• Title/Summary/Keyword: Hole arrays

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Hole-Array and Pillar-Array Patterned Si Solar Cells

  • Hong, Seung-Hyouk;Kim, Hyunyub;Kim, Hyunki;Kim, Joondong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.300.2-300.2
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    • 2013
  • Periodically shaped pillar-arrays and hole-arrays were fabricated on a Si wafer. Geometric features are similar in a periodic length of 4 ${\mu}m$ and a depth of 2 ${\mu}m$. For the hole-array patterns, positive PR processes were performed. UV exposed PR patterns were removed during a developing process to leave shapes of inversely replicated from a glass photomask. Meanwhile, negative PR processes were taken for the pillar-array patterns. UV exposed PR patterns were remained on a Si substrate having a same feature of patterns of a glass photomask. For an electrical aspect, a pillar structure has a short carrier-collection length resulting in the improved open-circuit voltage of 609 mV from 587 mV of a planar device. An improved performance may be achieved to reduce recombination loss along the patterning surface.

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Enhanced Cathodoluminescence of KOH-treated InGaN/GaN LEDs with Deep Nano-Hole Arrays

  • Doan, Manh-Ha;Lee, Jaejin
    • Journal of the Optical Society of Korea
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    • v.18 no.3
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    • pp.283-287
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    • 2014
  • Square lattice nano-hole arrays with diameters and periodicities of 200 and 500 nm, respectively, are fabricated on InGaN/GaN blue light emitting diodes (LEDs) using electron-beam lithography and inductively coupled plasma reactive ion etching processes. Cathodoluminescence (CL) investigations show that light emission intensity from the LEDs with the nano-hole arrays is enhanced compared to that from the planar sample. The CL intensity enhancement factor decreases when the nano-holes penetrate into the multiple quantum wells (MQWs) due to the plasma-induced damage and the residues. Wet chemical treatment using KOH solution is found to be an effective method for light extraction from the nano-patterned LEDs, especially, when the nano-holes penetrate into the MQWs. About 4-fold CL intensity enhancement factor is achieved by the KOH treatments after the dry etching for the sample with a 250-nm deep nano-hole array.

Hole and Pillar Patterned Si Absorbers for Solar Cells

  • Kim, Joondong;Kim, Hyunyub;Kim, Hyunki;Park, Jangho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.226-226
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    • 2013
  • Si is a dominant solar material, which is the second most abundant element in the earth giving a benefit in the aspect in cost with low toxicity. However, the inherent limit of Si has an indirect band gap of 1.1 eV resulting in the limited optical absorption. Therefore, a critical issue has been raised to increase the utilization of the incident light into the Si absorber. The enhancement of light absorption is a crucial to improve the performances and thus relieves the cost burden of Si photovoltaics. For the optical aspect, an efficient design of a front surface, where the incident light comes in, has been intensively investigated to improve the performance of photon absorption. Lambertian light trapping can be attained when the light active surface is ideally rough to increase the optical length by about 50 compared to a planar substrate. This suggests that an efficient design may reduce thickness of the Si absorber from the conventional 100~300 ${\mu}m$ to less than 3 ${\mu}m$. Theoretically, a hole-array structure satisfies an equivalent efficiency of c-Si with only one-twelfth mass and one-sixth thickness. Various approaches have been applied to improve the incident light utilization in a Si absorber using textured structures, periodic gratings, photonic crystals, and nanorod arrays. We have designed hole and pillar structured Si absorbers. Four-different Si absorbers have been simultaneously fabricated on an identical Si wafer with hole arrays or pillar arrays at a fixed depth of 2 ${\mu}m$. We have found that the significant enhanced solar cell performances both for the hole arrayed and pillar arrayed Si absorbers compared to that of a planar Si wafer resulting from the effective improvement in the quantum efficiencies.

