• Journal of the Korean Physical Society
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• v.80
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• pp.817-851
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• 2022

Nonthermal biocompatible plasma (NBP) sources operating in atmospheric pressure environments and their characteristics can be used for plasma bioscience, medicine, and hygiene applications, especially for COVID-19 and citizen. This review surveyed the various NBP sources, including a plasma jet, micro-DBD (dielectric barrier discharge) and nanosecond discharged plasma. The electron temperatures and the plasma densities, which are produced using dielectric barrier discharged electrode systems, can be characterized as 0.7 ~ 1.8 eV and (3-5) × 10^14-15 cm^-3, respectively. Herein, we introduce a general schematic view of the plasma ultraviolet photolysis of water molecules for reactive oxygen and nitrogen species (RONS) generation inside biological cells or living tissues, which would be synergistically important with RONS diffusive propagation into cells or tissues. Of the RONS, the hydroxyl radical [OH] and hydrogen peroxide H₂O₂ species would mainly result in apoptotic cell death with other RONS in plasma bioscience and medicines. The diseased biological protein, cancer, and mutated cells could be treated by using a NBP or plasma activated water (PAW) resulting in their apoptosis for a new paradigm of plasma medicine.

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.2
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• pp.95-102
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• 2001

Hafnium oxide thin films for gate dielectric were deposited at $300^{\circ}C$ on p-type Si (100) substrates by plasma enhanced chemical vapor deposition (PECVD) and annealed in $O_2$ and $N_2$ ambient at various temperatures. The effect of hydrogen treatment in 4% $H_2$ at $350^{\circ}C$ for 30 min on the electrical properties of $HfO_2$for gate dielectric was investigated. The flat-band voltage shifts of $HfO_2$capacitors annealed in $O_2$ambient are larger than those in $N_2$ambient because samples annealed in high oxygen partial pressure produces the effective negative charges in films. The oxygen loss in $HfO_2$films was expected in forming gas annealed samples and decreased the excessive oxygen contents in films as-deposited and annealed in $O_2$ or $N_2$ambient. The CET of films after hydrogen forming gas anneal almost did not vary compared with that before hydrogen gas anneal. Hysteresis of $HfO_2$films abruptly decreased by hydrogen forming gas anneal because hysteresis in C-V characteristics depends on the bulk effect rather than $HfO_2$/Si interface. The lower trap densities of films annealed in $O_2$ambient than those in $N_2$were due to the composition of interfacial layer becoming closer to $SiO_2$with increasing oxygen partial pressure. Hydrogen forming gas anneal at $350^{\circ}C$ for samples annealed at various temperatures in $O_2$and $N_2$ambient plays critical role in decreasing interface trap densities at the Si/$SiO_2$ interface. However, effect of forming gas anneal was almost disappeared for samples annealed at high temperature (about $800^{\circ}C$) in $O_2$ or $N_2$ambient.

• Journal of the Korean Society for Heat Treatment
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• v.25 no.2
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• pp.80-84
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• 2012

An apparatus was constructed to nitrify small metallic sintered components by using a hollow-cathode discharge plasma method. A stainless steel basket, which contains a sintered part to be nitrified, is potentially grounded and serves as hollow-cathode electrode. Hollow-cathode plasma was produced by supplying the positive voltage to the anode. In this study sintered carbon iron and stainless steel were used as testing specimens. It was shown that an effective nitrifying took place by controlling the total pressure of nitrogen and hydrogen gas and applied voltage.

• Textile Coloration and Finishing
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• v.1 no.1
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• pp.7-18
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• 1989

The distinguishing characteristic of the glow discharge is that chemical reaction induced by partially ionized gases are limited only to the substrate surface. Most studies have been done on the plasma etching and polymerization. The graft polymerization in vapour phase by cold plasma has been rarely investigated. In this study the system of tub3ar reaction chamber with capacitively coupled electrode of alternative current of 60 Hz was employed for the graft polymerization. The graft polymerization of Acylic Acid(AA) onto the poly (ethylene terephthalate) (PET) was carried out by treatment of PET film and fabric by cold plasma (glow discharge of argon gas), followed by the supply of AA vapour. The graft yield was about 1 wt%. The surface property was determined by contact angle, the surface tension was evaluated by zisman’s plot and equation of surface tension mesurement. The results were as follows: 1. In order to obtain lower contact angle, it was effective to avoid the vicinity of electrodes for a setting position of substrate. 2. Contact angle affected on the monomer pressure and its duration of exposure to the acid vapour. 3. Polymer radical formation was influenced by the changes of the value of current density and plasma treatment time. 4. Total surface tension of plasma grafted PET film increased. With an increase in the carboxylic acid content, the dispersion force decreased, while, the polar force and hydrogen bonding force increased. 5. The contact angle decreased from $75^\circ$ to around $30^\circ$ by plasma grafting. There was no ageing effect on the contact angle after 4 months.

