• Title/Summary/Keyword: ITO-PET film

Search Result 74, Processing Time 0.032 seconds

ITO Films Deposited by Sputter Method of Powder Target at Room Temperature. (상온에서 분말타겟의 스퍼터에 의해 증착된 ITO박막)

  • 김현후;이재형;신성호;신재혁;박광자
    • Journal of the Korean institute of surface engineering
    • /
    • v.33 no.5
    • /
    • pp.349-355
    • /
    • 2000
  • Indium tin oxide (ITO) thin films have been deposited on PET (polyethylene terephthalate) and glass substrates by a do magnetron sputter method of powder target without heat treatments such as substrate heater and post heat treatment. During the sputtering deposition, sputtering parameters such as sputtering power, working pressure, oxygen gas mixture, film thickness and substrate-target distance are important factors for the high quality of ITO thin films. The structural, electrical and optical properties of as-deposited ITO oxide films are investigated by sputtering power, oxygen partial pressure and films thickness among the several sputtering conditions. XRD patterns of ITO films are affected by sputtering power and pressure. As the power and pressure are increased, (411) and (422) peaks of ITO films are grown strongly. Electrical resistivity is also increased, as the sputtering power and pressure are increased. Transmittance of ITO thin films in the visible light ranges is lowered with an increase of sputtering power and film thickness. Reflectance of ITO films in infra-red region is decreased, as the power and pressure is increased.

  • PDF

Indium Tin Oxide(ITO) Thin Film Deposition on Polyethylene Terephthalate(PET) Using Ion Beam Assisted Deposition(IBAD)

  • Bae, J.W.;Kim, H.J.;Kim, J.S.;Lee, Y.H.;Lee, N.E.;Yeom, G.Y.
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2000.01a
    • /
    • pp.81-83
    • /
    • 2000
  • Tin-doped indium oxide(ITO) thin films were deposited on polyethylene terephthalate(PET) at room temperature by oxygen ion beam assisted evaporator system and the effects of oxygen gas flow rate on the properties of room temperature ITO thin films were investigated. Plasma characteristics of the ion gun such as oxygen ions and atomic oxygen radicals as a function of oxygen flow rate were investigated using optical emission spectroscopy(OES). Faraday cup also used to measure oxygen ion density. The increase of oxygen flow rate to the ion gun generally increase the optical transmittance of the deposited ITO up to 6sccm of $O_2$ and the further increase of oxygen flow rate appears to saturate the optical transmittance. In the case of electrical property, the resistivity showed a minimum at 6 sccm of $O_2$ with the increase of oxygen flow rate. Therefore, the improved ITO properties at 6 sccm of $O_2$ appear to be more related to the incorporation of low energy oxygen radicals to deposited ITO film rather than the irradiation of high energy oxygen ions to the substrate. At an optimal deposition condition, ITO thin films deposited on PET substrates showed the resistivity of $6.6{\times}10^{-4}$ ${\Omega}$ cm and optical transmittance of above 90%.

  • PDF

Characteristics of Transparent Electromagnetic Wave Shielding Film (광투과 전자파 차폐필름의 특성)

  • Choi, Kwang-Nam;Kwak, Sung-Kwan;Kim, Dong-Sik;Chung, Kwan-Soo
    • 전자공학회논문지 IE
    • /
    • v.44 no.2
    • /
    • pp.21-25
    • /
    • 2007
  • Multilayer transparent electromagnetic wave shielding film with 1 m wide, was fabricated by using roll to roll DC plasma coating with ITO and Ag layer on PET substrate. By optimizing properly the design parameters, such as a processing condition, the surface resistance and the thickness of each layers, the homogeneous film could be obtained. Electromagnetic wave shielding film showed the high shielding effectiveness of 23dB(99.5%) in 2-18 GHz range and the transmittance of 83.1% in 400-700nm.

Characteristics of amorphous indium tin oxide films on PET substrate grown by Roll-to-Roll sputtering system (저온 Roll-to-Roll 스퍼터 시스템을 이용하여 PET 기판위에 성막 시킨 ITO 박막의 전기적, 광학적, 구조적 특성)

  • Cho, Sung-Woo;Bae, Jung-Hyeok;Choi, Kwang-Hyuk;Moon, Jong-Min;Jeong, Jin-A;Jeong, Soon-Wook;Kim, Han-Ki
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2007.11a
    • /
    • pp.380-381
    • /
    • 2007
  • This paper reports on the deposition conditions and properties of ITO films used as electrode layer in a organic light emitting diodes on a PET substrate. The deposition technique employed was specially designed roll-to-roll sputtering. The oxide was deposited at room temperature in an argon and oxygen plasma on a transparent conducting ITO layer on a PET film. The influence of deposition parameters such as DC power, working pressure and oxygen partial pressure has been investigated, in order to obtain the best compromise between a high deposition rate and adequate electro-optical properties. Electrical and optical properties of ITO films were analyzed by Hall measurement examinations with van der pauw geometry at room temperature and UV/Vis spectrometer analysis, respectively. In addition, the structural properties and surface smoothness were measured by x-ray diffraction and scaning electron microscopy, respectively. From optimized ITO films grown by roll-to-roll sputter system, good electrical$(6.44{\times}10^{-4}\;{\Omega}-cm)$ and optical(above 86 % at 550 nm) properties were obtained. Also, the ITO films exhibited amorphous structure and very flat surface beacause of low deposition temperature.

