• Title/Summary/Keyword: InGaAs/GaAs

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Design of Optical Peramplifier with InGaAs APD/GaAs MESFET (InGaAs APD/GaAs MESFET를 이용한 광 수신 전치증폭기의 설계)

  • 이영철;신철재
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.16 no.11
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    • pp.1071-1083
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    • 1991
  • In this paper, we describe the design and realization of optical preamplifier with InGaAs APD and GaAs MESFET. Optical preamplifier which is three stage trans-impedance circuit is analyzed in detail and realized in microstrip circuits. With the kmowledge of the InGaAs, GaAs MESFET and BJT, the performance of the optical is predicted by computer simulation and the theoretical predictions are compared with the experimental results. The designed hybrid MIC optical preamplifier exhibits a bandwith of 380MHz and a receiver sensitivity of -40. 6dBm at $1.55{\mu}m$ wavelength when operating at 565Mb/s with BER of $10^{-9}$.

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Quantum Nanostructure of InGaAs on Submicron Gratings by Constant Growth Technique

  • Son, Chang-Sik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.12
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    • pp.1027-1031
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    • 2001
  • A new constant growth technique to conserve an initial grating height of V-groove AlGaAs/InGaAs quantum nanostructures above 1.0 $\mu\textrm{m}$ thickness has been successfully embodied on submicron gratings using low pressure metalorganic chemical vapor deposition. A GaAs buffer prior to an AlGaAs barrier layer on submicron gratings plays an important role in overcoming mass transport effects and improving the uniformity of gratings. Transmission electron microscopy (TEM) image shows that high-density V-groove InGaAs quantum wires (QWRs) are well confined at the bottom of gratings. The photoluminescence (PL) peak of the InGaAs QWRs is observed in the temperature range from 10 to 280 K with a relatively narrow full width at half maximum less than 40 meV at room temperature PL. The constant growth technique is an important step to realize complex optoelectronic devices such as one-step grown distributed feedback lasers and two-dimensional photonic crystal.

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Power Supply for White GaN LED by Using SMD Type Solar Cell Array (SMD 타입 태양전지 어레이를 이용한 white GaN LED용 전원 공급 장치)

  • Kim, Seong-Il;Lee, Yoon-Pyo
    • New & Renewable Energy
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    • v.5 no.4
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    • pp.34-37
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    • 2009
  • Using six SMD(surface mount device) type AlGaAs/GaAs single junction solar cells connected in series, a power source was fabricated for a white GaN LED. The electrical properties of the power source was measured and analyzed under one sun (100mW/$cm^2$) and various indoor light (300 - 900 lux) conditions. Under 600 lux indoor light condition, output power was 17.06 ${\mu}W$ and it was 30.75 ${\mu}W$ under 900 lux indoor light condition. Using the fabricated solar cell power supply, we have turned on the white GaN LED. It was worked well under 15 ${\mu}W$(at 480 lux) power supplied from solar cell array. This kind of solar cell power supply can be used as a power source for ubiquitous sensor network (USN).

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Generation of Coherent LO Phonons in GaAs/AlGaAs MQW's by the Impulsive Stimulated Raman Scattering (GaAs/AlGaAs 양자우물 구조에서 Impulsive Stimulated Raman Scattering 방법에 의한 결맞는 포논의 생성)

  • 이기주;이대수;조영달;임용식;김대식
    • Proceedings of the Optical Society of Korea Conference
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    • 2000.02a
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    • pp.24-25
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    • 2000
  • After the invention of the femtosecond pulse lasers, generating and detecting the coherent optical phonons in various materials became possible. In bulk GaAs, which is a polar material, the coherent LO phonons are known to be generated by the ultrafast screening of the surface space-charge fields. However, little is known about the generation mechanisms of coherent phonons in GaAs quantum structures. (omitted)

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Growth and optic characteristics of AgGaS$_2$/GaAs single crystal thin film by hot wall epitaxy (HWE 방법에 의한 AgGaS$_2$/GaAs 단결정 박막 성장과 광학적 특성)