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Fabrication of Ultra Small Size Hole Array on Thin Metal Foil (초미세 금속 박판 홀 어레이 가공)

  • Rhim S. H.;Son Y. K.;Oh S. I.
    • Transactions of Materials Processing
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    • v.15 no.1 s.82
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    • pp.9-14
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    • 2006
  • In the present research, the simultaneous punching of ultra small size hole of $2\~10\;{\mu}m$ in diameter on flat rolled thin metal foils was conducted with elastic polymer punch. Workpiece used in the present investigation were the rolled pure copper of $3{\mu}m$ in thickness and CP titanium of 1.5fm in thickness. The metal foils were punched with the dies and arrays of circular and rectangular holes were made. The process set-up is similar to that of the flexible rubber pad farming or Guerin process. Arrays of holes were punched successfully in one step forming. The punched holes were examined in terms of their dimensions. The effects of the wafer die hole dimension and heat treatment of the workpiece on ultra small size hole formation of the thin foil were discussed. The process condition such as proper die shape, pressure, pressure rate and diameter-thickness ratio (d/t) were also discussed. The results in this paper show that the present method can be successfully applied to the fabrication of ultra small size hole away in a one step operation.

Spectral Properties of THz-Periodic Metallic Structures

  • Kang, Chul;Kee, Chul-Sik;Sohn, Ik-Bu;Lee, Jong-Min
    • Journal of the Optical Society of Korea
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    • v.12 no.3
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    • pp.196-199
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    • 2008
  • We have investigated spectral properties of the periodic arrays of aluminum rods and holes on papers using the terahertz time-domain spectroscopy. The size of a rod(hole) is $600{\mu}m{\times}100{\mu}m$ and the spacing is $300{\mu}m$. The samples were fabricated by a femtosecond laser micromachining system. The periodic arrays of aluminum rods exhibit high reflection around 0.25 THz when the polarization of the THz pulse is parallel to the long axis of the rod, whereas the periodic arrays of holes exhibit high transmission around 0.25 THz when the polarization of the THz pulse is perpendicular to the long axis of the hole.

Fabrication of Plasmon Subwavelength Nanostructures for Nanoimprinting

  • Cho, Eun-Byurl;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.247-247
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    • 2012
  • Plasmon subwavelength nanostructures enable the structurally modulated color due to the resonance conditions for the specific wavelength range of light with the nanoscale hole arrays on a metal layer. While the unique properties offered from a single layer of metal may open up the potential applications of integrated devices to displays and sensors, fabrication requirements in nanoscale, typically on the order of or smaller than the wavelength of light in a corresponding medium can limit the cost-effective implementation of the plasmonic nanostructures. Simpler nanoscale replication technologies based on the soft lithography or roll-to-roll nanoimprinting can introduce economically feasible manufacturing process for these devices. Such replication requires an optimal design of a master template to produce a stamp that can be applied for a roll-to-roll nanoimprinting. In this paper, a master mold with subwavelength nanostructures is fabricated and optimized using focused ion beam for the applications to nanoimprinting process. Au thin film layer is deposited by sputtering on a glass that serves as a dielectric substrate. Focused ion beam milling (FIB, JEOL JIB-4601F) is used to fabricate surface plasmon subwavelength nanostructures made of periodic hole arrays. The light spectrum of the fabricated nanostructures is characterized by using UV-Vis-NIR spectrophotometer (Agilent, Cary 5000) and the surface morphology is measured by using atomic force microscope (AFM, Park System XE-100) and scanning electron microscope (SEM, JEOL JSM-7100F). Relationship between the parameters of the hole arrays and the corresponding spectral characteristics and their potential applications are also discussed.

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Light transmission in nanostructures

  • Kim, D. S.;Park, Q-H.;S. H. Han;Ch. Lienau
    • Journal of the Korean Vacuum Society
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    • v.12 no.S1
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    • pp.113-115
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    • 2003
  • We investigate transmission of light in nanoscale structures. We present spatial and temporal domain measurements of the dephasing of surface plasmon excitations in metal films with periodic nano-hole arrays. By probing coherent spatial SP propagation lengths of a few f1. $\mu$m and an ultrafast decay of the SP polarization on a 10 fs timescale, we demonstrate that the SP transmission peaks are homogeneously broadened by the SP radiative lifetime. The pronounced wavelength and hole size dependence of the dephasing rate shows that the microscopic origin of the conversion of SP into light is a Rayleigh-like scattering by the periodic hole array. We have experimentally studied the dephasing of surface plasmon excitations in metallic nano-hole arrays. By relating nanoscopic SP propagation, ultrafast light transmission and optical spectra, we demonstrate that the transmission spectra of these plasmonic bandgap structures are homogeneously broadened. The spectral line shape and dephasing time are dominated by Rayleigh scattering of SP into light and can varied over a wide range by controlling the resonance energy and/or hole radius. This opens the way towards designing SP nano-optic devices and spatially and spectrally tailoring light -matter interactions on nanometer length scales.

