• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.244.1-244.1
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• 2014

디스플레이 패널의 터치 스크린에 가장 널리 사용되는 ITO 전극은 사용자의 눈에 전극 면이 시각적으로 구분되지 않도록 해야 한다. 따라서 최근에는 ITO 전극 면이 구분되지 않도록 하기 위해 다층 박막으로 이루어진 인덱스 매칭(index matching, IM) 기술을 이용하여 ITO 전극 필름을 제작하고 있다. 이러한 인덱스 매칭된 ITO 필름은 기판이나 공정 조건, 인덱스 매칭 층의 물질 종류에 따라 ITO 박막의 전기적 광학적 특성이 각각 다르게 나타나기 때문에 이에 대한 많은 연구가 이루어지고 있다. 본 연구에서는 롤투롤 스퍼터링(roll to roll sputtering) 방법으로 고굴절과 저굴절이 순차적으로 코팅 처리된 PET 기판 위에 ITO 박막을 증착하여 IM-ITO 필름을 제작하고 전기적 광학적 특성을 관찰하였다. 이를 위해 습식(wet) 코팅 방법으로 저굴절층과 고굴절층을 PET 필름 위에 코팅하여 IM층을 제작한 PET 필름 위에 ITO 박막을 증착하고, $150^{\circ}C$로 후 열처리를 하여 인덱스 매칭된 ITO 필름을 제작하였다. 제작된 필름은 GIXD를 이용하여 박막의 구조와 결정성을 조사하였고, 면저항 측정기와 홀측정 장치를 이용하여 전기적 특성을 관찰하였다. 그리고 분광광도계와 탁도(haze) 측정기를 이용하여 광학적 특성을 조사하였다. 본 연구를 통해 롤투롤 스퍼터링 방법으로 유무기 복합막으로 구성된 IM-ITO 박막의 전기적 광학적 구조적 특성에 대해 보고하고자 한다.

• Journal of the Korean Vacuum Society
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• v.8 no.4A
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• pp.438-444
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• 1999

The characterization of the reactively sputtered ITO layer on the PET film has been studied. The PEM device has been used to determine the optimum stoichimetry through control of the amount of oxygen incorporated into the alloy target and the optimum operation conditions to produce films with the highest electrical conductivity and visible transparency. The PEP film was pre-treated under the plasma discharge condition to remove the adsorbed gases and to modify the surface morphology. The results revealed that by adjusting the flow rate of oxygen with the spectral intensity of indium target, the composition of plasma gas can be kept constant during the entire deposition period. The resistivity of ITO film obtained was fond to be about 37$\Omega\Box$, and the transmittance of visual range was about 86%.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.316-316
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• 2008

Using an evaporation method, $SiO_2$ was deposited as a buffer layer between a flexible PET substrate and a ITO film deposited by DC magnetron sputtering and electro-optical properties were investigated with thickness variance of $SiO_2$ layers. After coating a $SiO_2$ layer and a ITO film, the ITO/$SiO_2$/PET was heated up to $200^{\circ}C$ and the resistivity and the transmittance were measured by hall effect measurement system and UV/VIS/NIR spectroscopy. As a result of depositing a $SiO_2$ buffer layer, the resistivity increased and the transmittance and adhesion property were enhanced than ITO films with no buffer layers and the resistivity was lowered as $SiO_2$ thickness increased from 50 $\AA$ to 100 $\AA$. It was found that the transmittance was independent of annealing temperature variance in $150^{\circ}C{\sim}200^{\circ}C$ and the resistivity decreased as the temperature increased and especially decreasing rate of the resistivity was higher as the buffer layer thickness was thinner. So under optimized depositing of $SiO_2$ buffer layers and post-annealing of ITO/$SiO_2$/PET, ITO films with enhanced adhesion, electro-optical properties can obtained.

• Proceedings of the KSME Conference
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• 2005.11a
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• pp.132.1-132.1
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• 2005

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.336.1-336.1
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• 2014

대표적인 TCO 물질인 ITO는 디스플레이 패널이나 태양 전지 등과 같은 소자에 널리 사용되고 있다. 최근에는 대량생산 및 대면적화, 그리고 유연 디스플레이 응용을 위해 롤투롤 스퍼터링(roll to roll sputtering) 공정을 이용하여 플라스틱 기판에 ITO박막을 증착하여 ITO 필름을 제작하고 있다. 롤투롤 방식으로 ITO 필름의 제작 시 공정 변수에 따라 ITO 박막의 전기적 광학적 물성 변화가 매우 크기 때문에, 공정 변수에 따른 ITO 박막의 전기적, 광학적 특성 변화에 대한 연구의 필요성이 매우 높아지고 있다. 따라서 본 연구에서는 롤투롤 스퍼터링 방법으로 PET 기판 위에 다양한 조건으로 ITO 박막을 증착하여 공정변수에 따른 ITO 박막의 물성을 조사 하였다. 이를 위해 ITO (In/Sn=95/5 wt.%) 타겟을 사용하여 DC 파워와 산소 분압비, 열처리 온도 등을 변화시켜 낮은 면저항과 높은 광투과도를 가지는 최적의 ITO 증착 조건을 찾은 후 ITO 박막을 PET 기판 위에 두께 별로 증착 하였다. ITO 박막의 두께와 열처리 온도에 따른 전기적 특성은 면저항 측정기와 홀 측정 장치를 이용하여 분석하였고, 분광광도계와 탁도 측정기를 이용하여 광학적 특성을 관찰하였다. 또한, GIXD를 이용하여 이들 박막의 구조와 결정성에 대한 조사를 수행하였다. 이 결과들로부터 산소 분압비에 따른 ITO/PET 박막의 저항 특성 변화와 ITO 박막의 두께와 열처리 온도에 따른 구조적, 전기적, 광학적 특성을 조사하여, 롤투롤 스퍼터링법에서 공정 조건에 따른 ITO/PET 필름의 물성변화를 보고하고자 한다.

