• 제목/요약/키워드: ITO glass

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Simulation study on the optical structures for improving the outcoupling efficiency of organic light-emitting diodes

  • Jeong, Su Seong;Ko, Jae-Hyeon
    • Journal of Information Display
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    • 제13권4호
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    • pp.139-143
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    • 2012
  • In this study, optical simulation was used to compare three optical structures that could be applied to the typical organic light-emitting diode to increase the outcoupling efficiency. These were spherical scattering particles (treated as Mie scatterers) embedded in the glass substrate, microlenses formed on the glass substrate, and a diffusing layer (DL) with a Gaussian scattering distribution function inserted between the indium tin oxide (ITO) and the glass substrate. It was found that the application of microlens array and that of scattering particles in the glass substrate exhibited similar enhancements in the outcoupling efficiency when the density and the refractive index of the scattering particles were optimized. The DL located at the interface between the glass and the ITO further enhanced the efficiency because it could further extract the trapped light in the waveguide mode. The appropriate combination of these three structures increased the outcoupling efficiency to about 42%, which is much greater than the typical values of 15-20% when there is no optical structure for light extraction.

Effect of ZnO Buffer Layers on the Crystallization of ITO Thin Film at Low Temperature

  • Seong, Chung-Heon;Shin, Yong-Jun;Jang, Gun-Eik
    • Transactions on Electrical and Electronic Materials
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    • 제13권4호
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    • pp.208-211
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    • 2012
  • In the present study, a ZnO thin film, as a buffer layer of ITO (indium tin oxide) film was deposited on glass substrates by RF magnetron sputtering at low temperature of $150^{\circ}C$. In order to estimate the optical characteristics and compare with the experimental results in Glass/ZnO(100 nm)/ITO(35 nm) multilayered film, the simulation program, EMP (Essential Macleod Program) was adopted. The sheet resistance and optical transmittance of the films were measured using the four-point probe method and spectrophotometer, respectively. From X-ray diffraction patterns, all the films deposited at $150^{\circ}C$ demonstrated only the amorphous phase. Optical transmittance was the highest at a ZnO thickness of 100 nm. The ITO(35 nm)/ZnO(100 nm) film exhibits an optical transmittance of >92% at 550 nm. The multilayered film showed an electrical sheet resistance of 407 ${\Omega}/sq.$, which is significantly better than that of a single-layer ITO film without a ZnO buffer layer (815 ${\Omega}/sq.$).

Polyimide 막 공정이 ITO Glass의 특성에 미치는 영향 (The effect on characteristic of ITO(glass) by polyimide thin film process)

  • 김호수;김한일;정순원;구경완;한상옥
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.857-860
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    • 2002
  • The material that is both conductive in electricity and transparent to the visible-ray is called transparent conducting thin film. It has many field of application such as solar cell, liquid crystal display, transparent electrical heater, selective optical filter, and a optical electric device. In this study, indium tin oxide (ITO ; Sn-doped $In_2O_3$) thin films were deposited on $SiO_2$/soda-lime glass plates by a dc magnetron sputtering technique. The crystallinity and electrical properties of the films were investigated by X-ray diffraction(XRD), atomic force microscopy (AFM) scanning and 4-point probe. The optical transmittance of ITO films in the range of 300-1000nm were measured with a spectrophotometer. As a result, we obtained polycrystalline structured ITO films with (222), (400), and (440) peak. Transmittance of all the films were higher than 90% in the visible range.

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ITO 패턴의 식각 조건에 따른 OLED 특성에 관한 연구 (A Study on OLED Characteristics according to etching conditions of ITO Pattern)

  • 이의식;이병욱;이태성;이근우;이종하;문순권;홍진수;김창교
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 학술대회 및 기술세미나 논문집 디스플레이 광소자
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    • pp.49-51
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    • 2006
  • OLEOs was fabricated by PLD method. Wet etching process and plasma treatment of ITO on the glass were performed to extend the lifetime of the OLED and increase its brightness. The NPB, $Alq_3$, Li-Benzoate and AI layers on ITO pattern on the glass were deposited by PLO method, sequentially. When the etched ITO was treated by $O_2$ plasma with RF power of 50W, the best result was obtained. The lifetime of the OLED treated by $O_2$ plasma was extended from 3,770sec to 12,586sec compared to that without the plasma treatment.

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ITO/metal/ITO 적층형 박막 메탄가스 센서의 감지특성 연구

  • 채주현;김대일
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 춘계학술발표대회
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    • pp.19.2-19.2
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    • 2009
  • ITO는 n형 반도체 특성을 가지며 이와 동시에 높은 가시광투과율과 낮은 전기전도도를 가짐으로써 다양한 투명전극소재와 가스 검출센서로 많이 활용되고 있다. 본 연구에서는 RF magnetron sputtering 법을 이용하여 상온에서 glass 기판 위에 두께 100nm로 ITO 그리고 하층 ITO 박막 (두께 50 nm) 위에 층간 금속 (두께 5 nm)을 증착하고 다시 상부 ITO 박막 (두께 45 nm)을 증착하여 3층의 적층형 박막센서를 제작하였다. 층간 금속으로는 Au와 Cu를 각각 사용하였다. 박막 증착 후엔 진공분위기에서 $150^{\circ}C$, $300^{\circ}C$로 열처리 과정을 거쳐 열처리 전후의 물성 및 감지특성을 비교해보았다. 분석방법으로는 XRD, SEM, AFM, Hall effect 장치 등을 이용하였다. 분석 결과 $300^{\circ}C$에서 진공 열처리한 ITO/Au/ITO(IAI) 박막센서가 높은 결정화도 와 전기적 특성이 나타났으며, 0 에서 1000ppm 까지의 메탄가스의 민감도 측정에서도 열처리된 IAI 박막센서가 기존의 ITO 박막센서보다도 약 70% 정도 향상된 민감도를 나타내었다.

