• 제목/요약/키워드: ITO-coated glass

검색결과 130건 처리시간 0.028초

Rf Magnetron Sputtering 방법에 의하여 제조된 $(BaSr)TiO_3$ 박막의 구조적, 광학적 특성 고찰 (The Characterization of Structural and Optical Properties for rf Magnetron Sputtered $(BaSr)TiO_3$ Thin Film)

  • 김태송;오명환;김종희
    • 분석과학
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    • 제6권2호
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    • pp.239-246
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    • 1993
  • ITO coated glass, bare glass, 그리고 (100)Si 기판 위에 증착된 $(BaSr)TiO_3$ 박막의 구조는 기판의 종류에 관계없이 변하지 않았으나 결정성은 다결정 ITO층과 (100)Si 기판에 있어서 증대되었다. ITO coated glass 기판 위에 증착된 $(BaSr)TiO_3$ 박막의 조성은 거의 화학양론적으로 일치하였으며 ((Ba+Sr)/Ti=1.08~1.09) 증착 중 상당히 치밀하고 균질하였다. 그러나 증착온도가 증가함에 따라 성장한 박막과 ITO층 사이에, 그리고 ITO층과 base glass 사이에 확산이 보다 심화되었다. ITO coated glass 기판 위에 증착된 $(BaSr)TiO_3$ 박막은 상당히 투명하였으며(투과율 약 80%) 굴절률($n_f$)은 기판온도의 증가에 따라 2.138~2.286이었다.

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ALT기법을 이용한 ITO 코팅유리의 결함 검출 기법 개발 (Development of Scratch Detecting Algorithm for ITO Coated Glass using Adaptive Logical Thresholding Method)

  • 김면희;이상룡
    • 한국정밀공학회지
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    • 제20권8호
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    • pp.108-114
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    • 2003
  • This research describes a image-processing technique for the scratch detecting algorithm for ITO coated glass. We use the modified logical thresholding method (called adaptive logical thresholding method) for binarization of gray-scale glass image. This method is useful to the algorithm for detecting the scratch of ITO coated glass automatically without need of any prior information of manual fine-tuning of parameters.

화상처리를 이용한 ITO 코팅 유리의 결함검출기법 개발 (Deveopement of Scratch Detection Algorithm for ITO coated Glass using Image Processing Technique)

  • 김면희;배준영;이태영;안경철;이상룡
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1275-1278
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    • 2003
  • This research describes a image-processing technique for the scratch detecting algorithm for ITO coated glass. The light emitter efficiency of Organic EL has a failing-off in quality due to many causes. One of the many causes was the defects of the surface in ITO coated glass. We use the logical level thresholding method for binarization of gray-scaled glass image. This method is useful to the algorithm for detecting scratch of ITO coated glass automatically without need of any prior information of manual fine tuning of parameters.

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회귀분석을 이용한 ITO 코팅유리기판의 표면균일도와 운전변수의 상관관계 분석 (Relationship between Working Parameter and Surface Nniformity of ITO coated Glass Substrate using Regression Analysis)

  • 김면희;이상룡;이태영;배준영
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.1353-1356
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    • 2004
  • In recent year, OLED(organic light emitted display) is used as the next generation device of FPD. OLED have been replacing the flat panel display device such as LCD, STN-LCD and TFT because this device is more efficient, economic and simple than those FPD devices, and this need not backlight system for visualization. The performance and efficiency of OLED is related with surface defect of ITO coated glass substrate. The typical surface defect of glass substrate is nonuniformity and bad surface roughness. ITO coated glass substrate is destroied for inspection about surface roughness and non-uniformity. Generally detection of the defects in the surface for ITO coated glass substrate is dependent on operator's experience. In this research, relationship between working parameter and surface non-uniformity is studied using regression analysis.

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영상처리기법을 이용한 유기 EL용 ITO 코팅 유리의 표면결함 검출 알고리즘 개발 (Development of detection algorithm of the defected in the surface for ITO coated glass using image processing technique)

  • 김면희;박세홍;이상룡;김관수
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 춘계학술대회
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    • pp.1173-1178
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    • 2003
  • Recently, Organic EL(Electro Luminescence) is interested in Flat Panel Display(FPD) department of new generation. This paper describes a image processing algorithm for the scratch detecting for ITO coated glass. We use the logical level thresholding method for binarization of gray-scaled glass image. This method is useful to the algorithm for detecting scratch of ITO coated glass automatically without need of any prior information of manual fine tuning of parameters.

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Development of scratch detecting algorithm for ITO coated glass Using image processing technique

  • Kim, Myun-Hee;Bae, Joon-Young;Park, Se-Hong;Lee, Sang-Ryong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.849-851
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    • 2002
  • This research describes a image-processing technique for the scratch detecting algorithm for ITO coated glass. We use the modified logical thresholding method for binarization of gray-scale glass image. This method is useful to the algorithm for detecting the scratch of ITO coated glass automatically without need of any prior information of manual fine-tuning of parameters.