  • 이상열;홍광준;정준우
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.281-287
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    • 2002
  • The stochiometric composition of AgGaS$_2$ polycrystal source materials for the AgGaS$_2$/GaAs epilayer was prepared from horizontal furnace. From the extrapolation method of X-ray diffraction patterns it was found that the polycrystal AgGaS$_2$ has tetragonal structure of which lattice constant a$\sub$0/ and c$\sub$0/ were 5.756 ${\AA}$ and 10.305 ${\AA}$, respectively. AgGaS$_2$/GaAs epilayer was deposited on throughly etched GaAs(100) substrate from mixed crystal AgGaS$_2$ by the Hot Wall Epitaxy (100) system. The source and substrate temperature were 590$^{\circ}C$ and 440$^{\circ}C$ respectively. The crystallinity of the grown AgGaS$_2$/GaAs epilayer was investigated by the DCRC (double crystal X-ray diffraction rocking curve). The optical energy gaps were found to be 2.61 eV for AgGaS$_2$/GaAs epilayer at room temperature. The temperature dependence of the photocurrent peak energy is well explained by the Varshni equation, then the constants in the Varshni equation are given by ${\alpha}$ : 8.695${\times}$10$\^$-4/ eV/K, and ${\beta}$ = 332 K. From the photocurrent spectra by illumination of polarized light of the AgGaS$_2$/GaAs epilayer, we have found that crystal field splitting ΔCr was 0.28 eV at 20 K. From the PL spectra at 20 K, the peaks corresponding to free and bound excitons and a broad emission band due to D-A pain are identified. The binding energy of the free excitons are determined to be 0.2676 eV and 0.2430 eV and the dissociation energy of the bound excitons to be 0.4695 eV.

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The recombination velocity at III-V compound heterojunctions with applications to Al/$_x$/Ga/$_1-x$/As-GaAs/$_1-y$/Sb/$_y$/ solar cells

  • 김정순
    • 전기의세계
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    • v.28 no.4
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    • pp.53-63
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    • 1979
  • Interface recombination velocity in $Al_{x}$G $a_{1-x}$ As-GaAs and $Al_{0.85}$, G $a_{0.15}$ As-GaA $s_{1-y}$S $b_{y}$ heterojunction systems is studied as a function of lattice mismatch. The results are applied to the design of highly efficient III-V heterojunction solar cells. A horizontal liquid-phase epitaxial growth system was used to prepare p-p-p and p-p-n $Al_{x}$G $a_{1-x}$ As-GaA $s_{1-y}$S $b_{y}$-A $l_{x}$G $a_{1-x}$ As double heterojunction test samples with specified values of x and y. Samples were grown at each composition, with different GaAs and GaAs Sb layer thicknesses. A method was developed to obtain the lattice mismatch and lattice constants in mixed single crystals grown on (100) and (111)B oriented GaAs substrates. In the AlGaAs system, elastic lattice deformation with effective Poisson ratios .mu.$_{eff}$ (100=0.312 and .mu.$_{eff}$ (111B) =0.190 was observed. The lattice constant $a_{0}$ (A $l_{x}$G $a_{1-x}$ As)=5.6532+0.0084x.angs. was obtained at 300K which is in good Agreement with Vegard's law. In the GaAsSb system, although elastic lattice deformation was observed in (111) B-oriented crystals, misfit dislocations reduced the Poisson ratio to zero in (100)-oriented samples. When $a_{0}$ (GaSb)=6.0959 .angs. was assumed at 300K, both (100) and (111)B oriented GaAsSb layers deviated only slightly from Vegard's law. Both (100) and (111)B zero-mismatch $Al_{0.85}$ G $a_{0.15}$As-GaA $s_{1-y}$S $b_{y}$ layers were grown from melts with a weight ratio of $W_{sb}$ / $W_{Ga}$ =0.13 and a growth temperature of 840 to 820 .deg.C. The corresponding Sb compositions were y=0.015 and 0.024 on (100) and (111)B orientations, respectively. This occurs because of a fortuitous in the Sb distribution coefficient with orientation. Interface recombination velocity was estimated from the dependence of the effective minority carrier lifetime on double-heterojunction spacing, using either optical phase-shift or electroluminescence timedecay techniques. The recombination velocity at a (100) interface was reduced from (2 to 3)*10$^{4}$ for y=0 to (6 to 7)*10$^{3}$ cm/sec for lattice-matched $Al_{0.85}$G $a_{0.15}$As-GaA $s_{0.985}$S $b_{0.015}$ Although this reduction is slightly less than that expected from the exponential relationship between interface recombination velocity and lattice mismatch as found in the AlGaAs-GaAs system, solar cells constructed from such a combination of materials should have an excellent spectral response to photons with energies over the full range from 1.4 to 2.6 eV. Similar measurements on a (111) B oriented lattice-matched heterojunction produced some-what larger interface recombination velocities.ities.ities.s.