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Polyethersulfone(PES) 및 유리 기판위에 제작된 PVP 게이트 절연막의 전기적 특성 (Electrical Properties of PVP Gate Insulation Film on Polyethersulfone(PES) and Glass Substrates)

  • 신익섭;공수철;임현승;박형호;장호정
    • 마이크로전자및패키징학회지
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    • 제14권1호
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    • pp.27-31
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    • 2007
  • 휨성 유기박막트랜지스터(organic thin film transistor, OTFT)를 제작하기 위하여 게이트 절연막으로 PVP(poly-4-vinylphenol) 유기막을 이용하여 MIM (metal-insulator-metal) 구조의 캐패시터 소자를 제작하였다. 유기 절연층의 형성은 Al/PES (polyethersulfone) 기판과 ITO/Glass 기판 위에 PVP를 용질로, PGMEA(propylene glycol monomethyl ether acetate)를 용매로 사용하였다 또한 열경화성 수지인 poly(melamine-co-(ormaldehyde)를 사용하여 cross-linked PVP 절연막을 합성하여 스핀코팅법으로 소자를 형성하였다. 제작된 소자에 대해 절연막 두께와 기판 종류에 따른 전기적 특성을 조사한 결과 Al/PES 기판을 사용하였을때 누설전류는 1.3 nA로 ITO/glass 기판을 사용했을때의 27.5 nA보다 크게 개선되었다. 또한 제작된 모든 캐패시터 소자의 정전용량은 $1.0{\sim}1.2nF/cm^2$ 범위로 나타났으며 계산값과 매우 유사한 결과를 얻을 수 있었다.

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SiOC 절연박막 특성에 의존하는 ITO 투명박막의 전기적인 특성과 오믹접합의 효과 (Ohmic Contact Effect and Electrical Characteristics of ITO Thin Film Depending on SiOC Insulator)

  • 오데레사
    • 한국재료학회지
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    • 제25권7호
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    • pp.352-357
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    • 2015
  • To research the characteristics of ITO film depending on a polarity of SiOC, specimens of ITO/SiOC/glass with metal-insulator-substrates (MIS) were prepared using a sputtering system. SiOC film with 17 sccm of oxygen flow rate became a non-polarity with low surface energy. The PL spectra of the ITO films deposited with various argon flow rates on SiOC film as non-polarity were found to lead to similar formations. However, the PL spectra of ITO deposited with various argon flow rates on SiOC with polarity were seen to have various features owing to the chemical reaction between ITO and the polar sites of SiOC. Most ITO/SiOC films non-linearly showed the Schottky contacts and current increased. But the ITO/SiOC film with a low current demonstrated an Ohmic contact.

Optimization of Amorphous Indium Gallium Zinc Oxide Thin Film for Transparent Thin Film Transistor Applications

  • Shin, Han Jae;Lee, Dong Ic;Yeom, Se-Hyuk;Seo, Chang Tae
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.352.1-352.1
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    • 2014
  • Indium Tin Oxide (ITO) films are the most extensively studied and commonly used as ones of TCO films. The ITO films having a high electric conductivity and high transparency are easily fabricated on glass substrate at a substrate temperature over $250^{\circ}C$. However, glass substrates are somewhat heavy and brittle, whereas plastic substrates are lightweight, unbreakable, and so on. For these reasons, it has been recently suggested to use plastic substrates for flexible display application instead of glass. Many reaearchers have tried to produce high quality thin films at rood temperatures by using several methods. Therefore, amorphous ITO films excluding thermal process exhibit a decrease in electrical conductivity and optical transparency with time and a very poor chemical stability. However the amorphous Indium Gallium Zinc Oxide (IGZO) offers several advantages. For typical instance, unlike either crystalline or amorphous ITO, same and higher than a-IGZO resistivity is found when no reactive oxygen is added to the sputter chamber, this greatly simplifies the deposition. We reported on the characteristics of a-IGZO thin films were fabricated by RF-magnetron sputtering method on the PEN substrate at room temperature using 3inch sputtering targets different rate of Zn. The homogeneous and stable targets were prepared by calcine and sintering process. Furthermore, two types of IGZO TFT design, a- IGZO source/drain material in TFT and the other a- ITO source/drain material, have been fabricated for comparison with each other. The experimental results reveal that the a- IGZO source/drain electrode in IGZO TFT is shown to be superior TFT performances, compared with a- ITO source/drain electrode in IGZO TFT.

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분광타원법을 이용한 PDP용 ITO 박막의 패턴 분석 (Analysis of patterned ITO layer of PDP thin films using spectroscopic ellipsometry)

  • 윤희삼;김상열
    • 한국광학회지
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    • 제14권3호
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    • pp.272-278
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    • 2003
  • 분광타원법을 이용하여 PDP용 ITO박막의 광학상수 및 패턴을 분석하였다. ITO 박막의 광물성은 로렌쯔 진동자 모델을 사용하고 ITO의 패턴에 의한 효과는 전체빔이 ITO와 유리기층을 덮는 면적비 가중치를 가진 반사율 평균방법으로 반영시켰다. PDP 다층박막을 구성하고 있는 유리기층 위의 ITO박막 패턴이 타원데이터에 미치는 영향을 분석하여 ITO가 패턴에서 차지하는 면적비를 결정하였다. 측정된 분광타원데이터에 최적맞춤한 ITO의 상대면적값이 예측값과 보이는 차이를 검토함으로써 분광타원법을 사용한 ITO패턴분석의 한계와 이를 극복하는 방법을 제시하였다.