• 한국세라믹학회지
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• 제43권11호
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• pp.715-723
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• 2006

Perovskite oxide materials are very important for the electronics industry, because they exhibit promising properties. With an interest in the obvious applications, significant effort has been invested in the growth of highly crystalline epitaxial perovskite oxide thin films in our laboratory. And the desired structure of films was formed to achieve excellent properties. $Y_1Ba_2Cu_3O_{7-x}$ (YBCO) superconducting thin films were simultaneously deposited on both sides of 3 inch wafer by inverted cylindrical sputtering. Values of microwave surface resistance R$_2$ (75 K, 145 GHz, 0 T) smaller than 100 m$\Omega$ were reached over the whole area of YBCO thin films by pre-seeded a self-template layer. For implementation of voltage tunable high-quality varactor, A tri-layer structured SrTiO$_3$ (STO) thin films with different tetragonal distortion degree was prepared in order to simultaneously achieve a large relative capacitance change and a small dielectric loss. Highly a-axis textured $Ba_{0.65}Sr_{0.35}TiO_3$ (BST65/35) thin films was grown on Pt/Ti/SiO$_2$/Si substrate for monolithic bolometers by introducing $Ba_{0.65}Sr_{0.35}RuO_3$ (BSR65/35) thin films as buffer layer. With the buffer layer, the leakage current density of BST65/35 thin films were greatly reduced, and the pyroelectric coefficient of $7.6\times10_{-7}$ C $cm^{-2}$ $K^{-1}$ was achieved at 6 V/$\mu$m bias and room temperature.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.330-330
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• 2007

Polycrystalline mercuric iodide $HgI_2$) films are being developed as a new detector technology for digital x-ray imaging. The $HgI_2$ is generally vacuum deposited by physical vapor deposition (PVD) process. But the PVD thick deposition has been caused any instability in the biasing due to any defects or cracks. In this work we present a new particle-in-binder (PIB) methodologies used for the $HgI_2$ thick films. These growth techniques can be easily extended to produce much larger film areas. This paper, for the first time, presents results and comparison of polycrystalline $HgI_2$ films derived by various PIB methods. We investigated the structural and morphological properties of the films using X-ray diffraction (XRD) and scanning electron microscopy (SEM) analysis. The films were characterized with respect to their electrical properties and in response to x-ray photons. Physical and electrical results were also compared between conventional polycrystalline PVD and our detectors. Leakage current as low as $350\;pA/cm^2$ at the bias voltage of ~ 200 V has been observed. And high sensitivity and good linearity in the response to x-rays was obtained in the film derived by PIB sedimentation method. Our future efforts will concentrate on optimization of film growth techniques for uniform large area deposition on image readout arrays.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.176-176
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• 2007

Flat-panel direct conversion detectors used in compound substance of semiconductor are being studied for digital x-ray imaging. Recently, such detectors are deposited by physical vapor deposition(PVD) generally. But, most of materials (HgI2, PbI2, TlBr, PbO) deposited by PVD have shown difficult fabrication and instability for large area x-ray imaging. Consequently, in this paper, we propose applicable potentialities for screen printing method that is coated on a substrate easily. It is compared to electrical properties among semiconductors such as $HgI_2$, $PbI_2$, PbO, HgBrI, InI, and $TlPbI_3$ under investigation for direct conversion detectors. Each film detector consists of an ~25 to $35\;{\mu}m$ thick layer of semiconductor and was coated onto the substrate. Substrates of $2cm{\times}2cm$ have been used to evaluate performance of semiconductor radiation detectors. Dark current, sensitivity and physics properties were measured. Leakage current of $HgI_2$ as low as $9pA/mm^2$ at the operation bias voltage of ${\sim}1V/{\mu}m$ was observed. Such a value is not better than PVD process, but it is easy to be fabricated in high quality for large area x-ray Imaging. Our future efforts will concentrate on optimization of growth of film thickness that is coated onto a-Si TFT array.