  • PDF

Low Temperature Deposition of ITO Film Using Magnetron Sputtering (스퍼터링에 의한 ITO 박막의 저온 증착 및 측정)

  • Jang, Seung-Hyeon;Lee, Yeong-Min;Yang, Ji-Hun;Jeong, Jae-In
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2009.05a
    • /
    • pp.172-172
    • /
    • 2009
  • 전자부품 소재의 경량화 및 연성화 경향에 따라 고분자 소재의 수요가 증가하고 있으며 이에 따라 각종 디스플레이 소자의 투명 도전막으로 사용되는 ITO(Indium-tin Oxide) 피막의 저온 박막 성장에 대한 관심이 증가하고 있다. 본 연구에서는 PET 기판의 전처리 및 후처리 조건에 따라 저온에서 ITO 피막을 제조하고 전처리 및 후처리 조건이 ITO 피막의 면저항 및 투과율 그리고 결정성에 미치는 영향에 대해서 연구하였다.

  • PDF

RF Bias Effect of ITO Thin Films Reactively Sputtered on PET Substrates at Room Temperature

  • Kim, Hyun-Hoo;Shin, Sung-Ho
    • Transactions on Electrical and Electronic Materials
    • /
    • v.5 no.3
    • /
    • pp.122-125
    • /
    • 2004
  • ITO films were deposited on polyethylene terephthalate substrate by a dc reactive magnetron sputtering using rf bias without substrate heater and post-deposition thermal treatment. The dependency of rf substrate bias on plasma sputter processing was investigated to control energetic particles and improve ITO film properties. The substrate was applied negative rf bias voltage from 0 to -80 V. The composition of indium, tin, and oxygen atoms is strongly depended on the rf substrate bias. Oxygen deficiency is the highest at rf bias of -20 V. The electrical and optical properties of ITO films also are dominated obviously by negative rf bias.

Characteristics of the indium tin oxide film grown on PES and PET substrates by a low-frequency magnetron sputtering method

  • Jung, Sang-Kooun;Lee, Sung-Ho;Kim, Myung-Chan;Lee, Do-Kyung;Cho, Yong;Park, Duck-Kyu;Sohn, Sang-Ho
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2005.07b
    • /
    • pp.1560-1563
    • /
    • 2005
  • In this study, we introduce indium tin oxide (ITO) thin films grown by using a low-frequency magnetron sputtering method (LFMSM). Characteristics of the ITO thin films deposited on polyethersulfone (PES) and polyethylene terephthalate (PET) substrates are investigated. Experiments were carried out as a function of deposition time. ITO thin films on polymer substrates revealed amorphous structure. The optical, the electrical and structural properties of the films on PES substrate are better than those on PET substrates.

  • PDF

Chromaticity (b*) and Transmittance of ITO Thin Films Deposited on PET Substrate by Using Roll-to-Roll Sputter System (롤투롤 스퍼터를 이용하여 PET 기판 위에 제조된 ITO 박막의 색도(b*) 및 투과도 연구)

  • Seo, Sung-Man;Kang, Bo-Gab;Kim, Hu-Sik;Lim, Woo-Taik;Choi, Sik-Young
    • Korean Journal of Materials Research
    • /
    • v.19 no.7
    • /
    • pp.376-381
    • /
    • 2009
  • Indium Tin Oxide (ITO) thin films on Polyethylene Terephtalate (PET) substrate were prepared by Roll-to-Roll sputter system with targets of 5 wt% and 10 wt% $SnO_2$ at room temperature. The influence of the chromaticity (b*) and transmittance properties of the ITO Films were investigated. The ITO thin films were deposited as a function of the DC power, rolling speed, and Ar/$O_2$ gas flow ratio, and then characterized by spectrophotometer. Their crystallinity and surface resistance were also analyzed by X-ray diffractometer and 4-point probe. As a result, the chromaticity (b*) and transmittance of the ITO films were broadly dependent on the thickness, which was controlled by the rolling speed. When the ITO films were prepared with the DC power of 300 W and the Ar/$O_2$ gas flow ratio of 30/1 sccm using 10 wt% $SnO_2$ target as a function of the rolling speeds 0.01 through 0.10 m/min, its chromaticity (b*) and transmittance were about -4.01 to 11.28 and 75.76 to 86.60%, respectively. In addition, when the ITO films were deposited with the DC power of 400W and the Ar/$O_2$ gas flow ratio of 30/2 sccm used in 5 wt% $SnO_2$ target, its chromaticity (b*) and transmittance were about -2.98 to 14.22 and 74.29 to 88.52%, respectively.

Electrical Properties of ITO Thin Film Deposited by Reactive DC Magnetron Sputtering using Various Sn Concentration Target (반응성 DC 마그네트론 스퍼터링법으로 증착한 ITO 박막의 전기적 특성 평가)

  • Kim, Min-Je;Jung, Jae-Heon;Song, Pung-Keun
    • Journal of the Korean institute of surface engineering
    • /
    • v.47 no.6
    • /
    • pp.311-315
    • /
    • 2014
  • Indium tin oxide (ITO) thin films (30 nm) were deposited on PET substrate by reactive DC magnetron sputtering using In/Sn(2, 5 wt.%) metal alloy target without intentionally substrate heating during the deposition under different DC powers of 70 ~ 110 W. The electrical properties were estimated by Hall-effect measurements system. The resistivity of ITO thin film deposited using In/Sn (5 wt.%) metal alloy target at low DC power increased with increasing annealing time. However, they increased with increasing annealing time at high DC power. In the case of ITO (Sn 2 wt%), we can't find clear change in resistivity with increasing annealing time. However, carrier density and mobility showed difference behavior due to change of oxygen vacancy.