Punching of Micro-Hole Array (미세 홀 어레이 펀칭 가공)

  • Son Y. K.;Oh S. I.;Rhim S. H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.09a
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    • pp.193-197
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    • 2005
  • This paper presents a method by which multiple holes of ultra small size can be punched simultaneously. Silicon wafers were used to fabricate punching die. Workpiece used in the present investigation were the rolled pure copper of $3{\mu}m$ in thickness and CP titanium of $1.5{\mu}m$ in thickness. The metal foils were punched with the dies and arrays of circular and rectangular holes were made. The diameter of holes ranges from $2-10{\mu}m$. The process set-up is similar to that of the flexible rubber pad forming or Guerin process. Arrays of holes were punched successfully in one step forming. The punched holes were examined in terms of their dimensions, surface qualities, and potential defect. The effects of the die hole dimension on ultra small size hole formation of the thin foil were discussed. The optimum process condition such as proper die shape and diameter-thickness ratio (d/t) were also discussed. The results in this paper show that the present method can be successfully applied to the fabrication of ultra small size hole array in a one step operation.

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Color Tunable Nanostructures by Polarization Control for Display Applications

  • Cho, Eun-Byurl;Ko, Yeong-Il;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.567-567
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    • 2013
  • Surface plasmon resonance is the enhancement of electromagnetic wave caused by oscillation on the metal and dielectric interfaces. Surface plasmons with nanohole arrays provides an enhancedresonance for the specific wavelengths of interests. Asymmetric array of nanoscale structures can enable orientation dependent shift of resonance wavelengths when combined with the control of polarization for incident visible light, thus providing color tunability. Appropriate lattice constants along the direction of polarization in rectangular nanohole arrays can determine the resonance condition generating red (R), green (G), and blue (B) colors and potentially be applied to display applications. In ourprevious report, we have optimized the ion beam nanomachining conditions to fabricate the nanostructures on the metal film. We apply the fabrication conditions to make nanoscale hole arrays using 100 nm thick gold layer on the glass substrate with the optimal design of periodicities along x, y, and diagonal directions of a=440 nm, b=520 nm, c=682 nm, and the hole diameter of d=200 nm. Using the reflective light in dark field mode of optical microscope, we can observe different colors. When the polarizer is paralleled along a, b, or c direction, the represented color is changed to R, G, and B, respectively. We further map the color using i1 to correlate the conditions of the nanohole arrays with their characteristic color.

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PRESSURE MODULAION ON MICRO-MACHINED PORT FUEL INJECTOR PERFORMANCE

  • Kim, H.;Im, K.S.;Lai, M.C.
    • International Journal of Automotive Technology
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    • v.5 no.1
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    • pp.9-16
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    • 2004
  • An experimental study was carried out to characterize the spray atomization process of micro-machined port fuel injectors with a piezoelectric atomization device, which can generate pressure pulsations through vibration of a piezoelectric transducer. In this study, several types of micro-machined arrays such as 30∼200-microns of hole arrays were tested. Both a dual-stream and a central-port injectors with micro-machined arrays were tested and compared with normal port fuel injectors. The spray visualization was conducted to characterize overall spray structure and phase Doppler particle analyzer (PDPA) system was used to quantify the droplet size and velocity. In addition, the pressure history was recorded by using digitized signal from pressure transducer. The results showed that modulation is effective to the spray atomization for tested injectors and atomization performance depends on injector design factors, orifice sizes, and frequency and power of the modulator. A number of resonance frequencies of the modulator was modified by injector parameters and temperature. In addition, our results suggested that design of sufficient space among holes is critical to avoid droplet coalescence in the multi-hole micro-machined injectors.