• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.544-544
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• 2008

Metal-CMP 공정시 높은 압력을 가해 줌으로 인하여 금속배선의 디싱 현상과 에로젼 현상이 발생하고 다공성의 하부층에 균열이 생기는 문제점을 개선하고자, 낮은 하력에서 금속막의 광역 평탄화를 이룰 수 있는 ECMP(Electrochemical Chemical Mechanical Polishing)가 생겨나게 되었다. 본 논문에서는 다양한 전해액의 전류-전압 특성 곡선을 비교 분석하여, 패시베이션막이 형성되는 곳을 알 수 있었고, CV와 LSV 법을 통해 전기화학적인 특성을 고찰하였다.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.38 no.6
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• pp.404-411
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• 2001

In this paper, we have measured and analyzed the third-order intermodulation distortion(IMD3) mostly appeared in a laser diode(LD) of an optical link for CDMA signals to characterize the links with an inexpensive way. We analyzed adjacent channel power ratio(ACPR) of CDMA signals as a function of FA, which negatively affects ACPR.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.17 no.6 s.109
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• pp.519-528
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• 2006

This thesis is regarding of fabricating wibro PAM. First of all, we need to set specification based on link budget for wibro communication circumstance in order to develop PAM, then we decided specification concerning of wibro PAM by considering TTAS_Ko_06_0082R1 which is standarded in Korea, and IEEE Std. 802. 16d/e which is international standard. We selected the Doherty structure to increase efficiency, and pre-distorter structure to increase linearity. The fabricated PAM has not only a result of $26.5dB{\pm}1.0dB$ gain characteristics and maximum of -14 dB return loss characteristics in full frequency bands and full output ranges, but also a result of 37 dBc at 4 tone IMD characteristics which is improved result of 843 and a result of 31 dBc spurious characteristics which is improved result of 5 dB at 4.77 MHz offset point in status of having 27 % efficiency in the 26 dBm high power amplifier output signal. We confirmed the suggested structure is better than others by comparing with normal structure, balanced structure and Doherty structure without predistorter.

• Journal of Advanced Navigation Technology
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• v.8 no.2
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• pp.91-97
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• 2004

This paper presents the development of InGaAsP multiple quantum well asymmetric Fabry-Perot modulators(AFPM), which have a vertical structure and high performance and describes measurements of devices operating at 10GHz for next generation broadband wireless communication applications such as picocell systems. Advantages of the AFPM include low drive voltage, which is less than -2V, and -3dB coupling loss, good flatness of the frequency response and simple fiber alignment. A simple link demonstration has been introduced, resulting in 92dB/Hz spurious free dynamic range and 40dB inter-modulation distortion. This modulator could be use for broadband radio over fiber systems such as picocell and multiple RF links.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.26 no.8A
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• pp.1417-1427
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• 2001

본 논문에서는 밀리미터파를 이용하여 사용자에게 양방향 무선 멀티미디어의 구현을 가능케 하는 LMDS 송수신 모듈을 설계, 구현하였다. 제작된 LMDS 송수신 모듈은 신서사이져, 혼합기, 저잡음 증폭기, 고출력 증폭기, 듀플렉서 등으로 구성하였으며, 전체적으로는 전원부와 제어부를 통하여 이상여부를 감시하며, 송수신 모듈에 이상이 발생했을 때 이를 보호할 수 있도록 구현하였다. 여기서 DAVIC 표준에 맞도록 IF부 대역은 0.95∼1.45GHz의 500MHz 대역폭에서 동작하도록 제작하였고, 상하향 혼합기는 격리도 특성을 최대화하였으며, 이를 위해 하이브리드 링형을 이용한 다이오드 평형 구조를 적용하여 설계하였다. 혼합기로 주입되는 Local 주파수는 안정도가 높아야 함으로 유전체 공진형 발진기로 구현하였다. 또한 저잡음 증폭기와 고출력 증폭기는 정보통신부에서 공고한 3사 주파수 대역을 모두 수용할 수 있도록 24GHz∼26.5GHz의 대역에서 정상적인 동작을 할 수 있도록 설계하였으며, 특히 저잡음 증폭기는 잡음 환경에서 작은 신호를 손실 없이 얻을 수 있도록 잡음지수를 최소화하고, 30dB 이상의 충분한 이득이 구현되도록 하였다. 고출력 증폭기는 15dBm 이상의 출력을 송신하면서도 선형성에 문제가 없도록 혼변조왜곡(IMD) 특성을 고려하여 설계하였다. 그리고 듀플렉서는 우수한 주파수 선택도와 낮은 삽입손실 특성을 갖도록 송수신 필터 모두 5개의 공진기를 포함한 Chebyshev형 구조를 갖으며 생산성이 뛰어난 모노리딕형으로 구현하여, LMDS 송수신 성능을 구현하였다.