• 대한금속재료학회지
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• 제46권10호
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• pp.683-690
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• 2008

In order to develop transparent electrodes for high efficiency GaN-based light emitting diodes (LEDs), the electrical and optical properties of the electron beam evaporated ITO contacts have been investigated as a function of the deposition temperature and flow rate of oxygen during the deposition. As the deposition temperature increases from $140^{\circ}C$ to $220^{\circ}C$, the resistivity of the ITO films decreases slightly from $4.0{\times}10^{-4}{\Omega}cm$ to $3.3{\times}10^{-4}{\Omega}cm$, meanwhile the transmittance of the ITO films significantly increases from 67% to 88% at the wavelength of 470 nm. When the flow rate of oxygen during the deposition increases from 2 sccm to 4 sccm, the resistivity of the ITO films increases from $3.6{\times}10^{-4}{\Omega}cm$ to $7.4{\times}10^{-4}{\Omega}cm$, meanwhile the transmittance of the ITO films increases from 86% to 99% at 470 nm. Blue LEDs fabricated with the electron beam evaporated ITO electrode show that the ITO films deposited at $200^{\circ}C$ and 3 sccm of the oxygen flow rate give a low forward-bias voltage of 3.55 V at injection current of 20 mA with a highest output power.

• 한국인터넷방송통신학회논문지
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• 제22권4호
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• pp.67-72
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• 2022

본 논문에서는 60 nm GaN/Si HEMT 공정을 사용하여 전력증폭기(Power Amplifier)의 설계를 제시하였다. 고주파 설계를 위하여 맞춤형 트랜지스터 모델을 구성하였다. Output stage는 저손실 설계를 위해 마이크로스트립 라인을 사용하여 회로를 구성하였다. 또한 RC 네트워크로 구성된 Bias Feeding Line과 Input bypass 회로의 AC Ground(ACGND) 회로를 각각 적용하여 DC 소스에 연결된 노드의 최소임피던스가 RF회로에 영향을 미치지 않도록 하였다. 이득과 출력을 고려하여 3단의 구조로 설계되었다. 설계된 전력증폭기의 최종 사이즈는 3900 ㎛ × 2300 ㎛ 이다. 중심 주파수에서 설계된 결과는 12 V의 공급 전압에서 15.9 dB의 소 신호 이득, 29.9 dBm의 포화 출력(Psat), 24.2 %의 PAE를 달성하였다.

• Carbon letters
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• 제1권2호
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• pp.53-59
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• 2000

The synthetic methods for high yield of multiwalled carbon nanotube (MWNT) and singlewalled carbon nanotube (SWNT) with high purity by arc discharge have been investigated. MWNTs were synthesized under different pressures of helium and the gas mixture of argon and hydrogen. Relatively high pressure of 300-400 torr was required for high yield MWNTs synthesis at low bias voltage of about 20 V and 55 A, whereas low pressure of about 100 torr was required for SWNTs. The introduction of hydrogen gases during the synthesis of MWNTs improved the yield and purity of the samples. The SWNTs were synthesized by the assistance of a small amount of mixture of transition metals, which played as a catalyst during the formation process. The purity and yield of SWNTs were higher at a lower pressure and enhanced by mixing more components of the transition metals.

• 대한전자공학회논문지SD
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• 제42권5호
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• pp.31-38
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• 2005

본 논문에서는, UTMI호환 USB2.0 PHY 칩의 구조와 세부 설계 내용 전반에 대하여 기술하였다. 노이즈 채널 환경에서, 수신데이터의 유효성을 판단하기 위한 방법으로 squelch 상태 검출 회로 및 전류모드 슈미트-트리거 회로를 설계하였으며, 레플리카 바이어스 회로를 사용한 온칩 종단(ODT) 회로와, 480Mbps 데이터 송신을 위한 전류모드 차동 출력 구동회로를 설계하였다. 또한, 플레시오크로너스 클럭킹 방식을 사용하는 USB 시스템에서, 송수신단 사이의 주파수 차이를 보상하기 위하여, 클럭데이터 복원회로와 FIFO를 사용한 동기화 회로를 설계하였다. 네트웍 분석기를 이용한 손실전송선(W-model) 모델 파라미터를 측정을 통해 추출하였으며, 설계를 위한 시뮬레이션 과정에 활용하였다. 설계된 칩은 0.25um CMOS 공정으로 제작하였으며, 이에 대한 측정 결과를 제시하였다. IO패드를 제외한 칩의 코어 면적은 $0.91{\times}1.82mm^2$ 이었고, 2.5V 전원전압에서 전체 전력소모량은, 480MHz 동작 시 245mW, 12MHz 동작 시 150mW로 시뮬레이션 되었다.