• Korean Chemical Engineering Research
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• v.44 no.2
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• pp.160-165
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• 2006

A Pd-Cu-Ni alloyed hydrogen membrane has fabricated on porous nickel support formed by nickel powder. Porous nickel support made by sintering shows a strong resistance to hydrogen embrittlement and thermal fatigue. Plasma surface modification treatment is introduced as pre-treatment process instead of conventional HCl wet activation. Nickel was electroplated to a thickness of $2{\mu}m$ in order in to fill micropores at the nickel support surface. Palladium and copper were deposited at thicknesses of $4{\mu}m$ and $0.5{\mu}m$, respectively, on the nickel coated support by DC sputtering process. Subsequently, copper reflow at $700^{\circ}C$ was performed for an hour in $H_2$ ambient. And, as a result PdCu-Ni composite membrane has a pinhole-free and extremely dense microstructure, having a good adhesion to the porous nickel support and infinite hydrogen selectivity in $H_2/N_2$ mixtures.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.30A no.1
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• pp.23-30
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• 1993

Hydrogenation on the top gate and bottom gate Poly-Si TET's was performed by using Nh$_{3}$ plasma and annealing SiN film deposited by PECVD and then the electric characteristics on Poly-Si TET were investigated. As the time of NA$_{3}$ plasma treatment increaes, on/off current ratio gradually increases and the swing value decreases. The trap densities of graim boundaries in Poly-Si decrease very much during the inital 20min of hydrogenation time, and the decreasing scale becomes smaller after 20 min. The electric characteristics of the top gate TFT are better than those of the bottom gate TFT, it is considered due to the defects at the interface between the Poly-Si and the underlayer, SiO$_{2}$. After NH$_{3}$ plasma was treated for 2 hours for the top gate TFT, as the aging time atroon temperature increases on current was not scacely changed and off current decreases more than 1 order. Gate current density recovers to original value after the aging treatment for 8 days and then the electric characteristics are finally improved. It is suggested that the degraded characteristics of gate oxide are improved, from the variations of C-V characteristics with aging time. For the hydrogenation of isothermal and isochronal annealing SiN film deposited by PECVD, the characteristics of Poly-Si TFT are improved with increasing annealing temperature and are not largely changed with increasing annealing time. This results is good in agreement with the hydrogen reduction in Sin film as variations of annealing temperature and time.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1608-1611
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• 2009

Here the hydrogen passivation treatment has been adopted to enhance the performance of poly-Si crystallized by YAG laser annealing (LA poly-Si). We have investigated the effects of passivation time, passivation power and passivation temperature on the hall mobility of the LA poly-Si and analyzed the mechanism of the hydrogen passivation preliminary. It has been found that the quality of the poly-Si annealed by YAG laser could be improved after proper hydrogen plasma treatment.

• Applied Chemistry for Engineering
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• v.30 no.6
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• pp.719-725
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• 2019

In this study, activated carbon fibers were treated with oxygen plasma to investigate gas sensing properties of the dimethyl methylphosphonate (DMMP), which is a simulant gas of the chemical warfare agent, according to oxygen functional group contents. As the flow rate of oxygen plasma treatment increased, oxygen groups were introduced to the surface of activated carbon fibers from 6.90 up to 36.6%, increasing the -OH group which influences the DMMP gas sensing properties. However, as the flow rate of oxygen plasma increases, the specific surface area tends to decrease because etching on the surface of activated carbon fibers occurs due to active species generated during the oxygen plasma treatment. The resistance change rate of the DMMP gas sensor increased from 4.2 up to 25.1% as the oxygen plasma treatment flow rate increased. This is attributed to the hydrogen bonding between DMMP gas and introduced hydroxyl functional group on activated carbon fibers by the oxygen plasma treatment. Therefore, the oxygen plasma is considered to be one of the important surface treatment methods for detecting chemical warfare agents at room temperature.

• Applied Chemistry for Engineering
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• v.35 no.1
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• pp.8-15
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• 2024

In this study, nitrogen plasma treatment was performed in 5, 10, and 15 minutes to improve the tetracycline adsorption performance of activated carbon. All nitrogen plasma-treated activated carbons showed improved tetracycline adsorption compared to untreated activated carbons. The nitrogen functional groups in activated carbon lead to chemisorption with tetracycline via π-π interactions and hydrogen bonding. In particular, in the nitrogen plasma treatment at 80 W and 50 kHz, the activated carbon treated for 10 minutes had the best adsorption performance. At this time, the nitrogen content on the surface of the activated carbon was 2.03% and the specific surface area increased to 1,483 m²/g. As a result, nitrogen plasma treatment of activated carbon improved its physical and chemical adsorption capabilities. In addition, since the adsorption experimental results were in good agreement with the Langmuir isotherm and pseudo-second order model, it was determined that the adsorption of tetracycline on the nitrogen plasma-treated activated carbon was dominated by chemical adsorption through a monolayer. As a result, nitrogen plasma-treated activated carbon can be used as an adsorbent to efficiently remove tetracycline from water due to the synergistic effect of physical adsorption and proactive chemical adsorption.

• Applied Chemistry for Engineering
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• v.30 no.2
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• pp.160-166
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• 2019

In this study, oxygen functional groups were introduced on activated carbon fibers (ACFs) by oxygen plasma treatment to improve the adsorption performance on an acetic acid which is a sick house syndrome induced gas. The active species was generated more as the flow rate of the oxygen gas increased during the plasma treatment. For this reason, the specific surface area (SSA) of the ACFs decreased with much more physical and chemical etching. In particular, the SSA of the sample (A-O60) injected with an oxygen gas flow rate of 60 sccm was reduced to about $1.198m^2/g$, which was about 6.95% lower than that of the untreated samples. On the other hand, the oxygen content introduced into the surface of ACFs increased up to 35.87%. Also, the adsorption performance on the acetic acid gas of the oxygen plasma-treated ACFs was improved by up to 43% compared to that of using the untreated ACFs. It is attributed to the formation of the hydrogen bonding due to the dipole moments between acetic acid molecules and oxygen functional groups such as O=C-O introduced by the oxygen plasma treatment.