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Sol-Gel법으로 제조한 (Ba,Sr)$TiO_3$ 박막의 구조 및 유전특성 (Structural and Dielectric Properties of the (Ba,Sr)$TiO_3$Thin Films Prepared by Sol-Gel Method)

  • 이문기;정장호;이성갑;이영희
    • 한국전기전자재료학회논문지
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    • 제11권9호
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    • pp.711-717
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    • 1998
  • BST(70/30) and BST(50/50) thin films were prepared by Sol-Gel method and studied about the microstructural and dielectric properties with Pt and ITO bottom electrodes. The stock solution was synthesized and spin coated on the Pt/Ti$SiO_2$/Si and Indium Tin Oxide(ITO)/ glass substrate. the coated films were dries at 350$^{\circ}C$ for 10 minutes and annealed at $750^{\circ}C$ for 1 hour for the crystallization. The thin films coated on ITO substrate were crystallized easily and the packing density and roughness of surface were better that those of films coated on Pt substrates. In the BST(50/50) composition the structural properties were similar to the BST(70/30) composition and grain size were decreased with increasing the contents of Sr. The dielectric constant was higher in the BST(50/50) composition compared with the BST(70/30) composition. Using the ITO substrate, the dielectric constant was higher than the Pt substrate while the dielectric loss was showed a reverse trend. The dielectric constant with and increase of temperature was decreased slowly.

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초음파 분무 MOCVD법에 의한 PbTiO$_3$박막의 제조 및 특성 (Preparation and properties of PbTiO$_3$thin films by MOCVD using ultrasonic spraying)

  • 이진홍;김용환;이상희;박병옥
    • 한국결정성장학회지
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    • 제10권3호
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    • pp.205-210
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    • 2000
  • 초음파분무를 이용한 MOCVD법으로 강유전체 $PbTiO_3$박막을 Si(100) wafer와 ITO-coated glass위에 제조하였다 Si 기판 위에 증착된 박막으로부터, 출발원료의 농도비(Ti/Pb)가 1.2일 때, 단일 perovskite 상을 얻을 수 있었다. ITO-coated glass 위에 증착된 박막은 Si기판 위에 제조된 박막보다 박막의 성장속도가 더 빠르며, 기판온도를 $530^{\circ}C$부터 $570^{\circ}C$까지 증가시켰을 때, 결절성과 입자 크기의 증가에 의해 유전상수는 증가하였다. $570^{\circ}C$에서의 유전상수 및 유전손실 값은 각각 205, 0.016을 나타내었다. 기판온도가 $600^{\circ}C$ 이상인 경우, 유전상수가 감소되는 경향을 보였다.

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OLED용 ITO박막의 공정조건과 품질특성 추론에 근거한 품질관리 (Quality Management of ITO Thin Film for OLED Based on Relationship of Fabrication and Characteristics)

  • 서정민;박근영;이상룡;이춘영
    • 제어로봇시스템학회논문지
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    • 제14권4호
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    • pp.336-341
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    • 2008
  • Recently, research on a flat panel display(FPD) has focused on organic light-emitting display(OLED) which has wide angle of view, high contrast ratio and low power consumption. ITO(Indium-Tin-Oxide) films are the most widely used material as a transparent electrode of OLED and also in many other display devices like LCD or PDP. The performance and efficiency of OLED is related to the surface condition of ITO coated glass substrate. The typical surface defect of glass substrate is measured for electric characteristics and physical condition for transmittance and roughness. Since ITO coated glass substrate can be destroyed for inspection about surface roughness, sheet resistance, film thickness and transmittance, precise fabrication condition should be made based on the estimated relationship. In this paper, ITO films were prepared on the commercial glass substrate by the Ion-Plating method changing the partial pressure of gas(Ar, 02) and the chamber temperature between $200^{\circ}C$ and $300^{\circ}C$. The characteristics of films were examined by the 4-point probe, supersonic thickness measurement, transmittance measurement and AFM. We estimated the relationship between processing parameters(Ar gas, O2 gas, Temperature) and properties of ITO films (Sheet Resistance, Film Thickness, Transmittance, Surface Roughness).

실리콘 기판과 ITO가 코팅된 #7059 유리 기판간의 정전 열 접합 (Electrostatic bonding between Si and ITO-coated #7059 glass substrates)

  • 주병권;정회환;김영조;한정인;조경익;오명환
    • 센서학회지
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    • 제7권3호
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    • pp.211-217
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    • 1998
  • #7740 interlayer를 적용하여 Si 기관과 ITO가 코팅된 #7059 기판을 정전 열 접합하였다. SIMS 분석을 통하여 #7740 interlayer 내에 존재하는 $Na^{+}$ 이온들의 열-전기적 이동이 접합 메카니즘으로 작용함을 확인하였다. 우수한 접합을 얻기 위한 온도 및 전압 범위는 각각 $180{\sim}200^{\circ}C$ and $50{\sim}70V_{dc}$(10분)으로 나타났다. 이러한 저온 Si-ITO 코팅 유리 간의 접합 공정은 전계 방출 표시 소자의 패키징에 유용하게 이용될 수 있을 것으로 기대된다.

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