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Deep Levels in Semi-Insulating GaAs : Cr and Undoped GaAs (SI GaAs : Cr과 Undoped GaAs의 깊은 준위)

  • Rhee, Jin-Koo
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.25 no.11
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    • pp.1294-1303
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    • 1988
  • Electron and hole traps in semi-insulating GaAs with activation energies ({\Delta}E_r) ranging from 0.16 $\pm$ 0.01 to 0.98 $\pm$ 0.01 eV, have been detected and characterized by photo-induced current transient measurements. SI undoped GaAs has fewer deep levels than SI GaAs: Cr. The thermal capture cross section and density of the traps have been estimated and some of the centers have been related to native defects. In particular, the activation energy of the compensating Cr, and "0" levels in semi-insulating GaAs were accurately measured. The transient measurements were complemented by Hall measurements at T > 300K and photocurrent spectra measurements. The transition energies for the deep compensating levels obtained by the analyses of data from these measurements, when compared with those from the transient measurements, indicate negligible lattice-coupling of these centers. Analysis of the transport data also indicates that neutral impurity scattering plays a significant role in semi-insulating materials at high temperatures.

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A study on characteristics of $In_xGa_{1-x}As(0.03\leqx\leq0.11)$ epilayer by photoreflectance measuerment (Photoreflectance 측정에 의한 $In_xGa_{1-x}As(0.03\leqx\leq0.11)$ 에피층의 특성 연구)

  • 김인수;손정식;이철욱;배인호;임재영;한병국;신영남
    • Journal of the Korean Vacuum Society
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    • v.7 no.4
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    • pp.334-340
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    • 1998
  • Photoreflectance (PR) measurents have been performed on $In_xGa_{1-x}As/GaAs$ grown by molecular beam epitaxy (MBE). Bandgap $(E_0)$ of $In_xGa_{1-x}As$ epilayer measured from PR was separated as heavy-hole $(E_0(HH))$ and light-hole $(E_0(LH))$ by strain effect. The compositions and the strains of epilayer were obtained from the energy value of $E_0(HH)$ and from energy difference of $E_0(HH)$ and $E_0(LH)$, respectively. In addition, the PR signal of $E_0(LH)$ was diminished below 160 K. The interface electric field (E) of InGaAs/GaAs was increased from $0.75{\times}10^5$ V/cm to $2.66{\times}10^5$ V/cm as In composition increased, which was calculated from Franz-Keldysh oscillation (FKO) peaks. As the temperature dependence of the PR signal at x=0.09 sample, we obtained Varshni and Bose-Einstein coefficients.

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The study on photoreflectance characteristics of the $Al_xGa_{1-x}As$ epilayer grown by MBE method (MBE 법으로 성장시킨 $Al_xGa_{1-x}As$ 에피층의 Photoreflectance 특성에 관한 연구)

  • 이정렬;김인수;손정식;김동렬;배인호;김대년
    • Journal of the Korean Vacuum Society
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    • v.7 no.4
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    • pp.341-347
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    • 1998
  • We analyzed photoreflectance (PR) characterization of the $Al_xGa_{1-x}As$ epilayer grown by molecular beam epitaxy (MBE) method. The band-gap energy $(E_0)$ satisfying low power Franx-Keldysh (LPFK) due to GaAs buffer layer is 1.415 eV, interface electricall field $(E_i)$ is 1.05$\times$$10^4$V/cm, carrier concentration (N) is $1.3{\times}10^{15}\textrm{cm}^{-3}$. In PR spectrum intensity analysis at 300 K the $A^*$ peak below $(E_0)$ signal is low and distorted because of residual impurity in sample growth. The trap characteristic time ${\tau}_i$ of GaAs buffer layer is about 0.086 ms, and two superposed PR signal near 1.42eV consist of the third derivative signal of chemically eteched GaAs substrate and Franz-Keldysh oscillation (FKO) signal due to GaAs buffer layer.

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