• 한국항해항만학회지
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• 제26권1호
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• pp.22-27
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• 2002

본 논문에서는 hybrid 기법을 이용하여 INMARSAT 위성의 상향 주파수인 L-HAND(1.6265∼1.6465 GHz)에서 동작하는 위성단말기용 25 Watt C급 고출력증폭기를 설계 ·제작하였다. 제작의 간편성을 위해서 전력증폭기를 크게 구동증폭단과 전력증폭단으로 나누어 구현하였으며, 전력증폭단을 구동하기 위한 구동단은 Motorola사의 MRF-640을 사용하여 2단으로 구성하였고, 전력증폭단은 MRF-16006과 MRF-16730을 사용하였다. 또 각 부에 직류 전원을 공급하기 위해 바이어스 회로부를 같은 하우징 내에 장착하여 무게 및 부피를 최소화하였다. 제작된 고출력증폭기는 20 MHz 대역폭 내에서 이득이 30 dB 이상, 입 ·출력 정재파비는 1.7 이하의 특성을 가졌다. 1.635 GHz 주파수에 대해 1 dB 압축점의 출력전력은 44 dBm 으로서 설계시 목표로 했던 출력전력 25 Watt를 상회하였다. 본 논문에서 제시한 SSPA(Solid State Power Amplifier) 제작 기법은 각종 Radar 및 SCPC(Signal Channel Per Carrier)용 전력증폭기 설계 및 제작에도 적용할 수 있다.

• 한국전기전자재료학회논문지
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• 제24권3호
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• pp.182-187
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• 2011

In this paper, PBTI characteristics of NMOSFETs with La incorporated HfSiON and HfON are compared in detail. The charge trapping model shows that threshold voltage shift (${\Delta}V_{\mathrm{T}}$) of NMOSFETs with HfLaON is greater than that of HfLaSiON. PBTI lifetime of HfLaSiON is also greater than that of HfLaON by about 2~3 orders of magnitude. Therefore, high charge trapping rate of HfLaON can be explained by higher trap density than HfLaSiON. The different de-trapping behavior under recovery stress can be explained by the stable energy for U-trap model, which is related to trap energy level at zero electric field in high-k dielectric. The trap energy level of two devices at zero electric field, which is extracted using Frenkel-poole emission model, is 1,658 eV for HfLaSiON and 1,730 eV for HfLaON, respectively. Moreover, the optical phonon energy of HfLaON extracted from the thermally activated gate current is greater than that of HfLaSiON.

• 한국정보전자통신기술학회논문지
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• 제13권5호
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• pp.359-369
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• 2020

본 논문에서는 CMOS X-Ray 검출기의 메인 클럭을 발생시키는 위상 고정 루프(phase locked loop, PLL)을 위한 전류 불일치를 줄이면서도 넓은 동작 범위를 가지는 전하 펌프(charge pump, CP) 회로를 제안하였다. CP 회로의 동작 범위와 전류 불일치는 CP 회로를 구성하는 전류원 회로의 동작 범위와 출력 저항에 의해서 결정된다. 제안된 CP 회로는 넓은 동작 범위를 확보하기 위한 wide operating 전류 복사 바이어스 회로와 전류 불일치를 줄이기 위한 출력 저항이 큰 캐스코드 구조의 전류원으로 구현하였다. 제안된 wide operating range 캐스코드 CP 회로는 350nm CMOS 공정을 이용하여 칩으로 제작되었으며 소스 측정 장치(source measurement unit)을 활용하여 전류 일치 특성을 측정하였다. 이때 전원 전압은 3.3V이고 CP 회로의 전류 ICP=100㎂이었다. 제안된 CP 회로의 동작 범위 △VO_Swing=2.7V이고 이때 최대 전류 불일치는 5.15%이고 최대 전류 편차는 2.64%로 측정되었다. 제안된 CP 회로는 낮은 전류 불일치 특성을 가지면서 광대역 주파수 범위에 대응할 수 있으므로 다양한 클럭 속도가 필요한 시스템에 적용할 수 있다.