequency, a more efficiency-optimized frequency for the series-parallel (SP) compensation topology is detected and a detailed investigation has been presented accordingly. The optimized system is capable of an efficiency that is greater than 93% at a coil separation distance of 200mm and coil dimensions of $600mm{\times}400mm$.

• Journal of Power Electronics
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• v.13 no.2
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• pp.275-286
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• 2013

An explicit frequency-domain circuit model for the conventional coupled magnetic resonance system (CMRS) is newly proposed in this paper. Detail circuit parameters such as the leakage inductances, magnetizing inductances, turn-ratios, internal coil resistances, and source/load resistances are explicitly included in the model. Accurate overall system efficiency, DC gain, and key design parameters are deduced from the model in closed form equations, which were not available in previous works. It has been found that the CMRS can be simply described by an equivalent voltage source, resistances, and ideal transformers when it is resonated to a specified frequency in the steady state. It has been identified that the voltage gain of the CMRS was saturated to a specific value although the source side or the load side coils were strongly coupled. The phase differences between adjacent coils were ${\pi}/2$, which should be considered for the EMF cancellations. The analysis results were verified by simulations and experiments. A detailed circuit-parameter-based model was verified by experiments for 500 kHz by using a new experimental kit with a class-E inverter. The experiments showed a transfer of 1.38 W and a 40 % coil to coil efficiency.

• Clean Technology
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• v.9 no.3
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• pp.101-105
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• 2003

Plasma etching technology has been developed since it is recognized that silicon etching is very crucial in MEMS(Micro Electro Mechanical System) technology. In this study ICP(Inductive Coupled Plasma) technology was used as a new plasma etching to increase ion density without increasing ion energy, and to maintain the etching directions. This plasma etching can be used for many MEMS applications, but it has been used for PCR(Polymerase Chain Reaction) device fabrication. Platen power, Coil power and process pressure were parameters for observing the etching rate changes. Conclusively Platen power 12W, Coil power 500W, etchng/passivation cycle 6/7sec gives the etching rate of $1.2{\mu}m/min$ and sidewall profile of $90{\pm}0.7^{\circ}$, exclusively. It was concluded from this study that it was possible to minimize the environmental effect by optimizing the etching process using SF6 gas.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.227-227
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• 2011

최근 ECR (Electron Cyclotron Resonance) 가열에 의한 플라즈마 소스는 고밀도 플라즈마를 유지하면서 고진공 운전을 동시에 만족시켜 다양한 플라즈마 응용 분야에서 많은 관심을 받고 있다. 그 중 HNB (Hyperthermal Neutral Beam)를 이용한 플라즈마 소스에 있어서 ECR 플라즈마 소스는 고진공에서도 높은 플라즈마 밀도를 유지할 수 있기 때문에 기존의 HNB 플라즈마 소스인 ICP (Inductive Coupled Plasma)의 운전압력의 한계점을 해결하여 높은 HNB 방향성(~1mTorr이하)을 가진 고밀도플라즈마를 발생시킬 수 있을 것이라 제안되었다. ECR 플라즈마가 HNB 소스로서 적합하기 위해서는 플라즈마 소스의 대면적화와 균일화가 동시에 이루어져야 한다. 본 연구에서는 이러한 요구에 부합하여 Lisitano coil를 이용한 균일한 대면적 ECR 플라즈마 소스를 설계하였다. 최적의 설계와 진단을 위한 Lisitano Coil antenna 내의 B-field 분포 시뮬레이션과 Langmuir Probe 진단이 이루어졌다.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.53 no.3
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• pp.133-136
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• 2004

Low-Pressure inductively coupled RF discharge sources have important industrial applications mainly because they can provide a high-density electrodeless plasma source with low ion energy and low power loss. In an inductive discharge, the RF power is coupled to the plasma by an electromagnetic interaction with the current flowing in a coil. In this paper, the experiments have been focussed on the electric characteristic and carried out using a single Langmuir probe. The internal electric characteristics of inductively coupled Ar RF discharge at 13.56(MHz) have been measured over a wide range of power at gas pressure ranging from 1∼70(mTorr).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.05b
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• pp.61-64
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• 2004

Recently, the RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology. To the point of lighting sources, the electrodeless fluorescent lamps utilizing an inductively coupled plasma (ICP) have been objects of interest and research during the last decades, mainly because of their potential for extremely long life, high lamp efficacies, rapid power switching response. The electrodeless fluorescent lamp that is dealt with in this work comprises a bulb filled with rare gas and amalgam of vaporizable metal and has a coil provided with a winding around the ferrite. Current through a coil produces a magnetic field in the discharge space. The changing magnetic flux then produces an azimuthal electric field E around the coil, according to Faraday's laws of magnetic induction.

• Proceedings of the KIEE Conference
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• 2004.11a
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• pp.285-288
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• 2004

Recently, the RF inductive discharge or inductively coupled plasma(ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology. To the point of lighting sources, the electrodeless fluorescent lamps utilizing an inductively coupled plasma(ICP) have been objects of interest and research during the last decades, mainly because of their potential for extremely long life, high lamp efficacies, rapid power switching response. The electrodeless fluorescent lamp that is dealt with in this work comprises a bulb filled with rare gas and amalgam of vaporizable metal and has a coil provided with a winding around the ferrite. Current through a coil produces a magnetic field in the discharge space The changing magnetic flux then produces an azimuthal electric field E around the coil, according to Faraday's laws of magnetic induction.

• Proceedings of the KIEE Conference
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• 2003.07c
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• pp.1704-1706
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• 2003

Low-Pressure inductively coupled RF discharge sources have important industrial applications mainly because they can provide a high-density electrodeless plasma source with low ion energy and low power loss. In an inductive discharge, the RF power is coupled to the plasma by an electromagnetic interaction with the current flowing in a coil. In this paper, the experiments have been focussed on the electric characteristic and carried out using a single Langmuir probe. The internal electric characteristics of inductively coupled Ar RF discharge at 13.56 [MHz] have been measured over a wide range of power at gas pressure ranging from $1{\sim}70$ [mTorr].