• Korean Journal of Materials Research
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• v.21 no.5
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• pp.255-262
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• 2011

This paper has relatively high technical standard and experimental skill. The fabrication of TCO film with high transparency, low resistance and low chromaticity require exact control of several competing factors. This paper has resolved these problems reasonably well, thus recommended for publication. Indium tin oxide(ITO) thin films were by D.C. magnetron roll-to-roll sputter system utilizing ITO and $SiO_2$ targets of ITO and $SiO_2$. In this experiment, the effect of D.C. power, winding speed, and oxygen flow rate on electrical and optical properties of ITO thin films were investigated from the view point of sheet resistance, transmittance, and chromaticity($b^*$). The deposition of $SiO_2$ was performed with RF power of 400W, Ar gas of 50 sccm and the deposition of ITO, DC power of 600W, Ar gas of 50 sccm, $O^2$ gas of 0.2 sccm, and winding speed of 0.56m/min. High quality ITO thin films without $SiO_2$ layer had chromaticity of 2.87, sheet resistivity of 400 ohm/square, and transmittance of 88% and $SiO_2$-doped ITO Thin film with chromaticity of 2.01, sheet resistivity of 709 ohm/square, and transmittance of more than 90% were obtained. As a result, $SiO_2$ was coated on PET before deposition of ITO, their chromaticity($b^*$) and transmittance were better than previous results of ITO films. These results show that coating of $SiO_2$ induced arising chromaticity($b^*$) and transmittance. If the thickness of $SiO_2$ is controlled, sheet resistance value of ITO film will be expected to be better for touch screen. A four point probe and spectrophotometer are used to investigate the properties of ITO thin films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.1
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• pp.67-73
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• 2009

The stress-strain behavior and its effects on the crack initiation and growth of ITO film on PET substrate with a sheet resistance of 45 ohms/sq were investigated. Electrical resistance increased gradually at the strain of 0.7% in the elastic to plastic transition region of the stress strain curves. Numerous cracks were observed after 1% strain and the increase of the resistance can be linked to the cracking of ITO thin films. The onset strain for the increase of resistance increased with increasing strain rate, suggesting the crack initiation is dependent on the strain rate. Upon loading, the initial cracks perpendicular to the tensile axis were observed and propagated the whole sample width with increasing strain. The spacing between horizontal cracks is thought to be determined by the fracture strength and the interfacial strength between ITO and PET. The crack density increased with increasing strain. The spacing between horizontal cracks (perpendicular to the stress axis) increased with decreasing strain rate, The increase of crack density with decreasing strain rate can be attributed to the higher fraction of the plastic strain to the total strain at a given total strain. As the strain increased over 5% strain, cracks parallel to the stress axis were developed and increased in number with strain, accompanied by drastic increases of resistance.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.04a
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• pp.69-70
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• 2007

FTS(Facing Target Sputtering) 장치를 이용하여 polyethylene terephthalate (PET) 필름 위에 ITO(Indium Tin Oxide) 박막을 성장시키고 이들의 광학적, 구조적 특성을 조사하였다. 막 두께는 150 nm로 고정하였고, 인가적력과 산소 가스 유량비를 변수로 박막을 합성 하였다. 그 결과 80 % 이상의 광투과율과 Rms 26.8 nm 값을 갖는 ITO / PET 박막을 합성하였다.

• Journal of the Korean Chemical Society
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• v.65 no.2
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• pp.125-132
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• 2021

An electrochromic nickel oxide thin film was fabricated on a flexible PET/ITO substrate using a nanocrystallite- dispersed coating sol and bar coater. Nanocrystalline NiOx of 3-4 nm crystallite size was first synthesized by base precipitation and thermal conversion. This NiOx nanocrystallite powder was mechanically dispersed in an alcoholic solvent mixed with a silane binder to prepare a coating sol for thin film. This sol method is different from the normal sol-gel method in that it does not require the conversion of precursor by heat treatment. Therefore, this method provides a very facile method to prepare NiOx thin films on any kind of substrate and it can be easily applied to mass production. The electrochromic performance of this NiOx thin film on PET/ITO electrode with a thickness of about 400 nm was investigated in a nonaqueous LiClO4 electrolyte solution by cyclic voltammetric and repeated chronoamperometric measurements in conjunction with spectrophotometry. The visible light modulation of 44% and the colorization efficiency of 41 ㎠/C at 550 nm were obtained at the step potentials of -0.8/+1.2 V vs Ag and a duration of 30 s.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.24 no.6
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• pp.252-255
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• 2014

Indium tin oxide (ITO) films with various oxygen partial pressure from 0 to $6{\times}10^{-5}$ Pa were prepared onto polyethylene terephthalate (PET) using RF magnetron sputtering at room temperature. The structural, electrical and optical properties of the grown ITO films were investigated as a function of the oxygen partial pressure. The amorphous nature of the ITO films was dominant at the partial pressure below $1{\times}10^{-5}$ Pa and the degree of crystallinity increased as the oxygen concentration increased further. This structural change comes with the increased carrier concentration and reduction of the electrical resistivity down to $9.8{\times}10^{-4}{\Omega}{\cdot}cm$. The average transmittance (at 400~800 nm) of the ITO deposited on the PET substrates increased as the oxygen partial pressure increased and transmittance above 80 % was achieved with the partial pressure of $4{\times}10^{-5}$ Pa. The results show that the choice of optimal oxygen partial pressure can present improved film crystallinity, the increased carrier concentration, and the enhancement in the electrical conductivity.