• The Journal of the Korea institute of electronic communication sciences
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• v.7 no.2
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• pp.221-226
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• 2012

In this paper, wideband two-stage amplification stage was designed, fabricated and evaluated. The proposed amplification stage with a novel gain control method have a high gain, low noise and high linearity performance. It is consisted of common emitter amplifier as the first stage, cascode gain control amplifier as second stage and power detector which sense the received signal strength. The proposed amplification stage shows a total gain of 29 dB~37 dB, noise fiugre of 1.5 dB at operating band and high linearity performance as the IMD (third intermodulation distortion) level is below the noise level of the measurement equipment at the control voltage 2.0 V generated from power detector under the strong electric field condition.

• Proceedings of the KIEE Conference
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• 2004.07c
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• pp.1600-1604
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• 2004

As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric(IMD) layer with free-defect. The effect of alternative commerical slurries pads, and post-CMP cleaning alternatives are discuess, with removal rate, scratch dentisty, surface roughness, dishing, erosion and particulate density used as performance metrics. we investigated the performance of $SnO_2$-CMP process using commonly used silica slurry, ceria slurry, tungsten slurry. This study shows removal rate and nonuniformity of $SnO_2$ thin film used to gas sensor by using Ceria, Silica, W-Slurry after CMP process. This study also shows the relation between partical size and CMP with partical size analysis of used slurry.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.04b
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• pp.93-96
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• 2004

As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric(IMD) layer with free-defect. The effect of alternative commerical slurries pads, and post-CMP cleaning alternatives are discuess, with removal rate, scratch dentisty, surface roughness, dishing, erosion and particulate density used as performance metrics. we investigated the performance of $SnO_2$-CMP process using commonly used silica slurry, ceria slurry, tungsten slurry. This study shows removal rate and nonuniformity of $SnO_2$ thin film used to gas sensor by using Ceria, Silica, W-Slurry after CMP process. This study also shows the relation between partical size and CMP with partical size analysis of used slurry.

• 한국정보통신설비학회:학술대회논문집
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• 2006.08a
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• pp.15-18
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• 2006

We have proposed a broadband analog feedforward optical transmitter using a wideband $180^{\circ}$ hybrid coupler instead of conventional frequency-sensitive phase shifter with the narrow bandwidth property using a wideband $180^{\circ}$ hybrid coupler, the wide-band linearization technique enhances the linearity of the feedforward optical transmitter. In two-tone cases, the $3^{rd}-IMD$ products was enhanced more than 10 dB in 385 MHz range(1.375$\sim$l.76 GHz).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.389-392
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• 2004

As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric(IMD) layer with free-defect. The effect of alternative commerical slurries pads, and post-CMP cleaning alternatives are discuess, with removal rate, scratch dentisty, surface roughness, dishing, erosion and particulate density used as performance metrics. we investigated the performance of $SnO_2$-CMP process using commonly used silica slurry, ceria slurry, tungsten slurry. This study shows removal rate and non-uniformity of $SnO_2$ thin film used to gas sensor by using Ceria, Silica, W-Slurry after CMP process. This study also shows the relation between particle size and CMP with particle size analysis of used slurry.